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公开(公告)号：US09976037B2
公开(公告)日：2018-05-22
申请号：US15084169
申请日：2016-03-29
发明人： Seiji Inaoka , William Jack Casteel, Jr. , Raymond Nicholas Vrtis , Kathleen Esther Theodorou , Tianniu Chen , Mark Richard Brown
IPC分类号： B05D1/18 , C09D4/00 , B08B3/10 , B81C1/00 , H01L21/02 , C11D11/00 , C11D3/16 , C11D3/36 , H01L21/3105
CPC分类号： C09D4/00 , B08B3/10 , B81C1/00849 , C11D3/162 , C11D3/36 , C11D11/0047 , H01L21/02041 , H01L21/0206 , H01L21/02068 , H01L21/02129 , H01L21/02282 , H01L21/3105
摘要： Treatment compositions and methods of treating the surface of a substrate by using the treatment composition, and a semiconductor or MEMS substrate having the treatment composition thereon.
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公开(公告)号：US09472420B2
公开(公告)日：2016-10-18
申请号：US14547864
申请日：2014-11-19
发明人： William Jack Casteel, Jr. , Seiji Inaoka , Madhukar Bhaskara Rao , Brenda Faye Ross , Yi-Chia Lee , Wen Dar Liu , Tianniu Chen
IPC分类号： H01L21/3213 , H01L21/02 , C09K13/06 , C09K13/08 , H01L21/311
CPC分类号： H01L21/32134 , C09K13/06 , C09K13/08 , H01L21/02063 , H01L21/31144
摘要： Aqueous compositions for stripping titanium nitride (TiN or TiNxOy) hard mask and removing etch residue are low pH aqueous composition comprising solvent, a weakly coordinating anion, amine, and at least two non-oxidizing trace metal ions. The aqueous compositions contain no non-ambient oxidizer, and are exposed to air. Bifluoride, or metal corrosion inhibitor may be added to the aqueous composition. Systems and processes use the aqueous compositions for stripping titanium nitride (TiN or TiNxOy) hard mask and removing titanium nitride (TiN or TiNxOy) etch residue.
摘要翻译： 用于汽提氮化钛（TiN或TiN x O y）硬掩模和去除蚀刻残余物的水性组合物是包含溶剂，弱配位阴离子，胺和至少两种非氧化痕量金属离子的低pH水性组合物。 含水组合物不含非环境氧化剂，并暴露于空气中。 可以将氟化物或金属腐蚀抑制剂加入含水组合物中。 系统和方法使用水性组合物来剥离氮化钛（TiN或TiN x O y）硬掩模并除去氮化钛（TiN或TiN x O y）蚀刻残余物。
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公开(公告)号：US10252242B2
公开(公告)日：2019-04-09
申请号：US15461625
申请日：2017-03-17
发明人： Garret Chi-Ho Lau , Erin Marie Sorensen , Fred William Taylor , Timothy Christopher Golden , Robert Quinn , William Jack Casteel, Jr.
IPC分类号： B01J20/04 , B01J20/08 , B01J20/30 , B01D53/04 , B01D53/62 , B01D53/81 , B01J20/28 , B01D53/047
摘要： An adsorbent for removing CO2 from a gas mixture, the adsorbent comprising alumina and a carbonate compound where the carbonate to alumina IR absorbance intensity ratio is reduced by washing the adsorbent with water. The disclosure also describes a method of making adsorbent particles, process for removing CO2 from a gas mixture using the adsorbent, and an adsorption unit using the adsorbent.
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公开(公告)号：US09925514B2
公开(公告)日：2018-03-27
申请号：US15049610
申请日：2016-02-22
发明人： Charles Gardner Coe , Christopher Robert Bongo , Geoffrey John Ochs , Marissa Ann Bonanno , Garret Chi-Ho Lau , William Jack Casteel, Jr. , Qiao Zhao , Roger Dean Whitley , Erin Marie Sorensen
CPC分类号： B01J20/18 , B01D53/02 , B01D53/04 , B01D2253/1085 , B01D2256/10 , B01D2256/18 , B01D2257/104 , B01J20/186 , C01B39/46
摘要： An adsorbent having a composition comprising at least 90% chabazite where the chabazite is a single phase chabazite having an Si/Al ratio of 1.2 to 1.8, the chabazite includes a mixture of at least two types of cations, and each of the at least two types of cations are in a molar ratio relative to Al of at least 0.05.
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公开(公告)号：US11173451B1
公开(公告)日：2021-11-16
申请号：US17083435
申请日：2020-10-29
发明人： Garret Chi-Ho Lau , William Jack Casteel, Jr. , Timothy Christopher Golden , Venkataramanan Ravi , Jeffrey Raymond Hufton , Guarav Kumar
IPC分类号： B01D53/86 , B01D53/96 , B01J23/889 , B01J35/10 , C01G45/12
摘要： Trace hydrogen may be removed from a dry gas by passing the dry gas at a temperature from about 0° C. to about 60° C. through at least one layer of a first hopcalite catalyst to produce product gas that is at least substantially free of hydrogen, wherein the first hopcalite catalyst has a molar ratio of copper to manganese of more than 0.55. Advantages include increase hydrogen capacity, lower feed and regeneration temperatures and lower sensitivity to carbon dioxide than equivalent processes using standard hopcalite catalyst having a Cu/Mn molar ratio from 0.45 to 0.55.
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公开(公告)号：US10654024B2
公开(公告)日：2020-05-19
申请号：US16145770
申请日：2018-09-28
摘要： Disclosed are novel, as-crystallized RHO zeolite compositions with improved uniformity in morphology. These RHO compositions are useful for preparing cation-exchanged RHO zeolites that can be used as adsorbents for oxygen and/or nitrogen with improved properties. The adsorbents can be used in pressure swing adsorption processes for selectively adsorbing oxygen and/or nitrogen from feed streams such as an air stream or crude argon stream. Also disclosed are novel methods of preparing RHO zeolites with improved morphology control.
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公开(公告)号：US10332784B2
公开(公告)日：2019-06-25
申请号：US15077374
申请日：2016-03-22
IPC分类号： C09K13/00 , H01L21/768 , C09K13/04 , C23F1/14 , C09K13/08 , C09K13/06 , C23F1/38 , H01L21/3213 , H01L21/311
摘要： Formulations for stripping titanium nitride hard mask and removing titanium nitride etch residue comprise an amine salt buffer, a non-ambient oxidizer, and the remaining being liquid carrier includes water and non-water liquid carrier selected from the group consisting of dimethyl sulfone, lactic acid, glycol, and a polar aprotic solvent including but not limited to sulfolanes, sulfoxides, nitriles, formamides and pyrrolidones. The formulations have a pH
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公开(公告)号：US09873833B2
公开(公告)日：2018-01-23
申请号：US14978383
申请日：2015-12-22
IPC分类号： B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00 , C25F3/00 , C09K13/02 , H01L21/306 , H01L21/768
CPC分类号： C09K13/02 , H01L21/30608 , H01L21/76898
摘要： Etching compositions and method of using the etching compositions comprising potassium hydroxide; one or more than one additional alkaline compounds selected from the group consisting of TEAH, TMAF and NH4OH; and water; or etching compositions comprising one or more than one inorganic alkali basic hydroxides selected from the group consisting of potassium hydroxide, cesium hydroxide, sodium hydroxide, rubidium hydroxide, or lithium hydroxide; optionally one or more than one additional alkaline compounds; water; and optionally one or more corrosion inhibitors; wherein the composition preferentially etches silicon present on a substrate as compared to silicon dioxide present on said substrate.
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公开(公告)号：US10646848B2
公开(公告)日：2020-05-12
申请号：US15718467
申请日：2017-09-28
发明人： Magdalena M. Lozinska , Paul A. Wright , Elliott L. Bruce , William Jack Casteel, Jr. , Shubhra Jyoti Bhadra , Robert Quinn , Garret Chi-Ho Lau , Erin Marie Sorensen , Roger Dean Whitley , Timothy Christopher Golden , Mohammad Ali Kalbassi
IPC分类号： B01J20/18 , B01D53/047 , C01B39/46 , B01J20/30 , B01J20/34 , C01B23/00 , B01J20/28 , B01D53/02
摘要： Disclosed herein are novel RHO zeolites useful as kinetically selective adsorbents for oxygen and/or nitrogen. The adsorbents can be used in pressure swing adsorption processes for selectively adsorbing oxygen and/or nitrogen from feed streams such as an air stream or crude argon stream. Also disclosed are novel methods of preparing RHO zeolites, including in particular mixed-cation RHO zeolites.
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公开(公告)号：US10343139B2
公开(公告)日：2019-07-09
申请号：US15718620
申请日：2017-09-28
发明人： Shubhra Jyoti Bhadra , Roger Dean Whitley , William Jack Casteel, Jr. , Timothy Christopher Golden , Garrett Chi-Ho Lau , Erin Marie Sorensen , Robert Quinn , Magdalena M. Lozinska , Paul A. Wright , Mohammad Ali Kalbassi
IPC分类号： B01J20/18 , B01D53/047 , B01D53/02 , B01D53/04 , C01B21/04 , C01B23/00 , C01B33/26 , C01B13/02 , F25J3/04
摘要： Disclosed herein are new processes for adsorbing oxygen using adsorbent compositions comprising RHO zeolites kinetically selective for oxygen. The RHO zeolites can be used in pressure swing adsorption processes for separating oxygen from oxygen containing streams, such as for, but not limited to, purifying a crude argon feed stream or separating oxygen from an air feed stream.
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