摘要:
An apparatus system for controlling liquid in a fluid channel in a micro-fluid device has an ultrasonic oscillator for conveying liquid. The ultrasonic oscillator oscillates with amplitude modulation. The apparatus system has a holding section for holding the micro-fluid device on the ultrasonic oscillator to allow a micro-fluid device to be removably fitted to it. A liquid conveying method and a liquid conveying unit showing an improved liquid conveying efficiency are provided.
摘要:
A processing apparatus for transferring a relief pattern on a mold to a resist on a substrate through a compression of the mold against the resist, includes a supplier for supplying the resist between the substrate and the mold, and a recovery unit for recovering the resist.
摘要:
Disclosed is a fine pattern forming apparatus and a fine pattern inspecting apparatus. In one preferred form, the fine pattern forming apparatus includes a surface irregularity information reading device for detecting a shape signal corresponding to a surface irregularity of a surface of an original, while scanning the surface by use of a first probe, and a surface irregularity information writing device for processing a substrate to be processed, while scanning a surface of the substrate by use of a second probe, wherein an applied electric voltage to the second probe is changed in accordance with the shape signal while a distance between the second probe and the substrate is kept substantially constant, or the distance between the second probe and the substrate is changed in accordance with the shape signal while the applied electric voltage to the second probe is kept substantially constant, such that the substrate is processed in accordance with the surface irregularity of the original.
摘要:
An exposure apparatus includes a projection optical system for projecting a multigradation pattern onto an object, a spatial modulation element that includes plural, two-dimensionally arranged pixels, and forms an optical image by binary control over each pixel, and a superposing optical system for forming the multigradation pattern by superposing the optical images for each row and/or for each column.
摘要:
An imprinting machine that brings a mold having a pattern into contact with an object and transfers the pattern onto the object includes a measurement unit that measures a position of the mold when the mold contacts the object.
摘要:
An exposure apparatus includes a projection optical system for projecting a multigradation pattern onto an object, a spatial modulation element that includes plural, two-dimensionally arranged pixels, and forms an optical image by binary control over each pixel, and a superposing optical system for forming the multigradation pattern by superposing the optical images for each row and/or for each column.
摘要:
A processing apparatus for transferring a relief pattern on a mold to a resist on a substrate through a compression of the mold against the resist, includes a supplier for supplying the resist between the substrate and the mold, and an illumination optical system for illuminating ultraviolet light onto the resist via the mold so as to cure the resist.
摘要:
An exposure method includes the steps of introducing fluid between a surface of an object to be exposed, and a final surface of a projection optical system, displacing an interface of the fluid arranged between the surface of the object and the final surface of the projection optical system, and projecting a pattern on a mask onto the object via the projection optical system and the fluid.
摘要:
A light irradiating apparatus is used, which is characterized by having: a probe including an irradiating unit which guides light to an object, a housing containing the irradiating unit, and a touch sensor acquiring a contact condition amount between the object and the housing; and a controller controlling irradiation with light from the irradiating unit based on a level of the contact condition amount and a change in the contact condition amount, wherein in a case where the contact condition amount is equal to or more than a first reference value while the change in the contact condition amount which occurs when the housing is pressed against the object is a positive value, the controller performs a control which enables irradiation with light from the irradiating unit when the change in the contact condition amount is equal to or more than a second reference value.
摘要:
The present invention employs an object information acquiring apparatus having: a photoacoustic probe unit including a light irradiating unit which irradiates light, and a probe which receives a photoacoustic wave generated from an object irradiated with light while transmitting an ultrasound wave to the object and receiving a reflected wave thereof; a processor configured to create image information of the object based on the photoacoustic wave; and a controller configured to control irradiation with light, wherein when a first contact condition is defined as a condition in which the object is irradiated with light while the probe is acoustically matched with the object, the controller determines whether or not the photoacoustic probe unit is in the first contact condition by using the reflected wave and enables irradiation with light when the photoacoustic probe unit is in the first contact condition.