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公开(公告)号：US10750604B2
公开(公告)日：2020-08-18
申请号：US15781885
申请日：2016-11-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Johan Frederik Dijksman , Wilhelmus Henricus Theodorus Maria Aangenent , Ronald Johannes Hultermans , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Peter Wilhelm Hendrik Van Putten
IPC: H05G2/00
Abstract: An EUV source for generating a beam of EUV radiation, has a droplet generator with a nozzle assembly to emit droplets of fuel from a nozzle towards a plasma formation location. The nozzle assembly receives the fuel from a reservoir. The nozzle assembly has a pump chamber receiving the fuel from the reservoir and an actuator to vibrate a membrane that forms a wall of the pump chamber. The wall is oriented perpendicularly to a direction wherein the nozzle emits the fuel. The nozzle assembly has first and second nozzle filters non-adjacently arranged in series in a path of the fuel from the pump chamber to the nozzle.
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公开(公告)号：US20180364580A1
公开(公告)日：2018-12-20
申请号：US16061847
申请日：2016-12-15
Applicant: ASML Netherlands B.V.
Inventor： Johan Frederik Dijksman , Bastiaan Lambertus Wilhelmus Marinus van de Ven , Koen Gerhardus Winkels , Theodorus Wilhelmus Driessen , Georgiy O. Vaschenko , Peter Michael Baumgart , Wilhelmus Henricus Theodorus Maria Aangenent , Jan Okke Nieuwenkamp , Wim Ronald Kampinga , Jari Ruotsalainen
CPC classification number: G03F7/70033 , H05G2/006 , H05G2/008
Abstract: Droplet generators, such as used in an EUV radiation source, and associated EUV radiation sources and lithographic apparatuses. A droplet generator can include a nozzle assembly to emit the fuel as droplets, the nozzle assembly being within a pressurized environment at substantially the same pressure as the fuel pressure within the droplet generator. A droplet generator can include an actuator in contact with and biased against a pump chamber by means of a biasing mechanism having an actuator support biased against the actuator. The actuator acts on the fuel within the pump chamber to create droplets. The actuator support has a material with a greater coefficient of thermal expansion than its surrounding structure, such that it is moveable within the surrounding structure at ambient temperature, but expands against the surrounding structure at an operating temperature, so as to clamp the actuator support against the surrounding structure at the operating temperature.
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公开(公告)号：US09662678B2
公开(公告)日：2017-05-30
申请号：US14222013
申请日：2014-03-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Ivar Schram , Johan Frederik Dijksman , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers
CPC classification number: B05D5/00 , B82Y10/00 , B82Y40/00 , G03F7/0002
Abstract: A method of depositing an imprintable medium onto a target area of a substrate for imprint lithography is disclosed. The method includes moving the substrate, a print head comprising a nozzle to eject an imprintable medium onto the substrate, or both, relative to the other in a first direction across the target area while ejecting a first series of droplets of imprintable medium onto the substrate and moving the substrate, the print head, or both, relative to the other in a second opposing direction across the target area while ejecting a second series of droplets of imprintable medium onto the substrate on or adjacent to droplets from the first series of droplets.
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公开(公告)号：US09510432B2
公开(公告)日：2016-11-29
申请号：US14383359
申请日：2013-02-07
Applicant: ASML Netherlands B.V.
CPC classification number: H05G2/006 , B05B17/0653 , G03F7/70033 , G03F7/70058 , G03F7/7085 , G03F7/709 , G03F7/70916
Abstract: The present invention provides a method of monitoring the operation of a radiation source fuel droplet stream generator comprising a fuel-containing capillary and a piezo-electric actuator (500). The method comprises analyzing the resonance frequency spectrum of a system comprising the fuel-containing capillary and the piezo-electric actuator in particular to look for changes in the resonance frequencies of the acoustic system which may be indicative of a change in the properties of the system requiring investigation.
Abstract translation: 本发明提供一种监测包括含燃料毛细管和压电致动器（500）的辐射源燃料液滴流发生器的操作的方法。 该方法包括分析包括含燃料的毛细管和压电致动器的系统的共振频谱，以寻找声学系统的共振频率的变化，其可以指示系统的性质的变化 需要调查。
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15.发明申请DROPLET GENERATOR, EUV RADIATION SOURCE, LITHOGRAPHIC APPARATUS, METHOD FOR GENERATING DROPLETS AND DEVICE MANUFACTURING METHOD 有权DROPLET发生器，EUV辐射源，光刻设备，用于产生DROPLETS的方法和设备制造方法公开(公告)号：US20150293456A1
公开(公告)日：2015-10-15
申请号：US14443965
申请日：2013-10-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Johan Frederik Dijksman , Ramin Badie , Ronald Johannes Hultermans , Dzmitry Labetski
CPC classification number: G03F7/70033 , B05B17/06 , H05G2/005 , H05G2/006 , H05G2/008
Abstract: A droplet generator, for an EUV radiation source, comprises: a capillary in which, in use, molten material flows; an actuator configured to modulate a pressure inside the capillary; and a controller configured to drive the actuator at a driving frequency; wherein the droplet generator is arranged such that, in use, the driving frequency is equal or about equal to a main resonance frequency of the molten material in the capillary.
Abstract translation: 用于EUV辐射源的液滴发生器包括：毛细管，其中在使用中熔融材料流动; 构造成调节毛细管内的压力的致动器; 以及控制器，其构造成以驱动频率驱动所述致动器; 其中所述液滴发生器被布置为使得在使用中，所述驱动频率等于或大致等于所述毛细管中的熔融材料的主共振频率。
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Patent Agency Ranking
公开(公告)号：US11635696B2
公开(公告)日：2023-04-25
申请号：US17120506
申请日：2020-12-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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公开(公告)号：US10904994B2
公开(公告)日：2021-01-26
申请号：US16671348
申请日：2019-11-01
Applicant: ASML Netherlands B.V.
Inventor： Koen Gerhardus Winkels , Georgiy O. Vaschenko , Theodorus Wilhelmus Driessen , Johan Frederik Dijksman , Bastiaan Lambertus Wilhelmus Marinus van de Ven , Wilhelmus Henricus Theodorus Maria Aangenent
Abstract: A supply system for an extreme ultraviolet (EUV) light source includes an apparatus configured to be fluidly coupled to a reservoir configured to contain target material that produces EUV light in a plasma state, the apparatus including two or more target formation units, each one of the target formation units including: a nozzle structure configured to receive the target material from the reservoir, the nozzle structure including an orifice configured to emit the target material to a plasma formation location. The supply system further includes a control system configured to select a particular one of the target formation units for emitting the target material to the plasma formation location. An apparatus for a supply system of an extreme ultraviolet (EUV) light source includes a MEMS system fabricated in a semiconductor device fabrication technology, and the MEMS system including a nozzle structure configured to be fluidly coupled to a reservoir.
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公开(公告)号：US09715174B2
公开(公告)日：2017-07-25
申请号：US14443965
申请日：2013-10-30
Applicant: ASML Netherlands B.V.
Inventor： Johan Frederik Dijksman , Ramin Badie , Ronald Johannes Hultermans , Dzmitry Labetski
CPC classification number: G03F7/70033 , B05B17/06 , H05G2/005 , H05G2/006 , H05G2/008
Abstract: A droplet generator, for an EUV radiation source, comprises: a capillary in which, in use, molten material flows; an actuator configured to modulate a pressure inside the capillary; and a controller configured to drive the actuator at a driving frequency; wherein the droplet generator is arranged such that, in use, the driving frequency is equal or about equal to a main resonance frequency of the molten material in the capillary.
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公开(公告)号：US09442380B2
公开(公告)日：2016-09-13
申请号：US14439476
申请日：2013-10-03
Applicant: ASML Netherlands B.V.
Inventor： Ramin Badie , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Antonius Theodorus Wilhelmus Kempen , Andrei Mikhailovich Yakunin , Hendrikus Robertus Marie Van Greevenbroek , Koen Gerhardus Winkels
CPC classification number: G03F7/70033 , H05G2/003 , H05G2/006 , H05G2/008
Abstract: A radiation source (e.g., LPP—laser produced plasma source) for generation of extreme UV (EUV) radiation has at least two fuel particle streams having different trajectories. Each stream is directed to cross the path of an excitation (laser) beam focused at a plasma formation region, but the trajectories are spaced apart at the plasma formation region, and the streams phased, so that only one stream has a fuel particle in the plasma formation region at any time, and so that when a fuel particle from one stream is generating plasma and EUV radiation at the plasma generation region, other fuel particles are sufficiently spaced so as to be substantially unaffected by the plasma. The arrangement permits potential doubling of the radiation intensity achievable for a particular fuel particle size.
Abstract translation: 用于产生极端UV（EUV）辐射的辐射源（例如，LPP激光产生的等离子体源）具有至少两个具有不同轨迹的燃料粒子流。 每个流被引导以跨过等离子体形成区域聚焦的激发（激光）束的路径，但是轨迹在等离子体形成区域处被间隔开，并且流被相位化，使得仅一条流在 等离子体形成区域，并且使得当来自一个流的燃料粒子在等离子体产生区域产生等离子体和EUV辐射时，其它燃料颗粒被充分间隔开，以致基本上不受等离子体的影响。 该布置允许对于特定燃料粒子尺寸可实现的辐射强度的潜在加倍。
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公开(公告)号：US20140199485A1
公开(公告)日：2014-07-17
申请号：US14222013
申请日：2014-03-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Ivar SCHRAM , Johan Frederik Dijksman , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers
IPC: B05D5/00
CPC classification number: B05D5/00 , B82Y10/00 , B82Y40/00 , G03F7/0002
Abstract: A method of depositing an imprintable medium onto a target area of a substrate for imprint lithography is disclosed. The method includes moving the substrate, a print head comprising a nozzle to eject an imprintable medium onto the substrate, or both, relative to the other in a first direction across the target area while ejecting a first series of droplets of imprintable medium onto the substrate and moving the substrate, the print head; or both, relative to the other in a second opposing direction across the target area while ejecting a second series of droplets of imprintable medium onto the substrate on or adjacent to droplets from the first series of droplets.
Abstract translation: 公开了一种将可压印介质沉积到用于压印光刻的基板的目标区域上的方法。 该方法包括移动基板，包括喷嘴的打印头，以在横过目标区域的第一方向上相对于另一方弹出可压印介质，同时将可压印介质的第一系列液滴喷射到基板上 并移动基板，打印头; 或两者相对于另一个在相对于目标区域的第二相对方向上，同时在第一系列液滴上或邻近液滴上喷射可压印介质的第二系列液滴到基板上。
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