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公开(公告)号：US11266002B2
公开(公告)日：2022-03-01
申请号：US16756185
申请日：2018-10-19
Applicant: ASML Netherlands B.V.
Inventor： Michael Anthony Purvis , Klaus Martin Hummler , Chengyuan Ding , Robert Jay Rafac , Igor Vladimirovich Fomenkov
Abstract: An amplified optical beam is provided to a region that receives a target including target material, an interaction between the amplified optical beam and the target converting at least some of the target material from a first form to a second form to form a light-emitting plasma; first data comprising information related to the amplified optical beam is accessed; second data comprising information related to the light-emitting plasma is accessed; and an amount of the target material converted from the first form to the second form is determined. The determination is based on at least the first data and the second data, and the second form of the target material is less dense than the first form of the target material.
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公开(公告)号：US10667377B2
公开(公告)日：2020-05-26
申请号：US14979657
申请日：2015-12-28
Applicant: ASML Netherlands B.V.
Inventor： Robert Jay Rafac , Richard L. Sandstrom , Daniel John William Brown , Kai-Chung Hou
Abstract: A target material is provided at a target location, the target material including a material that emits extreme ultraviolet light when converted to plasma, and the target material extending in a first extent along a first direction and in a second extent along a second direction; an amplified light beam is directed along a direction of propagation toward the target location; and the amplified light beam is focused in a focal plane, where the target location is outside of the focal plane and an interaction between the amplified light beam and the target material converts at least part of the target material to plasma that emits EUV light.
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公开(公告)号：US10349509B2
公开(公告)日：2019-07-09
申请号：US16057101
申请日：2018-08-07
Applicant: ASML Netherlands B.V.
Inventor： Robert Jay Rafac , John Tom Stewart , Andrew David LaForge
IPC: H05G2/00
Abstract: A first target is provided to an interior of a vacuum chamber, a first light beam is directed toward the first target to form a first plasma from target material of the first target, the first plasma being associated with a directional flux of particles and radiation emitted from the first target along a first emission direction, the first emission direction being determined by a position of the first target; a second target is provided to the interior of the vacuum chamber; and a second light beam is directed toward the second target to form a second plasma from target material of the second target, the second plasma being associated with a directional flux of particles and radiation emitted from the second target along a second emission direction, the second emission direction being determined by a position of the second target, the first and second emission directions being different.
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公开(公告)号：US20180136541A1
公开(公告)日：2018-05-17
申请号：US15349600
申请日：2016-11-11
Applicant: ASML Netherlands B.V.
Inventor： Robert Jay Rafac
CPC classification number: G02F1/33 , G02B27/0068 , G02F2001/291 , G02F2203/18 , G02F2203/60 , G03F7/70041 , G03F7/706 , G03F7/70941
Abstract: A wavefront of a light beam that exits an acousto-optic material is estimated; a control signal for an acousto-optic system that includes the acousto-optic material is generated, the control signal being based on the estimated wavefront of the light beam; and the control signal is applied to the acousto-optic system to generate a frequency-chirped acoustic wave that propagates in the acousto-optic material, the frequency-chirped acoustic wave forming a transient diffractive element in the acousto-optic material, an interaction between the transient diffractive element and the light beam adjusting the wavefront of the light beam to compensate for a distortion of the wavefront of the light beam, the distortion of the wavefront being at least partially caused by a physical effect in the acousto-optic material.
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公开(公告)号：US20180081280A1
公开(公告)日：2018-03-22
申请号：US15270072
申请日：2016-09-20
Applicant: ASML Netherlands B.V.
Inventor： Alexander Anthony Schafgans , Igor Vladimirovich Fomenkov , Yezheng Tao , Rostislav Rokitski , Robert Jay Rafac , Daniel John William Brown , Cory Alan Stinson
Abstract: An optical source for an extreme ultraviolet (EUV) photolithography tool includes a light-generation system including a light-generation module; an optical amplifier including a gain medium associated with a gain band, the gain medium configured to amplify light having a wavelength in the gain band; and a wavelength-based optical filter system on a beam path between the light-generation module and the optical amplifier, the wavelength-based optical filter system including at least one optical element configured to allow light having a wavelength in a first set of wavelengths to propagate on the beam path and to remove light having a wavelength in a second set of wavelengths from the beam path, the first set of wavelengths and the second set of wavelengths including different wavelengths in the gain band of the optical amplifier.
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Patent Agency Ranking
公开(公告)号：US09462668B2
公开(公告)日：2016-10-04
申请号：US14874164
申请日：2015-10-02
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Robert Jay Rafac , Igor Vladimirovich Fomenkov , Daniel John William Brown , Daniel James Golich
Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
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公开(公告)号：US20240419083A1
公开(公告)日：2024-12-19
申请号：US18818079
申请日：2024-08-28
Applicant: ASML Netherlands B.V.
Inventor： Robert Jay Rafac , Igor Vladimirovich Fomenkov
Abstract: Disclosed is a system and method for generating EUV radiation in which a laser is used in a multistage process to illuminate without altering a target material and then irradiate the target material to alter a target material with the illumination stage being used to determine the timing for firing during the irradiation stage or stages.
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公开(公告)号：US12171053B2
公开(公告)日：2024-12-17
申请号：US17583799
申请日：2022-01-25
Applicant: ASML Netherlands B.V.
Inventor： Michael Anthony Purvis , Klaus Martin Hummler , Chengyuan Ding , Robert Jay Rafac , Igor Vladimirovich Fomenkov
Abstract: An amplified optical beam is provided to a region that receives a target including target material, an interaction between the amplified optical beam and the target converting at least some of the target material from a first form to a second form to form a light-emitting plasma; first data comprising information related to the amplified optical beam is accessed; second data comprising information related to the light-emitting plasma is accessed; and an amount of the target material converted from the first form to the second form is determined. The determination is based on at least the first data and the second data, and the second form of the target material is less dense than the first form of the target material.
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公开(公告)号：US20200344868A1
公开(公告)日：2020-10-29
申请号：US16756185
申请日：2018-10-19
Applicant: ASML Netherlands B.V.
Inventor： Michael Anthony Purvis , Klaus Martin Hummler , Chengyuan Ding , Robert Jay Rafac , Igor Vladimirovich Fomenkov
Abstract: An amplified optical beam is provided to a region that receives a target including target material, an interaction between the amplified optical beam and the target converting at least some of the target material from a first form to a second form to form a light-emitting plasma; first data comprising information related to the amplified optical beam is accessed; second data comprising information related to the light-emitting plasma is accessed; and an amount of the target material converted from the first form to the second form is determined. The determination is based on at least the first data and the second data, and the second form of the target material is less dense than the first form of the target material.
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公开(公告)号：US20200260564A1
公开(公告)日：2020-08-13
申请号：US16859042
申请日：2020-04-27
Applicant: ASML Netherlands B.V.
Inventor： Daniel Jason Riggs , Robert Jay Rafac
IPC: H05G2/00
Abstract: A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.
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