公开(公告)号：US20070139633A1

公开(公告)日：2007-06-21

申请号：US11311640

申请日：2005-12-20

申请人： Arno Bleeker ,  Kars Troost

发明人： Arno Bleeker ,  Kars Troost

IPC分类号： G03B27/54

CPC分类号： G03F7/7045 ,  G03F7/70291 ,  G03F7/70341 ,  G03F7/70408 ,  G03F7/70466

摘要： A lithographic system combining an interference exposure unit and a lithography unit. The lithography unit can comprise an array of individually controllable elements. The lithography system can be arranged such that a pitch of the lines exposed by the interference exposure unit is an integer multiple of a size of an exposure area of the lithography unit corresponding to a single individually controllable element.

摘要翻译： 组合干涉曝光单元和光刻单元的光刻系统。 光刻单元可以包括单独可控元件的阵列。 光刻系统可以布置成使得由干涉曝光单元曝光的线的间距是与单个可单独控制的元件对应的光刻单元的曝光区域的尺寸的整数倍。

公开(公告)号：US20070030471A1

公开(公告)日：2007-02-08

申请号：US11580134

申请日：2006-10-13

申请人： Kars Troost ,  Arno Bleeker

发明人： Kars Troost ,  Arno Bleeker

IPC分类号： G03B27/54

CPC分类号： G03F7/70058 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70383 ,  G03F7/70425

摘要： A system and method are used to manufacture a device using at least one exposure step. Each exposure step projects a patterned beam of radiation onto a substrate. The patterned beam includes a plurality of pixels. Each pixel delivers a radiation dose no greater than a predetermined normal maximum dose to the target portion in the exposure step and/or at least one selected pixel delivers an increased radiation dose, greater than the normal maximum dose. The increased dose may be delivered to compensate for the effect of a defective element at a known position in the array on a pixel adjacent a selected pixel or compensate for underexposure of the target portion at the location of a selected pixel resulting from exposure of that location to a pixel affected by a known defective element in another exposure step.

摘要翻译： 使用系统和方法来制造使用至少一个曝光步骤的装置。 每个曝光步骤将图案化的辐射束投射到衬底上。 图案化的波束包括多个像素。 每个像素在曝光步骤中向目标部分提供不大于预定正常最大剂量的辐射剂量，和/或至少一个所选择的像素传递大于正常最大剂量的增加的辐射剂量。 可以递送增加的剂量以补偿阵列中与已选择像素相邻的像素处的已知位置处的有缺陷元件的影响，或者补偿由于该位置的曝光导致的所选像素的位置处的目标部分的曝光不足 涉及在另一曝光步骤中受已知缺陷元件影响的像素。

公开(公告)号：US20060203220A1

公开(公告)日：2006-09-14

申请号：US11252877

申请日：2005-10-19

申请人： Kars Troost ,  Johannes Baselmans ,  Arno Bleeker ,  Louis Markoya ,  Neal Callan ,  Nicholas Eib

发明人： Kars Troost ,  Johannes Baselmans ,  Arno Bleeker ,  Louis Markoya ,  Neal Callan ,  Nicholas Eib

IPC分类号： G03B27/54

CPC分类号： G03F7/70291 ,  G03F7/70275 ,  G03F7/70358

摘要： The tilt and position of individually controllable element are simultaneously adjusted to allow a greater range of contrasts to be achieved. This can also be used to compensate for cupping of individually controllable elements. Simultaneous adjustment of both the position and tilt of the individually controllable elements can be achieved by two electrodes operable over a range of values.

公开(公告)号：US20060138349A1

公开(公告)日：2006-06-29

申请号：US11020567

申请日：2004-12-27

申请人： Arno Bleeker ,  Johannes Jacobus Baselmans ,  Marce Mathijs Dierichs ,  Stanislav Smirnov ,  Christian Wagner ,  Lev Ryzhikov ,  Kars Troost

发明人： Arno Bleeker ,  Johannes Jacobus Baselmans ,  Marce Mathijs Dierichs ,  Stanislav Smirnov ,  Christian Wagner ,  Lev Ryzhikov ,  Kars Troost

IPC分类号： G03F7/20

CPC分类号： G03F7/702 ,  G03F7/70291

摘要： A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.

摘要翻译： 系统和方法用于引导辐射束非垂直地照射用于图案化辐射束的单独可控元件的构图阵列。 可单独控制的元件可以改变辐射束的远心性。 将辐射束投射到可独立控制的元件上可以通过凹面镜或使用放置在单独可控元件的物场中的折叠镜。 或者，独立可控元件可以改变辐射束的光轴。

公开(公告)号：US20060038969A1

公开(公告)日：2006-02-23

申请号：US10919530

申请日：2004-08-17

申请人： Johannes Baselmans ,  Arno Bleeker ,  Pieter De Jager ,  Kars Troost

发明人： Johannes Baselmans ,  Arno Bleeker ,  Pieter De Jager ,  Kars Troost

IPC分类号： G03B27/42

CPC分类号： G03F7/70383 ,  G03F7/70291

摘要： An array of individually controllable elements, comprising a plurality of control areas consisting of a plurality of rows of reflectors. Alternate rows of reflectors are actuated in a common manner such that the control areas function as a grating to provide a control element that can be used as a diffractive optical element.

摘要翻译： 一组可独立控制的元件，包括由多排反射器组成的多个控制区域。 交替的反射体行以常见的方式启动，使得控制区域用作光栅，以提供可用作衍射光学元件的控制元件。

公开(公告)号：US20070258078A1

公开(公告)日：2007-11-08

申请号：US11417210

申请日：2006-05-04

申请人： Kars Troost ,  Johannes Baselmans ,  James Greeneich

发明人： Kars Troost ,  Johannes Baselmans ,  James Greeneich

IPC分类号： G03B27/58

CPC分类号： G03F7/70408

摘要： A lithographic apparatus including an exposure unit that exposes parallel lines on a target area of a substrate by projecting two beams of radiation onto the substrate. The two beams of radiation are projected such that they interfere with each other to form the parallel lines. An actuator continuously moves the substrate relative to the exposure unit, while the exposure unit exposes the parallel lines on the target areas on the substrate.

摘要翻译： 一种光刻设备，包括曝光单元，该曝光单元通过将两束辐射投射到基板上而使基板的目标区域上的平行线曝光。 两束辐射被投影使得它们彼此干涉以形成平行线。 执行器相对于曝光单元连续移动基板，同时曝光单元将平行线暴露在基板上的目标区域上。

公开(公告)号：US20070139637A1

公开(公告)日：2007-06-21

申请号：US11312638

申请日：2005-12-21

申请人： Kars Troost ,  Johannes Baselmans

发明人： Kars Troost ,  Johannes Baselmans

IPC分类号： G03B27/58

CPC分类号： G03F7/70291 ,  G02B26/0833

摘要： A lithographic apparatus comprising an array of individually controllable elements that modulates a beams of radiation and a projection system that projects the modulated beam onto the substrate. The individually controllable elements are provided with a compensation feature that is arranged to provide compensation radiation that substantially or at least partially cancels out unwanted radiation, such that the unwanted radiation is not projected by the projection system onto the substrate.

摘要翻译： 一种光刻设备，其包括调制辐射束的独立可控元件阵列和将调制束投影到基底上的投影系统。 独立可控元件设置有补偿特征，该补偿特征被布置成提供基本上或至少部分地抵消不想要的辐射的补偿辐射，使得不需要的辐射不被投影系统投影到衬底上。

公开(公告)号：US20070268547A1

公开(公告)日：2007-11-22

申请号：US11790222

申请日：2007-04-24

申请人： Azat Latypov ,  Kars Troost ,  Johannes Baselmans

发明人： Azat Latypov ,  Kars Troost ,  Johannes Baselmans

IPC分类号： G02B26/00 ,  G02F1/00

CPC分类号： G03F7/70291

摘要： A method and system for determining specific pixel modulation states of a spatial light modulator (SLM) to print a desired pattern on a substrate are disclosed. The method includes selecting at least one super-pixel in an object plane of the desired pattern, the super-pixel being formed of at least two pixels. At least one edge of the desired pattern crosses a boundary within the super-pixel, the at least one edge being defined by specific slope and position parameters relative to the super-pixel. The method also includes (i) forming an interpolation table to tabulate pre-calculated pixel modulation states and (ii) determining the specific pixel modulation states for each of the pixels in accordance with the interpolation table. Disclosed also are a method and system for providing a spatial light modulator (SLM). The SLM includes a plurality of mirrors structured to form groups of super-pixels. Each super-pixel (i) includes two or more mirrors from the plurality of mirrors and (ii) is configured to switch only one pixel of light. Each of the two or more mirrors can be separately actuated.

摘要翻译： 公开了一种用于确定空间光调制器（SLM）的特定像素调制状态以在衬底上打印所需图案的方法和系统。 所述方法包括：在所述期望图案的物平面中选择至少一个超像素，所述超像素由至少两个像素形成。 所需图案的至少一个边缘穿过超像素内的边界，所述至少一个边缘由相对于超像素的特定斜率和位置参数限定。 该方法还包括（i）形成内插表以列出预先计算的像素调制状态，以及（ii）根据内插表确定每个像素的特定像素调制状态。 还公开了一种用于提供空间光调制器（SLM）的方法和系统。 SLM包括被构造成形成超像素组的多个反射镜。 每个超像素（i）包括来自多个反射镜的两个或更多个反射镜，并且（ii）被配置为仅切换一个像素的光。 两个或更多个反射镜中的每一个可以被单独地致动。

公开(公告)号：US20060132742A1

公开(公告)日：2006-06-22

申请号：US11013939

申请日：2004-12-17

申请人： Karel Van Der Mast ,  Kars Troost

发明人： Karel Van Der Mast ,  Kars Troost

IPC分类号： G03B27/68

CPC分类号： G03F7/70183 ,  G03F7/70216 ,  G03F7/70258 ,  G03F7/70291 ,  G03F7/70425

摘要： A system and method are provided including different moveable lenses within a projection system that can be placed in the path of a radiation beam to change a magnification of the projection system. By changing the magnification of the projection system an area of a substrate exposed per pixel can be adjusted, and a throughput of the system optimized.

摘要翻译： 提供了一种系统和方法，其包括在投影系统内的不同的可移动透镜，其可以放置在辐射束的路径中以改变投影系统的放大率。 通过改变投影系统的放大倍数，可以调整每像素曝光的衬底的面积，并优化系统的吞吐量。

公开(公告)号：US20070002419A1

公开(公告)日：2007-01-04

申请号：US11170065

申请日：2005-06-30

申请人： Azat Latypov ,  Kars Troost ,  Johannes Matheus Baselmans

发明人： Azat Latypov ,  Kars Troost ,  Johannes Matheus Baselmans

IPC分类号： G02B26/00

CPC分类号： G03F7/70291

摘要： A method and system for determining specific pixel modulation states of a spatial light modulator (SLM) to print a desired pattern on a substrate are disclosed. The method includes selecting at least one super-pixel in an object plane of the desired pattern, the super-pixel being formed of at least two pixels. At least one edge of the desired pattern crosses a boundary within the super-pixel, the at least one edge being defined by specific slope and position parameters relative to the super-pixel. The method also includes (i) forming an interpolation table to tabulate pre-calculated pixel modulation states and (ii) determining the specific pixel modulation states for each of the pixels in accordance with the interpolation table. Disclosed also are a method and system for providing a spatial light modulator (SLM). The SLM includes a plurality of mirrors structured to form groups of super-pixels. Each super-pixel (i) includes two or more mirrors from the plurality of mirrors and (ii) is configured to switch only one pixel of light. Each of the two or more mirrors can be separately actuated.