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77 条记录 (耗时 0.03 秒)

    POLISHING PAD HAVING GROOVE STRUCTURE FOR AVOIDING THE POLISHING SURFACE STRIPPING
    11.
    发明申请
    POLISHING PAD HAVING GROOVE STRUCTURE FOR AVOIDING THE POLISHING SURFACE STRIPPING 有权
    用于避免抛光表面剥落的抛光结构的抛光垫

    公开(公告)号：US20090258587A1

    公开(公告)日：2009-10-15

    申请号：US12139525

    申请日：2008-06-16

    申请人： Chung-Chih Feng ,  Wei-Te Liu ,  Yung-Chang Hung ,  Chun-Ta Wang ,  I-Peng Yao

    发明人： Chung-Chih Feng ,  Wei-Te Liu ,  Yung-Chang Hung ,  Chun-Ta Wang ,  I-Peng Yao

    IPC分类号： B24D11/00

    CPC分类号： B24B37/26

    摘要： The present invention relates to a polishing pad having a groove structure for avoiding the polishing surface stripping. The polishing pad of present invention includes a base material and a grinding layer. The base material has a surface. The grinding layer is disposed on the surface, and part of the surface around the edge of the base material is exposed. The grinding layer has a plurality of first grooves and second grooves, and the first grooves cross the second grooves to define a plurality of grinding areas. The exposed part of the surface around the edge of the base material is located between the first grooves, the second grooves and the edge of the polishing pad. Whereby, the polishing pad of present invention is capable to contain more grinding liquid, and is contributive to clean the small grinded pieces. Furthermore, the grinding layer does not have acute structure and is not easy to peel to form the small grinded pieces. Therefore, the grinding quality and grinding effect can be improved.

    摘要翻译： 本发明涉及一种具有用于避免抛光表面剥离的凹槽结构的抛光垫。 本发明的抛光垫包括基材和研磨层。 基材具有表面。 磨削层设置在表面上，并且暴露基体材料边缘周围的一部分表面。 研磨层具有多个第一凹槽和第二凹槽，并且第一凹槽与第二凹槽交叉以限定多个研磨区域。 围绕基材边缘的表面的暴露部分位于第一凹槽，第二凹槽和抛光垫的边缘之间。 因此，本发明的抛光垫能够容纳更多的研磨液，并且有助于清洁小的研磨件。 此外，研磨层不具有尖锐的结构，并且不容易剥离以形成小的研磨件。 因此，可以提高研磨质量和研磨效果。

    SHEET FOR MOUNTING POLISHING WORKPIECE AND METHOD FOR MAKING THE SAME
    13.
    发明申请
    SHEET FOR MOUNTING POLISHING WORKPIECE AND METHOD FOR MAKING THE SAME 审中-公开
    安装抛光工具的表格及其制作方法

    公开(公告)号：US20090252876A1

    公开(公告)日：2009-10-08

    申请号：US12482330

    申请日：2009-06-10

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Chen-Hsiang Chao

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Chen-Hsiang Chao

    IPC分类号： B05D5/02

    CPC分类号： B24B37/30 ,  B24B41/068

    摘要： The present invention relates to a sheet for mounting a polishing workpiece. The sheet comprises a substrate and a surface layer. The substrate has a surface. The surface layer is located on the surface of the substrate, with no hole structure existing in the interior thereof, and has a surface and a slightly rough layer. The slightly rough layer is located on the surface of the surface layer to carry and mount the polishing workpiece, with no hole structure existing in the interior thereof. Accordingly, when the polishing workpiece contacts the slightly rough layer, the air therebetween is easily vented out via the slightly rough layer, without the phenomenon of air wrapping, which increases the adsorption force between the polishing workpiece and the sheet.

    摘要翻译： 本发明涉及一种用于安装抛光工件的片材。 片材包括基底和表面层。 基板具有表面。 表面层位于基板的表面上，其内部没有孔结构，并且具有表面和稍微粗糙的层。 稍微粗糙的层位于表层的表面上，以承载和安装抛光工件，其内部没有孔结构。 因此，当研磨工件接触稍微粗糙的层时，它们之间的空气容易通过稍微粗糙的层排出，而没有空气缠绕现象，这增加了研磨工件和片材之间的吸附力。

    Carrier film for mounting polishing workpiece and method for making the same
    14.
    发明申请
    Carrier film for mounting polishing workpiece and method for making the same 审中-公开
    用于安装抛光工件的载体膜及其制造方法

    公开(公告)号：US20080200105A1

    公开(公告)日：2008-08-21

    申请号：US11706226

    申请日：2007-02-15

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Lyang-Gung Wang ,  Yung-Chang Hung

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Lyang-Gung Wang ,  Yung-Chang Hung

    IPC分类号： B24B19/00 ,  C09J5/06

    CPC分类号： C09J5/06 ,  B24B9/146 ,  B24B37/30 ,  B24B41/068 ,  C09J2423/006 ,  C09J2427/006 ,  C09J2475/006

    摘要： The present invention relates to a carrier film for mounting a polishing workpiece. The carrier film comprises a surface substrate and a buffer substrate. The surface substrate comprises holes, and the material of the surface substrate comprises elastomer. The buffer substrate comprises holes, and the material of the buffer substrate comprises the elastomer. The surface substrate and the buffer substrate are adhered with adhesive comprising the elastomer. A method for making the carrier film is also provided. When polishing, the carrier film provides a good buffer property to conduct and release down force applied on the polishing workpiece.

    摘要翻译： 本发明涉及一种用于安装抛光工件的载体膜。 载体膜包括表面基板和缓冲基板。 表面基材包括孔，表面基材的材料包括弹性体。 缓冲基板包括孔，缓冲基板的材料包括弹性体。 表面基板和缓冲基板用包含弹性体的粘合剂粘合。 还提供了制造载体膜的方法。 当抛光时，载体膜提供良好的缓冲性能以传导和释放施加在抛光工件上的下压力。

    Method for manufacturing polishing pad and polishing pad
    15.
    发明授权
    Method for manufacturing polishing pad and polishing pad 有权

    公开(公告)号：US09862071B2

    公开(公告)日：2018-01-09

    申请号：US12887363

    申请日：2010-09-21

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Yung-Chang Hung ,  Lyang-Gung Wang

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Yung-Chang Hung ,  Lyang-Gung Wang

    IPC分类号： C09K3/14 ,  B24B37/24

    CPC分类号： B24B37/24

    摘要： The present invention relates to a method for manufacturing a polishing pad. The method of the invention includes the steps of forming a polishing layer from a polyurethane solution has a solid content more than about 90 wt % and drying the polyurethane solution at a temperature from about 130° C. to about 170° C. The invention also provides a polishing pad manufactured by the method mentioned above. The defect of scraping the surface of the substrate to be polished due to polishing particles remaining is avoided when applying the polishing pad according to the invention, and the flatness of the substrate to be polished is raised and the defective rate is eliminated also.

    Sheet for mounting a workpiece
    16.
    发明授权
    Sheet for mounting a workpiece 有权
    用于安装工件的板

    公开(公告)号：US09193028B2

    公开(公告)日：2015-11-24

    申请号：US13287328

    申请日：2011-11-02

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Lyang-Gung Wang ,  Wen-Chieh Wu ,  Wei-Te Liu

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Lyang-Gung Wang ,  Wen-Chieh Wu ,  Wei-Te Liu

    IPC分类号： B24B37/30 ,  B24B41/06

    CPC分类号： B24B37/30 ,  B24B41/061

    摘要： The present invention relates to a sheet for mounting a workpiece, which includes a sheet body. The sheet body includes a top surface, a plurality of foamed pores, and a plurality of surface holes or at least one surface groove. The top surface is used for mounting a workpiece. The foamed pores are disposed in the interior of the sheet body. The surface holes or the surface groove have opening on the top surface but does not communicate with the foamed pores. The surface holes or the surface groove is formed by machining, and arranged in at least one pattern. Whereby, the time for taking off the workpiece from the sheet is reduced.

    摘要翻译： 本发明涉及一种用于安装工件的片材，其包括片体。 片体包括顶表面，多个发泡孔，以及多个表面孔或至少一个表面凹槽。 顶面用于安装工件。 发泡孔设置在片体的内部。 表面孔或表面凹槽在顶表面上具有开口，但不与发泡孔连通。 表面孔或表面凹槽通过机械加工形成，并以至少一种图案布置。 从而减少了从片材中取出工件的时间。

    Polishing pad, the use thereof and the method for manufacturing the same
    17.
    发明授权
    Polishing pad, the use thereof and the method for manufacturing the same 有权
    抛光垫及其制造方法

    公开(公告)号：US08414669B2

    公开(公告)日：2013-04-09

    申请号：US12883446

    申请日：2010-09-16

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Lyang-Gung Wang ,  Yung-Chang Hung

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Lyang-Gung Wang ,  Yung-Chang Hung

    IPC分类号： B24D11/00

    CPC分类号： B24D18/00 ,  B24B37/22 ,  B24B37/24 ,  B24D3/26

    摘要： The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a first membrane with low permeability; a two-component paste formed on the upper surface of the first membrane with low permeability for adhering the base material to the first membrane with low permeability; and a polyurethane paste formed on the lower surface of the first membrane with low permeability. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided. The polishing pad as mentioned above prevents the polishing pad from detaching from the polishing platen or head. The polishing pad is easy to be replaced without leaving residues on the polishing platen or head.

    摘要翻译： 本发明主要涉及一种包括由纤维构成的基材的抛光垫; 具有低渗透性的第一膜; 在所述第一膜的上表面上形成低渗透性的双组分糊料，用于将所述基材粘附到所述第一膜，所述第一膜具有低渗透性; 以及形成在第一膜的下表面上的低渗透性的聚氨酯浆料。 还提供了一种抛光包括使用抛光垫的基板的方法和如上所述的用于制造抛光垫的方法。 如上所述的抛光垫防止抛光垫从抛光台板或头部分离。 抛光垫易于更换，而不会在研磨台板或头部上留下残留物。

    Polishing pad having groove structure for avoiding stripping of a polishing surface of the polishing pad
    20.
    发明授权
    Polishing pad having groove structure for avoiding stripping of a polishing surface of the polishing pad 有权
    抛光垫具有用于避免剥离抛光垫的抛光表面的凹槽结构

    公开(公告)号：US07662028B2

    公开(公告)日：2010-02-16

    申请号：US12139525

    申请日：2008-06-16

    申请人： Chung-Chih Feng ,  Wei-Te Liu ,  Yung-Chang Hung ,  Chun-Ta Wang ,  I-Peng Yao

    发明人： Chung-Chih Feng ,  Wei-Te Liu ,  Yung-Chang Hung ,  Chun-Ta Wang ,  I-Peng Yao

    IPC分类号： B24D11/00

    CPC分类号： B24B37/26

    摘要： A groove structure for avoiding stripping of a polishing surface of a polishing pad, the polishing pad including a base material and a grinding layer. The base material has a surface. The grinding layer is disposed on the surface, and part of the surface around the edge of the base material is exposed. The grinding layer has a plurality of first grooves and second grooves, and the first grooves cross the second grooves to define a plurality of grinding areas. The exposed part of the surface around the edge of the base material is located between the first grooves, the second grooves and the edge of the polishing pad. The polishing pad contains more grinding liquid, to clean the small grinded pieces. The grinding layer does not have an acute structure and is not easily peeled to form the small grinded pieces. Therefore, grinding quality and grinding effect are improved.

    摘要翻译： 一种用于避免剥离抛光垫的抛光表面的凹槽结构，所述抛光垫包括基底材料和研磨层。 基材具有表面。 磨削层设置在表面上，并且暴露基体材料边缘周围的一部分表面。 研磨层具有多个第一凹槽和第二凹槽，并且第一凹槽与第二凹槽交叉以限定多个研磨区域。 围绕基材边缘的表面的暴露部分位于第一凹槽，第二凹槽和抛光垫的边缘之间。 抛光垫包含更多的研磨液，以清洁小磨碎的碎片。 研磨层不具有尖锐的结构，并且不容易剥离以形成小的研磨件。 因此，磨削质量和磨削效果得到提高。