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11.发明授权Alkaline-resistant negative photoresist for silicon wet-etch without silicon nitride 有权不含氮化硅的硅湿蚀刻用耐碱性负性光致抗蚀剂公开(公告)号：US07709178B2
公开(公告)日：2010-05-04
申请号：US11736429
申请日：2007-04-17
Applicant: Xing-Fu Zhong , Tony D. Flaim , Jyoti Malhotra
Inventor： Xing-Fu Zhong , Tony D. Flaim , Jyoti Malhotra
CPC classification number: G03F7/0752 , G03F7/0045 , G03F7/0382 , G03F7/0751 , Y10S430/108 , Y10S430/115
Abstract: New photoresists for use during the production of semiconductor and MEMS devices are provided. The primer layer preferably comprises a silane dissolved or dispersed in a solvent system. The photoresist layer includes a first polymer prepared from a styrene and an acrylonitrile, and a second polymer comprising epoxy-containing monomers (and preferably phenolic-containing monomers). The photoresist layer comprises a photoacid generator, and is preferably negative-acting.
Abstract translation: 提供了在制造半导体和MEMS器件期间使用的新型光致抗蚀剂。 底漆层优选包含溶解或分散在溶剂体系中的硅烷。 光致抗蚀剂层包括由苯乙烯和丙烯腈制备的第一聚合物和包含含环氧单体（优选含酚单体）的第二聚合物。 光致抗蚀剂层包括光致酸发生剂，并且优选为负性作用。
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12.发明申请Composition for removing protective layer in fabrication of MEMS and method for removing same 审中-公开用于去除MEMS制造中的保护层的组合物及其除去方法公开(公告)号：US20090270299A1
公开(公告)日：2009-10-29
申请号：US12081912
申请日：2008-04-23
Applicant: Hiroyuki Uehara , Kazuhiro Aoba , Gu Xu , Xing-Fu Zhong
Inventor： Hiroyuki Uehara , Kazuhiro Aoba , Gu Xu , Xing-Fu Zhong
IPC: C11D7/32
CPC classification number: C11D11/0047 , C11D7/08 , C11D7/5004 , G03F7/423 , G03F7/425
Abstract: There is provided a composition that can effectively remove a protective coating and a primer coating that have a resistance to etching solutions and are rendered unnecessary after wet-etching treatment in MEMS fabrication processes, and a method for removing the protective layer. The composition contains (A) at least one organic solvent selected from the group consisting of amides, lactones, pyrrolidones and ketones, (B) water, and (C) a fluoride, in an amount of 80.00 to 99.90 mass %, 0.05 to 12.00 mass %, and 0.05 to 8.00 mass %, respectively. The composition may further contain (D) phosphoric acid, phosphonic acid or phosphinic acid in an amount over 0 mass part to 5.5 mass parts, or (E) an organic amine in an amount over 0 mass part to 45 mass parts, based on 100 mass parts of the composition.
Abstract translation: 提供了一种可以有效地去除在MEMS制造工艺中在湿蚀刻处理之后具有耐蚀刻溶液并且不需要的保护涂层和底漆涂层的组合物，以及用于去除保护层的方法。 组合物含有（A）至少一种选自酰胺，内酯，吡咯烷酮和酮的有机溶剂，（B）水和（C）氟化物，其含量为80.00-99.90质量％，0.05至12.00 质量％，0.05〜8.00质量％。 组合物还可以含有（D）0质量份〜5.5质量份的磷酸，膦酸或次膦酸，或（E）0质量份〜45质量份的有机胺，基于100 大部分组成。
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13.发明授权公开(公告)号：US06692890B2
公开(公告)日：2004-02-17
申请号：US09826315
申请日：2001-04-04
Applicant: Jen-Chi Huang , Xing-Fu Zhong , S. Peter Pappas , Shashikant Saraiya
Inventor： Jen-Chi Huang , Xing-Fu Zhong , S. Peter Pappas , Shashikant Saraiya
IPC: G03F700
CPC classification number: B41C1/1025 , B41C2201/04 , B41C2210/04 , B41C2210/06 , B41C2210/10 , B41C2210/24 , B41C2210/262 , B41N3/03 , B41N3/038
Abstract: The present invention includes a radiation-imageable element for lithographic printing having a hydrophilic anodized aluminum base with a surface having pores and a image-forming layer having polymer particles coated on the aluminum base. The ratio of the average pore diameter to the average particle diameter is from 0.4:1 to 10:1. The present invention further includes a method of producing the imaged element. The method includes the steps of imagewise exposing the radiation-imageable element to radiation to produce exposed and unexposed regions and contacting the imagewise exposed radiation-imageable element and a developer to remove the exposed or the unexposed regions.
Abstract translation: 本发明包括用于平版印刷的可辐射成像元件，其具有具有孔的表面的亲水阳极化铝基底和具有涂覆在铝基底上的聚合物颗粒的图像形成层。 平均孔径与平均粒径之比为0.4:1〜10:1。 本发明还包括一种制造成像元件的方法。 该方法包括以下步骤：将可辐射成像元件成像曝光到辐射以产生曝光和未曝光区域，并使图像曝光的可辐射成像元件和显影剂接触以去除曝光或未曝光区域。
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公开(公告)号：US20130032296A1
公开(公告)日：2013-02-07
申请号：US13196679
申请日：2011-08-02
Applicant: Xing-Fu Zhong
Inventor： Xing-Fu Zhong
CPC classification number: C11D3/2003 , B08B3/024 , B08B3/04 , B08B3/041 , C11D1/22 , C11D3/43 , C11D11/0047 , Y10T156/1116
Abstract: A cleaning composition for removing temporary wafer bonding material is provided. The cleaning composition comprises an alkylarylsulfonic acid and an aliphatic alcohol dispersed or dissolved in a hydrocarbon solvent system. Methods of separating bonded substrates and cleaning debonded substrates using the cleaning composition are also provided. The invention is particularly useful for temporary bonding materials and adhesives. The methods generally comprise contacting the bonding material with the cleaning solution for time periods sufficient to dissolve the desired amount of bonding material for separation and/or cleaning of the substrates.
Abstract translation: 提供一种用于去除临时晶片接合材料的清洁组合物。 清洁组合物包含分散或溶解在烃溶剂系统中的烷基芳基磺酸和脂族醇。 还提供了使用清洁组合物分离粘合的基材和清洁脱粘的基材的方法。 本发明对临时粘合材料和粘合剂特别有用。 所述方法通常包括使结合材料与清洁溶液接触足以溶解所需量的粘合材料以用于分离和/或清洁基底的时间。
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公开(公告)号：US20110171478A1
公开(公告)日：2011-07-14
申请号：US12718516
申请日：2010-03-05
Applicant: Tingji Tang , Gu Xu , Xing-Fu Zhong , Wenbin Hong , Tony D. Flaim , Kimberly Yess , Ramachandran K. Trichur
Inventor： Tingji Tang , Gu Xu , Xing-Fu Zhong , Wenbin Hong , Tony D. Flaim , Kimberly Yess , Ramachandran K. Trichur
IPC: C09D145/00 , B32B13/12 , B32B15/08 , B32B27/00 , B32B27/08 , B32B17/10 , G03F7/20 , G03F7/004 , H05K13/00
CPC classification number: B81C1/00801 , B81C2201/053 , C08G61/08 , C08G2261/3324 , C08G2261/418 , G03F7/033 , G03F7/094 , H01L21/0274 , H01L21/3081 , Y10T428/31645 , Y10T428/31667 , Y10T428/31692 , Y10T428/31855 , Y10T428/31909
Abstract: New compositions and methods of using those compositions as protective layers during the production of semiconductor and MEMS devices are provided. The compositions comprise a cycloolefin copolymer dispersed or dissolved in a solvent system, and can be used to form layers that protect a substrate during acid etching and other processing and handling. The protective layer can be photosensitive or non-photosensitive, and can be used with or without a primer layer beneath the protective layer. Preferred primer layers comprise a basic polymer in a solvent system.
Abstract translation: 提供了在制造半导体和MEMS器件期间使用这些组合物作为保护层的新组合物和方法。 组合物包含分散或溶解在溶剂体系中的环烯烃共聚物，并且可以用于在酸蚀刻和其它加工和处理期间形成保护基材的层。 保护层可以是光敏的或非感光的，并且可以在保护层下面使用或不使用底漆层。 优选的底漆层在溶剂体系中包含碱性聚合物。
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Patent Agency Ranking
公开(公告)号：US20070075309A1
公开(公告)日：2007-04-05
申请号：US11470520
申请日：2006-09-06
Applicant: Xing-Fu Zhong , Jyoti Malhotra , Chenghong Li
Inventor： Xing-Fu Zhong , Jyoti Malhotra , Chenghong Li
CPC classification number: G03F7/0382 , G03F7/0752 , H01L21/3081 , Y10S430/108 , Y10S430/115
Abstract: New photoresists for use during the production of semiconductor and MEMS devices are provided. The primer layer preferably comprises a silane dissolved or dispersed in a solvent system. The photoresist layer includes copolymers prepared from styrene, acrylonitrile, and epoxy-containing monomers. The photoresist layer comprises a photoacid generator, and is preferably negative-acting.
Abstract translation: 提供了在制造半导体和MEMS器件期间使用的新型光致抗蚀剂。 底漆层优选包含溶解或分散在溶剂体系中的硅烷。 光致抗蚀剂层包括由苯乙烯，丙烯腈和含环氧基的单体制备的共聚物。 光致抗蚀剂层包括光致酸发生剂，并且优选为负性作用。
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17.发明授权Digital waterless lithographic printing plate having high resistance to water-washable inks 失效具有高耐水洗性油墨的数字无水平版印刷版公开(公告)号：US06730457B2
公开(公告)日：2004-05-04
申请号：US10190066
申请日：2002-07-05
Applicant: Shashikant Saraiya , Xing Fu Zhong , Jianbing Huang , S. Peter Pappas
Inventor： Shashikant Saraiya , Xing Fu Zhong , Jianbing Huang , S. Peter Pappas
IPC: G03F711
CPC classification number: G03F7/0752 , B41C1/1016 , B41C2201/02 , B41C2201/04 , B41C2201/14 , B41C2210/02 , B41C2210/12 , B41C2210/16 , B41C2210/22 , B41C2210/24 , B41C2210/266
Abstract: Thermally imageable elements and methods for their preparation and use are disclosed. The elements contain, in order, a substrate; an underlayer; and an ink-repellent layer. The underlayer contains a crosslinked allyl functional polyurethane. A photothermal conversion material is present in either in the underlayer or in an absorber layer between the underlayer and the ink-repellent layer. Thermal imaging and development removes the ink-repellent layer and reveals the underlayer in the exposed regions to form an imaged element useful as a waterless lithographic printing plate.
Abstract translation: 公开了可热成像的元件及其制备和使用方法。 这些元素依次含有底物; 底层 和拒油层。 底层含有交联的烯丙基官能聚氨酯。 光热转换材料存在于底层中或在底层和拒墨层之间的吸收层中。 热成像和显影去除了拒油层并且暴露在暴露区域中的底层以形成可用作无水平版印刷版的成像元件。
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公开(公告)号：US08771927B2
公开(公告)日：2014-07-08
申请号：US12718516
申请日：2010-03-05
Applicant: Tingji Tang , Gu Xu , Xing-Fu Zhong , Wenbin Hong , Tony D. Flaim , Kimberly Yess , Ramachandran K. Trichur
Inventor： Tingji Tang , Gu Xu , Xing-Fu Zhong , Wenbin Hong , Tony D. Flaim , Kimberly Yess , Ramachandran K. Trichur
IPC: G03F7/26
CPC classification number: B81C1/00801 , B81C2201/053 , C08G61/08 , C08G2261/3324 , C08G2261/418 , G03F7/033 , G03F7/094 , H01L21/0274 , H01L21/3081 , Y10T428/31645 , Y10T428/31667 , Y10T428/31692 , Y10T428/31855 , Y10T428/31909
Abstract: New compositions and methods of using those compositions as protective layers during the production of semiconductor and MEMS devices are provided. The compositions comprise a cycloolefin copolymer dispersed or dissolved in a solvent system, and can be used to form layers that protect a substrate during acid etching and other processing and handling. The protective layer can be photosensitive or non-photosensitive, and can be used with or without a primer layer beneath the protective layer. Preferred primer layers comprise a basic polymer in a solvent system.
Abstract translation: 提供了在制造半导体和MEMS器件期间使用这些组合物作为保护层的新组合物和方法。 组合物包含分散或溶解在溶剂体系中的环烯烃共聚物，并且可以用于在酸蚀刻和其它加工和处理期间形成保护基材的层。 保护层可以是光敏的或非感光的，并且可以在保护层下面使用或不使用底漆层。 优选的底漆层在溶剂体系中包含碱性聚合物。
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公开(公告)号：US07608342B2
公开(公告)日：2009-10-27
申请号：US11550279
申请日：2006-10-17
Applicant: Xing-Fu Zhong
Inventor： Xing-Fu Zhong
CPC classification number: H01B1/127 , H01L51/0037 , Y10T428/31507 , Y10T428/31645 , Y10T428/31855 , Y10T428/31909
Abstract: Photocurable, conductive, and transparent polymer coating compositions and methods of using the same are provided. The compositions include a photopolymer and an electrically conductive polymer dissolved or dispersed in a solvent system. Preferred photopolymers include water-miscible, multifunctional acrylates. Preferred electrically conductive polymers include poly(3,4-ethylenedioxythiophene)/poly(styrene sulfonate) (PEDOT-PSS). The compositions preferably also contain a photoinitiator and may contain a water-immiscible acrylate and/or a surfactant. The compositions are applied to substrates and exposed to actinic radiation such as ultraviolet (UV) light to form a cured, durable, conductive, and transparent coating.
Abstract translation: 提供光固化，导电和透明的聚合物涂料组合物及其使用方法。 组合物包括溶解或分散在溶剂体系中的光聚合物和导电聚合物。 优选的光聚合物包括水混溶性多官能丙烯酸酯。 优选的导电聚合物包括聚（3,4-亚乙基二氧噻吩）/聚（苯乙烯磺酸盐）（PEDOT-PSS）。 组合物优选还含有光引发剂并且可以含有不与水混溶的丙烯酸酯和/或表面活性剂。 将组合物施加到基底上并暴露于光化辐射如紫外（UV）光下以形成固化的，耐久的，导电的和透明的涂层。
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公开(公告)号：US20070176152A1
公开(公告)日：2007-08-02
申请号：US11550279
申请日：2006-10-17
Applicant: Xing-Fu Zhong
Inventor： Xing-Fu Zhong
IPC: H01B1/12
CPC classification number: H01B1/127 , H01L51/0037 , Y10T428/31507 , Y10T428/31645 , Y10T428/31855 , Y10T428/31909
Abstract: Photocurable, conductive, and transparent polymer coating compositions and methods of using the same are provided. The compositions include a photopolymer and an electrically conductive polymer dissolved or dispersed in a solvent system. Preferred photopolymers include water-miscible, multifunctional acrylates. Preferred electrically conductive polymers include poly(3,4-ethylenedioxythiophene)/poly(styrene sulfonate) (PEDOT-PSS). The compositions preferably also contain a photoinitiator and may contain a water-immiscible acrylate and/or a surfactant. The compositions are applied to substrates and exposed to actinic radiation such as ultraviolet (UV) light to form a cured, durable, conductive, and transparent coating.
Abstract translation: 提供光固化，导电和透明的聚合物涂料组合物及其使用方法。 组合物包括溶解或分散在溶剂体系中的光聚合物和导电聚合物。 优选的光聚合物包括水混溶性多官能丙烯酸酯。 优选的导电聚合物包括聚（3,4-亚乙基二氧噻吩）/聚（苯乙烯磺酸盐）（PEDOT-PSS）。 组合物优选还含有光引发剂并且可以含有不与水混溶的丙烯酸酯和/或表面活性剂。 将组合物施加到基底上并暴露于光化辐射如紫外（UV）光下以形成固化的，耐久的，导电的和透明的涂层。
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