公开(公告)号：US20170068175A1

公开(公告)日：2017-03-09

申请号：US15354821

申请日：2016-11-17

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Jan Steven Christiaan WESTERLAKEN ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Peter A. DELMASTRO ,  Thibault Simon Mathieu LAURENT ,  Martinus Hendrikus Antonius LEENDERS ,  Mark Josef SCHUSTER ,  Christopher Charles WARD ,  Frank Johannes Jacobus VAN BOXTEL ,  Justin Matthew VERDIRAME ,  Samir A. NAYFEH

IPC: G03F7/20

Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.

Abstract translation: 光刻设备具有构造成支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望的图案对辐射束进行图案化，并具有辐射束通过的平面主表面; 出口开口，其构造成将气体流引导到图案形成装置上; 以及入口开口，被配置为提取已经离开出口的气体，其中出口开口和入口开口面向面向图案形成装置的平面主表面的面对表面。

公开(公告)号：US20220057722A1

公开(公告)日：2022-02-24

申请号：US17519713

申请日：2021-11-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Giovanna DE SIMONE ,  Marco Adrianus Peter VAN DEN HEUVEL ,  Thibault Simon Mathieu LAURENT ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Niek Jacobus Johannes ROSET ,  Justin Johannes Hermanus GERRITZEN

IPC: G03F7/20

Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.

公开(公告)号：US20190294056A1

公开(公告)日：2019-09-26

申请号：US16437760

申请日：2019-06-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis KUNNEN ,  Martijn HOUBEN ,  Thibault Simon Mathieu LAURENT ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Armand Rosa Jozef DASSEN ,  Sander Catharina Reinier DERKS

IPC: G03F7/20 ,  H01L21/687 ,  H01L21/68

Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

公开(公告)号：US20170315454A1

公开(公告)日：2017-11-02

申请号：US15629399

申请日：2017-06-21

Applicant: ASML Netherlands B.V.

Inventor： Thibault Simon Mathieu LAURENT ,  Johannes Henricus Wilhelmus JACOBS ,  Wilhelmus Franciscus Johannes SIMONS ,  Martijn HOUBEN ,  Raymond Wilhelmus Louis LAFARRE ,  Koen STEFFENS ,  Han Henricus Aldegonda LEMPENS ,  Rogier Hendrikus Magdalena CORTIE ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Gerben PIETERSE ,  Siegfried Alexander TROMP ,  Theodorus Wilhelmus POLET ,  Jim Vincent OVERKAMP ,  Van Vuong VY

IPC: G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/7095 ,  H01L21/682

Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

公开(公告)号：US20170176872A1

公开(公告)日：2017-06-22

申请号：US15435094

申请日：2017-02-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis KUNNEN ,  Martijn HOUBEN ,  Thibault Simon Mathieu LAURENT ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Armand Rosa Jozef DASSEN ,  Sander Catharina Reinier DERKS

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/68 ,  H01L21/6875

Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

公开(公告)号：US20150277243A1

公开(公告)日：2015-10-01

申请号：US14634272

申请日：2015-02-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis KUNNEN ,  Martijn HOUBEN ,  Thibault Simon Mathieu LAURENT ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Armand Rosa Jozef DASSEN ,  Sander Catharina Reinier DERKS

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/68 ,  H01L21/6875

Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

Abstract translation: 用于光刻设备的支撑台，支撑台具有支撑部分和调节系统，其中支撑部分，调节系统或两者都被配置成使得热传递到支撑在支撑台上的基板或从支撑在支撑台上的基板，导致 从处理系统的操作来看，在衬底的与衬底边缘相邻的区域中比在衬底中心处的区域更大。

公开(公告)号：US20210132510A1

公开(公告)日：2021-05-06

申请号：US16617242

申请日：2018-05-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Giovanna DE SIMONE ,  Marco Adrianus Peter VAN DEN HEUVEL ,  Thibault Simon Mathieu LAURENT ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Niek Jacobus Johannes ROSET ,  Justin Johannes Hermanns GERRITZEN

IPC: G03F7/20

Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.

公开(公告)号：US20180340767A1

公开(公告)日：2018-11-29

申请号：US15778061

申请日：2016-11-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Stoyan NIHTIANOV ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Johannes Paul Marie DE LA ROSETTE ,  Thibault Simon Mathieu LAURENT ,  Kofi Afoiabi MAKINWA ,  Jacobus NEEFS ,  Johannes Petrus Martinus Bernardus VERMEULEN

IPC: G01B7/16 ,  G03F7/20 ,  G01K7/01 ,  H01L21/67

CPC classification number: G01B7/20 ,  G01K7/01 ,  G03F7/70625 ,  G03F7/7085 ,  G03F7/70866 ,  G03F7/70875 ,  H01L21/67248 ,  H01L21/67276 ,  H01L22/34

Abstract: A measurement substrate for measuring a condition pertaining in an apparatus for processing production substrates during operation thereof, the measurement substrate including: a body having dimensions compatible with the apparatus; a plurality of sensor modules embedded in the body, each sensor module having: a sensor configured generate an analog measurement signal, an analog to digital converter to generate digital measurement information from the analog measurement signal, and a module controller configured to output the digital measurement information; and a central control module configured to receive the digital measurement information from each of the module controllers and to communicate the digital measurement information to an external device.

公开(公告)号：US20170261864A1

公开(公告)日：2017-09-14

申请号：US15520193

申请日：2015-10-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Gunes NAKIBOGLU ,  Jan Steven Christiaan WESTERLAKEN ,  Frank Johannes Jacobus VAN BOXTEL ,  Maria del Carmen MERCADO CARMONA ,  Thibault Simon Mathieu LAURENT

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70808 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/709 ,  G03F7/70933 ,  G03F9/7096

Abstract: A lithographic apparatus including: a projection system to project radiation onto a substrate supported on a substrate stage, during an exposure phase; a sensing system to sense a property of the substrate on the stage during a sensing phase; and a positioning system to determine a position of the stage relative to a reference system via a radiation path between the stage and the reference system, wherein the apparatus is configured to control stage movement relative to the reference system in the sensing phase and to control other movement relative to the reference system during the exposure phase; the stage or reference system having an outlet to provide a gas curtain to reduce ingress of ambient gas into the path; and the apparatus is operative such that a characteristic of the gas curtain is different in at least part of the sensing phase compared to in the exposure phase.

公开(公告)号：US20170212429A1

公开(公告)日：2017-07-27

申请号：US15329536

申请日：2015-07-16

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik KOEVOETS ,  Christianus Wilhelmus Johannes BERENDSEN ,  Rogier Hendrikus Magdalena CORTIE ,  Jim Vincent OVERKAMP ,  Patricius Jacobus NEEFS ,  Putra SAPUTRA ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Michael Johannes Hendrika Wilhelmina RENDERS ,  Johan Gertrudis Cornelis KUNNEN ,  Thibault Simon Mathieu LAURENT

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70341 ,  G03F7/70783 ,  G03F7/70875

Abstract: A lithographic apparatus comprising an object table which carries an object. The lithographic apparatus may further comprise at least one sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the deformation of the object due to varying loads during operation of the lithographic apparatus, for example varying loads induced by a two- phase flow in a channel formed within the object table. Additionally, or alternatively, the lithographic apparatus comprises a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation. The positioning of a projection beam, used to pattern a substrate, can be controlled relative to the object, to alter the position of the pattern and/or the projection beam on the substrate, based on the estimated deformation.