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公开(公告)号：US10018921B2
公开(公告)日：2018-07-10
申请号：US15688262
申请日：2017-08-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Cornelius Maria Rops , Nicolaas Rudolf Kemper , Michel Riepen
CPC classification number: G03F7/70341
Abstract: An immersion lithographic apparatus is disclosed that includes a fluid handling system configured to confine immersion liquid to a localized space between a final element of a projection system and a substrate and/or table and a gas supplying device configured to supply gas with a solubility in immersion liquid of greater than 5×10−3 mol/kg at 20° C. and 1 atm total pressure to an area adjacent the space.
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公开(公告)号：US09946172B2
公开(公告)日：2018-04-17
申请号：US15039795
申请日：2014-11-14
Applicant: ASML Netherlands B.V.
Inventor： Peter Paul Hempenius , Martijn Houben , Nicolaas Rudolf Kemper , Robertus Mathijs Gerardus Rijs , Paul Corné Henri De Wit , Stijn Willem Boere , Youssef Karel Maria De Vos , Frits Van Der Meulen
CPC classification number: G03F7/70875 , G03F7/70775 , G03F7/709
Abstract: A lithographic apparatus includes: an object that is moveable in at least one direction; a control system to move the object in the at least one direction, wherein the control system is arranged to control movement of the object in the at least one direction in a frequency range of interest; and a conduit provided with a fluid, wherein the conduit is arranged on or in the object in a pattern, and wherein the pattern is such that an acceleration of the object in the at least one direction causes an acceleration pressure profile in the fluid along the conduit, the acceleration pressure profile not matching with a resonance pressure profile that corresponds to a standing wave mode in the fluid with a resonance frequency in the frequency range of interest.
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公开(公告)号：US09746788B2
公开(公告)日：2017-08-29
申请号：US15293009
申请日：2016-10-13
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
CPC classification number: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
Abstract: A lithographic projection apparatus, including a liquid supply system configured to supply a liquid to a space between a projection system and a movable table; a member to at least partly confine liquid in the space, the member including a recovery opening facing toward the movable table, the recovery opening including a first porous structure configured to recover fluid; and a chamber configured to receive recovered fluid and to separate liquid from gas in the recovered fluid, the chamber including a second porous structure.
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公开(公告)号：US20160370713A1
公开(公告)日：2016-12-22
申请号：US15250658
申请日：2016-08-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcel BECKERS , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70808
Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
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15.发明授权Fluid extraction system, lithographic apparatus and device manufacturing method 有权流体萃取系统，光刻设备和装置制造方法公开(公告)号：US09213246B2
公开(公告)日：2015-12-15
申请号：US14179276
申请日：2014-02-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Rudolf Kemper , Robertus Nicodemus Jacobus Van Ballegoij , Marcus Martinus Petrus Adrianus Vermeulen , Michel Riepen , Martinus Wilhelmus Van Den Heuvel , Paul Petrus Joannes Berkvens , Christophe De Metsenaere , Jimmy Matheus Wilhelmus Van De Winkel , Cornelius Maria Rops
CPC classification number: G03F7/70341 , F01N1/023 , G03F7/709
Abstract: An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.
Abstract translation: 浸没式光刻设备通常包括流体处理系统。 流体处理系统通常具有配置成从给定位置去除气体和液体的混合物的两相流体萃取系统。 因为提取液包含两相，所以提取系统中的压力可以变化。 该压力变化可以通过浸没液体并导致曝光不准确。 为了减少提取系统中的压力波动，可以使用缓冲室。 该缓冲室可以连接到流体提取系统，以便提供减小压力波动的一定体积的气体。 或者或另外，柔性壁可以设置在流体提取系统的某处。 响应于流体提取系统中的压力变化，柔性壁可以改变形状。 通过改变形状，柔性壁可以帮助减少或消除压力波动。
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Patent Agency Ranking
公开(公告)号：US20150309420A1
公开(公告)日：2015-10-29
申请号：US14664360
申请日：2015-03-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcel BECKERS , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70808
Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
Abstract translation: 用于浸没式光刻设备的液体供应系统在投影系统的最终元件和基底之间提供浸液的层流。 控制系统使溢出的机会最小化，并且提取器包括被配置为使振动最小化的出口阵列。
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公开(公告)号：US20140327893A1
公开(公告)日：2014-11-06
申请号：US14331003
申请日：2014-07-14
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341
Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
Abstract translation: 公开了一种浸没式光刻设备，其中液体供应系统（其在投影系统和基板之间提供液体）的至少一部分可在扫描期间在基本上平行于基板的顶表面的平面中移动。 移动部件以减小该部件与基板之间的相对速度，使得可以相对于投影系统移动基板的速度。
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公开(公告)号：US11789369B2
公开(公告)日：2023-10-17
申请号：US17560841
申请日：2021-12-23
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G03F7/70341 , G03F7/70866
Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
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公开(公告)号：US11537038B2
公开(公告)日：2022-12-27
申请号：US17119331
申请日：2020-12-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Rudolf Kemper , Sjoerd Nicolaas Lambertus Donders , Joost Jeroen Ottens , Edwin Cornelis Kadijk , Sergei Shulepov
Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.
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公开(公告)号：US20220113641A1
公开(公告)日：2022-04-14
申请号：US17560841
申请日：2021-12-23
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
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