公开(公告)号：US6122036A

公开(公告)日：2000-09-19

申请号：US206238

申请日：1998-12-07

申请人： Shigeru Yamasaki ,  Masahiko Okumura

发明人： Shigeru Yamasaki ,  Masahiko Okumura

IPC分类号： G03B27/42 ,  G03F7/20 ,  G03F9/00 ,  G03B27/54

CPC分类号： G03F7/70691 ,  G03B27/42 ,  G03F7/70358 ,  G03F9/7034

摘要： In a projection exposure apparatus and method in which a substrate is exposed with a projected image of a mask through a projection optical system, a table which is movable in a direction of an optical axis of the projection optical system in arranged at an image side of the projection optical system to hold the substrate. A tilt amount of the table is monitored, and position information of a mark on the table is detected, which changes in accordance with the tilt of the table. Information on the relationship between a displacement amount of the substrate and a plane perpendicular to the optical axis and the tilt angle of the substrate is obtained, based on the monitored tilt amount and the position information of the mark.

摘要翻译： 在通过投影光学系统以掩模的投影图像曝光基板的投影曝光装置和方法中，可以在投影光学系统的光轴的方向上移动的工作台，该工作台布置在投影光学系统的图像侧 投影光学系统保持基板。 监视表的倾斜量，并检测表上的标记的位置信息，其根据表的倾斜而改变。 基于所监视的倾斜量和标记的位置信息，获得关于基板的位移量和垂直于光轴的平面与基板的倾斜角之间的关系的信息。

公开(公告)号：US08941808B2

公开(公告)日：2015-01-27

申请号：US12155714

申请日：2008-06-09

申请人： Katsushi Nakano ,  Masahiko Okumura ,  Tarou Sugihara ,  Takeyuki Mizutani ,  Tomoharu Fujiwara

发明人： Katsushi Nakano ,  Masahiko Okumura ,  Tarou Sugihara ,  Takeyuki Mizutani ,  Tomoharu Fujiwara

IPC分类号： G03B27/52 ,  G03F7/20 ,  G03F7/38

CPC分类号： G03F7/2041 ,  G03F7/38 ,  G03F7/70341 ,  G03F7/70925

摘要： An immersion type lithographic apparatus includes at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate.

摘要翻译： 浸没型光刻设备包括至少一个浸没空间和浸没系统，其被配置为至少部分地用液体填充浸没空间。 该装置被配置为在装置用于将图案化的辐射束投射到基板之前用冲洗液冲洗至少部分浸没空间。

公开(公告)号：US08780326B2

公开(公告)日：2014-07-15

申请号：US11517397

申请日：2006-09-08

申请人： Tohru Kiuchi ,  Takeyuki Mizutani ,  Masahiro Nei ,  Masato Hamatani ,  Masahiko Okumura

发明人： Tohru Kiuchi ,  Takeyuki Mizutani ,  Masahiro Nei ,  Masato Hamatani ,  Masahiko Okumura

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/58 ,  G03B27/32 ,  G03B27/54

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/70733

摘要： An exposure apparatus comprises a liquid immersion system, a first mover, and a prescribed member. The exposure apparatus exposes a substrate via an optical member and a liquid. The liquid immersion system performs supply and recovery of the liquid. The first mover can move in a first area, and can hold the liquid between itself and the optical member. The prescribed member is removed from the first mover when the first mover withdraws from a position opposing the optical member, and can hold the liquid between itself and the optical member.

摘要翻译： 曝光装置包括液浸系统，第一推动器和规定构件。 曝光装置经由光学部件和液体露出基板。 液浸系统进行液体的供给和回收。 第一移动器可以在第一区域中移动，并且可以在其与光学构件之间保持液体。 当第一移动器从与光学构件相对的位置退出时，规定构件从第一移动体移除，并且能够将液体保持在其与光学构件之间。

公开(公告)号：US07068350B2

公开(公告)日：2006-06-27

申请号：US10456485

申请日：2003-06-09

申请人： Kenji Nishi ,  Masahiko Okumura ,  Hiroki Okuno

发明人： Kenji Nishi ,  Masahiko Okumura ,  Hiroki Okuno

IPC分类号： G03B27/42 ,  G03B27/62

CPC分类号： G03F7/70425 ,  G03F7/70725 ,  G03F7/70733

摘要： After exposure of a divided area on a wafer is completed, for exposure of the next divided area, a control unit sends configuration information on control parameters necessary to expose the next divided area to a stage control system, sometime before the stage control system begins deceleration of a reticle stage and a wafer stage in a scanning direction. Therefore, both stages do not have to be suspended before acceleration for the stage control system to receive the configuration information on control parameters necessary to expose the next divided area, and since suspension time is not required, throughput can be improved. In this case, no serious problems occur, so the performance of other devices is not disturbed.

摘要翻译： 在晶片上的分割区域的曝光完成之后，为了下一个分割区域的曝光，控制单元将阶段控制系统开始减速之前的某个时刻向控制系统发送关于将下一个分割区域暴露出来的控制参数的配置信息 的标线片台和扫描方向的晶片台。 因此，在阶段控制系统的加速之前，不需要暂停两个阶段，以接收关于暴露下一个分割区域所需的控制参数的配置信息，并且由于不需要暂停时间，因此可以提高生产率。 在这种情况下，不会出现严重的问题，所以其他设备的性能不会受到干扰。

公开(公告)号：US06624433B2

公开(公告)日：2003-09-23

申请号：US09290867

申请日：1999-04-14

申请人： Masahiko Okumura ,  Kenji Nishi

发明人： Masahiko Okumura ,  Kenji Nishi

IPC分类号： G01N2186

CPC分类号： G03F7/70691 ,  G03F9/7011 ,  G03F9/7046

摘要： A positioning method and apparatus for positioning a substrate on a substrate stage which is movable in a predetermined direction (Y direction). In the positioning method, a relationship between a longitudinal direction (X′ direction) of a band-shaped light beam irradiated onto the substrate and the predetermined direction (Y direction) for determining the position of the substrate and the predetermined direction is measured and the substrate is positioned on the substrate stage based on the relationship between said longitudinal direction of the band-shaped light beam and the predetermined direction.

摘要翻译： 一种定位方法和装置，用于将衬底定位在可沿预定方向（Y方向）移动的衬底台上。 在定位方法中，测量照射到基板上的带状光束的纵向方向（X'方向）与用于确定基板的位置和预定方向的预定方向（Y方向）之间的关系，并且 基于所述带状光束的所述纵向与所述预定方向之间的关系，将所述基板定位在所述基板台上。

公开(公告)号：US6141108A

公开(公告)日：2000-10-31

申请号：US258146

申请日：1999-02-26

申请人： Yoshiki Kida ,  Masahiko Okumura

发明人： Yoshiki Kida ,  Masahiko Okumura

IPC分类号： G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  G01N11/00

CPC分类号： G03F7/70691 ,  G03F9/7011 ,  G03F9/7015

摘要： A method provides a technique for exposing a pattern on a mask that is held by a mask stage onto a substrate. The method includes a first step of detecting a mark on the mask that is held at a first position by the mask stage and determining a corresponding position of the mask stage; a second step of detecting the mark on the mask that is held at a second position different from the first position by the mask stage and determining a corresponding position of the mask stage; a third step of determining a position of the mask relative to the mask stage in accordance with the detection results in the first and second steps; a fourth step of aligning the mask with the substrate; and a fifth step of exposing the pattern on the mask onto the substrate.

摘要翻译： 一种方法提供了将由掩模台保持的掩模上的图案曝光到基板上的技术。 该方法包括：第一步骤，通过掩模台检测保持在第一位置的掩模上的标记，并确定掩模台的对应位置; 第二步骤，通过掩模台检测保持在与第一位置不同的第二位置的掩模上的标记，并确定掩模台的对应位置; 第三步骤，根据第一和第二步骤中的检测结果确定掩模相对于掩模载物台的位置; 将掩模与衬底对准的第四步骤; 以及将掩模上的图案曝光到基板上的第五步骤。

公开(公告)号：US5798530A

公开(公告)日：1998-08-25

申请号：US729938

申请日：1996-10-15

申请人： Masahiko Okumura

发明人： Masahiko Okumura

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01N21/86

CPC分类号： G03F7/70633 ,  G03F7/70725 ,  G03F9/7046 ,  G03F9/7088

摘要： An exposure apparatus is designed to reduce the influences of alignment errors due to dynamic fluctuations and improve the throughput while basically using an off-axis alignment scheme. A wafer stage on which a test wafer is place is step-driven in accordance with a shot arrangement in an exposure operation. Subsequently, variations in position of the wafer stage, which occur while the position of alignment marks observed by a TTR alignment system coincide with aimed positions, are stored. In an exposure operation with respect to a wafer to be exposed, the prestored variations in position of the wafer stage are reproduced when alignment of each shot area is performed in accordance with the position of each alignment mark, detected by an off-axis alignment system.

摘要翻译： 设计曝光装置以减少由于动态波动引起的对准误差的影响，并且在基本上使用离轴对准方案时提高了吞吐量。 其中放置测试晶片的晶片台根据曝光操作中的拍摄布置进行逐步驱动。 随后，存储当由TTR对准系统观察到的对准标记的位置与目标位置一致时发生的晶片台位置的变化。 在相对于要曝光的晶片的曝光操作中，根据由对准系统检测的每个对准标记的位置执行每个拍摄区域的对准时，再现晶片台的预先存储的位置变化 。

公开(公告)号：US08136472B2

公开(公告)日：2012-03-20

申请号：US12770108

申请日：2010-04-29

申请人： Junji Yamauchi ,  Yasuhito Hanaki ,  Kuniharu Iwamoto ,  Toshiaki Matsuno ,  Masahiko Okumura ,  Henry J. Kelm

发明人： Junji Yamauchi ,  Yasuhito Hanaki ,  Kuniharu Iwamoto ,  Toshiaki Matsuno ,  Masahiko Okumura ,  Henry J. Kelm

IPC分类号： G01L19/12 ,  G01L7/16 ,  F17C13/02

CPC分类号： G01F22/02 ,  G01F23/161 ,  G01L19/08 ,  Y10S116/07

摘要： An indicator includes a case mountable in a gas filling passage of a pressure container; a valve element which is urged toward one side of the case connectable to the pressure container, the valve element being movable in the case to a position balanced with gas pressure in the pressure container; a seal member for ensuring gas tightness between the valve element and the case; and an indicating member slidable relative to the case between a position protruding outside the case and a position not protruding. The spring force and a gas pressure force may be equally balanced at first and second balanced positions of the valve element.

摘要翻译： 指示器包括可安装在压力容器的气体填充通道中的壳体; 阀元件，其被推向与壳体连接的壳体的一侧，阀元件可在壳体中移动到与压力容器中的气体压力平衡的位置; 用于确保阀元件和壳体之间的气密性的密封构件; 以及指示构件，其能够相对于所述壳体在突出到所述壳体外部的位置与未突出的位置之间滑动。 在阀元件的第一和第二平衡位置处，弹簧力和气体压力力可以相等地平衡。

公开(公告)号：US20110222037A1

公开(公告)日：2011-09-15

申请号：US11517397

申请日：2006-09-08

申请人： Tohru Kiuchi ,  Takeyuki Mizutani ,  Masahiro Nei ,  Masato Hamatani ,  Masahiko Okumura

发明人： Tohru Kiuchi ,  Takeyuki Mizutani ,  Masahiro Nei ,  Masato Hamatani ,  Masahiko Okumura

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/70733

摘要： An exposure apparatus comprises a liquid immersion system, a first mover, and a prescribed member. The exposure apparatus exposes a substrate via an optical member and a liquid. The liquid immersion system performs supply and recovery of the liquid. The first mover can move in a first area, and can hold the liquid between itself and the optical member. The prescribed member is removed from the first mover when the first mover withdraws from a position opposing the optical member, and can hold the liquid between itself and the optical member.

摘要翻译： 曝光装置包括液浸系统，第一推动器和规定构件。 曝光装置经由光学部件和液体露出基板。 液浸系统进行液体的供给和回收。 第一移动器可以在第一区域中移动，并且可以在其与光学构件之间保持液体。 当第一移动器从与光学构件相对的位置退出时，规定构件从第一移动体移除，并且能够将液体保持在其与光学构件之间。

公开(公告)号：US20100269748A1

公开(公告)日：2010-10-28

申请号：US12770108

申请日：2010-04-29

申请人： Junji YAMAUCHI ,  Yasuhito HANAKI ,  Kuniharu IWAMOTO ,  Toshiaki MATSUNO ,  Masahiko OKUMURA ,  Henry J. KELM

发明人： Junji YAMAUCHI ,  Yasuhito HANAKI ,  Kuniharu IWAMOTO ,  Toshiaki MATSUNO ,  Masahiko OKUMURA ,  Henry J. KELM

IPC分类号： G01L19/00

CPC分类号： G01F22/02 ,  G01F23/161 ,  G01L19/08 ,  Y10S116/07

摘要： An indicator includes a case mountable in a gas filling passage of a pressure container; a valve element which is urged toward one side of the case connectable to the pressure container, the valve element being movable in the case to a position balanced with gas pressure in the pressure container; a seal member for ensuring gas tightness between the valve element and the case; and an indicating member slidable relative to the case between a position protruding outside the case and a position not protruding. The spring force and a gas pressure force may be equally balanced at first and second balanced positions of the valve element.

摘要翻译： 指示器包括可安装在压力容器的气体填充通道中的壳体; 阀元件，其被推向与壳体连接的壳体的一侧，阀元件可在壳体中移动到与压力容器中的气体压力平衡的位置; 用于确保阀元件和壳体之间的气密性的密封构件; 以及指示构件，其能够相对于所述壳体在突出到所述壳体外部的位置与未突出的位置之间滑动。 在阀元件的第一和第二平衡位置处，弹簧力和气体压力力可以相等地平衡。