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公开(公告)号:US09976111B2
公开(公告)日:2018-05-22
申请号:US15138835
申请日:2016-04-26
发明人: Wen Dar Liu , Yi-Chia Lee , William Jack Casteel, Jr. , Tianniu Chen , Rajiv Krishan Agarwal , Madhukar Bhaskara Rao
IPC分类号: C11D7/26 , C11D11/00 , C11D3/39 , C11D3/43 , C11D3/30 , C11D3/20 , C11D3/33 , C11D3/28 , C11D3/00 , C11D3/37 , H01L21/311 , H01L21/033 , H01L21/768 , H01L21/02
CPC分类号: C11D11/0047 , C11D3/0073 , C11D3/2086 , C11D3/28 , C11D3/30 , C11D3/33 , C11D3/3773 , C11D3/3947 , C11D3/43 , H01L21/02068 , H01L21/0332 , H01L21/31111 , H01L21/31144 , H01L21/32134 , H01L21/76865
摘要: Composition, method and system for PVD TiN hard mask removal from 28/20 nm pattern wafers have been disclosed. The composition uses peroxide as oxidizing agent for PVD TiN hard mask removal under slightly basic conditions. The composition comprises bulky or long chain organic amines or polyalkylamine to improve removal/etching selectivity of PVD TiN vs CVD TiN. The composition further comprises long chain organic acids or amines to maintain Co compatibility.
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公开(公告)号:US09669349B1
公开(公告)日:2017-06-06
申请号:US15049634
申请日:2016-02-22
发明人: Garret Chi-Ho Lau , Qiao Zhao , Roger Dean Whitley , Erin Marie Sorensen , Charles Gardner Coe , William Jack Casteel, Jr. , Geoffrey John Ochs , Christopher Robert Bongo , Marissa Ann Bonanno
IPC分类号: B01D53/047 , B01J20/18
CPC分类号: B01D53/047 , B01D53/0473 , B01D2253/1085 , B01D2256/12 , B01D2256/18 , B01D2257/102 , B01D2257/104 , B01D2257/11 , B01J20/18
摘要: A method of separating oxygen from an oxygen-containing fluid stream is disclosed, the method including the step of contacting the oxygen-containing fluid stream with an oxygen-selective zeolite adsorbent comprising at least 90% chabazite, wherein the chabazite is a single phase chabazite having an Si/Al ratio of 1.2 to 1.8. The single phase chabazite may comprise a mixture of at least two types of cations.
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公开(公告)号:US10799849B2
公开(公告)日:2020-10-13
申请号:US16551816
申请日:2019-08-27
发明人: Garret Chi-Ho Lau , Erin Marie Sorensen , Fred William Taylor , Timothy Christopher Golden , Robert Quinn , William Jack Casteel, Jr.
摘要: An adsorbent for removing CO2 from a gas mixture, the adsorbent comprising alumina and a carbonate compound where the carbonate to alumina IR absorbance intensity ratio is reduced by washing the adsorbent with water. The disclosure also describes a method of making adsorbent particles, process for removing CO2 from a gas mixture using the adsorbent, and an adsorption unit using the adsorbent.
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公开(公告)号:US09222018B1
公开(公告)日:2015-12-29
申请号:US14642831
申请日:2015-03-10
IPC分类号: C09K13/00 , C09K13/08 , H01L21/311
CPC分类号: C09K13/08 , H01L21/02063 , H01L21/31144 , H01L21/32134
摘要: Formulations for stripping titanium nitride (TiN or TiNxOy; x=0 to 1.3 and y=0 to 2) hard mask and removing titanium nitride etch residue are low pH (
摘要翻译: 用于剥离氮化钛(TiN或TiN x O y; x = 0至1.3和y = 0至2)的硬掩模和去除氮化钛蚀刻残留物的制剂是低pH(<4)包含具有在其整个结构中高度分散的负电荷的弱配位阴离子 ,胺盐缓冲液,非氧化痕量金属离子,非环境痕量氧化剂,剩余的是选自水,环丁砜,二甲基硫醚,乳酸,乙二醇及其混合物的溶剂。 制剂不含过氧化氢,并暴露于空气中。 可将氟化物,缓蚀剂,表面活性剂加入制剂中。 系统和方法使用用于汽提氮化钛硬掩模和去除氮化钛蚀刻残留物的配方。
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