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26 条记录 (耗时 0.016 秒)

    Process of making and using a positive working photosensitive film resist material
    1.
    发明授权
    Process of making and using a positive working photosensitive film resist material 失效
    制造和使用正性感光膜抗蚀剂材料的工艺

    公开(公告)号：US4576902A

    公开(公告)日：1986-03-18

    申请号：US678050

    申请日：1984-12-04

    申请人： Dietrich Saenger ,  Helmut Barzynski

    发明人： Dietrich Saenger ,  Helmut Barzynski

    IPC分类号： G03C1/72 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/16 ,  H01L21/027 ,  G03C5/00

    CPC分类号： G03F7/039 ,  G03F7/161

    摘要： A positive working photosensitive film resist material suitable for multiple image-wise exposure comprises, on a dimensionally stable base film, a photosensitive coating which contains (a) a polymer which possesses aromatic or hetero-aromatic o-nitrocarbinol ester groups (for example o-nitrobenzyl acrylate units) and which can be washed out, after exposure, with an alkaline solvent, and (b) a transparent plasticizer compatible with (a). The product may be used as photopolymer dry film resist material in the production of electrical conductor boards, chemically milled fine-line parts, and identification plates.

    摘要翻译： 适用于多次成像曝光的正性感光性感光膜材料包括在尺寸稳定的基底膜上的感光性涂层，其包含（a）具有芳族或杂芳族邻硝基甲醇酯基团的聚合物（例如， 硝基苄基丙烯酸酯单元），并且可以在暴露后用碱性溶剂洗涤，和（b）与（a）相容的透明增塑剂。 该产品可用作生产电导体板，化学磨细细线部件和识别板中的光聚合物干膜抗蚀剂材料。

    Photopolymerizable coating and recording materials containing a photoinitiator and an organic halogen compound
    2.
    发明授权
    Photopolymerizable coating and recording materials containing a photoinitiator and an organic halogen compound 失效
    含有光引发剂和有机卤素化合物的光聚合涂层和记录材料

    公开(公告)号：US4239609A

    公开(公告)日：1980-12-16

    申请号：US974622

    申请日：1978-12-27

    申请人： Helmut Barzynski ,  Dietrich Saenger

    发明人： Helmut Barzynski ,  Dietrich Saenger

    IPC分类号： C08F2/00 ,  C08F2/46 ,  C08F2/50 ,  C08F4/32 ,  C09D4/00 ,  C09D5/00 ,  C09D11/00 ,  C09D11/10 ,  G03F7/029 ,  G03F7/031

    CPC分类号： G03F7/0295 ,  C08F2/50 ,  G03F7/031

    摘要： Photopolymerizable coating and recording materials, such as photopolymer dry film resist materials and photoresist materials, comprising at least one photopolymerizable olefinic compound, which materials contain, as activated photoinitiator system, a carbonyl compound that, when exposed to actinic light, forms free radicals which initiate polymerization, such as benzophenone and benzophenone derivatives, as well as a benzene compound having at least two dichloromethyl groups bound to the benzene nucleus, such as bis(dichloromethyl)-benzene and 2,5-dichloro-1,4-bis(dichloromethyl)benzene, and preferably also a dye which changes color in the presence of acid. The coating and recording materials of the invention exhibit improved curing when exposed to ultraviolet light for the usual periods and can be readily washed out with solvents without any damage to the exposed areas.

    摘要翻译： 可光聚合涂层和记录材料，例如光聚合物干膜抗蚀剂材料和光致抗蚀剂材料，其包含至少一种可光聚合的烯属化合物，该材料包含作为活化的光引发剂体系的羰基化合物，其在暴露于光化光时形成自由基，其起始 例如二苯甲酮和二苯甲酮衍生物，以及具有与苯核结合的至少两个二氯甲基的苯化合物，例如双（二氯甲基） - 苯和2,5-二氯-1,4-双（二氯甲基） 苯，优选还有在酸存在下改变颜色的染料。 本发明的涂料和记录材料在常规时期暴露于紫外线时表现出改进的固化，并且可以容易地用溶剂洗涤而不会对暴露的区域造成任何损害。

    Image-recording materials and image-recording carried out using these
    9.
    发明授权
    Image-recording materials and image-recording carried out using these 失效
    使用这些图像记录材料和图像记录

    公开(公告)号：US4555471A

    公开(公告)日：1985-11-26

    申请号：US678051

    申请日：1984-12-04

    申请人： Helmut Barzynski ,  Klaus Holoch

    发明人： Helmut Barzynski ,  Klaus Holoch

    IPC分类号： B41M5/28 ,  B41M5/30 ,  B41M5/333 ,  G03C1/00 ,  G03F1/68 ,  G03F7/004 ,  G03C1/71 ,  G03F7/02

    CPC分类号： G03F1/68 ,  B41M5/282 ,  B41M5/333 ,  Y10S428/913 ,  Y10S430/146 ,  Y10S522/907

    摘要： A resist film comprises a dimensionally stable base (B), which is transparent to actinic light in the wavelength range from 300 to 420 nm, and a mask-forming layer (ML) which is sensitive to heat radiation and contains a thermochromic system which, when irradiated with an IR laser having a wavelength greater than 1.00 .mu.m, undergoes an irreversible change in its absorption spectrum in the wavelength range from 300 to 420 nm so that the optical density of the mask-forming layer (ML) in this wavelength range changes by not less than 1.3 units. The base of the resist film can also be applied onto the photosensitive relief-forming layer (RL) of a recording material to give a multilayer image-recording material. Imagewise irradiation with heat, for example using an IR laser, produces, in the mask-forming layer (ML) of the resist film, a UV photomask which is very useful for exposing photosensitive recording materials.

    摘要翻译： 抗蚀剂膜包括对波长范围为300〜420nm的光化素透明的尺寸稳定的基材（B）和对热辐射敏感的掩模形成层（ML），并且含有热变色体系， 当用波长大于1.00μm的IR激光器照射时，在300〜420nm的波长范围内，其吸收光谱发生不可逆变化，使得在该波长范围内的掩模形成层（ML）的光密度 变化不小于1.3个单位。 抗蚀剂膜的基底也可以施加到记录材料的感光凸版形成层（RL）上，得到多层图像记录材料。 用例如使用IR激光的热成像照射在抗蚀剂膜的掩模形成层（ML）中产生对于曝光感光记录材料非常有用的UV光掩模。