公开(公告)号：US07715101B2

公开(公告)日：2010-05-11

申请号：US11860309

申请日：2007-09-24

Applicant: Hako Botma

Inventor： Hako Botma

IPC: G02B27/10 ,  G02B27/14

CPC classification number: G02B27/144 ,  G02B17/004

Abstract: Apparatus and methods are used for controlling electromagnetic radiation pulse duration in a lithographic apparatus. A dividing element is arranged to divide an electromagnetic radiation pulse into a first portion and a second portion. A prism receives, refracts, and subsequently emits the first portion of the electromagnetic radiation pulse. A directing element is arranged to direct the first and second portions of the electromagnetic radiation pulse parallel to a common optical axis. The first portion combines with the second portion to form a combined radiation beam pulse. The combined radiation beam pulse has a longer pulse duration than the divided electromagnetic pulse and experiences no corresponding loss in intensity.

Abstract translation: 设备和方法用于控制光刻设备中的电磁辐射脉冲持续时间。 分隔元件布置成将电磁辐射脉冲分成第一部分和第二部分。 棱镜接收，折射并随后发射电磁辐射脉冲的第一部分。 引导元件布置成引导电磁辐射脉冲的第一和第二部分平行于共同的光轴。 第一部分与第二部分组合以形成组合的辐射束脉冲。 组合的辐射束脉冲具有比分割的电磁脉冲更长的脉冲持续时间，并且没有经历相应的强度损失。

公开(公告)号：US20090159819A1

公开(公告)日：2009-06-25

申请号：US12324218

申请日：2008-11-26

Applicant: Hako Botma

Inventor： Hako Botma

IPC: G01R23/02

CPC classification number: G03F7/70983 ,  G03F7/7055 ,  Y10S372/70

Abstract: A pulse modifier, and associated lithographic apparatus and a method for manufacturing a device, is disclosed. The pulse modifier is configured to receive an input pulse of radiation and further configured to emit a plurality of corresponding output pulse portions of radiation, wherein the respective pulse portions are respectively mirrored about an axis transverse to the optical axis and mirrored about a point of the optical axis of the pulse portions.

Abstract translation: 公开了一种脉冲修正器及相关的光刻设备及其制造方法。 脉冲修改器被配置为接收辐射的输入脉冲，并进一步被配置为发射多个对应的辐射输出脉冲部分，其中相应的脉冲部分分别围绕横向于光轴的轴线镜像并绕着 脉冲部分的光轴。

公开(公告)号：US07400381B2

公开(公告)日：2008-07-15

申请号：US10853723

申请日：2004-05-26

Applicant: Hako Botma

Inventor： Hako Botma

IPC: G03B27/54 ,  G03B27/42 ,  G03B27/72

CPC classification number: G03F7/70158 ,  G03F7/70066

Abstract: A lithographic apparatus comprises an illumination system for providing a projection beam of radiation. A support structure is provided for supporting a patterning device, the patterning device serving to impart the projection beam with a pattern in its cross-section. A substrate table holds a substrate, while a projection system projects the patterned beam onto a target portion of the substrate. The illumination system comprises a field defining element arranged to define an illuminating field in the plane of the patterning device or in a plane conjugate thereto, the field being off-axis with respect to the optical axis of the illuminating system.

Abstract translation: 光刻设备包括用于提供投影辐射束的照明系统。 提供了用于支撑图案形成装置的支撑结构，图案形成装置用于使投影光束在其横截面上具有图案。 衬底台保持衬底，而投影系统将图案化的光束投射到衬底的目标部分上。 所述照明系统包括场限定元件，所述场限定元件布置成在所述图案形成装置的平面中或在与其共同的平面中限定照明场，所述场相对于所述照明系统的光轴偏离轴。

公开(公告)号：US07326948B2

公开(公告)日：2008-02-05

申请号：US11203413

申请日：2005-08-15

Applicant: Hako Botma

Inventor： Hako Botma

IPC: H01S3/13

CPC classification number: G03F7/7055

Abstract: A beam modifying device configured to receive an input radiation beam along a first optical axis, and configured to emit an output radiation beam along a second optical axis. The beam modifying device includes a divider disposed along the first optical axis and configured to divide the incoming radiation beam into a first part and a second part, the divider being configured to direct the first part along the second optical axis and to direct the second part via a delay path. The beam modifying device further includes optics forming the delay path, the optics being configured to receive the second part and to direct the second part via the delay path and then along the second optical axis. The optics are arranged to mirror the second part such that the second part is mirrored with respect to the first part.

Abstract translation: 光束修改装置，被配置为沿着第一光轴接收输入辐射束，并且被配置为沿着第二光轴发射输出辐射束。 光束修改装置包括沿着第一光轴设置的分配器，其被配置为将进入的辐射束分成第一部分和第二部分，分配器被配置为沿着第二光轴引导第一部分并且引导第二部分 通过延迟路径。 光束修改装置还包括形成延迟路径的光学器件，光学器件被配置为接收第二部分并且经由延迟路径然后沿着第二光轴引导第二部分。 光学器件布置成镜像第二部分，使得第二部分相对于第一部分被镜像。

公开(公告)号：US08030628B2

公开(公告)日：2011-10-04

申请号：US12324218

申请日：2008-11-26

Applicant: Hako Botma

Inventor： Hako Botma

IPC: G03R23/02 ,  H01L3/13

CPC classification number: G03F7/70983 ,  G03F7/7055 ,  Y10S372/70

Abstract: A pulse modifier, and associated lithographic apparatus and a method for manufacturing a device, is disclosed. The pulse modifier is configured to receive an input pulse of radiation and further configured to emit a plurality of corresponding output pulse portions of radiation, wherein the respective pulse portions are respectively mirrored about an axis transverse to the optical axis and mirrored about a point of the optical axis of the pulse portions.

Abstract translation: 公开了一种脉冲修正器及相关的光刻设备及其制造方法。 脉冲修改器被配置为接收辐射的输入脉冲，并进一步被配置为发射多个对应的辐射输出脉冲部分，其中相应的脉冲部分分别围绕横向于光轴的轴线镜像并绕着 脉冲部分的光轴。

公开(公告)号：US07312850B2

公开(公告)日：2007-12-25

申请号：US10816170

申请日：2004-04-02

Applicant: Heine Melle Mulder ,  Hako Botma

Inventor： Heine Melle Mulder ,  Hako Botma

IPC: G03B27/54 ,  G03B27/42 ,  G03B27/32 ,  G02B5/08

CPC classification number: G03F7/70108

Abstract: A lithographic projection apparatus includes an illumination system having a reflective integrator with a rectangular cross-section. An optical element is provided to redistribute an intensity distribution exiting the reflective integrator.

Abstract translation: 光刻投影设备包括具有矩形横截面的反射积分器的照明系统。 提供光学元件以重新分布离开反射积分器的强度分布。

公开(公告)号：US20060126681A1

公开(公告)日：2006-06-15

申请号：US11270898

申请日：2005-11-10

Applicant: Hako Botma ,  Joerg Bruebach ,  Mark Trentelman ,  Adel Joobeur

Inventor： Hako Botma ,  Joerg Bruebach ,  Mark Trentelman ,  Adel Joobeur

IPC: H01S3/13

CPC classification number: B23K26/0613 ,  B23K26/0622 ,  B23K26/066 ,  B23K26/067 ,  G03F7/7055

Abstract: A pulse modifying unit is provided in the illumination system of the lithographic apparatus to reduce the degradation of the expensive lens elements by billions of the high intensity ultraviolet pulses from the laser is configured to receive an input pulse of radiation along a first optical axis and further configured to emit one or more corresponding output pulses of radiation along a second optical axis, including a divider disposed along the first optical axis and configured to divide the incoming pulse into a first and a second pulse portion, wherein the divider is further configured to direct the first pulse portion along the second optical axis. A first and a second mirror, each with a radius of curvature, are disposed facing each other with a predetermined separation, configured to receive the second pulse portion and to redirect the second portion along the second optical axis. The optical path of the second portion through the pulse modifier is longer than that of the first portion, and the separation is less than radius of curvature.

Abstract translation: 在光刻设备的照明系统中提供脉冲修改单元以减少昂贵的透镜元件的劣化，数十亿的来自激光器的高强度紫外线脉冲被配置成沿第一光轴接收辐射的输入脉冲 被配置为沿着第二光轴发射一个或多个对应的辐射输出脉冲，包括沿着所述第一光轴设置的分配器，并且被配置为将所述输入脉冲分成第一和第二脉冲部分，其中所述除法器还被配置为引导 沿第二光轴的第一脉冲部分。 每个具有曲率半径的第一和第二反射镜以预定间隔彼此面对地布置，被配置为接收第二脉冲部分并且沿着第二光轴重定向第二部分。 通过脉冲调制器的第二部分的光路比第一部分的光路长，并且分离小于曲率半径。

公开(公告)号：US20050270513A1

公开(公告)日：2005-12-08

申请号：US11139990

申请日：2005-05-31

Applicant: Marcel Dierichs ,  Hako Botma ,  Markus Franciscus Eurlings

Inventor： Marcel Dierichs ,  Hako Botma ,  Markus Franciscus Eurlings

IPC: G03B27/54 ,  G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70075 ,  G03F7/70091 ,  G03F7/70108 ,  G03F7/702

Abstract: A lithographic apparatus includes an illumination system including a field faceted mirror including a plurality of field facets and configured to receive radiation from a radiation source and form a plurality of images of the radiation source on corresponding pupil facets of a pupil faceted mirror. Each of the field facets is configured to provide an illumination slit at a level of a patterning device. The illumination slits are summed together at the level of the patterning device to illuminate the patterning device. First blades are configured to block radiation from a radiation source and each first blade is selectively actuable to cover a portion of a selectable number of field facets. The field faceted mirror further comprises partial field facets, the partial field facets being configured to produce a partial illumination slit at the level of the patterning device, and the pupil faceted mirror further includes pupil facets corresponding to the partial field facets. The partial field facets are configured to produce an illumination slit that is summed with the summed illumination slits of the field facets and/or correct for non-uniformity in the summed illumination slits of the field facets. Second blades are selectively actuable to cover a portion of a selectable number of partial field facets.

Abstract translation: 光刻设备包括照明系统，该照明系统包括包括多个场面的场分面反射镜，并且被配置为从辐射源接收辐射并且在瞳孔面镜的相应光瞳面上形成辐射源的多个图像。 每个场面被配置为在图案形成装置的水平面上提供照明狭缝。 照明狭缝在图案形成装置的水平面相加在一起，以照亮图案形成装置。 第一刀片被配置为阻挡来自辐射源的辐射，并且每个第一刀片可选择性地致动以覆盖可选择数量的场面的一部分。 场分面镜还包括部分场面，部分场面被配置为在图案形成装置的高度处产生局部照明狭缝，并且瞳孔面镜还包括对应于部分场面的光瞳面。 部分场面被配置为产生与场面的相加的照明狭缝相加的照明狭缝和/或校正场面的相加的照明狭缝中的不均匀性。 第二刀片可选择性地致动以覆盖可选数量的部分场面的一部分。

公开(公告)号：US06924885B2

公开(公告)日：2005-08-02

申请号：US10734639

申请日：2003-12-15

Applicant: Hako Botma

Inventor： Hako Botma

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/72 ,  G03B27/32 ,  G03B27/42 ,  G03B27/54

CPC classification number: G03F7/70108 ,  G03F7/70158

Abstract: A projection beam PB is projected onto a substrate W via a mask MA. The direction dependence of the intensity of the beam at the substrate W is controlled by passing the beam through a series of optical elements 120a-b in front of a pupil plane 14. The intensity distribution as a function of position in the pupil plane 14 determines the angle dependence at the substrate W. The optical elements 120a-b, which are preferably arrays of microlenses (or more particularly DOE's: Diffractive Optical Elements) each define an angle dependence of the intensity of the beam PB. The optical elements 120a-b are each arranged to pass a major part of the beam PB substantially without deflection and a minor part with a deflection angle dependent intensity. The major part of the beam is blocked out of the beam behind the series of optical elements 120a-b. As a result an addition of the effects of upon the intensity in the pupil plane 14 is realized.

Abstract translation: 通过掩模MA将投影光束PB投影到基板W上。 通过使光束通过光瞳面14前面的一系列光学元件120a-b来控制光束在衬底W处的强度的方向依赖性。 作为光瞳平面14中的位置的函数的强度分布确定了衬底W处的角度依赖性。优选地，微透镜阵列（或更特别是DOE的衍射光学元件）的光学元件120b限定角度依赖性 光束PB的强度。 光学元件120a-b分别布置成基本上不偏转地使光束PB的主要部分和具有偏转角依赖强度的次要部分通过。 光束的主要部分被阻挡在一系列光学元件120a-b之后的光束之外。 结果，实现了对瞳孔平面14中的强度的影响。

公开(公告)号：US20050140957A1

公开(公告)日：2005-06-30

申请号：US10748849

申请日：2003-12-31

Applicant: Cornelis Petrus Luijkx ,  Vadim Banine ,  Hako Botma ,  Martinus Van Duijnhoven ,  Markus Eurlings ,  Heine Mulder ,  Johannes Hendrik Everhardus Muijderman ,  Cornelis Van Duijn ,  Jan Krikke

Inventor： Cornelis Petrus Luijkx ,  Vadim Banine ,  Hako Botma ,  Martinus Van Duijnhoven ,  Markus Eurlings ,  Heine Mulder ,  Johannes Hendrik Everhardus Muijderman ,  Cornelis Van Duijn ,  Jan Krikke

IPC: G02B26/02 ,  G03F7/20 ,  G03B27/72

CPC classification number: G03F7/70191 ,  G03F7/70066 ,  G03F7/70116 ,  G03F7/70558

Abstract: An optical attenuator device operates to remove a part of a beam of radiation having a higher than average intensity using at least one optical attenuator element. The device has application in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction.

Abstract translation: 光衰减器装置使用至少一个光衰减器元件来操作以去除具有高于平均强度的辐射束的一部分。 该装置具有应用于辐射系统和/或光刻设备，特别是扫描光刻设备中，其中光学衰减器元件设置在光束的中心部分，例如垂直于扫描方向。