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11.发明申请Metrology system and method for monitoring and correcting system generated errors 审中-公开计量系统和方法，用于监控和校正系统产生的错误公开(公告)号：US20100302555A1
公开(公告)日：2010-12-02
申请号：US12799362
申请日：2010-04-23
IPC分类号： G01B11/02
CPC分类号： G01B11/005 , G01B21/047
摘要： A metrology system (1) and a method for determining low order errors are disclosed. At least one measurement objective (9) for the determination of the position of structures (3) on a substrate (2) is provided. The substrate (2) to be measured rests in a support on three points of support (52). The support exhibits an opening (53) for measuring the substrate (2). At least two marks (54) are provided on the support for the mask (2) in such a way that the marks (54) are capturable with the measurement objective (9) by moving the measurement table (20). Furthermore the substrate (2) in the support does not screen the marks (54) on the support.
摘要翻译： 公开了一种计量系统（1）和确定低阶误差的方法。 提供了用于确定衬底（2）上的结构（3）的位置的至少一个测量目标（9）。 要测量的基板（2）支撑在三个支撑点（52）上。 支撑件具有用于测量基板（2）的开口（53）。 在用于掩模（2）的支撑件上设置至少两个标记（54），使得通过移动测量台（20）可以通过测量物镜（9）捕获标记（54）。 此外，支撑件中的基板（2）不会屏蔽支撑件上的标记（54）。
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公开(公告)号：US20060275017A1
公开(公告)日：2006-12-07
申请号：US11437953
申请日：2006-05-19
申请人： Wolfgang Sulik , Hans-Artur Boesser
发明人： Wolfgang Sulik , Hans-Artur Boesser
IPC分类号： G02B6/00
摘要： Apparatus and method for optically detecting an object. The apparatus includes a light source to illuminate an object, an illumination optical path, a detection optical path, imaging optics, a detection means, wherein the imaging optics are arranged in the detection optical path and wherein light from the object can be imaged onto the detection means with the aid of the imaging optics, an adjustment means is provided, by means of which at least one imaging optical component, arranged in the illumination optical path or in the detection optical path, is rotatable about its respective optical axes, or is pivotable with respect to the optical axis of the optical path in which the optical component is arranged, and is translatable in a direction transverse to the optical axis, to detect an object with the aid of the optical component in a rotated, pivoted or translated state.
摘要翻译： 用于光学检测物体的装置和方法。 该装置包括用于照亮物体的光源，照明光路，检测光路，成像光学器件，检测装置，其中成像光学元件布置在检测光路中，并且其中来自物体的光可以成像到 检测装置借助于成像光学元件，提供了一种调节装置，通过该调节装置，布置在照明光路或检测光路中的至少一个成像光学部件可绕其相应的光轴旋转，或者是 可相对于其中配置有光学部件的光路的光轴可枢转，并且可以在横向于光轴的方向上平移，以借助于光学部件以旋转，枢转或翻转的状态来检测物体 。
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13.发明申请APPARATUS WITH ENHANCED RESOLUTION FOR MEASURING STRUCTURES ON A SUBSTRATE FOR SEMICONDUCTOR MANUFACTURE AND USE OF APERTURES IN A MEASURING APPARATUS 有权具有增强分辨率的装置，用于测量用于半导体制造的基板上的结构和在测量装置中使用的孔公开(公告)号：US20080278790A1
公开(公告)日：2008-11-13
申请号：US12113227
申请日：2008-05-01
CPC分类号： G01B11/24 , G02B5/1857
摘要： A measuring system is disclosed with enhanced resolution for periodic structures on a substrate for semiconductor manufacture. Aperture structures of varying geometries are provided in the illumination beam path. The aperture structures differ regarding the transmission characteristics of light, and which adjust the intensity distribution of the diffraction orders in the imaging pupil of the optical system.
摘要翻译： 公开了一种测量系统，其具有用于半导体制造的衬底上的周期性结构的增强的分辨率。 在照明光束路径中提供具有不同几何形状的光圈结构。 孔结构关于光的透射特性不同，并且调节光学系统的成像光瞳中的衍射级的强度分布。
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14.发明授权Measuring device and method for determining relative positions of a positioning stage configured to be moveable in at least one direction 有权用于确定定位台的相对位置的测量装置和方法，所述定位台被配置成可在至少一个方向上移动公开(公告)号：US07450246B2
公开(公告)日：2008-11-11
申请号：US11432949
申请日：2006-05-12
IPC分类号： G01B11/02
CPC分类号： G01B9/0207 , G01B9/02002 , G01B9/02018 , G01B9/02021 , G01B2290/70
摘要： A measuring apparatus for determining relative positions of a positioning stage arranged in a moveable fashion in at least one direction by a predeterminable maximum traversing path. The measuring device comprises at least one interferometric measuring means and at least one interferometric correction means. An interferometric measuring means is operable with the laser light of a laser of at least one wavelength. Correction results can be generated with the interferometric correction means allowing conclusions to be drawn with respect to the actual wavelength of the laser light during a position determination of the positioning stage in order to take into account variations of the wavelength of the laser light, in particular due to ambient conditions, when evaluating the measuring results. The interferometric correction means is arranged proximate to the interferometric measuring means, and the proximity corresponds to a predeterminable portion of the maximum traversing path of the positioning stage.
摘要翻译： 一种测量装置，用于确定以可移动的方式在至少一个方向上布置有可预定的最大横向路径的定位台的相对位置。 测量装置包括至少一个干涉测量装置和至少一个干涉校正装置。 干涉测量装置可操作于具有至少一个波长的激光的激光。 可以用干涉校正装置产生校正结果，以便在定位台的位置确定期间相对于激光的实际波长得出结论，以便考虑到激光的波长的变化，特别是 由于环境条件，在评估测量结果时。 干涉校正装置设置在干涉测量装置附近，并且接近度对应于定位台的最大横移路径的可预定部分。
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15.发明申请公开(公告)号：US20100020332A1
公开(公告)日：2010-01-28
申请号：US12459751
申请日：2009-07-07
IPC分类号： G01B11/14
CPC分类号： G01B9/02027 , G01B9/02021 , G01B11/03 , G01B21/042 , G01B2290/25 , G01B2290/60 , G01B2290/70
摘要： An interferometric device for position measurement of an element moveable in a plane is disclosed. A laser light source measures the position of the moveable element and emits the required measuring light. A beam splitter splits the measuring light into a first partial beam path and a second partial beam path, which each impinge on a reflecting surface of the moveable element via an interferometer. Herein, at least the beam splitter, which splits the measuring light into a first partial beam path and a second partial beam path, and the beam splitter, which directs the third partial beam path onto an etalon via an interferometer, have a respective beam trap associated with them, which traps the light returning from the respective interferometers.
摘要翻译： 公开了一种用于在平面中可移动的元件的位置测量的干涉测量装置。 激光源测量可移动元件的位置并发射所需的测量光。 分束器将测量光分成第一部分光束路径和第二局部光束路径，每个光束路径经由干涉仪撞击可移动元件的反射表面。 这里，至少将测量光分成第一部分光束路径和第二部分光束路径的分束器以及将第三部分光束路径经由干涉仪引导到标准具上的分束器具有相应的光束捕获器 与它们相关联，其捕获从各个干涉仪返回的光。
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16.发明授权Method for determining the focal position of at least two edges of structures on a substrate 有权用于确定衬底上的结构的至少两个边缘的焦点位置的方法公开(公告)号：US07551296B2
公开(公告)日：2009-06-23
申请号：US12040872
申请日：2008-03-01
IPC分类号： G01B11/14
摘要： A method for determining the focal position of at least two edges of structures (31) on a substrate (30) is disclosed. During the movement of a measurement objective (21) in the Z-coordinate direction, a plurality of images of the at least one structure (31) is acquired with at least one measurement window (45) of a detector. An intensity profile of the structure (31) is determined for each image.
摘要翻译： 公开了一种用于确定衬底（30）上的结构（31）的至少两个边缘的焦点位置的方法。 在测量目标（21）在Z坐标方向移动期间，采用检测器的至少一个测量窗（45）获取所述至少一个结构（31）的多个图像。 为每个图像确定结构（31）的强度分布。
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17.发明申请Measuring device and method for determining relative positions of a positioning stage configured to be moveable in at least one direction 有权用于确定定位台的相对位置的测量装置和方法，所述定位台被配置成可在至少一个方向上移动公开(公告)号：US20060279743A1
公开(公告)日：2006-12-14
申请号：US11432949
申请日：2006-05-12
CPC分类号： G01B9/0207 , G01B9/02002 , G01B9/02018 , G01B9/02021 , G01B2290/70
摘要： A measuring apparatus for determining relative positions of a positioning stage arranged in a moveable fashion in at least one direction by a predeterminable maximum traversing path. The measuring device comprises at least one interferometric measuring means and at least one interferometric correction means. An interferometric measuring means is operable with the laser light of a laser of at least one wavelength. Correction results can be generated with the interferometric correction means allowing conclusions to be drawn with respect to the actual wavelength of the laser light during a position determination of the positioning stage in order to take into account variations of the wavelength of the laser light, in particular due to ambient conditions, when evaluating the measuring results. The interferometric correction means is arranged proximate to the interferometric measuring means, and the proximity corresponds to a predeterminable portion of the maximum traversing path of the positioning stage.
摘要翻译： 一种测量装置，用于确定以可移动的方式在至少一个方向上布置有可预定的最大横向路径的定位台的相对位置。 测量装置包括至少一个干涉测量装置和至少一个干涉校正装置。 干涉测量装置可操作于具有至少一个波长的激光的激光。 可以用干涉校正装置产生校正结果，以便在定位台的位置确定期间相对于激光的实际波长得出结论，以便考虑到激光的波长的变化，特别是 由于环境条件，在评估测量结果时。 干涉校正装置设置在干涉测量装置附近，并且接近度对应于定位台的最大横移路径的可预定部分。
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18.发明授权公开(公告)号：US08351049B2
公开(公告)日：2013-01-08
申请号：US12459751
申请日：2009-07-07
IPC分类号： G01B11/02
CPC分类号： G01B9/02027 , G01B9/02021 , G01B11/03 , G01B21/042 , G01B2290/25 , G01B2290/60 , G01B2290/70
摘要： An interferometric device for position measurement of an element moveable in a plane is disclosed. A laser light source measures the position of the moveable element and emits the required measuring light. A beam splitter splits the measuring light into a first partial beam path and a second partial beam path, which each impinge on a reflecting surface of the moveable element via an interferometer. Herein, at least the beam splitter, which splits the measuring light into a first partial beam path and a second partial beam path, and the beam splitter, which directs the third partial beam path onto an etalon via an interferometer, have a respective beam trap associated with them, which traps the light returning from the respective interferometers.
摘要翻译： 公开了一种用于在平面中可移动的元件的位置测量的干涉测量装置。 激光源测量可移动元件的位置并发射所需的测量光。 分束器将测量光分成第一部分光束路径和第二局部光束路径，每个光束路径经由干涉仪撞击可移动元件的反射表面。 这里，至少将测量光分成第一部分光束路径和第二部分光束路径的分束器以及将第三部分光束路径经由干涉仪引导到标准具上的分束器具有相应的光束捕获器 与它们相关联，其捕获从各个干涉仪返回的光。
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19.发明申请METHOD FOR DETERMINING THE FOCAL POSITION OF AT LEAST TWO EDGES OF STRUCTURES ON A SUBSTRATE 有权用于确定基底上最少两个结构边缘的焦点位置的方法公开(公告)号：US20080252903A1
公开(公告)日：2008-10-16
申请号：US12040872
申请日：2008-03-01
IPC分类号： G01B11/14
摘要： A method for determining the focal position of at least two edges of structures (31) on a substrate (30) is disclosed. During the movement of a measurement objective (21) in the Z-coordinate direction, a plurality of images of the at least one structure (31) is acquired with at least one measurement window (45) of a detector. An intensity profile of the structure (31) is determined for each image.
摘要翻译： 公开了一种用于确定衬底（30）上的结构（31）的至少两个边缘的焦点位置的方法。 在测量目标（21）在Z坐标方向移动期间，采用检测器的至少一个测量窗（45）获取至少一个结构（31）的多个图像。 为每个图像确定结构（31）的强度分布。
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20.发明申请DEVICE FOR INSPECTING A MICROSCOPIC COMPONENT BY MEANS OF AN IMMERSION OBJECTIVE 审中-公开用于通过注入目标检查微观组件的装置公开(公告)号：US20070206279A1
公开(公告)日：2007-09-06
申请号：US11569180
申请日：2005-07-05
IPC分类号： G02B21/26
CPC分类号： G02B21/0016
摘要： A device (1) is disclosed for inspecting, measuring defined structures, simulating structures and structural defects, repair of and to structures, and post-inspecting defined object sites on a microscopic component (2) with an immersion objective (8a). The device (1) comprises a stage that is movable in the x-coordinate direction and in the y-coordinate direction and a holder (42) for the microscopic component (2), whereby the holder (42) is placed on the stage (4) with the microscopic component (2) in it. The holder (42) has a reservoir (51a) with immersion or cleaning fluid, respectively. The stage (4) is movable such that the immersion objective (8a) is located directly above the reservoir (51a) and may dip into the fluid with its front-most lens.
摘要翻译： 公开了一种用于检测，测量定义的结构，模拟结构和结构缺陷，对结构进行修复和对具有浸没物镜（8a））的微观部件（2）上的定义的物体位置进行后检查的设备（1）。 装置（1）包括能够在x坐标方向和y坐标方向上移动的台架和用于微型部件（2）的支架（42），由此将支架（42）放置在台架 4）与其中的微观组分（2）。 保持器（42）具有分别具有浸没或清洁流体的储存器（51a）。 工作台（4）是可移动的，使得浸没物镜（8a）位于储存器（51a）的正上方，并且可以用其最前面的透镜浸入流体中。
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