Manufacturing method of thin film transistor and thin film transistor
    13.
    发明授权
    Manufacturing method of thin film transistor and thin film transistor 有权
    薄膜晶体管和薄膜晶体管的制造方法

    公开(公告)号:US09553170B2

    公开(公告)日:2017-01-24

    申请号:US14425994

    申请日:2014-06-26

    Abstract: A manufacturing method of a thin film transistor and a thin film transistor are provided. In the manufacturing method, formation of pattern of a source electrode (7), a drain electrode (8) and an active layer (6) comprises: forming a semiconductor layer (10) and a conductive layer (11) that cover the whole substrate on the substrate in sequence; forming a first photoresist layer (4) at a region where the source electrode is to be formed and at a region where the drain electrode is to be formed on the conductive layer (11), respectively; forming a second photoresist layer (5) at least at a gap between the source electrode and the drain electrode that are to be formed on the conductive layer (11); conducting an etching process on the substrate with the first photoresist layer (4), the second photoresist layer (5), the semiconductor layer (10) and the conductive layer (11) formed thereon, so as to form pattern of the active layer (6), the source electrode (7) and the drain electrode (8).

    Abstract translation: 提供薄膜晶体管和薄膜晶体管的制造方法。 在制造方法中,源电极(7),漏电极(8)和有源层(6)的图案的形成包括:形成覆盖整个基板的半导体层(10)和导电层(11) 在底物上; 在要形成源电极的区域和在导电层(11)上分别形成漏电极的区域上形成第一光致抗蚀剂层(4); 在所述导电层(11)上形成至少在所述源电极和所述漏电极之间的间隙处形成第二光致抗蚀剂层(5); 在所述基板上对所述第一光致抗蚀剂层(4),所述第二光致抗蚀剂层(5),所述半导体层(10)和所述导电层(11)进行蚀刻处理,以形成所述有源层的图案( 6),源电极(7)和漏电极(8)。

    Touch screen and display device
    14.
    发明授权
    Touch screen and display device 有权
    触摸屏和显示设备

    公开(公告)号:US09448654B2

    公开(公告)日:2016-09-20

    申请号:US14235922

    申请日:2013-10-11

    CPC classification number: G06F3/0412 G06F1/16 G06F3/044 G06F2203/04111

    Abstract: The embodiment provides a touch screen and a display device. The touch screen has: a first substrate and a second substrate arranged in opposite to each other, and a touch-driving electrode and a touch-sensing electrode arranged in a crossing manner on the first substrate and the second substrate, a non-flat region is provided at a region of the first substrate on which the touch-sensing electrode is to be formed, and the touch-sensing electrode is arranged on the first substrate in accordance with a shape of the first substrate so as to be formed with a non-flat region; and/or a non-flat region is provided at a region of the second substrate on which the touch-driving electrode is to be formed, and the touch-driving electrode is arranged on the second substrate in accordance with a shape of the second substrate so as to be formed with a non-flat region.

    Abstract translation: 该实施例提供了触摸屏和显示装置。 触摸屏具有:彼此相对布置的第一基板和第二基板,以及在第一基板和第二基板上以交叉方式布置的触摸驱动电极和触摸感测电极,非平坦区域 设置在要在其上形成触摸感测电极的第一基板的区域处,并且触摸感测电极根据第一基板的形状布置在第一基板上,以形成非 - 平坦区域 和/或非平坦区域设置在要在其上形成触摸驱动电极的第二基板的区域处,并且触摸驱动电极根据第二基板的形状布置在第二基板上 以形成非平坦区域。

    Array substrate and display device
    18.
    发明授权

    公开(公告)号:US10133136B2

    公开(公告)日:2018-11-20

    申请号:US14770561

    申请日:2014-10-21

    Inventor: Jian Guo

    Abstract: An array substrate includes a thin film transistor (1) and a pixel electrode (2) disposed on the thin film transistor; an insulation layer is disposed between the pixel electrode and the thin film transistor, the pixel electrode (2) is connected to a drain electrode (11) of the thin film transistor via a through hole (3) disposed in the insulation layer, the pixel electrode (2) partially covers an edge of the through hole (3) in an orthographic projection direction. The array substrate not only avoids a short circuit between the pixel electrodes, but also properly increases an area of a pixel electrode and the number of and numbers, so that an aperture ratio and a resolution of a display product can be enhanced.

    Multi-layer substrate, preparation method thereof and display device

    公开(公告)号:US10101661B2

    公开(公告)日:2018-10-16

    申请号:US14347791

    申请日:2013-04-12

    Inventor: Jian Guo

    Abstract: A method for preparing a multi-layer substrate, which includes: forming a first film layer on a substrate, and forming a group of alignment marks in alignment areas of the first film layer; and forming a plurality of subsequent film layers and a top film layer on the first film layer in sequence; in the patterning process for each subsequent film layer, alignment marks in a mask plate for the subsequent film layer are aligned with the alignment marks in the first film layer, and photoresist coated on the subsequent film layer is subjected to exposure; and in a patterning process of the subsequent film layer, photoresist patterns, formed by the alignment marks in the mask plate at pattern positions of the alignment marks of the first film layer when the photoresist coated on the subsequent film layer is subjected to exposure, are removed. The method improves the alignment accuracy between the patterns of the formed subsequent film layer.

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