Method for Coating a Substrate and Metal Alloy Vacuum Deposition Facility

    公开(公告)号:US20180112305A1

    公开(公告)日:2018-04-26

    申请号:US15851154

    申请日:2017-12-21

    Applicant: ArcelorMittal

    Abstract: A vacuum deposition facility for continuously depositing coatings formed from metal alloys having at least two metallic elements on a running substrate is provided. The vacuum deposition facility includes a vacuum deposition chamber, a substrate running through the vacuum deposition chamber and an evaporation crucible inside the vacuum deposition chamber. The evaporation crucible includes a heater and a bath of molten metal alloy which has at least two metallic elements in a predetermined and constant ratio. The evaporation crucible evaporates the molten metal alloy into a vapor. The vacuum deposition facility also includes a coater inside the vacuum deposition chamber and connected to the evaporation crucible. The coater sprays a face of the running substrate with the vapor at a sonic velocity in order to deposit a coating on the running substrate. The vapor includes the at least two metallic elements in the predetermined and constant ratio.

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