公开(公告)号：US5995219A

公开(公告)日：1999-11-30

申请号：US35268

申请日：1998-03-05

申请人： Mitsuo Tabata

发明人： Mitsuo Tabata

IPC分类号： H01L21/66 ,  G01N21/956 ,  G06T1/00 ,  H05K3/00 ,  G01N21/88

CPC分类号： G01N21/95607

摘要： A pattern defect inspection apparatus. Light is irradiated on a sample having a pattern formed thereon and the transmitted or reflected portion of the irradiated light is condensed. The condensed light is received so as to acquire the observed data corresponding to the pattern formed in the sample. A design pattern image is compared with a pattern formed in the sample by the observed data. Alternatively, two sets of observed data corresponding to a plurality of patterns formed in the sample are compared. The presence or absence of a defect of the pattern is judged based on the result of comparison. This also determines whether the size of the defect of the pattern is larger than a predetermined size. The inspection is temporarily stopped if the size of the defect detected by the judging circuit during inspection is larger than a predetermined size.

摘要翻译： 图案缺陷检查装置。 光照射在其上形成有图案的样品上，照射光的透射或反射部分被冷凝。 收集凝聚的光以获得与样品中形成的图案相对应的观察数据。 将设计图案图像与通过观察数据在样本中形成的图案进行比较。 或者，比较与样品中形成的多个图案对应的两组观察数据。 基于比较的结果来判断图案的缺陷的存在或不存在。 这还确定图案的缺陷的尺寸是否大于预定尺寸。 如果在检查期间由判断电路检测到的缺陷的尺寸大于预定尺寸，则临时停止检查。

公开(公告)号：US5602645A

公开(公告)日：1997-02-11

申请号：US527633

申请日：1995-09-13

申请人： Mitsuo Tabata ,  Toru Tojo ,  Kiminobu Akeno ,  Toshiyuki Watanabe ,  Tomohide Watanabe ,  Eiji Yamanaka ,  Chikara Itoh ,  Makoto Taya

发明人： Mitsuo Tabata ,  Toru Tojo ,  Kiminobu Akeno ,  Toshiyuki Watanabe ,  Tomohide Watanabe ,  Eiji Yamanaka ,  Chikara Itoh ,  Makoto Taya

IPC分类号： G01N21/956 ,  G03F1/84 ,  H01L21/027 ,  G01B11/00

CPC分类号： G03F1/84 ,  G01N21/95607 ,  G03F1/62

摘要： The present invention provides a pattern evaluating device including light irradiating means for irradiating the rays of light from a light source upon an object, an objective lens through which the light having penetrated through the object passes, an aperture member stopping the diameter of a light beam which has passed the objective lens, a photo receiving element receiving the light beam which has had the diameter stopped by the aperture member, and judging means for evaluating the pattern, following the information of the light received by the photo receiving element and which corresponds to the pattern, wherein the aperture member is capable of changing the numerical aperture, depending whether or not the sample is provided with a pericle.

摘要翻译： 本发明提供了一种图案评估装置，其包括用于将来自光源的光线照射到物体上的光照射装置，穿过物体的光穿过的物镜通过阻止光束直径的孔径构件 已经通过物镜的光接收元件，接收由孔部件阻挡直径的光束的光接收元件，以及用于评估图案的判断装置，遵循由光接收元件接收的光的信息，并且对应于 所述图案，其中所述孔径构件能够根据样品是否设置有微孔而能够改变数值孔径。

公开(公告)号：US4326202A

公开(公告)日：1982-04-20

申请号：US133574

申请日：1980-03-24

申请人： Masatsugu Kidode ,  Haruo Asada ,  Mitsuo Tabata

发明人： Masatsugu Kidode ,  Haruo Asada ,  Mitsuo Tabata

IPC分类号： G06F13/18 ,  G06T1/60 ,  G09G1/16 ,  G09G5/00 ,  H04N1/32 ,  G06F3/14

CPC分类号： G09G5/001 ,  H04N1/32358 ,  H04N1/32443

摘要： The invention provides an improved image memory device including an image processing memory unit incorporated into a universal image processing device and an address switching control circuit connected thereto, wherein an address data for raster display and an address data fed from an external input-output device are periodically selected by an address switching control circuit for supply to the image processing memory unit so that the memory unit may be accessed by an external input-output device without intercepting the raster display with remarkably reduced data transfer time.

摘要翻译： 本发明提供了一种改进的图像存储装置，其包括结合到通用图像处理装置中的图像处理存储器单元和与其连接的地址切换控制电路，其中用于光栅显示的地址数据和从外部输入 - 输出装置馈送的地址数据是 由地址切换控制电路周期性地选择供给图像处理存储器单元，使得存储器单元可以被外部输入输出设备访问，而不会以显着减少的数据传输时间截取光栅显示。

公开(公告)号：US07068364B2

公开(公告)日：2006-06-27

申请号：US10627702

申请日：2003-07-28

申请人： Shinji Sugihara ,  Mitsuo Tabata ,  Hideo Tsuchiya ,  Yasushi Sanada

发明人： Shinji Sugihara ,  Mitsuo Tabata ,  Hideo Tsuchiya ,  Yasushi Sanada

IPC分类号： G01N21/88

CPC分类号： G01N21/95607

摘要： A pattern inspection apparatus includes a light source irradiating a plate having a pattern, a photoelectric device photoelectrically converting the image of the pattern, a generator generating detected pattern data based on a photoelectrically converted signal, a generator generating reference pattern data from designed data, a comparator comparing the detected pattern data with the reference pattern data, a sensor detecting a light intensity of the light source, a barometric pressure sensor detecting a barometric pressure in the apparatus, a detector detecting at least one of the light intensity and barometric pressure deviating from predetermined ranges, a memory storing the detected and reference pattern data at a point of time when the abnormal status is generated in synchronization with position data and detected values of the light intensity and barometric pressure and an output device which outputs these.

摘要翻译： 图案检查装置包括照射具有图案的板的光源，对图案的图像进行光电转换的光电装置，基于光电转换信号产生检测图案数据的发生器，从设计数据生成参考图案数据的发生器， 将检测到的图案数据与参考图案数据进行比较，检测光源的光强度的传感器，检测设备中的气压的大气压传感器，检测到偏离的光强度和大气压力中的至少一个 预定范围，在与位置数据同步生成异常状态的时间点和检测到的光强度和大气压值的同时存储检测到的参考图形数据的存储器和输出这些数据的输出装置。

公开(公告)号：US06909501B2

公开(公告)日：2005-06-21

申请号：US09956010

申请日：2001-09-20

申请人： Riki Ogawa ,  Yasushi Sanada ,  Mitsuo Tabata

发明人： Riki Ogawa ,  Yasushi Sanada ,  Mitsuo Tabata

IPC分类号： G01B11/30 ,  G01N21/956 ,  G03F1/84 ,  G06T1/00 ,  G06T7/00 ,  H01L21/66 ,  G01N21/88

CPC分类号： G06T7/001 ,  G06T7/0002 ,  G06T2207/30148

摘要： A pattern inspection apparatus includes a pulse laser light source sequentially generating pulse laser light, an illumination optics applying the pulse laser light onto a mask substrate, an imaging optics collecting light from the mask substrate to form an image thereof, an area sensor sensing the image of the mask substrate obtained by the optics in a rectangular area unit, a comparator comparing image data acquired by the area sensor with previously prepared reference data to detect a defect of a pattern, a stage driving apparatus two-dimensionally scanning a stage having the mask substrate placed thereon, and a stage position detector detecting a position of the stage. With the above configuration, it is possible to efficiently inspect the surface of the mask substrate by adequately setting the moving speed of the mask substrate and the sensing timing of the sensing apparatus.

摘要翻译： 图案检查装置包括顺序产生脉冲激光的脉冲激光光源，将脉冲激光施加到掩模基板上的照明光学器件，从掩模基板收集光以形成其图像的成像光学元件，感测图像的区域传感器 通过光学器件以矩形区域单位获得的掩模基板，比较器，将由区域传感器获取的图像数据与预先准备的参考数据进行比较，以检测图案的缺陷;平台驱动装置，二维地扫描具有掩模 放置在其上的基板，以及检测台的位置的台位置检测器。 利用上述结构，可以通过适当地设定掩模基板的移动速度和感测装置的检测定时来有效地检查掩模基板的表面。

公开(公告)号：US5828457A

公开(公告)日：1998-10-27

申请号：US854750

申请日：1997-05-12

申请人： Mitsuo Tabata ,  Toru Tojo ,  Hisakazu Yoshino

发明人： Mitsuo Tabata ,  Toru Tojo ,  Hisakazu Yoshino

IPC分类号： G01N21/88 ,  G01N21/93 ,  G01N21/956 ,  G06T1/00 ,  G06T7/00 ,  H01L21/66 ,  G01B11/00 ,  H01L21/00

CPC分类号： G01N21/95607

摘要： A sample detection apparatus includes a light radiation unit, having an illumination lens and an objective lens, for radiating light on a sample on which a pattern relating to fabrication of a semiconductor device is formed. A light receiving unit detects a light transmission image of the pattern on the sample on which the light has been radiated by the light radiation unit. A determination unit determines a presence/absence of a defect of the pattern obtained by the light receiving unit with reference data relating to the pattern, and a control unit controls a ratio .sigma. of a numerical aperture of the objective lens, in accordance with a type of the pattern.

摘要翻译： 样品检测装置包括具有照明透镜和物镜的光辐射单元，用于在形成有与半导体器件的制造相关的图案的样品上照射光。 光接收单元检测由光辐射单元辐射光的样品上的图案的透光图像。 确定单元使用与该图案相关的参考数据来确定由光接收单元获得的图案的缺陷的存在/不存在，并且控制单元根据类型来控制物镜的数值孔径的比率σ 的模式。

公开(公告)号：US4808002A

公开(公告)日：1989-02-28

申请号：US167233

申请日：1988-03-11

申请人： Toru Tojo ,  Mitsuo Tabata ,  Hisakazu Yoshino

发明人： Toru Tojo ,  Mitsuo Tabata ,  Hisakazu Yoshino

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68

CPC分类号： G03F9/70

摘要： First and second objects are moved relative and parallel to each other, in order to be aligned. More specifically, a first mark formed on the first object has first and second light-passing sections. A second mark formed on the second object has first and second light-reflecting sections. A light beam from a light source is directed to and reflected by the first and second light-reflecting sections of said second mark and transferred onto said first mark. An image of said first light-reflecting section is projected onto the first mark, so that the first light-passing section has a first overlapping region which overlaps a part of the inner of said first light-reflecting section. An image of said second light-reflecting section is projected onto the first mark, so that said second light-passing section has a second overlapping region which overlaps a part of the image of said second light-reflecting section. A first light beam passed through the first overlapping region and a second light beam passed through the second overlapping region are detected independently. The difference in amount between these two light beams is proportional to the positional shift between the objects. The objects are adjusted relative to each other to make the first and second light beams equal in amount, so that the objects can be aligned relative to each other. The first object is a reticle and the second object is a wafer or wafer table in the projecting and exposing apparatus.

摘要翻译： 第一和第二物体相对移动并且彼此平行，以便对齐。 更具体地，形成在第一物体上的第一标记具有第一和第二光通过部分。 形成在第二物体上的第二标记具有第一和第二光反射部分。 来自光源的光束被引导到所述第二标记的第一和第二光反射部分并被其反射并被转移到所述第一标记上。 所述第一光反射部的图像被投影到第一标记上，使得第一透光部具有与所述第一光反射部的内部的一部分重叠的第一重叠区域。 所述第二光反射部的图像被投影到第一标记上，使得所述第二透光部具有与所述第二光反射部的图像的一部分重叠的第二重叠区域。 独立地检测通过第一重叠区域的第一光束和穿过第二重叠区域的第二光束。 这两个光束之间的量的差异与物体之间的位置偏移成比例。 物体相对于彼此调节以使第一和第二光束的量相等，使得物体可以相对于彼此对准。 第一个目的是掩模版，第二个目的是在投影和曝光装置中的晶片或晶圆台。

公开(公告)号：US4698513A

公开(公告)日：1987-10-06

申请号：US9628

申请日：1987-01-23

申请人： Toru Tojo ,  Mitsuo Tabata

发明人： Toru Tojo ,  Mitsuo Tabata

IPC分类号： G01B11/02 ,  G03F9/00 ,  G01N21/86

CPC分类号： G03F9/7023 ,  G01B11/026

摘要： A device for measuring the position of an object has a light radiation mechanism for causing light to be obliquely incident on a surface of the object, a vibrating mechanism for vibrating the light incident on the surface of the object at a predetermined frequency, and a detecting mechanism for detecting light reflected by the surface of the object, generating a detection signal, and obtaining the position of the object in accordance with the detection signal.

摘要翻译： 用于测量物体的位置的装置具有用于使光倾斜地入射到物体的表面上的光辐射机构，用于以预定频率振动入射在物体表面上的光的振动机构，以及检测 用于检测由物体的表面反射的光的机构，产生检测信号，并根据检测信号获得物体的位置。

公开(公告)号：US4642468A

公开(公告)日：1987-02-10

申请号：US681491

申请日：1984-12-13

申请人： Mitsuo Tabata ,  Nobuo Shibuya

发明人： Mitsuo Tabata ,  Nobuo Shibuya

IPC分类号： G01B11/00 ,  G01D5/26 ,  G01D5/30 ,  G03F9/00 ,  H01J37/304 ,  G01N21/86

CPC分类号： G03F9/70 ,  G01D5/26 ,  H01J37/3045

摘要： In a position detecting method, a light beam is radiated onto an object on which a position detecting mark is formed; the reflected beam is detected by a beam detector through a slit; the slit is vibrated, and at the same time a detection signal outputted from the beam detector is detected synchronously with the vibration of the slit; thereby detecting the position of the object. A fundamental wave component a.sub.f and a second harmonic component a.sub.2f of the detection signal are fetched due to the synchronous detection and these components a.sub.f and a.sub.2f are subjected to the conversions for eliminating the variation in output level in association with the variation in input level while the corresponding relation between the peak point of the fundamental wave component a.sub.f and the zero point of the second harmonic component a.sub.2f is held. For example, as these conversions, the following conversions are performed: ##EQU1## The output components a.sub.f * and a.sub.2f * obtained due to these conversions are used as the detection signals, and the position of the object is detected by use of these detection signals a.sub.f * and a.sub.2f *.

摘要翻译： 在位置检测方法中，将光束照射到形成有位置检测标记的物体上; 反射光束由光束检测器通过狭缝检测; 狭缝被振动，并且同时从狭缝的振动检测从光束检测器输出的检测信号; 从而检测物体的位置。 检测信号的基波分量af和二次谐波分量a2f由于同步检测而被取出，这些分量af和a2f被进行转换，以消除与输入电平的变化相关的输出电平的变化，而 保持基波分量af的峰值点与二次谐波分量a2f的零点之间的对应关系。 例如，作为这些转换，执行以下转换：由于这些转换而获得的输出组件af *和a2f *用作检测信号，并且通过使用这些检测信号来检测对象的位置 af *和a2f *。