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    Image-recording materials and image-recording carried out using these to produce an optical mask
    11.
    发明授权
    Image-recording materials and image-recording carried out using these to produce an optical mask 失效
    使用这些图像记录材料和图像记录来制造光学掩模

    公开(公告)号：US4515877A

    公开(公告)日：1985-05-07

    申请号：US554327

    申请日：1983-11-22

    Applicant: Helmut Barzynski ,  Klaus Holoch

    Inventor： Helmut Barzynski ,  Klaus Holoch

    IPC: B41M5/28 ,  B41M5/30 ,  B41M5/333 ,  G03C1/00 ,  G03F1/68 ,  G03F7/004 ,  G03F9/00

    CPC classification number: G03F1/68 ,  B41M5/282 ,  B41M5/333 ,  Y10S428/913 ,  Y10S430/146 ,  Y10S522/907

    Abstract: A resist film comprises a dimensionally stable base (B), which is transparent to actinic light in the wavelength range from 300 to 420 nm, and a mask-forming layer (ML) which is sensitive to heat radiation and contains a thermochromic system which, when irradiated with an IR laser having a wavelength greater than 1.00 .mu.m, undergoes an irreversible change in its absorption spectrum in the wavelength range from 300 to 420 nm so that the optical density of the mask-forming layer (ML) in this wavelength range changes by not less than 1.3 units. The base of the resist film can also be applied onto the photosensitive relief-forming layer (RL) of a recording material to give a multilayer image-recording material. Imagewise irradiation with heat, for example using an IR laser, produces, in the mask-forming layer (ML) of the resist film, a UV photomask which is very useful for exposing photosensitive recording materials.

    Abstract translation: 抗蚀剂膜包括对波长范围为300〜420nm的光化素透明的尺寸稳定的基材（B）和对热辐射敏感的掩模形成层（ML），并且含有热变色体系， 当用波长大于1.00μm的IR激光器照射时，在300〜420nm的波长范围内，其吸收光谱发生不可逆变化，使得在该波长范围内的掩模形成层（ML）的光密度 变化不小于1.3个单位。 抗蚀剂膜的基底也可以施加到记录材料的感光凸版形成层（RL）上，得到多层图像记录材料。 用例如使用IR激光的热成像照射在抗蚀剂膜的掩模形成层（ML）中产生对于曝光感光记录材料非常有用的UV光掩模。

    Sheet-like, multilayer, laser-optical recording material
    13.
    发明授权
    Sheet-like, multilayer, laser-optical recording material 失效
    片状，多层，激光光学记录材料

    公开(公告)号：US4889756A

    公开(公告)日：1989-12-26

    申请号：US231384

    申请日：1988-08-12

    Applicant: Helmut Barzynski ,  Heidi Benthack-Thomas ,  Karl-Ruediger Hellwig ,  Christof Taubitz

    Inventor： Helmut Barzynski ,  Heidi Benthack-Thomas ,  Karl-Ruediger Hellwig ,  Christof Taubitz

    IPC: B41M5/26 ,  C08L25/04 ,  C08L71/00 ,  C08L71/12 ,  G11B7/253 ,  G11B7/257 ,  G11B11/10 ,  G11B11/105

    CPC classification number: G11B7/253 ,  G11B7/257 ,  Y10S428/913 ,  Y10S430/146 ,  Y10T428/31

    Abstract: Laser-optical recording material comprises:(a) an optically transparent and isotropic, homogeneous substrate which is free of orientation birefringence and(b) one or more amorphous, thermally alterable recording layers,wherein the substrate (a)(a.sub.1) has one or two structured surfaces, the structures being in the micrometer and/or submicrometer range, and is formed form a blend of poly-(2,6-dimethylphenylene ether) (PPE) with one or more styrene polymers, the content of PPE in this blend being about 25-45% by weight, based on the blend, and(a.sub.2) that part of the blend which is not PPE contains, based on this part (a.sub.2),(a.sub.21) from 0.1 to 8% by weight of cyanoethylene groups and/or(a.sub.22) from 1 to 60% by weight of 1-methyl-1-phenylethylene groups and/or(a.sub.23) from 1 to 60% by weight of 4'-methylphenylethylene groups and/or(a.sub.24) from 0.01 to 10% by weight of groups of the general formula I ##STR1## where R.sup.1 is hydrogen or methyl and R.sup.2 is C.sub.1 -C.sub.10 -alkyl, C.sub.5 -C.sub.8 -cycloalkyl or C.sub.6 -C.sub.10 -alkyl, C.sub.5 -C.sub.8 -cycloalkyl or C.sub.6 C.sub.10 -aryl, and in any case,(a.sub.25) not less than 40% by weight of phenylethylene groups.Audio or video compact disks which contains a substrate having the said composition are also claimed.

    Abstract translation: 激光光学记录材料包括：（a）光学透明和各向同性的均匀的基体，其不具有取向双折射和（b）一个或多个非晶的可热改变的记录层，其中基底（a）（a1）具有一个或多个 两个结构化表面，该结构处于千分尺和/或亚微米范围内，并由聚（2,6-二甲基亚苯基醚）（PPE）与一种或多种苯乙烯聚合物的共混物形成，该混合物中PPE的含量 为基于共混物的约25-45重量％，和（a2）不是PPE的共混物的一部分基于该部分（a2），（a21）含有0.1-8重量％的氰乙烯基 和/或（a22）1〜60重量％的1-甲基-1-苯基乙烯基和/或（a23）1〜60重量％的4'-甲基苯基乙烯基和/或（a24）0.01〜 10重量％的通式I的基团，其中R 1是氢或甲基，R 2是C 1 -C 10 - 烷基，C 5 -C 8 - 环烷基或C 6 -C 10 - 烷基 ，C 5 -C 8 - 环烷基或C 6 C 10 - 芳基，并且在任何情况下，（a25）不少于40重量％的苯基乙烯基。 还要求保护含有具有所述组合物的基片的音频或视频光盘。

    Process of making and using a positive working photosensitive film resist material
    14.
    发明授权
    Process of making and using a positive working photosensitive film resist material 失效
    制造和使用正性感光膜抗蚀剂材料的工艺

    公开(公告)号：US4576902A

    公开(公告)日：1986-03-18

    申请号：US678050

    申请日：1984-12-04

    Applicant: Dietrich Saenger ,  Helmut Barzynski

    Inventor： Dietrich Saenger ,  Helmut Barzynski

    IPC: G03C1/72 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/16 ,  H01L21/027 ,  G03C5/00

    CPC classification number: G03F7/039 ,  G03F7/161

    Abstract: A positive working photosensitive film resist material suitable for multiple image-wise exposure comprises, on a dimensionally stable base film, a photosensitive coating which contains (a) a polymer which possesses aromatic or hetero-aromatic o-nitrocarbinol ester groups (for example o-nitrobenzyl acrylate units) and which can be washed out, after exposure, with an alkaline solvent, and (b) a transparent plasticizer compatible with (a). The product may be used as photopolymer dry film resist material in the production of electrical conductor boards, chemically milled fine-line parts, and identification plates.

    Abstract translation: 适用于多次成像曝光的正性感光性感光膜材料包括在尺寸稳定的基底膜上的感光性涂层，其包含（a）具有芳族或杂芳族邻硝基甲醇酯基团的聚合物（例如， 硝基苄基丙烯酸酯单元），并且可以在暴露后用碱性溶剂洗涤，和（b）与（a）相容的透明增塑剂。 该产品可用作生产电导体板，化学磨细细线部件和识别板中的光聚合物干膜抗蚀剂材料。

    Multi-layer elements suitable for the production of printing plates and relief plates
    15.
    发明授权
    Multi-layer elements suitable for the production of printing plates and relief plates 失效
    适用于生产印版和浮雕板的多层元件

    公开(公告)号：US4459348A

    公开(公告)日：1984-07-10

    申请号：US498711

    申请日：1983-05-27

    Applicant: Mong-Jon Jun ,  Peter Richter ,  Helmut Barzynski

    Inventor： Mong-Jon Jun ,  Peter Richter ,  Helmut Barzynski

    IPC: G03F7/09 ,  G03C1/93 ,  G03F7/11 ,  G03F7/30 ,  G03C1/78

    CPC classification number: G03F7/11 ,  G03C1/93 ,  Y10S430/106

    Abstract: A multi-layer element for the production of printing plates and relief plates which is based on an elastomeric polymer binder and is firmly anchored to a polyester base by means of an adhesive layer. The adhesive layer consists of a thermally hardened mixture which is insoluble in aromatic hydrocarbon solvents or aliphatic halohydrocarbon solvents and contains (c1) from 90 to 40% by weight, based on the sum of (c1) and (c2), of an hydroxyl-containing polyurethane, hydroxyl-containing epoxy, hydroxyl-containing phenoxy resin, polyester-ol or polyether-ol resin which has been hardened and crosslinked with isocyanate, and which has from about 4 to 20% by weight, based on the non-crosslinked and hardenable resin, of free OH groups before hardening and crosslinking with isocyanate, and (c2) from 10 to 60% by weight, based on the sum of (c1) and (c2), of an OH-free polycarbonate which is compatible with the resin (c1) before the latter is hardened and crosslinked.

    Abstract translation: 一种用于生产基于弹性体聚合物粘合剂并且通过粘合剂层牢固地锚固到聚酯基底的印刷版和凸版的多层元件。 粘合剂层由热固化的混合物组成，其不溶于芳烃溶剂或脂族卤代烃溶剂，并且含有（c1）基于（c1）和（c2）之和的90至40重量％ 含有羟基的环氧树脂，含羟基的苯氧基树脂，聚酯 - 醇或聚醚 - 醇树脂，其已经被异氰酸酯硬化和交联，并且基于未交联和/或交联的约4至20重量％ 硬化和与异氰酸酯交联之前的游离OH基的可硬化树脂，和（c2）基于（c1）和（c2）之和为10至60重量％的与OH 树脂（c1）在其后硬化和交联。

    Photopolymerizable coating and recording materials containing a photoinitiator and an organic halogen compound
    17.
    发明授权
    Photopolymerizable coating and recording materials containing a photoinitiator and an organic halogen compound 失效
    含有光引发剂和有机卤素化合物的光聚合涂层和记录材料

    公开(公告)号：US4239609A

    公开(公告)日：1980-12-16

    申请号：US974622

    申请日：1978-12-27

    Applicant: Helmut Barzynski ,  Dietrich Saenger

    Inventor： Helmut Barzynski ,  Dietrich Saenger

    IPC: C08F2/00 ,  C08F2/46 ,  C08F2/50 ,  C08F4/32 ,  C09D4/00 ,  C09D5/00 ,  C09D11/00 ,  C09D11/10 ,  G03F7/029 ,  G03F7/031

    CPC classification number: G03F7/0295 ,  C08F2/50 ,  G03F7/031

    Abstract: Photopolymerizable coating and recording materials, such as photopolymer dry film resist materials and photoresist materials, comprising at least one photopolymerizable olefinic compound, which materials contain, as activated photoinitiator system, a carbonyl compound that, when exposed to actinic light, forms free radicals which initiate polymerization, such as benzophenone and benzophenone derivatives, as well as a benzene compound having at least two dichloromethyl groups bound to the benzene nucleus, such as bis(dichloromethyl)-benzene and 2,5-dichloro-1,4-bis(dichloromethyl)benzene, and preferably also a dye which changes color in the presence of acid. The coating and recording materials of the invention exhibit improved curing when exposed to ultraviolet light for the usual periods and can be readily washed out with solvents without any damage to the exposed areas.

    Abstract translation: 可光聚合涂层和记录材料，例如光聚合物干膜抗蚀剂材料和光致抗蚀剂材料，其包含至少一种可光聚合的烯属化合物，该材料包含作为活化的光引发剂体系的羰基化合物，其在暴露于光化光时形成自由基，其起始 例如二苯甲酮和二苯甲酮衍生物，以及具有与苯核结合的至少两个二氯甲基的苯化合物，例如双（二氯甲基） - 苯和2,5-二氯-1,4-双（二氯甲基） 苯，优选还有在酸存在下改变颜色的染料。 本发明的涂料和记录材料在常规时期暴露于紫外线时表现出改进的固化，并且可以容易地用溶剂洗涤而不会对暴露的区域造成任何损害。

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