公开(公告)号：US20110043791A1

公开(公告)日：2011-02-24

申请号：US12855394

申请日：2010-08-12

Applicant: Hendrik Jan Hidde Smilde ,  Arno Jan Bleeker ,  Arie Jeffrey Den Boef ,  Armand Eugene Albert Koolen ,  Henricus Petrus Maria Pellemans ,  Reinder Teun Plug ,  Willem Marie Julia Marcel Coene

Inventor： Hendrik Jan Hidde Smilde ,  Arno Jan Bleeker ,  Arie Jeffrey Den Boef ,  Armand Eugene Albert Koolen ,  Henricus Petrus Maria Pellemans ,  Reinder Teun Plug ,  Willem Marie Julia Marcel Coene

IPC: G01N21/41

CPC classification number: G03F7/70633 ,  G03F7/70616

Abstract: A metrology apparatus is arranged to illuminate a plurality of targets with an off-axis illumination mode. Images of the targets are obtained using only one first order diffracted beam. Where the target is a composite grating, overlay measurements can be obtained from the intensities of the images of the different gratings. Overlay measurements can be corrected for errors caused by variations in the position of the gratings in an image field.

Abstract translation: 计量装置被布置成以离轴照明模式照亮多个目标。 仅使用一个一阶衍射光束获得目标图像。 在目标是复合光栅的地方，可以从不同光栅的图像的强度获得覆盖测量。 可以对由图像场中的光栅位置的变化引起的误差来校正叠加测量。

公开(公告)号：US07659988B2

公开(公告)日：2010-02-09

申请号：US11704375

申请日：2007-02-09

Applicant: Martinus Joseph Kok ,  Reinder Teun Plug ,  Sander Kerssemakers

Inventor： Martinus Joseph Kok ,  Reinder Teun Plug ,  Sander Kerssemakers

IPC: G01N21/55

CPC classification number: G01N21/4738 ,  G03F7/70625 ,  G03F7/70716 ,  G03F9/7003

Abstract: To inspect all portions of the substrate the substrate table can be moved rotationally and linearly. Furthermore the detector can be moved rotationally. This enables all portions of a surface of the substrate to be inspected from all angles in a plane parallel to the substrate. Less linear motion is needed, so the apparatus occupies a smaller volume and generates smaller vibrations.

Abstract translation: 为了检查基板的所有部分，基板台可以旋转和线性移动。 此外，检测器可以旋转移动。 这使得可以在平行于衬底的平面中从所有角度检查衬底的表面的所有部分。 需要较少的线性运动，因此该装置占据较小的体积并产生较小的振动。

公开(公告)号：US07502103B2

公开(公告)日：2009-03-10

申请号：US11443452

申请日：2006-05-31

Applicant: Reinder Teun Plug ,  Arie Jeffrey Den Boef ,  Karel Diederick Van Der Mast

Inventor： Reinder Teun Plug ,  Arie Jeffrey Den Boef ,  Karel Diederick Van Der Mast

IPC: G01N21/00

CPC classification number: G03F7/70758 ,  G03F7/70766

Abstract: A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table constructed and arranged to hold the substrate, at least one sensor constructed and arranged to measure a parameter of the substrate, a displacement system to displace one of the substrate table and sensor with respect to the other one of the substrate table and sensor in at least a first direction, a first balance mass, and a first bearing which movably supports the first balance mass so as to be substantially free to translate in the opposite direction of the first direction in order to counteract a displacement of the one of the substrate table and sensor in the first direction.

Abstract translation: 计量工具被布置成测量在光刻设备中已经设置有图案的衬底的参数。 该测量工具包括底架，构造和布置成保持基板的基板台，至少一个构造和布置以测量基板的参数的传感器，相对于基板移位基板台和传感器之一的位移系统 至少第一方向上的基板台和传感器中的另一个，第一平衡块和第一轴承，其可移动地支撑第一平衡块，以便在与第一方向相反的方向基本上自由地平移，以便 抵消基板台和传感器中的一个在第一方向上的位移。

公开(公告)号：US20080143985A1

公开(公告)日：2008-06-19

申请号：US12068288

申请日：2008-02-05

Applicant: Franciscus Van De Mast ,  Johan Christiaan Gerard Hoefnagels ,  Johannes Onvlee ,  Reinder Teun Plug

Inventor： Franciscus Van De Mast ,  Johan Christiaan Gerard Hoefnagels ,  Johannes Onvlee ,  Reinder Teun Plug

IPC: G03B27/42

CPC classification number: G03F7/70616 ,  G03F7/70525

Abstract: A lithography system in which a performance criterion of the lithography system is predicted, based on one or more operating conditions of the lithography system, and compared to measurements of that performance criterion. The lithography system may determine from a difference between the measured and predicted performance criterion which, if any, sub-system of the lithography system is not performing as expected.

公开(公告)号：US07352439B2

公开(公告)日：2008-04-01

申请号：US11497534

申请日：2006-08-02

Applicant: Franciscus Van De Mast ,  Johan Christiaan Gerard Hoefnagels ,  Johannes Onvlee ,  Reinder Teun Plug

Inventor： Franciscus Van De Mast ,  Johan Christiaan Gerard Hoefnagels ,  Johannes Onvlee ,  Reinder Teun Plug

IPC: G03B27/42

CPC classification number: G03F7/70616 ,  G03F7/70525

Abstract: A lithography system in which a performance criterion of the lithography system is predicted, based on one or more operating conditions of the lithography system, and compared to measurements of that performance criterion. The lithography system may determine from a difference between the measured and predicted performance criterion which, if any, sub-system of the lithography system is not performing as expected.

Abstract translation: 基于光刻系统的一个或多个操作条件预测光刻系统的性能标准的光刻系统，并与该性能标准的测量值进行比较。 光刻系统可以根据测量和预测的性能标准之间的差异来确定，如果有的话，光刻系统的子系统如预期的那样不能执行。

公开(公告)号：US20080036983A1

公开(公告)日：2008-02-14

申请号：US11497534

申请日：2006-08-02

Applicant: Franciscus Van De Mast ,  Johan Christiaan Gerard Hoefnagels ,  Johannes Onvlee ,  Reinder Teun Plug

Inventor： Franciscus Van De Mast ,  Johan Christiaan Gerard Hoefnagels ,  Johannes Onvlee ,  Reinder Teun Plug

IPC: G03B27/42

CPC classification number: G03F7/70616 ,  G03F7/70525

Abstract: A lithography system in which a performance criterion of the lithography system is predicted, based on one or more operating conditions of the lithography system, and compared to measurements of that performance criterion. The lithography system may determine from a difference between the measured and predicted performance criterion which, if any, sub-system of the lithography system is not performing as expected.

公开(公告)号：US20080002207A1

公开(公告)日：2008-01-03

申请号：US11704375

申请日：2007-02-09

Applicant: Martinus Joseph Kok ,  Reinder Teun Plug ,  Sander Kerssemakers

Inventor： Martinus Joseph Kok ,  Reinder Teun Plug ,  Sander Kerssemakers

IPC: G01N21/47

CPC classification number: G01N21/4738 ,  G03F7/70625 ,  G03F7/70716 ,  G03F9/7003

Abstract: To inspect all portions of the substrate the substrate table can be moved rotationally and linearly. Furthermore the detector can be moved rotationally. This enables all portions of a surface of the substrate to be inspected from all angles in a plane parallel to the substrate. Less linear motion is needed, so the apparatus occupies a smaller volume and generates smaller vibrations.

Abstract translation: 为了检查基板的所有部分，基板台可以旋转和线性移动。 此外，检测器可以旋转移动。 这使得可以在平行于衬底的平面中从所有角度检查衬底的表面的所有部分。 需要较少的线性运动，因此该装置占据较小的体积并产生较小的振动。

公开(公告)号：US07113253B2

公开(公告)日：2006-09-26

申请号：US10662881

申请日：2003-09-16

Applicant: Reinder Teun Plug

Inventor： Reinder Teun Plug

IPC: G03B27/32 ,  G03B27/42 ,  G03D5/00 ,  B05C11/00 ,  G06F19/00

CPC classification number: G03F7/70508 ,  G03F7/70533

Abstract: A method, apparatus and computer product for processing of substrates in at least a part of a substrate processing system is provided. In an embodiment, the method includes obtaining, using a processing unit, at least one of a rate of processing and a time of processing of a plurality of substrate lots to be introduced into a part of the substrate processing system and determining, using the processing unit, an order of introduction of the plurality of substrate lots into the part of the substrate processing system to at least one of increase the rate of processing and decrease the time of processing of the plurality of substrate lots.

Abstract translation: 提供了一种在基板处理系统的至少一部分中处理基板的方法，装置和计算机产品。 在一个实施例中，所述方法包括：使用处理单元获得要引入到所述基板处理系统的一部分中的多个基板批次的处理速率和处理时间中的至少一个，并且使用所述处理 单元，将多个基板批次的引入到基板处理系统的一部分中的顺序中的至少一个以提高处理速率并减少多个基板批次的处理时间中的至少一个。