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公开(公告)号：US20050186718A1
公开(公告)日：2005-08-25
申请号：US11099587
申请日：2005-04-06
申请人： Soon Yoo , Youn Chang , Heung Cho , Seung Nam
发明人： Soon Yoo , Youn Chang , Heung Cho , Seung Nam
IPC分类号： G02F1/1345 , G02F1/1362 , G02F1/136 , H01L21/00 , H01L21/84
CPC分类号： G02F1/13458 , G02F1/1345
摘要： A method for fabricating a liquid crystal display panel is provided. A thin film transistor array substrate and a color filter array substrate are formed. The thin film transistor array substrate includes a screen region having gate lines, data lines, thin film transistors, and pixel electrodes; a pad region having gate pads, an overetch prevention pattern formed overlapped with a gate insulating film in an outer portion of each gate pad, and data pads; data pad protection electrodes each on a respective data pad, and a protection film on an entire surface of the screen region and the pad region. The thin film transistor array substrate and the color filter array substrate are bonded together so that the pad region remains uncovered. Also, a portion of the protection film and the overetch prevention pattern of the pad region are etched to partially expose the gate pads and the data pad protection electrodes, and to form gate holes in the gate insulating film over corresponding gate pads.
摘要翻译： 提供一种制造液晶显示面板的方法。 形成薄膜晶体管阵列基板和滤色器阵列基板。 薄膜晶体管阵列基板包括具有栅极线，数据线，薄膜晶体管和像素电极的屏幕区域; 具有栅极焊盘的焊盘区域，与每个栅极焊盘的外部部分中的栅极绝缘膜重叠的防止溢出图案以及数据焊盘; 各个数据焊盘上的数据焊盘保护电极，以及屏幕区域和焊盘区域的整个表面上的保护膜。 薄膜晶体管阵列基板和滤色器阵列基板结合在一起，使得焊盘区域保持未被覆盖。 此外，蚀刻保护膜的一部分和焊盘区域的防刮擦图案以部分地暴露栅极焊盘和数据焊盘保护电极，并且在相应的栅极焊盘上的栅极绝缘膜中形成栅极孔。
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公开(公告)号：US20070015093A1
公开(公告)日：2007-01-18
申请号：US11476660
申请日：2006-06-29
IPC分类号： G03C5/00
CPC分类号： G03F7/0035 , G02F1/1339 , G03F7/0007 , G03F7/40
摘要： A method for manufacturing a printing plate is realizes a precise and fine pattern by minimizing a variation of etching critical dimension. The method includes forming a hard mask having an opening on an insulating substrate; forming a first trench having a first depth in the insulating substrate using the hard mask; coating, patterning and developing a first photoresist over an entire surface of the insulating substrate including the hard mask; and forming at least a second trench having a second depth in the insulating substrate using the hard mask, wherein the second depth is deeper than the first depth.
摘要翻译： 制版印版的方法通过最小化蚀刻临界尺寸的变化来实现精确和精细的图案。 该方法包括在绝缘基板上形成具有开口的硬掩模; 使用所述硬掩模在所述绝缘基板中形成具有第一深度的第一沟槽; 在包括硬掩模的绝缘基板的整个表面上涂覆，图案化和显影第一光致抗蚀剂; 以及使用所述硬掩模在所述绝缘基板中形成具有第二深度的至少第二沟槽，其中所述第二深度比所述第一深度更深。
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13.发明申请公开(公告)号：US20050078264A1
公开(公告)日：2005-04-14
申请号：US10964485
申请日：2004-10-13
申请人： Soon Yoo , Youn Chang , Heung Cho , Seung Nam
发明人： Soon Yoo , Youn Chang , Heung Cho , Seung Nam
IPC分类号： G02F1/1345 , G02F1/1362
CPC分类号： G02F1/136204 , G02F1/1345 , G02F2001/136231 , H01L27/0296 , H01L27/1244 , H01L27/1288
摘要： A substrate has intersecting gate and data lines with a gate insulating film therebetween, a thin film transistor provided at an intersection of the gate and data lines, a pixel electrode connected to the transistor, a pad connected to a signal line via a contact hole and containing a transparent conductive film, and a protective film overlapping a color filter array substrate to expose the film. The contact hole exposes the end of the pad and/or signal line and an adjacent area. A gate electrode, source and drain electrodes, and a contact electrode are formed from first, second, and third conductive layers, respectively. A contact hole exposes the first conductive layer of one transistor and an adjacent portion of the second conductive layer of another transistor. The contact electrode connects the exposed first and second conductive layers. Only three mask processes are used in fabricating the substrate.
摘要翻译： 基板具有与栅极绝缘膜相交的栅极和数据线，设置在栅极和数据线的交叉点处的薄膜晶体管，连接到晶体管的像素电极，经由接触孔连接到信号线的焊盘，以及 含有透明导电膜和与滤色器阵列基板重叠以使膜曝光的保护膜。 接触孔暴露焊盘和/或信号线的末端和相邻区域。 栅电极，源电极和漏电极以及接触电极分别由第一，第二和第三导电层形成。 接触孔暴露一个晶体管的第一导电层和另一个晶体管的第二导电层的相邻部分。 接触电极连接暴露的第一和第二导电层。 在制造基板中仅使用三个掩模工艺。
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14.发明申请Thin film transistor substrate for display device and fabricating method thereof 有权用于显示装置的薄膜晶体管基板及其制造方法公开(公告)号：US20050077523A1
公开(公告)日：2005-04-14
申请号：US10963599
申请日：2004-10-14
IPC分类号： G02F1/1368 , G02F1/1345 , G02F1/136 , G02F1/1362 , G09F9/30 , H01L21/336 , H01L21/77 , H01L21/84 , H01L27/12 , H01L27/13 , H01L29/786
CPC分类号： G02F1/136227 , G02F1/136213 , H01L27/124 , H01L27/1255 , H01L27/1288
摘要： A thin film transistor (TFT) substrate is fabricated in three mask processes. In a first mask process, a gate line and a gate electrode are formed. In a second mask process, a data line, a source electrode, a drain electrode, a semiconductor layer, and a first upper storage electrode overlapping the gate line are formed from a gate insulating film, undoped and doped amorphous silicon layers, and a data metal layer. In a third mask process, a pixel hole is formed through protective and gate insulating films within and outside a pixel area, the first upper storage electrode is partially removed, a pixel electrode contacts a side of the drain electrode within the pixel hole at the pixel area, and a second upper storage electrode contacts a side of the first upper storage electrode in the pixel hole outside the pixel area.
摘要翻译： 在三个掩模工艺中制造薄膜晶体管（TFT）衬底。 在第一掩模工艺中，形成栅极线和栅电极。 在第二掩模处理中，从栅极绝缘膜，未掺杂和掺杂的非晶硅层形成数据线，源电极，漏极，半导体层和与栅极线重叠的第一上部存储电极，以及数据 金属层。 在第三掩模处理中，通过像素区域内和外部的保护栅极绝缘膜形成像素孔，部分地去除第一上部存储电极，像素电极在像素的像素孔内接触漏电极的一侧 并且第二上部存储电极接触像素区域外的像素孔中的第一上部存储电极的一侧。
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15.发明申请Thin film transistor substrate using a horizontal electric field and fabricating method thereof 有权使用水平电场的薄膜晶体管基板及其制造方法公开(公告)号：US20050092990A1
公开(公告)日：2005-05-05
申请号：US10978522
申请日：2004-11-02
IPC分类号： H01L29/786 , H01L21/336 , H01L21/77 , H01L21/84 , H01L27/12 , H01L29/04
CPC分类号： G02F1/13458 , G02F1/134363 , H01L27/124 , H01L27/1288 , H01L29/66765
摘要： A thin film transistor substrate structure for using a horizontal electric field includes a substrate; a gate line and a first common line formed on the substrate parallel to each other from a first conductive layer; a gate insulating film formed on the substrate, the gate line, and the first common line; a data line formed from a second conductive layer on the gate insulating film crossing the gate line and the common line with the gate insulating film therebetween to define a pixel area; a thin film transistor connected to the gate line and the data line; a protective film covering the data line and the thin film transistor; a common electrode formed from a third conductive layer connected to the common line through a hole passing through the protective film and the gate insulating film; and a pixel electrode formed from the second conductive layer connected to the thin film transistor to define a horizontal electric field between the pixel electrode and the common electrode.
摘要翻译： 用于使用水平电场的薄膜晶体管衬底结构包括：衬底; 形成在所述基板上的栅极线和第一公共线从第一导电层彼此平行; 形成在基板上的栅极绝缘膜，栅极线和第一公共线; 由栅极绝缘膜上的与栅极线交叉的第二导电层和与其间的栅极绝缘膜的公共线形成的数据线，以限定像素区域; 连接到栅极线和数据线的薄膜晶体管; 覆盖数据线和薄膜晶体管的保护膜; 由通过穿过保护膜的孔和栅极绝缘膜连接到公共线的第三导电层形成的公共电极; 以及由连接到薄膜晶体管的第二导电层形成的像素电极，以在像素电极和公共电极之间限定水平电场。
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16.发明申请Stripper solution and method for manufacturing liquid crystal display using the same 有权剥离剂溶液及使用其制造液晶显示器的方法公开(公告)号：US20050245010A1
公开(公告)日：2005-11-03
申请号：US11117306
申请日：2005-04-29
CPC分类号： H01L27/1288 , H01L27/1214 , Y10S438/951
摘要： A method for manufacturing a liquid crystal display includes simultaneously forming a gate electrode and a gate bus line on a transparent dielectric substrate, simultaneously forming a channel layer, an ohmic contact layer, and source/drain electrodes by forming a gate insulation film, an amorphous silicon film, a doped amorphous silicon film, and a metal film on the transparent dielectric substrate on which the gate electrode and the gate bus line are formed and etching the metal film, the amorphous silicon film, and the doped amorphous silicon film, and forming a pixel electrode by forming a protective film and a transparent metal film on the transparent dielectric substrate upon which the source/drain electrodes are formed and finely etching the transparent metal film through a lift-off process using a stripper solution.
摘要翻译： 液晶显示器的制造方法包括：在透明电介质基板上同时形成栅极电极和栅极总线，同时形成沟道层，欧姆接触层，源极/漏极，形成栅极绝缘膜， 硅膜，掺杂非晶硅膜和金属膜，在其上形成栅极电极和栅极总线的透明介质基板上蚀刻金属膜，非晶硅膜和掺杂非晶硅膜，并形成 通过在形成源/漏电极的透明电介质基板上形成保护膜和透明金属膜，并通过使用剥离剂溶液的剥离工艺对透明金属膜进行微细蚀刻来形成像素电极。
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公开(公告)号：US20070035678A1
公开(公告)日：2007-02-15
申请号：US11502470
申请日：2006-08-11
IPC分类号： G02F1/1333
CPC分类号： G02F1/1309 , G02F2201/508
摘要： An LCD device and a method for manufacturing the same are disclosed. The LCD device comprises first and second substrates facing each other, a liquid crystal layer formed between the first and second substrates, a pixel region defined on the first and the second substrates, at least one micro hole formed from a rear surface of any one of the first and second substrates in the pixel region, the rear surface being an opposite surface of the substrate with respect to the liquid crystal layer, and a non-transparent material at least partially filled in the micro hole.
摘要翻译： 公开了一种LCD装置及其制造方法。 LCD装置包括彼此面对的第一和第二基板，形成在第一和第二基板之间的液晶层，限定在第一和第二基板上的像素区域，由从第一和第二基板的背面形成的至少一个微孔 像素区域中的第一和第二基板，背面相对于液晶层是基板的相对表面，以及至少部分地填充在微孔中的不透明材料。
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公开(公告)号：US20070170435A1
公开(公告)日：2007-07-26
申请号：US11715889
申请日：2007-03-09
申请人： Soon Yoo , Youn Chang , Heung Cho
发明人： Soon Yoo , Youn Chang , Heung Cho
IPC分类号： H01L29/04
CPC分类号： H01L27/1288 , G02F1/133707 , G02F1/13394 , G02F1/13458 , G02F2001/136231 , H01L27/1214
摘要： A liquid crystal display (LCD) panel is fabricated in a simplified process. The LCD panel includes a thin film transistor (TFT) array substrate with a gate and data lines crossing each other to define a pixel area, a TFT at the crossings of the gate and data lines, a protective film, and a pixel electrode connected to the TFT and formed within a pixel opening that is arranged at the pixel area and formed through the protective film and a gate insulating film. A color filter array substrate is joined to the TFT array substrate. A pattern spacer is between the TFT and color filter array substrate and overlaps at least one of the gate line, the data line, and the thin film transistor. A rib is formed from the same layer as the pattern spacer and overlaps the pixel electrode. Liquid crystal material is provided within the LCD panel.
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19.发明申请Printing plate, method of fabricating the same, and method of fabricating flat panel display using the same 有权印版，其制造方法以及使用其制造平板显示器的方法公开(公告)号：US20070048667A1
公开(公告)日：2007-03-01
申请号：US11413571
申请日：2006-04-28
申请人： Soon Yoo , Youn Chang , Heung Cho
发明人： Soon Yoo , Youn Chang , Heung Cho
IPC分类号： G03F7/00
CPC分类号： B41N1/006 , B41C1/00 , B41M3/003 , B41N1/04 , B41N1/06 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L27/1214 , H01L27/1288 , H01L27/3244 , H01L51/0004 , H01L51/56 , H05K3/0079 , H05K3/1275 , H05K2203/0143 , H05K2203/0534 , H05K2203/0537
摘要： A method of fabricating a printing plate includes: preparing a substrate; forming a metal layer on an entire surface of the substrate; forming a resist pattern on the metal layer, the resist pattern having a fine pattern exposing a portion of the metal layer; wet etching the exposed metal layer, and removing the resist pattern to form a metal layer pattern exposing a portion of the substrate; wet etching the exposed substrate, and removing the metal layer pattern to form a recessed pattern; and forming a compensation layer on an entire surface of the substrate where the recessed pattern is formed.
摘要翻译： 印版的制造方法包括：准备基板; 在所述基板的整个表面上形成金属层; 在所述金属层上形成抗蚀剂图案，所述抗蚀剂图案具有暴露所述金属层的一部分的微细图案; 湿蚀刻暴露的金属层，以及去除抗蚀剂图案以形成暴露基板的一部分的金属层图案; 湿式蚀刻曝光的基板，并且去除金属层图案以形成凹陷的形状“img id =”custom-character-00001“he =”3.56mm“wi =”6.01mm“file =”US20070048667A1-20070301-P00001.TIF“ alt =“custom character”img-content =“character”img-format =“tif”/> pattern; 并且在衬底的整个表面上形成补偿层，其中凹进的
pattern。
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20.发明申请公开(公告)号：US20070000865A1
公开(公告)日：2007-01-04
申请号：US11476806
申请日：2006-06-29
IPC分类号： C23F1/00
CPC分类号： G02F1/1362
摘要： The present invention relates to the implementation of minute patterns and thus improving pattern resolution and transcription property. Provided is a printing substrate for a liquid crystal display comprising a transparent insulating substrate, and a material layer for dry etching formed on an upper surface of the transparent insulating substrate, the material layer for dry etching constituting a printing pattern, and a manufacturing method of a printing substrate for a liquid crystal display comprising forming a material layer on a transparent insulating substrate, applying a photo resist along a printing pattern on the upper side of the material layer, dry-etching the material layer along the printing pattern using the photo resist as an etching mask, and striping the photo resist.
摘要翻译： 本发明涉及微小图案的实现，从而提高图案分辨率和转录特性。 提供一种用于液晶显示器的印刷基板，其包括透明绝缘基板和形成在透明绝缘基板的上表面上的干蚀刻用材料层，构成印刷图案的干蚀刻用材料层及其制造方法 一种用于液晶显示器的印刷基板，包括在透明绝缘基板上形成材料层，沿着材料层上侧的印刷图案施加光致抗蚀剂，使用光致抗蚀剂沿印刷图案对材料层进行干蚀刻 作为蚀刻掩模，并且剥离光刻胶。
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