公开(公告)号：US5466929A

公开(公告)日：1995-11-14

申请号：US20802

申请日：1993-02-22

申请人： Katsuhiko Sakai ,  Osamu Nasu ,  Yoichi Ose

发明人： Katsuhiko Sakai ,  Osamu Nasu ,  Yoichi Ose

IPC分类号： H01J37/02 ,  H01J37/30 ,  H05H3/00

CPC分类号： H01J37/026 ,  H01J2237/0041 ,  H01J2237/0044 ,  H01J2237/3175

摘要： When a charged beam is irradiated on a sample, charge up of electric charge of the same polarity as that of the charged beam is built up on the sample surface. In order to neutralize the charge up electric charge, an apparatus for suppressing electrification of sample in charged beam irradiation apparatus is provided in which electric charge of opposite polarity to that of the charged beam is generated near the sample surface to neutralize the charged beam or charge up electric charge on the sample surface. The electric charge for neutralization is generated by admitting elecrtic charge from a plasma generation unit to the vicinity of the sample surface, ionizing gas generated from the sample surface by causing the charged beam to collide the gas or by irradiating electrons from an electron source on the sample surface. Especially when there is a possibility that impurities other than the electric charge for neutralization affect the sample adversely, an impurity generation source is blind folded with a cover so as not to be seen through from the sample and charged beam so that the impurities may be prevented from impinging upon the sample surface or intersecting the charged beam path.

摘要翻译： 当将带电束照射在样品上时，在样品表面上积累与带电束相同极性的电荷的充电。 为了中和充电电荷，提供了一种用于抑制带电束照射装置中的样品带电的装置，其中在样品表面附近产生与带电束的极性相反极性的电荷以中和充电的光束或电荷 样品表面上的电荷。 用于中和的电荷是通过将等离子体发生单元的电荷进入到样品表面附近而产生的，通过使带电的束撞击气体或通过在电子源上照射电子而从样品表面产生的电离电离 样品表面。 特别是当除了中和电荷以外的杂质有可能不利地影响样品时，杂质产生源被遮盖物盲目地折叠，从而不能从样品和带电束中透过，从而可以防止杂质 撞击在样品表面上或与带电光束相交。

公开(公告)号：US4939360A

公开(公告)日：1990-07-03

申请号：US310917

申请日：1989-02-16

申请人： Katsuhiko Sakai

发明人： Katsuhiko Sakai

IPC分类号： H01J37/20 ,  H01J37/02 ,  H01J37/04 ,  H01J37/317

CPC分类号： H01J37/026

摘要： A particle beam irradiating apparatus including a particle beam irradiating device for irradiating a charged particle beam such as ions or electrons to a specimen. A charged particle source is included for irradiating an electron beam to the specimen which is positively charged or an ion beam to the specimen which is negatively charged so as to neutralize the specimen, and a voltage supply is include for applying a bias voltage difference not more than 10 V between the charged particle source and the specimen. As the specimen is not charged with a high voltage, the specimen does not break down.The particle beam irradiating apparatus is effectively used in an electron microscope, an electron beam lithography system, an ion implanter, an ion microprobe analyzer, a secondary ion mass spectrometer.

摘要翻译： 一种粒子束照射装置，其包括用于向样本照射诸如离子或电子的带电粒子束的粒子束照射装置。 包括带电粒子源，用于向带正电荷的样品照射电子束或将带有负电荷的样品的离子束照射到中和样本，并且电压源包括用于施加不超过 带电粒子源与样品之间的电压高于10 V。 由于样品没有高电压充电，样品不会分解。 粒子束照射装置有效地用于电子显微镜，电子束光刻系统，离子注入机，离子微探针分析仪，二次离子质谱仪中。

公开(公告)号：US07973282B2

公开(公告)日：2011-07-05

申请号：US11723457

申请日：2007-03-20

申请人： Mitsugu Sato ,  Katsuhiko Sakai ,  Atsushi Takane ,  Yoshihiko Nakayama

发明人： Mitsugu Sato ,  Katsuhiko Sakai ,  Atsushi Takane ,  Yoshihiko Nakayama

IPC分类号： H01J37/21 ,  G01N21/00 ,  G01N23/00

CPC分类号： H01J37/244 ,  H01J37/21 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/21 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/24592 ,  H01J2237/2816 ,  H01J2237/2817

摘要： There is provided a charged particle beam apparatus which allows implementation of a high-reliability and high-accuracy dimension measurement even if height differences exist on the surface of a sample. The charged particle beam apparatus includes the following configuration components: An acquisition unit for acquiring a plurality of SEM images whose focus widths are varied in correspondence with the focal depths, a determination unit for determining, from the plurality of SEM images acquired, a SEM image for which the image sharpness degree of the partial domain including a dimension-measuring domain becomes the maximum value, and a measurement unit for measuring the dimension of the predetermined domain from the SEM image whose image sharpness degree is the maximum value.

摘要翻译： 提供了一种带电粒子束装置，即使在样品的表面上存在高差也允许实现高可靠性和高精度尺寸测量。 带电粒子束装置包括以下配置部件：用于获取与焦点深度相对应的聚焦宽度变化的多个SEM图像的获取单元，确定单元，用于从所获取的多个SEM图像中确定SEM图像 包括尺寸测量区域的部分域的图像清晰度变为最大值;以及测量单元，用于从图像锐度度为最大值的SEM图像测量预定域的尺寸。

公开(公告)号：US07679411B2

公开(公告)日：2010-03-16

申请号：US12289030

申请日：2008-10-17

申请人： Katsuhiko Sakai ,  Atsuhiro Sengoku ,  Teruhiko Saitou

发明人： Katsuhiko Sakai ,  Atsuhiro Sengoku ,  Teruhiko Saitou

IPC分类号： H03L7/00

CPC分类号： G06F1/24 ,  G06F1/30 ,  H03K17/22

摘要： A reset signal generation circuit for generating a reset signal synchronously or asynchronously to a clock signal in accordance with an operation state. An operation detection circuit detects operation of a CPU and generates an operation detection signal. A signal control circuit generates a first reset signal synchronously or asynchronously to an internal clock signal based on the operation detection signal and a system reset signal. The first reset signal is provided to synchronous circuits including the CPU.

摘要翻译： 一种复位信号产生电路，用于根据操作状态产生与时钟信号同步或异步的复位信号。 操作检测电路检测CPU的操作并产生操作检测信号。 信号控制电路基于操作检测信号和系统复位信号，产生与内部时钟信号同步或异步的第一复位信号。 第一复位信号被提供给包括CPU的同步电路。

公开(公告)号：US5907053A

公开(公告)日：1999-05-25

申请号：US894136

申请日：1997-07-30

申请人： Katsuhiko Sakai

发明人： Katsuhiko Sakai

IPC分类号： C07C253/24 ,  C07C253/26 ,  C07C253/28 ,  C07C255/08

CPC分类号： C07C253/28 ,  C07C253/24 ,  C07C253/26

摘要： This invention relates to a method for preparing acrylonitrile by ammoxydation using a multi-story quenching tower. The method comprises the steps of supplying the reacted gas into the first quenching chamber of the multi-story quenching tower, said first quenching chamber has a water supply pipe equipped with spray nozzles at a two-dimensional density of more than 2 nozzles/m.sup.2 for the sectional area of the multi-story quenching tower and contacting the reacted gas with 5 T or more of water per 1 T of the reacted gas fed from the nozzles.

摘要翻译： PCT No.PCT / JP96 / 00133 Sec。 371日期1997年7月30日 102（e）日期1997年7月30日PCT提交1996年1月25日PCT公布。 第WO96 / 23765号公报 日期：1996年8月8日本发明涉及使用多层骤冷塔通过氨氧化制备丙烯腈的方法。 该方法包括以下步骤：将反应的气体供应到多层骤冷塔的第一淬火室中，所述第一淬火室具有供水管，该供水管具有二维密度大于2个喷嘴/ m2的喷嘴，用于 多层淬火塔的截面积，并使反应气体与每喷嘴喷射的每1升反应气体中的5T或更多的水接触。

公开(公告)号：US5668368A

公开(公告)日：1997-09-16

申请号：US643252

申请日：1996-05-02

申请人： Katsuhiko Sakai ,  Osamu Nasu ,  Yoichi Ose

发明人： Katsuhiko Sakai ,  Osamu Nasu ,  Yoichi Ose

IPC分类号： H01J37/02 ,  H01J37/30 ,  H05H3/00

CPC分类号： H01J37/026 ,  H01J2237/0041 ,  H01J2237/0044 ,  H01J2237/3175

摘要： When a charged beam is irradiated on a sample, charge up of electric charge of the same polarity as that of the charged beam is built up on the sample surface. In order to neutralize the charge up electric charge, an apparatus for suppressing electrification of sample in charged beam irradiation apparatus is provided in which electric charge of opposite polarity to that of the charged beam is generated near the sample surface to neutralize the charged beam or charge up electric charge on the sample surface. The electric charge for neutralization is generated by admitting electric charge from a plasma generation unit to the vicinity of the sample surface ionizing gas generated from the sample surface by causing the charged beam to collide the gas or by irradiating electrons from an electron source on the sample surface. Especially when there is a possibility that impurities other than the electric charge for neutralization affect the sample adversely, an impurity generation source is blind folded with a cover so as not to be seen through from the sample and charged beam so that the impurities may be prevented from impinging upon the sample surface or intersecting the charged beam path.

摘要翻译： 当将带电束照射在样品上时，在样品表面上积累与带电束相同极性的电荷的充电。 为了中和充电电荷，提供了一种用于抑制带电束照射装置中的样品带电的装置，其中在样品表面附近产生与带电束的极性相反极性的电荷以中和充电的光束或电荷 样品表面上的电荷。 用于中和的电荷是通过将电荷从等离子体产生单元接收到从样品表面产生的样品表面电离气体附近，通过使带电的束撞击气体或通过从样品上的电子源照射电子而产生的 表面。 特别是当除了中和电荷以外的杂质有可能不利地影响样品时，杂质产生源被遮盖物盲目地折叠，从而不能从样品和带电束中透过，从而可以防止杂质 撞击在样品表面上或与带电光束相交。

公开(公告)号：US20090079476A1

公开(公告)日：2009-03-26

申请号：US12289030

申请日：2008-10-17

申请人： Katsuhiko Sakai ,  Atsuhiro Sengoku ,  Teruhiko Saitou

发明人： Katsuhiko Sakai ,  Atsuhiro Sengoku ,  Teruhiko Saitou

IPC分类号： H03L7/00

CPC分类号： G06F1/24 ,  G06F1/30 ,  H03K17/22

摘要： A reset signal generation circuit for generating a reset signal synchronously or asynchronously to a clock signal in accordance with an operation state. An operation detection circuit detects operation of a CPU and generates an operation detection signal. A signal control circuit generates a first reset signal synchronously or asynchronously to an internal clock signal based on the operation detection signal and a system reset signal. The first reset signal is provided to synchronous circuits including the CPU.

摘要翻译： 一种复位信号产生电路，用于根据操作状态产生与时钟信号同步或异步的复位信号。 操作检测电路检测CPU的操作并产生操作检测信号。 信号控制电路基于操作检测信号和系统复位信号，产生与内部时钟信号同步或异步的第一复位信号。 第一复位信号被提供给包括CPU的同步电路。

公开(公告)号：US06858059B2

公开(公告)日：2005-02-22

申请号：US10279867

申请日：2002-10-25

申请人： Norio Yamamoto ,  Katsuhiko Sakai

发明人： Norio Yamamoto ,  Katsuhiko Sakai

IPC分类号： C22B9/22 ,  C22B34/12

CPC分类号： C22B9/228

摘要： An electron beam melting method for a metallic material which is melted by an electron beam in a melting furnace is disclosed. The method comprises: locating an actual melting material and a pre-melting material in the melting furnace; forming a melted surface on the pre-melting material by an electron beam under a reduced pressure; and melting the actual melting material by the electron beam while maintaining the reduced pressure in the melting furnace.

摘要翻译： 公开了一种在熔融炉中通过电子束熔化的金属材料的电子束熔化方法。 该方法包括：在熔炉中定位实际的熔化材料和预熔材料; 通过电子束在减压下在预熔材料上形成熔融表面; 并通过电子束熔化实际的熔融材料，同时保持熔化炉中的减压。

公开(公告)号：US5576538A

公开(公告)日：1996-11-19

申请号：US411150

申请日：1995-03-27

申请人： Katsuhiko Sakai ,  Osamu Nasu ,  Yoichi Ose

发明人： Katsuhiko Sakai ,  Osamu Nasu ,  Yoichi Ose

IPC分类号： H01J37/02 ,  H05H3/00

CPC分类号： H01J37/026 ,  H01J2237/0041 ,  H01J2237/0044 ,  H01J2237/3175

摘要： When a charged beam is irradiated on a sample, charge up of electric charge of the same polarity as that of the charged beam is built up on the sample surface. In order to neutralize the charge up electric charge, an apparatus for suppressing electrification of sample in charged beam irradiation apparatus is provided in which electric charge of opposite polarity to that of the charged beam is generated near the sample surface to neutralize the charged beam or charge up electric charge on the sample surface. The electric charge for neutralization is generated by admitting elecrtic charge from a plasma generation unit to the vicinity of the sample surface, ionizing gas generated from the sample surface by causing the charged beam to collide the gas or by irradiating electrons from an electron source on the sample surface. Especially when there is a possibility that impurities other than the electric charge for neutralization affect the sample adversely, an impurity generation source is blind folded with a cover so as not to be seen through from the sample and charged beam so that the impurities may be prevented from impinging upon the sample surface or intersecting the charged beam path.

摘要翻译： 当将带电束照射在样品上时，在样品表面上积累与带电束相同极性的电荷的充电。 为了中和充电电荷，提供了一种用于抑制带电束照射装置中的样品带电的装置，其中在样品表面附近产生与带电束的极性相反极性的电荷以中和充电的光束或电荷 样品表面上的电荷。 用于中和的电荷是通过将等离子体发生单元的电荷进入到样品表面附近而产生的，通过使带电束与气体碰撞或通过在电子源上照射电子而从样品表面产生的电离电离 样品表面。 特别是当除了中和电荷以外的杂质有可能不利地影响样品时，杂质产生源被遮盖物盲目地折叠，从而不能从样品和带电束中透过，从而可以防止杂质 撞击在样品表面上或与带电光束相交。