公开(公告)号：US20140300879A1

公开(公告)日：2014-10-09

申请号：US14179276

申请日：2014-02-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Michel Riepen ,  Martinus Wilhelmus Van Den Heuvel ,  Paul Petrus Joannes Berkvens ,  Christophe De Metsenaere ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  F01N1/023 ,  G03F7/709

Abstract: An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.

Abstract translation: 浸没式光刻设备通常包括流体处理系统。 流体处理系统通常具有配置成从给定位置去除气体和液体的混合物的两相流体萃取系统。 因为提取液包含两相，所以提取系统中的压力可以变化。 该压力变化可以通过浸没液体并导致曝光不准确。 为了减少提取系统中的压力波动，可以使用缓冲室。 该缓冲室可以连接到流体提取系统，以便提供减小压力波动的一定体积的气体。 或者或另外，柔性壁可以设置在流体提取系统的某处。 响应于流体提取系统中的压力变化，柔性壁可以改变形状。 通过改变形状，柔性壁可以帮助减少或消除压力波动。

公开(公告)号：US20220082948A1

公开(公告)日：2022-03-17

申请号：US17531953

申请日：2021-11-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Christian Gerardus Norbertus Hendricus Marie CLOIN ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Marco Koert Stavenga ,  Erik Henricus Egidius Catharina Eummelen ,  Michel Riepen ,  Olga Vladimirovna Elisseeva ,  Tijmen Wilfred Mathijs Gunther ,  Michael Christiaan Van Der Wekken

IPC: G03F7/20

Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

公开(公告)号：US10394141B2

公开(公告)日：2019-08-27

申请号：US15661888

申请日：2017-07-27

Applicant: ASML Netherlands B.V.

Inventor： Michel Riepen ,  Dzmitry Labetski ,  Wilbert Jan Mestrom ,  Wim Ronald Kampinga ,  Jan Okke Nieuwenkamp ,  Jacob Brinkert ,  Henricus Jozef Castelijns ,  Nicolaas Ten Kate ,  Hendrikus Gijsbertus Schimmel ,  Hans Jansen ,  Dennis Jozef Maria Paulussen ,  Brian Vernon Virgo ,  Reinier Theodorus Martinus Jilisen ,  Ramin Badie ,  Albert Pieter Rijpma ,  Johannes Christiaan Leonardus Franken ,  Peter Van Putten ,  Gerrit Van Der Straaten

IPC: H05G2/00 ,  G03F7/20 ,  G21K5/08 ,  G21K1/06 ,  F15D1/00

Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

公开(公告)号：US10209624B2

公开(公告)日：2019-02-19

申请号：US15838634

申请日：2017-12-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdalena Cortie ,  Paulus Martinus Maria Liebregts ,  Michel Riepen ,  Fabrizio Evangelista

IPC: G03F7/20

Abstract: A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.

公开(公告)号：US10018925B2

公开(公告)日：2018-07-10

申请号：US15452445

申请日：2017-03-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf Kemper ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Marcel Beckers ,  Marco Polizzi ,  Michel Riepen ,  Anthonie Kuijper ,  Koen Steffens ,  Adrianes Johannes Baeten ,  Anca Mihaela Antonevici

IPC: G03B27/52 ,  G03B27/58 ,  G03B27/60 ,  G03F7/20 ,  B01D19/00

CPC classification number: G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

公开(公告)号：US09846372B2

公开(公告)日：2017-12-19

申请号：US15016041

申请日：2016-02-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdalena Cortie ,  Paulus Martinus Maria Liebregts ,  Michel Riepen ,  Fabrizio Evangelista

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.

公开(公告)号：US09746782B2

公开(公告)日：2017-08-29

申请号：US14975412

申请日：2015-12-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria Rops ,  Nicolaas Rudolf Kemper ,  Michel Riepen

IPC: G03B27/52 ,  G03B27/68 ,  G03B27/58 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: An immersion lithographic apparatus is disclosed that includes a fluid handling system configured to confine immersion liquid to a localized space between a final element of a projection system and a substrate and/or table and a gas supplying device configured to supply gas with a solubility in immersion liquid of greater than 5×10−3 mol/kg at 20° C. and 1 atm total pressure to an area adjacent the space.

公开(公告)号：US09645506B2

公开(公告)日：2017-05-09

申请号：US14106403

申请日：2013-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Michel Riepen ,  Christiaan Alexander Hoogendam ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniël Jozef Maria Direcks ,  Paul Petrus Joannes Berkvens ,  Eva Mondt ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete ,  Franciscus Johannes Joseph Janssen

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

公开(公告)号：US20160377989A1

公开(公告)日：2016-12-29

申请号：US15261616

申请日：2016-09-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdalena CORTIE ,  Michel Riepen ,  Cornelius Maria Rops

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70341

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the plurality of gas supply openings in a linear array.

公开(公告)号：US20160011522A1

公开(公告)日：2016-01-14

申请号：US14858885

申请日：2015-09-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Christian Gerardus Norbertus Hendricus Marie CLOIN ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Marco Koert Stavenga ,  Erik Henricus Egidius Catharina Eummelen ,  Michel Riepen ,  Olga Vladimirovna Elisseeva ,  Tijmen Wilfred Mathijs Gunther ,  Michaël Christiaan Van Der Wekken

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733

Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.