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公开(公告)号：US10254660B2
公开(公告)日：2019-04-09
申请号：US15994492
申请日：2018-05-31
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade
IPC: G03B27/52 , G03B27/42 , G03F7/20 , H01L21/687 , C23C16/44
Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
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公开(公告)号：US09737934B2
公开(公告)日：2017-08-22
申请号：US15296968
申请日：2016-10-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
IPC: G03B27/58 , B22F7/06 , G03F7/20 , B23Q3/18 , B05D3/06 , B05D5/00 , B23K26/00 , B23K26/342 , B33Y10/00 , B33Y80/00 , B22F3/105
CPC classification number: B22F7/062 , B05D3/06 , B05D5/00 , B22F3/1055 , B23K26/342 , B23K26/354 , B23Q3/18 , B33Y10/00 , B33Y80/00 , G03F7/20 , G03F7/70341 , G03F7/70416 , G03F7/707 , G03F7/70708 , G03F7/70716 , G03F7/70733 , G03F7/708
Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
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公开(公告)号：US09507274B2
公开(公告)日：2016-11-29
申请号：US14373291
申请日：2013-01-17
Applicant: ASML Netherlands B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
CPC classification number: B22F7/062 , B05D3/06 , B05D5/00 , B22F3/1055 , B23K26/342 , B23K26/354 , B23Q3/18 , B33Y10/00 , B33Y80/00 , G03F7/20 , G03F7/70341 , G03F7/70416 , G03F7/707 , G03F7/70708 , G03F7/70716 , G03F7/70733 , G03F7/708
Abstract: An object holder (100) for a lithographic apparatus has a main body (400) having a surface (400a). A plurality of burls (406) to support an object are formed on the surface or in apertures of a thin-film stack (410, 440, 450). At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
Abstract translation: 用于光刻设备的物体保持器（100）具有具有表面（400a）的主体（400）。 在薄膜堆叠（410,440,450）的表面上或孔中形成有用于支撑物体的多个毛刺（406）。 通过激光烧结形成至少一个毛刺。 通过激光烧结形成的毛刺中的至少一个可以是先前通过激光烧结形成的损坏的隆起的修复或其他方法。
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公开(公告)号：US11754929B2
公开(公告)日：2023-09-12
申请号：US17856520
申请日：2022-07-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
IPC: G03F7/20 , G03F7/00 , B23K26/354 , B23K26/342 , B22F10/00 , B22F10/20 , B23Q3/18 , B05D3/06 , B05D5/00 , B33Y10/00 , B33Y80/00 , B22F7/06 , B22F10/25 , B22F10/28 , B22F10/66
CPC classification number: G03F7/70341 , B05D3/06 , B05D5/00 , B22F7/062 , B22F10/00 , B22F10/20 , B23K26/342 , B23K26/354 , B23Q3/18 , B33Y10/00 , B33Y80/00 , G03F7/20 , G03F7/707 , G03F7/708 , G03F7/70416 , G03F7/70708 , G03F7/70716 , G03F7/70733 , B22F10/25 , B22F10/28 , B22F10/66
Abstract: A substrate holder for use in a lithographic apparatus, the substrate holder including: a main body; a plurality of first burls provided on a first side of the main body and having end surfaces to support a substrate, wherein the first burls each include CrN; and a plurality of second burls provided on a second side of the main body.
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公开(公告)号：US11376663B2
公开(公告)日：2022-07-05
申请号：US17132084
申请日：2020-12-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
IPC: B22F7/06 , B23K26/354 , B23K26/342 , G03F7/20 , B22F10/20 , B22F10/00 , B23Q3/18 , B05D3/06 , B05D5/00 , B33Y10/00 , B33Y80/00
Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
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Patent Agency Ranking
公开(公告)号：US10898955B2
公开(公告)日：2021-01-26
申请号：US16369368
申请日：2019-03-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
IPC: G03F7/20 , B22F7/06 , B23K26/354 , B23K26/342 , B23Q3/18 , B05D3/06 , B05D5/00 , B33Y10/00 , B33Y80/00 , B22F3/105
Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burs to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
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公开(公告)号：US10245641B2
公开(公告)日：2019-04-02
申请号：US15261553
申请日：2016-09-09
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
IPC: B22F7/06 , B23K26/354 , G03F7/20 , B23Q3/18 , B05D3/06 , B05D5/00 , B23K26/342 , B33Y10/00 , B33Y80/00 , B22F3/105
Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
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公开(公告)号：US10018924B2
公开(公告)日：2018-07-10
申请号：US15014829
申请日：2016-02-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Siegfried Alexander Tromp , Jacobus Josephus Leijssen , Elisabeth Corinne Rodenburg , Maurice Wilhelmus Leonardus Hendricus Feijts , Hendrik Huisman
CPC classification number: G03F7/70716 , B05D3/02 , G01J5/0285 , G01J5/20 , G03F7/70341 , G03F7/70708
Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The thin film stack comprises an (optional) isolation layer, a metal layer forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer.
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公开(公告)号：US09829803B2
公开(公告)日：2017-11-28
申请号：US15131986
申请日：2016-04-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg , Peter Van Delft
CPC classification number: G03F7/70716 , B05D1/005 , G03F7/70341 , G03F7/70691 , G03F7/707
Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The planarization layer is of substantially uniform thickness and/or its outer surface has a peak to valley distance of less than 10 μm. The planarization layer may be formed by applying two solutions of different concentration. A surface treatment may be applied to the burls to repel a solution of the planarization layer material.
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20.发明申请SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER 有权基板支架，光刻装置，装置制造方法及制造基板支架的方法公开(公告)号：US20140368804A1
公开(公告)日：2014-12-18
申请号：US14374197
申请日：2013-01-17
Applicant: ASML Netherlands B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
CPC classification number: B22F7/062 , B05D3/06 , B05D5/00 , B22F3/1055 , B23K26/342 , B23K26/354 , B23Q3/18 , B33Y10/00 , B33Y80/00 , G03F7/20 , G03F7/70341 , G03F7/70416 , G03F7/707 , G03F7/70708 , G03F7/70716 , G03F7/70733 , G03F7/708
Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
Abstract translation: 用于光刻设备的衬底保持器具有设置在其表面上的薄膜堆叠的主体。 薄膜堆叠形成诸如电极，传感器，加热器，晶体管或逻辑器件的电子或电气部件，并且具有顶部隔离层。 在薄膜叠层或薄膜叠层的孔中形成有用于支撑衬底的多个毛刺。
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