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公开(公告)号：US07068364B2
公开(公告)日：2006-06-27
申请号：US10627702
申请日：2003-07-28
申请人： Shinji Sugihara , Mitsuo Tabata , Hideo Tsuchiya , Yasushi Sanada
发明人： Shinji Sugihara , Mitsuo Tabata , Hideo Tsuchiya , Yasushi Sanada
IPC分类号： G01N21/88
CPC分类号： G01N21/95607
摘要： A pattern inspection apparatus includes a light source irradiating a plate having a pattern, a photoelectric device photoelectrically converting the image of the pattern, a generator generating detected pattern data based on a photoelectrically converted signal, a generator generating reference pattern data from designed data, a comparator comparing the detected pattern data with the reference pattern data, a sensor detecting a light intensity of the light source, a barometric pressure sensor detecting a barometric pressure in the apparatus, a detector detecting at least one of the light intensity and barometric pressure deviating from predetermined ranges, a memory storing the detected and reference pattern data at a point of time when the abnormal status is generated in synchronization with position data and detected values of the light intensity and barometric pressure and an output device which outputs these.
摘要翻译： 图案检查装置包括照射具有图案的板的光源，对图案的图像进行光电转换的光电装置，基于光电转换信号产生检测图案数据的发生器，从设计数据生成参考图案数据的发生器， 将检测到的图案数据与参考图案数据进行比较，检测光源的光强度的传感器，检测设备中的气压的大气压传感器，检测到偏离的光强度和大气压力中的至少一个 预定范围，在与位置数据同步生成异常状态的时间点和检测到的光强度和大气压值的同时存储检测到的参考图形数据的存储器和输出这些数据的输出装置。
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公开(公告)号：US07209584B2
公开(公告)日：2007-04-24
申请号：US11079338
申请日：2005-03-15
CPC分类号： G03F1/26 , G03F1/84 , G06T7/001 , G06T2207/30148
摘要： A pattern inspection apparatus determines a difference of the measured dislocation of respective alignment marks of an opaque pattern and a phase shifting pattern (measurement difference), in addition to a difference between the both alignment mark positions in design (design difference). A difference between the measurement difference and the design difference is set as a difference in alignment mark position between the opaque pattern and the phase shifting pattern in a reference pattern which is later used in inspection. In this manner, by correcting one pattern data with respect to the other pattern data in the reference pattern, the displacement generated in the both patterns can be reflected, and the reference pattern data regarding an image of a sample which is actually observed can be created.
摘要翻译： 除了设计中的两个对准标记位置（设计差异）之外，图案检查装置还确定不透明图案的各个对准标记的测量位错与相移图案（测量差异）之间的差异。 测量差异和设计差异之间的差异被设置为稍后在检查中使用的参考图案中的不透明图案和相移图案之间的对准标记位置的差异。 以这种方式，通过相对于参考图案中的其他图案数据校正一个图案数据，可以反映两种图案中产生的位移，并且可以创建关于实际观察到的样本的图像的参考图案数据 。
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公开(公告)号：US06883160B2
公开(公告)日：2005-04-19
申请号：US10252718
申请日：2002-09-24
CPC分类号： G03F1/26 , G03F1/84 , G06T7/001 , G06T2207/30148
摘要： A pattern inspection apparatus determines a difference of the measured dislocation of respective alignment marks of an opaque pattern and a phase shifting pattern (measurement difference), in addition to a difference between the both alignment mark positions in design (design difference). A difference between the measurement difference and the design difference is set as a difference in alignment mark position between the opaque pattern and the phase shifting pattern in a reference pattern which is later used in inspection. In this manner, by correcting one pattern data with respect to the other pattern data in the reference pattern, the displacement generated in the both patterns can be reflected, and the reference pattern data regarding an image of a sample which is actually observed can be created.
摘要翻译： 除了设计中的两个对准标记位置（设计差异）之外，图案检查装置还确定不透明图案的各个对准标记的测量位错与相移图案（测量差异）之间的差异。 测量差异和设计差异之间的差异被设置为稍后在检查中使用的参考图案中的不透明图案和相移图案之间的对准标记位置的差异。 以这种方式，通过相对于参考图案中的其他图案数据校正一个图案数据，可以反映两种图案中产生的位移，并且可以创建关于实际观察到的样本的图像的参考图案数据 。
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公开(公告)号：US20050172255A1
公开(公告)日：2005-08-04
申请号：US11079338
申请日：2005-03-15
CPC分类号： G03F1/26 , G03F1/84 , G06T7/001 , G06T2207/30148
摘要： A pattern inspection apparatus determines a difference of the measured dislocation of respective alignment marks of an opaque pattern and a phase shifting pattern (measurement difference), in addition to a difference between the both alignment mark positions in design (design difference). A difference between the measurement difference and the design difference is set as a difference in alignment mark position between the opaque pattern and the phase shifting pattern in a reference pattern which is later used in inspection. In this manner, by correcting one pattern data with respect to the other pattern data in the reference pattern, the displacement generated in the both patterns can be reflected, and the reference pattern data regarding an image of a sample which is actually observed can be created.
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公开(公告)号：US20110138885A1
公开(公告)日：2011-06-16
申请号：US12965963
申请日：2010-12-13
CPC分类号： F02M25/0836 , F01C21/10 , F04C2/344 , F04C2240/805 , F04C2250/00
摘要： A vane pump has an upper casing, a lower casing, a rotor and a motor. First to fourth points are defined on an outer peripheral end of a lower flat surface of the lower casing. The first point is farthest from an intersection between an axis of a shaft of the motor and the lower flat surface. A suction passage passing through the third point and a discharge passage passing through the second point are formed between the upper casing and the lower casing. The fourth point is defined in a range from the third point to the first point. The lower flat surface is provided to incline with respect to the axis of the shaft of the motor such that the fourth point is farthest from a motor case of the motor among points on the outer peripheral end.
摘要翻译： 叶片泵具有上壳体，下壳体，转子和马达。 第一至第四点限定在下壳体的下平坦表面的外周端上。 第一点与电机的轴的轴线和下平面之间的交点最远。 通过第三点的抽吸通道和穿过第二点的排出通道形成在上壳体和下壳体之间。 第四点定义在从第三点到第一点的范围内。 下平面设置成相对于电动机的轴的轴线倾斜，使得第四点在外周端上的点之间离马达的马达外壳最远。
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6.发明申请公开(公告)号：US20100247085A1
公开(公告)日：2010-09-30
申请号：US12729307
申请日：2010-03-23
IPC分类号： G03B13/00
CPC分类号： G03B13/00
摘要： In an automatic focus adjusting mechanism, a test sample having a patterned surface is mounted on a mount table, and an light beam passing through a slit formed in a field stop is applied to the patterned surface of the test sample. The light beam reflected from the test sample is split into two segment light beams. Focus adjusting aperture stops having respective apertures formed rhomboid are provided across the optical paths of the segment light beams. The amounts of the segment light beams passing through the rhomboid apertures are detected by light receiving units. Based on the difference between the detected light amounts, the position of the mount table is controlled by the focus adjusting unit.
摘要翻译： 在自动聚焦调节机构中，将具有图案化表面的测试样品安装在安装台上，并且将通过形成在场停止器中的狭缝的光束施加到测试样品的图案化表面。 从测试样品反射的光束被分成两段光束。 在分段光束的光路上设置聚焦调节孔径，具有形成菱形的各个孔。 穿过菱形孔的分段光束的量由光接收单元检测。 基于检测到的光量之差，通过焦点调节单元来控制安装台的位置。
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7.发明申请公开(公告)号：US20090147409A1
公开(公告)日：2009-06-11
申请号：US12256189
申请日：2008-10-22
申请人： Shinji Sugihara , Hideto Ando , Shinichi Sasaki , Takuya Seino
发明人： Shinji Sugihara , Hideto Ando , Shinichi Sasaki , Takuya Seino
IPC分类号： G11B5/33
CPC分类号： H01F10/3268 , B82Y25/00 , B82Y40/00 , G01R33/093 , G11B5/3929 , H01F41/306 , H01L27/22 , H01L43/08
摘要： The thickness of an antiferromagnetic layer (IrMn) and the thickness of a nonmagnetic interlayer (Cu) are adjusted so as to be within the area surrounded by boundaries a to f on the graph of FIG. 6 in which the horizontal axis represents the IrMn film thickness and the vertical axis represents the Cu film thickness. Consequently, the interlayer coupling magnetic field Hin can be made to be 10 Oe or more, and the variation in the interlayer coupling magnetic field Hin can be made to be 2 Oe or less. In addition, in the area surrounded by boundaries a to f, at any IrMn film thickness, the Cu film thickness range in which the variation can be made to be 2 Oe or less can be set over a wide range, as compared with a known structure.
摘要翻译： 调整反铁磁性层（IrMn）的厚度和非磁性中间层（Cu）的厚度，使其在由图中的边界a至f包围的区域内。 6 ，其中横轴表示IrMn膜厚度，纵轴表示Cu膜厚度。 因此，层间耦合磁场Hin可以为10Oe以上，层间耦合磁场Hin的变化可以为2Oe以下。 此外，在边界a至f所包围的区域中，在任何IrMn膜厚度下，与已知的相比，可以在宽范围内将变化的Cu膜厚度范围设定为2Oe以下 结构体。
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公开(公告)号：US07539350B2
公开(公告)日：2009-05-26
申请号：US11360584
申请日：2006-02-24
申请人： Junji Oaki , Shinji Sugihara , Yuichi Nakatani
发明人： Junji Oaki , Shinji Sugihara , Yuichi Nakatani
IPC分类号： G06K9/40
摘要： An image correction method having a small number of setting parameters achieved by integrating shift (alignment) in unit of a sub-pixel and image correction. A relationship between an inspection reference pattern image and a pattern image under test is identified, a mathematical expression model which fits a pixel error, expansion and contraction/distortion noise, and sensing noise of the image is constructed, and the model is simulated to generate an estimation model image.
摘要翻译： 一种通过以子像素为单位整合移位（对齐）和图像校正而实现的少量设定参数的图像校正方法。 识别检查参考图案图像和被测图案图像之间的关系，构建适合像素误差，扩张和收缩/失真噪声以及图像感测噪声的数学表达式模型，并且模拟模型以产生 估计模型图像。
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公开(公告)号：US07359546B2
公开(公告)日：2008-04-15
申请号：US11072317
申请日：2005-03-07
申请人： Shinji Sugihara , Ikunao Isomura , Junji Oaki , Toru Tojo
发明人： Shinji Sugihara , Ikunao Isomura , Junji Oaki , Toru Tojo
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01R31/311 , G03F1/84 , G06T2207/30148
摘要： A defect inspection method comprises irradiating a sample including a pattern under inspection with light, acquiring measurement pattern data of the pattern based on intensity of light reflected by the sample, generating conversion data including pixel data corresponding to the measurement pattern data from design data of the sample, applying FIR filter process to the conversion data, reconstructing the conversion data by replacing pixel data having value not larger than first reference value with first pixel data, replacing pixel data having value larger than second reference value larger than first reference value with second pixel data having value larger than first pixel data, replacing pixel data having value larger than first reference value and less than second reference value with third pixel data having value between the value of first and second pixel data, the pixel data having larger value being replaced with third pixel data having higher value.
摘要翻译： 缺陷检查方法包括用光照射包括检查中的图案的样品，基于由样品反射的光的强度获取图案的测量图案数据，生成包括与来自样品的设计数据相对应的测量图案数据的像素数据的转换数据 将FIR滤波处理应用于转换数据，通过用第一像素数据替换具有不大于第一参考值的像素数据来重构转换数据，用第二像素替换具有大于第一参考值的值的大于第二参考值的像素数据 具有大于第一像素数据的数据的数据，替换具有大于第一参考值且小于第二参考值的像素数据，其中第三像素数据具有在第一和第二像素数据的值之间的值，具有较大值的像素数据被替换为 第三像素数据具有较高的值。
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10.发明申请Pattern inspection system using image correction scheme with object-sensitive automatic mode switchability 有权模式检测系统采用具有对象敏感自动模式切换功能的图像校正方案公开(公告)号：US20070064993A1
公开(公告)日：2007-03-22
申请号：US11360580
申请日：2006-02-24
申请人： Junji Oaki , Shinji Sugihara
发明人： Junji Oaki , Shinji Sugihara
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T2207/30164
摘要： An image correction device for use in a pattern inspection apparatus is disclosed, which has automatic adaptability to variations in density of a pattern image of a workpiece being tested. The device is operable to identify a two-dimensional (2D) linear predictive model from the pattern image of interest and determine the amount of eccentricity of a centroid position of this model. This amount is then used to switch between a corrected pattern image due to the 2D linear prediction modeling and a corrected image that is interpolated by bicubic interpolation techniques. A pattern inspection method using the image correction technique is also disclosed.
摘要翻译： 公开了一种用于图案检查装置的图像校正装置，其具有对被测工件的图案图像的密度变化的自动适应性。 该装置可操作以从感兴趣的图案图像中识别二维（2D）线性预测模型，并确定该模型的质心位置的偏心量。 然后，该量用于在2D线性预测建模的校正图案图像与通过双三次插值技术进行内插的校正图像之间切换。 还公开了使用图像校正技术的图案检查方法。
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