公开(公告)号：US5200299A

公开(公告)日：1993-04-06

申请号：US454199

申请日：1989-12-21

申请人： Hartmut Steppan ,  Hans-Dieter Frommeld

发明人： Hartmut Steppan ,  Hans-Dieter Frommeld

IPC分类号： C07D215/12 ,  C07D215/14 ,  C07D219/02 ,  C07D221/16 ,  C08F2/50 ,  G03F7/031

CPC分类号： C07D219/02 ,  C07D221/16 ,  G03F7/031 ,  Y10S430/121 ,  Y10S522/904

摘要： Compounds of the general formula I ##STR1## are described in which R.sup.1 is a group of the formula ##STR2## and R.sup.2 is a hydrogen atom or a methyl group, orR.sup.1 and R.sup.2 jointly form an optionally substituted 5- or 6-membered ring,R.sup.3 is a hydrogen atom, a methyl group or an optionally substituted phenyl group,R.sup.4 is a hydrogen or halogen atom, a methyl group, an optionally substituted benzoyl group or a group of the formula ##STR3## n is zero or 1, X is a hydrogen or chlorine atom, an alkyl group containing 1 to 4 carbon atoms or one of the groups OA, CH.sub.2 OA, CH.sub.2 NHA or C.sub.2 H.sub.4 OA, andA is an acryloyl or methacryloyl group,the compounds containing in each case at least one group A. The compounds are suitable for the production of photoresists and printing plates as diffusion-resistant photoinitiators in photopolymerizable mixtures.

摘要翻译： 描述了通式I的化合物（I），其中R 1是下式的基团，其中R 2是氢原子或甲基，或者R 1和R 2共同形成任选被取代的5-或6 R 3是氢原子，甲基或任意取代的苯基，R 4是氢或卤素原子，甲基，任意取代的苯甲酰基或下式的基团n是0或 1，X是氢或氯原子，含有1至4个碳原子的烷基或基团OA，CH2OA，CH2NHA或C2H4OA之一，A是丙烯酰基或甲基丙烯酰基，每种情况下含有至少一个 该组合物适用于在可光聚合混合物中制备光致抗蚀剂和印版作为扩散阻力的光引发剂。

公开(公告)号：US4966828A

公开(公告)日：1990-10-30

申请号：US651116

申请日：1984-09-13

申请人： Reinhard Doenges ,  Hans Ruckert ,  Ulrich Geissler ,  Hartmut Steppan

发明人： Reinhard Doenges ,  Hans Ruckert ,  Ulrich Geissler ,  Hartmut Steppan

IPC分类号： C07D277/20 ,  C07D209/12 ,  C07D215/10 ,  C07D215/12 ,  C07D215/14 ,  C07D277/12 ,  C07D277/64 ,  C07D277/84 ,  C07D293/00 ,  C07D293/12 ,  C07D521/00 ,  C08F2/00 ,  C08F2/50 ,  C08G85/00 ,  G03C1/00 ,  G03C1/675 ,  G03F7/029

CPC分类号： C07D215/10 ,  C07D209/12 ,  C07D215/12 ,  C07D277/12 ,  C07D277/64 ,  C07D277/84 ,  C07D293/12 ,  G03C1/675 ,  G03F7/0295 ,  Y10S430/123

摘要： Disclosed is a compound of the general formula ##STR1## wherein L=H or CO--(R.sup.1).sub.n (CX.sub.3).sub.m, M=alkylene, alkenylene, Q=S, Se, O, dialkylmethylene, alken-1,2-ylene, 1,2-phenylene or N-R, with M+Q together forming 3 or 4 ring members, R=alkyl, aralkyl or alkoxyalkyl, R.sup.1 is an aromatic group and X=Cl, Br or I, with n=O and m=1 or n=1 and m=1 or 2. The compounds, on exposure, eliminate HX and form free radicals and are therefore highly effective as acid donors and free radical initiators for photochemical processes.

摘要翻译： 公开了通式“IMAGE”的化合物，其中L = H或CO-（R1）n（CX3）m，M =亚烷基，亚烯基，Q = S，Se，O，二烷基亚甲基，烯-1,2-亚烯 ，1,2-亚苯基或NR，其中M + Q一起形成3或4个环成员，R =烷基，芳烷基或烷氧基烷基，R 1是芳基，X = Cl，Br或I，n = O，m = 1或n = 1且m = 1或2.化合物在暴露时消除HX并形成自由基，因此作为酸化剂和光化学过程的自由基引发剂是高度有效的。

公开(公告)号：US4956264A

公开(公告)日：1990-09-11

申请号：US820782

申请日：1986-01-22

申请人： Ulrich Geissler ,  Hartmut Steppan ,  Walter Herwig

发明人： Ulrich Geissler ,  Hartmut Steppan ,  Walter Herwig

IPC分类号： C08F2/50 ,  C08F2/46 ,  C08F2/48 ,  C08F2/54 ,  C08F20/28 ,  C08F20/34 ,  C08F290/00 ,  C08F299/02 ,  G03C1/00 ,  G03F7/004 ,  G03F7/027 ,  G03F7/028 ,  G03F7/032 ,  H01L21/027

CPC分类号： G03F7/027 ,  Y10S430/111

摘要： A radiation-polymerizable mixture, recording material and process for using the recording material in relief recordings. The radiation-polymerizable mixture contains:(a) a polymeric binder,(b) a compound of the formula: ##STR1## `in which A is O, NH or N-alkyl,Q is --CO--C.sub.p H.sub.2p -Z-- or --C.sub.k H.sub.2k O--,Z is O or NH,R.sup.1 is H or alkyl,R.sup.2 is alkyl, alkenyl, cycloalkyl, aryl, aralkyl or SO.sub.2 R.sup.3,R.sup.3 is alkyl, alkenyl, cycloalkyl, aryl, aralkyl or aryloxy,k is a number from 3 to 20,l is a number from 0 to 20,m is a number from 2 to 20,n is a number from 1 to 20 andp is a number from 2 to 10, and(c) a compound or a combination of compounds, which is capable of initiating the polymerization of the compound (b) under the action of actinic radiation.The mixture is especially suitable for the preparation of dry photoresist materials and is distinguished by good flexibility and adhesion to copper and by easy strippability in the light-cured state.

摘要翻译： 辐射聚合性混合物，记录材料以及在凸版记录中使用记录材料的方法。 可辐射聚合的混合物包含：（a）聚合物粘合剂，（b）下式化合物：其中A是O，NH或N-烷基，Q是-CO-CpH2p-Z-或 - CkH2kO-，Z是O或NH，R1是H或烷基，R2是烷基，烯基，环烷基，芳基，芳烷基或SO2R3，R3是烷基，烯基，环烷基，芳基，芳烷基或芳氧基，k是3〜 20，l为0〜20的数，m为2〜20的数，n为1至20的数，p为2至10的数，以及（c）化合物或化合物的组合， 其能够在光化辐射的作用下引发化合物（b）的聚合。 该混合物特别适用于干燥光致抗蚀剂材料的制备，并且具有良好的柔韧性和对铜的粘合性，并且在光固化状态下易于剥离。

公开(公告)号：US4506003A

公开(公告)日：1985-03-19

申请号：US551025

申请日：1983-11-14

申请人： Hans Ruckert ,  Gerhard Buhr ,  Hartmut Steppan

发明人： Hans Ruckert ,  Gerhard Buhr ,  Hartmut Steppan

IPC分类号： G03C1/72 ,  C08L33/00 ,  C08L33/02 ,  C08L61/00 ,  C08L61/04 ,  C08L61/06 ,  C08L75/00 ,  C08L75/04 ,  G03C1/74 ,  G03C5/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/16 ,  H01L21/027 ,  H01L21/30 ,  H05K3/00 ,  G03C1/68

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S522/904

摘要： A positive-working radiation-sensitive mixture is described which is composed of a compound having at least one C--O--C bond which can be split by acid, a compound which forms a strong acid when irradiated, a binder which is insoluble in water and soluble in aqueous-alkaline solutions, and a resin having solubility properties which differ from those of the binder and which is selected from (1) a polyurethane resin obtained from an organic isocyanate and a polymer which contains hydroxyl groups, (2) a polyvinyl alkyl ether, (3) an alkyl acrylate polymer, or (4) a hydrogenated or partially hydrogenated derivative of colophony. As a result of the resin additives, photoresist layers are obtained which have good adhesion to the support, good flexibility, good latitude in developing and good resolution.

摘要翻译： 描述了一种正性辐射敏感性混合物，其由具有至少一个可被酸分解的COC键的化合物，在照射时形成强酸的化合物，不溶于水并且可溶于水的粘合剂 - 碱性溶液和具有与粘合剂不同的溶解性的树脂，其选自（1）由有机异氰酸酯和含有羟基的聚合物得到的聚氨酯树脂，（2）聚乙烯基烷基醚，（ 3）丙烯酸烷基酯聚合物，或（4）氢化或部分氢化的松香衍生物。 作为树脂添加剂的结果，获得了对支持物具有良好粘附性的光致抗蚀剂层，良好的柔韧性，显影良好的分辨率和良好的分辨率。

公开(公告)号：US3985566A

公开(公告)日：1976-10-12

申请号：US549429

申请日：1975-02-12

申请人： Gerhard Buhr ,  Hartmut Steppan

发明人： Gerhard Buhr ,  Hartmut Steppan

IPC分类号： C08F20/00 ,  C08F8/00 ,  C08F20/26 ,  C08F20/30 ,  C08F220/00 ,  C08F220/10 ,  C08F290/00 ,  C08F299/00 ,  C09D133/04 ,  G03F7/038 ,  G03C1/68 ,  G03C1/70 ,  G03C5/08

CPC分类号： G03F7/0388 ,  C08F20/30 ,  C08F8/00 ,  G03F7/038 ,  Y10S522/904

摘要： Polymers capable of being cross-linked by light, which comprise units having lateral substituted 1-carbonyloxy-1H-naphthalene-2-one groups of the formula ##SPC1##Where R is hydrogen or methyl; R.sub.1 is a streight-chain or branched, saturated or unsaturated hydrocarbon radical having from 1 to 3 carbon atoms, in which a hydrogen atom may be substituted by cyano, (C.sub.1 to C.sub.2) alkoxy, carbo-(C.sub.1 to C.sub.2)-alkoxy, (C.sub.1 to C.sub.2)acyl or (C.sub.1 to C.sub.2)acyloxy and R.sub.2 and R.sub.3, independently, each are (C.sub.1 to C.sub.4)alkyl or chlorine; and R.sub.4 is (C.sub.1 to C.sub.4)alkyl, nitro, chlorine or bromine, are provided.

摘要翻译： 能够通过光交联的聚合物，其包含具有式WHERE R为氢或甲基的侧取代的1-羰基氧基-1H-萘-2-酮的单元; R 1是具有1至3个碳原子的链状或支链，饱和或不饱和的烃基，其中氢原子可以被氰基，（C1-C2）烷氧基，碳 - （C1-C2） - 烷氧基， （C1至C2）酰基或（C1至C2）酰氧基，R2和R3独立地为（C1至C4）烷基或氯; 并且R4是（C1-C4）烷基，硝基，氯或溴。