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    Methods for performing photolithography using BARCs having graded optical properties
    12.
    发明授权
    Methods for performing photolithography using BARCs having graded optical properties 有权
    使用具有渐变光学特性的BARC进行光刻的方法

    公开(公告)号：US08153351B2

    公开(公告)日：2012-04-10

    申请号：US12255514

    申请日：2008-10-21

    申请人： Thomas I. Wallow ,  Jongwook Kye

    发明人： Thomas I. Wallow ,  Jongwook Kye

    IPC分类号： G03F7/09 ,  G03F7/11

    CPC分类号： G03F7/091

    摘要： Photolithography methods using BARCs having graded optical properties are provided. In an exemplary embodiment, a photolithography method comprises the steps of depositing a BARC overlying a material to be patterned, the BARC having a refractive index and an absorbance. The BARC is modified such that, after the step of modifying, values of the refractive index and the absorbance are graded from first values at a first surface of the BARC to second values at a second surface of the BARC. The step of modifying is performed after the step of depositing.

    摘要翻译： 提供了使用具有渐变光学特性的BARC的光刻方法。 在示例性实施例中，光刻方法包括沉积覆盖待图案化材料的BARC，BARC具有折射率和吸光度的步骤。 修改BARC使得在修改步骤之后，折射率和吸光度的值从BARC的第一表面处的第一值到BARC的第二表面处的第二值分级。 在存放步骤之后执行修改步骤。

    Lithographic photoresist composition and process for its use in the manufacture of integrated circuits
    13.
    发明授权
    Lithographic photoresist composition and process for its use in the manufacture of integrated circuits 失效
    平版光刻胶组合物及其在制造集成电路中的应用

    公开(公告)号：US06165678A

    公开(公告)日：2000-12-26

    申请号：US111558

    申请日：1998-07-08

    申请人： Robert David Allen ,  Richard Anthony DiPietro ,  Ratnam Sooriyakumaran ,  Thomas I. Wallow ,  Gregory Michael Wallraff

    发明人： Robert David Allen ,  Richard Anthony DiPietro ,  Ratnam Sooriyakumaran ,  Thomas I. Wallow ,  Gregory Michael Wallraff

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

    摘要： A novel radiation-sensitive lithographic photoresist composition is provided which has improved sensitivity and resolution. The composition comprises a photosensitive acid generator and an acrylate or methacrylate copolymer. The copolymer contains first monomeric units having polar pendant groups and second monomeric units containing photoacid-cleavable ester groups. The polar pendant groups preferably comprise C.sub.6 -C.sub.12 alicyclic substituents containing a polar moiety R*, wherein the alicyclic substituents are bound through a linker moiety to the polymer backbone. Other monomeric units may be included as well. A process for using the composition to generate resist images on a substrate, i.e., in the manufacture of integrated circuits or the like.

    摘要翻译： 提供了一种具有改进的灵敏度和分辨率的新型辐射敏感平版印刷光刻胶组合物。 该组合物包含光敏酸产生剂和丙烯酸酯或甲基丙烯酸酯共聚物。 共聚物含有具有极性侧基的第一单体单元和含有光可酸裂解酯基的第二单体单元。 极性侧基优选包含含有极性部分R *的C6-C12脂环族取代基，其中脂环取代基通过连接体部分结合至聚合物主链。 也可以包括其它单体单元。 一种使用该组合物在基板上生成抗蚀剂图像，即集成电路等的制造方法。