摘要:
The present invention provides a protein having low-substrate-specific amino acid racemase activity; DNA encoding the protein; a recombinant DNA comprising the DNA; a transformant carrying the recombinant DNA; a process for producing the protein by using the transformant; and a process for producing a racemic amino acid which comprises allowing a culture of the transformant or a treated matter thereof as an enzyme source and an amino acid to be present in an aqueous medium to racemize the amino acid in the aqueous medium, and recovering the racemic amino acid from the aqueous medium.
摘要:
An SiGe layer is grown on a silicon substrate. The SiGe layer or the silicon substrate and SiGe layer are porosified by anodizing the SiGe layer to form a strain induction porous layer or a porous silicon layer and strain induction porous layer. An SiGe layer and strained silicon layer are formed on the resultant structure. The SiGe layer in the stacking growth step only needs to be on the uppermost surface of the porous layer. For this reason, an SiGe layer with a low defect density and high concentration can be formed. Since the SiGe layer on the strain induction porous layer can achieve a low defect density without lattice mismatching. Hence, a high-quality semiconductor substrate having a high strained silicon layer can be obtained.
摘要:
The present invention provides a process for producing a dipeptide or a dipeptide derivative using a phosphate donor, a substance selected from the group consisting of adenosine-5′-monophosphate, adenosine-5′-diphosphate and adenosine-5′-triphosphate, one or more kinds of amino acids or amino acid derivatives, and as enzyme sources, a protein having polyphosphate kinase activity, or a culture of cells having the ability to produce the protein or a treated matter of the culture, and a protein having the activity to ATP-dependently form the dipeptide or dipeptide derivative from one or more kinds of amino acids or amino acid derivatives, or a culture of cells having the ability to produce the protein or a treated matter of the culture.
摘要:
The present invention provides a liquid crystal display device which can simplify patterning steps of signal wirings and electrodes during manufacture and can enhance the reliability by preventing the electrolytic corrosion of terminal portions or the like. At the time of forming electrodes and/or signal wirings on a substrate 1, an amorphous oxide conductive film 3 having a large etching rate is laminated onto a metal film 2 which is made of chromium or the like and is formed on the substrate 1, and these films arc etched simultaneously in only one photolithography treatment.
摘要:
A reflection type display apparatus includes an image display having a plurality of pixels, with each of the pixels including a first electrode having a light transmitting property, a second electrode disposed in opposition to the first electrode, and a third electrode disposed in opposition to the first or second electrode. An electrolytic solution containing a metal ion is disposed in contact with the first, second and third electrodes, and a control unit sets a direction of a current flowing between the first, second and third electrodes. The control unit sets a first state of forming a first electroplating of a first color on the first electrode using the first electrode as a negative electrode and using the second electrode as a positive electrode, a second state of forming a second electroplating of a second color on the second electrode using the second electrode as the negative electrode and using the first electrode as the positive electrode without forming the first electroplating, and a third state of forming a third electroplating of a third color on the third electrode using the third electrode as the negative electrode and using the first and second electrodes as the positive electrodes without forming the first and second electroplatings.
摘要:
The present invention provides a process for producing a dipeptide or a dipeptide derivative using a phosphate donor, a substance selected from the group consisting of adenosine-5′-monophosphate, adenosine-5′-diphosphate and adenosine-5′-triphosphate, one or more kinds of amino acids or amino acid derivatives, and as enzyme sources, a protein having polyphosphate kinase activity, or a culture of cells having the ability to produce the protein or a treated matter of the culture, and a protein having the activity to ATP-dependently form the dipeptide or dipeptide derivative from one or more kinds of amino acids or amino acid derivatives, or a culture of cells having the ability to produce the protein or a treated matter of the culture.
摘要:
A method for controlling noxious organisms in a field of soybean or corn, comprising the steps of: treating soybean or corn seeds with at least one neonicotinoid compound selected from the group consisting of clothianidin, thiamethoxam, imidacloprid, dinotefuran, nitenpyram, acetamiprid, and thiacloprid, and treating the field with at least one PPO inhibitor compound selected from the group consisting of flumioxazin, sulfentrazone, saflufenacil, oxyfluorfen, and 3-(4-chloro-6-fluoro-2-trifluoromethylbenzimidazol-7-yl)-1-methyl-6-trifluoromethyl-2,4-(1H,3H)pyrimidinedione before or after the soybean or corn seeds treated with the neonicotinoid compound are sown in the field.
摘要:
A display apparatus using electroplating on an electrode for modulating light includes a layer formed on the electrode. The layer has an insulator with a gap therein, and conductive fine particles are dispersed in the gap.
摘要:
An SiGe layer is grown on a silicon substrate. The SiGe layer or the silicon substrate and SiGe layer are porosified by anodizing the SiGe layer to form a strain inducing porous layer or a porous silicon layer and strain inducing porous layer. An SiGe layer and strained silicon layer are formed on the resultant structure. The SiGe layer in the stacking growth step only needs to be on the uppermost surface of the porous layer. For this reason, an SiGe layer with a low defect density and high concentration can be formed. Since the SiGe layer on the strain inducing porous layer can achieve a low defect density without lattice mismatching. Hence, a high-quality semiconductor substrate having a high strained silicon layer can be obtained.
摘要:
A method of manufacturing a semiconductor substrate includes a growing step of growing a second single crystalline semiconductor on a first single crystalline semiconductor, a blocking layer forming step of forming a blocking layer on the second single crystalline semiconductor, and a relaxing step of generating crystal defects at a portion deeper than the blocking layer to relax a stress acting on the second single crystalline semiconductor. The blocking layer includes, e.g., a porous layer, and prevents the crystal defects at the portion deeper than the blocking layer from propagating to the surface of the second single crystalline semiconductor.