Apparatus for spatial and temporal control of temperature on a substrate
    11.
    发明授权
    Apparatus for spatial and temporal control of temperature on a substrate 有权
    用于空间和时间控制基板上的温度的装置

    公开(公告)号:US08038796B2

    公开(公告)日:2011-10-18

    申请号:US11027481

    申请日:2004-12-30

    Abstract: An apparatus for control of a temperature of a substrate has a temperature-controlled base, a heater, a metal plate, a layer of dielectric material. The heater is thermally coupled to an underside of the metal plate while being electrically insulated from the metal plate. A first layer of adhesive material bonds the metal plate and the heater to the top surface of the temperature controlled base. This adhesive layer is mechanically flexible, and possesses physical properties designed to balance the thermal energy of the heaters and an external process to provide a desired temperature pattern on the surface of the apparatus. A second layer of adhesive material bonds the layer of dielectric material to a top surface of the metal plate. This second adhesive layer possesses physical properties designed to transfer the desired temperature pattern to the surface of the apparatus. The layer of dielectric material forms an electrostatic clamping mechanism and supports the substrate.

    Abstract translation: 用于控制基板的温度的装置具有温度控制的基座,加热器,金属板,电介质材料层。 加热器在与金属板电绝缘的同时热耦合到金属板的下侧。 第一层粘合剂材料将金属板和加热器粘合到温度受控底座的顶部表面。 该粘合剂层具有机械柔性,并具有设计用于平衡加热器的热能和外部工艺的物理性能,以在设备的表面上提供期望的温度图案。 第二层粘合剂材料将介电材料层粘合到金属板的顶表面上。 该第二粘合剂层具有设计成将期望的温度图案转移到设备的表面的物理性质。 介电材料层形成静电夹持机构并支撑基板。

    Method of manufacturing apparatus for spatial and temporal control of temperature on a substrate
    12.
    发明申请
    Method of manufacturing apparatus for spatial and temporal control of temperature on a substrate 有权
    制造基板温度空间和时间控制装置的方法

    公开(公告)号:US20090078360A1

    公开(公告)日:2009-03-26

    申请号:US12232673

    申请日:2008-09-22

    Abstract: An apparatus for control of a temperature of a substrate has a temperature-controlled base, a heater, a metal plate, a layer of dielectric material. The heater is thermally coupled to an underside of the metal plate while being electrically insulated from the metal plate. A first layer of adhesive material bonds the metal plate and the heater to the top surface of the temperature controlled base. This adhesive layer is mechanically flexible, and possesses physical properties designed to balance the thermal energy of the heaters and an external process to provide a desired temperature pattern on the surface of the apparatus. A second layer of adhesive material bonds the layer of dielectric material to a top surface of the metal plate. This second adhesive layer possesses physical properties designed to transfer the desired temperature pattern to the surface of the apparatus. The layer of dielectric material forms an electrostatic clamping mechanism and supports the substrate.

    Abstract translation: 用于控制基板的温度的装置具有温度控制的基座,加热器,金属板,电介质材料层。 加热器在与金属板电绝缘的同时热耦合到金属板的下侧。 第一层粘合剂材料将金属板和加热器粘合到温度受控底座的顶部表面。 该粘合剂层具有机械柔性,并具有设计用于平衡加热器的热能和外部工艺的物理性能,以在设备的表面上提供期望的温度图案。 第二层粘合剂材料将介电材料层粘合到金属板的顶表面上。 该第二粘合剂层具有设计成将期望的温度图案转移到设备的表面的物理性质。 介电材料层形成静电夹持机构并支撑基板。

    Apparatus for spatial and temporal control of temperature on a substrate
    13.
    发明申请
    Apparatus for spatial and temporal control of temperature on a substrate 有权
    用于空间和时间控制基板上的温度的装置

    公开(公告)号:US20060144516A1

    公开(公告)日:2006-07-06

    申请号:US11027481

    申请日:2004-12-30

    Abstract: An apparatus for control of a temperature of a substrate has a temperature-controlled base, a heater, a metal plate, a layer of dielectric material. The heater is thermally coupled to an underside of the metal plate while being electrically insulated from the metal plate. A first layer of adhesive material bonds the metal plate and the heater to the top surface of the temperature controlled base. This adhesive layer is mechanically flexible, and possesses physical properties designed to balance the thermal energy of the heaters and an external process to provide a desired temperature pattern on the surface of the apparatus. A second layer of adhesive material bonds the layer of dielectric material to a top surface of the metal plate. This second adhesive layer possesses physical properties designed to transfer the desired temperature pattern to the surface of the apparatus. The layer of dielectric material forms an electrostatic clamping mechanism and supports the substrate.

    Abstract translation: 用于控制基板的温度的装置具有温度控制的基座,加热器,金属板,电介质材料层。 加热器在与金属板电绝缘的同时热耦合到金属板的下侧。 第一层粘合剂材料将金属板和加热器粘合到温度受控底座的顶部表面。 该粘合剂层具有机械柔性,并具有设计用于平衡加热器的热能和外部工艺的物理性能,以在设备的表面上提供期望的温度图案。 第二层粘合剂材料将介电材料层粘合到金属板的顶表面上。 该第二粘合剂层具有设计成将期望的温度图案转移到设备的表面的物理性质。 介电材料层形成静电夹持机构并支撑基板。

    Module for automated matrix removal
    14.
    发明申请
    Module for automated matrix removal 失效
    自动矩阵去除模块

    公开(公告)号:US20050036917A1

    公开(公告)日:2005-02-17

    申请号:US10641946

    申请日:2003-08-15

    Abstract: An automated matrix removal module is configurable to automatically withdraw a portion of sample containing an interferent. The module is further configurable to mix the portion of sample with a precipitating reagent selected to react with the interferent to form a precipitant and then filter mixture of sample and precipitant reagent through a filter. Finally, the module is further configurable to flush the precipitant from the filter.

    Abstract translation: 自动矩阵去除模块可配置为自动提取含有干扰物的样品的一部分。 该模块还可配置为将样品的一部分与选择的与沉淀剂反应的沉淀剂混合以形成沉淀剂,然后通过过滤器过滤样品和沉淀剂的混合物。 最后,该模块进一步可配置以从过滤器冲洗沉淀剂。

    Plasma processing systems with mechanisms for controlling temperatures of components
    15.
    发明授权
    Plasma processing systems with mechanisms for controlling temperatures of components 有权
    具有用于控制部件温度的机构的等离子体处理系统

    公开(公告)号:US08900404B2

    公开(公告)日:2014-12-02

    申请号:US12468670

    申请日:2009-05-19

    Applicant: James Tappan

    Inventor: James Tappan

    CPC classification number: H01J37/32568 H01J37/32522 H01J37/32623

    Abstract: A plasma processing system with improved component temperature control is disclosed. The system may include a plasma processing chamber having a chamber wall. The system may also include an electrode disposed inside the plasma processing chamber. The system may also include a support member disposed inside the plasma processing chamber for supporting the electrode. The system may also include a support plate disposed outside the chamber wall. The system may also include a cantilever disposed through the chamber wall for coupling the support member with the support plate. The system may also include a lift plate disposed between the chamber wall and the support plate. The system may also include thermally resistive coupling mechanisms for mechanically coupling the lift plate with the support plate.

    Abstract translation: 公开了一种具有改进的组件温度控制的等离子体处理系统。 该系统可以包括具有室壁的等离子体处理室。 该系统还可以包括设置在等离子体处理室内部的电极。 该系统还可以包括设置在等离子体处理室内部用于支撑电极的支撑构件。 该系统还可以包括设置在室壁外部的支撑板。 该系统还可以包括通过室壁设置的用于将支撑构件与支撑板联接的悬臂。 该系统还可以包括设置在室壁和支撑板之间的提升板。 该系统还可以包括用于将升降板与支撑板机械联接的热阻耦合机构。

    Multiple electrospray probe interface for mass spectrometry
    16.
    发明申请
    Multiple electrospray probe interface for mass spectrometry 失效
    用于质谱的多个电喷探针接口

    公开(公告)号:US20070221837A1

    公开(公告)日:2007-09-27

    申请号:US11386389

    申请日:2006-03-22

    CPC classification number: H01J49/165 H01J49/0431

    Abstract: In one embodiment, an analytical apparatus is provided that includes a carriage; and a plurality of electrospray probes pivotably mounted on the carriage, wherein movement of the carriage engages a feature with a selected one of the electrospray probes whereby movement of the feature pivots the selected one of the electrospray probes with respect to the carriage.

    Abstract translation: 在一个实施例中,提供一种包括滑架的分析装置; 以及可枢转地安装在滑架上的多个电喷雾探针,其中滑架的运动与选定的电喷雾探针中的一个特征接合,由此该特征的运动相对于滑架枢转所选择的一个电喷雾探针。

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