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公开(公告)号：US06815699B2
公开(公告)日：2004-11-09
申请号：US10314447
申请日：2002-12-09
IPC分类号： G21K510
CPC分类号： G03F7/70716 , G03F7/70758
摘要： A lithographic projection apparatus, in which movement of a substrate table in a plane is accomplished by a planar magnetic positioning device, has a mechanical limiter that limits rotation of the substrate table about a direction orthogonal to the plane.
摘要翻译： 在平面中通过平面磁定位装置实现平面中的基板台的运动的光刻投影装置具有限制基板台绕与该平面正交的方向的旋转的机械限制器。
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公开(公告)号：US07239369B2
公开(公告)日：2007-07-03
申请号：US10670791
申请日：2003-09-26
CPC分类号： G03F7/709 , G03F7/70766
摘要： A lithographic projection apparatus in which a balance mass is supported by a base frame using at least one supporting member which is coupled to both the base frame and balance mass. Free horizontal movement is provided by providing the supporting member with at least two pivot points.
摘要翻译： 一种光刻投影装置，其中平衡块由基架支撑，所述平衡块使用耦合到所述基架和平衡块的至少一个支撑构件。 通过为支撑构件提供至少两个枢转点来提供自由水平运动。
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公开(公告)号：US07417711B2
公开(公告)日：2008-08-26
申请号：US11593022
申请日：2006-11-06
CPC分类号： G03F7/709 , G03F7/70766
摘要： A lithographic projection apparatus in which a balance mass is supported by a base frame using at least one supporting member which is coupled to both the base frame and balance mass. Free horizontal movement is provided by providing the supporting member with at least two pivot points.
摘要翻译： 一种光刻投影装置，其中平衡块由基架支撑，所述平衡块使用耦合到所述基架和平衡块的至少一个支撑构件。 通过为支撑构件提供至少两个枢转点来提供自由水平运动。
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公开(公告)号：US20100165319A1
公开(公告)日：2010-07-01
申请号：US12642627
申请日：2009-12-18
申请人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter Paul Steijaert , Marcus Martinus Petrus Adrianus Vermeulen , Jan Cornelis Van Der Hoeven
发明人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter Paul Steijaert , Marcus Martinus Petrus Adrianus Vermeulen , Jan Cornelis Van Der Hoeven
IPC分类号： G03B27/32
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
摘要翻译： 公开了一种浸没式光刻投影装置，其中液体移除系统围绕向投影系统和基板之间的空间提供液体的液体供应系统。 液体移除系统相对于液体供应系统是可移动的，并且被控制为相对于移动的基板台具有基本上零的速度。 可以覆盖液体供应系统和液体移除系统之间的间隙，并且可以保持液体供应系统和衬底台之上的液体去除系统之间的气氛，使得液体的蒸汽压力相对较高。
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公开(公告)号：US07012264B2
公开(公告)日：2006-03-14
申请号：US10860654
申请日：2004-06-04
申请人： Martinus Arnoldus Henricus Terken , Hernes Jacobs , Harmen Klaas Van Der Schoot , Petrus M H Vosters , Koen J J M Zaal
发明人： Martinus Arnoldus Henricus Terken , Hernes Jacobs , Harmen Klaas Van Der Schoot , Petrus M H Vosters , Koen J J M Zaal
IPC分类号： G21K5/10
CPC分类号： G03F7/70716
摘要： A lithographic apparatus is provided. The apparatus includes an illumination system that conditions a beam of radiation, an article support member that supports an article to be placed in a beam path of the beam of radiation on the article support, and a movable carriage for moving the article support member. The carriage includes a compartmented composite structure provided with a non-composite mounting interface and/or cooling interface With such an arrangement, conventional interfacing using, for example metal or ceramic materials, can be applied in combination with the advantages of composite structures, such as a low specific weight, a high Young's modulus at places and directions where required, high strength, high stability, and high electrical resistivity.
摘要翻译： 提供光刻设备。 该装置包括照射辐射束的照明系统，支撑待放置在物品支撑件上的辐射束的光束路径中的物品的物品支撑构件以及用于移动物品支撑构件的可移动托架。 托架包括设置有非复合安装界面和/或冷却界面的分隔复合结构。通过这种布置，使用例如金属或陶瓷材料的常规接口可以与复合结构的优点结合使用，诸如 低比重，高的杨氏模量和需要的方向，高强度，高稳定性和高电阻率。
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公开(公告)号：US20050269525A1
公开(公告)日：2005-12-08
申请号：US10860654
申请日：2004-06-04
申请人： Martinus Arnoldus Henricus Terken , Hernes Jacobs , Harmen Klaas Van Der Schoot , Petrus M. H. Vosters , Koen J. J. M. Zaal
发明人： Martinus Arnoldus Henricus Terken , Hernes Jacobs , Harmen Klaas Van Der Schoot , Petrus M. H. Vosters , Koen J. J. M. Zaal
IPC分类号： H01L21/027 , G03F7/20 , H01J37/20
CPC分类号： G03F7/70716
摘要： A lithographic apparatus is provided. The apparatus includes an illumination system that conditions a beam of radiation, an article support member that supports an article to be placed in a beam path of the beam of radiation on the article support, and a movable carriage for moving the article support member. The carriage includes a compartmented composite structure provided with a non-composite mounting interface and/or cooling interface With such an arrangement, conventional interfacing using, for example metal or ceramic materials, can be applied in combination with the advantages of composite structures, such as a low specific weight, a high Young's modulus at places and directions where required, high strength, high stability, and high electrical resistivity.
摘要翻译： 提供光刻设备。 该装置包括照射辐射束的照明系统，支撑待放置在物品支撑件上的辐射束的光束路径中的物品的物品支撑构件以及用于移动物品支撑构件的可移动托架。 托架包括设置有非复合安装界面和/或冷却界面的分隔复合结构。通过这种布置，使用例如金属或陶瓷材料的常规接口可以与复合结构的优点结合使用，诸如 低比重，高的杨氏模量和需要的方向，高强度，高稳定性和高电阻率。
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公开(公告)号：US06879377B2
公开(公告)日：2005-04-12
申请号：US10305266
申请日：2002-11-27
申请人： Hernes Jacobs , Piet Vosters , Sven Antoin Johan Hol , Harmen Klaas Van Der Schoot , Robert Johannes Petrus Van Diesen , David William Callan
发明人： Hernes Jacobs , Piet Vosters , Sven Antoin Johan Hol , Harmen Klaas Van Der Schoot , Robert Johannes Petrus Van Diesen , David William Callan
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42 , G03B27/58
CPC分类号： G03F7/70991
摘要： A lithographic projection apparatus includes a conduit that supplies utilities to a movable component in a vacuum chamber such as an object table, associated motor or sensor. The conduit comprises flexible metal bellows preventing out-gassing of the conduit due to the vacuum in the vacuum chamber while allowing movement of the movable component in at least a first degree of freedom.
摘要翻译： 光刻投影装置包括向诸如对象台，相关联的电动机或传感器的真空室中的可移动部件供应电力的导管。 导管包括柔性金属波纹管，以防止由于真空室中的真空引起的导管的泄气，同时允许可移动部件以至少第一自由度的运动。
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公开(公告)号：US20080073602A1
公开(公告)日：2008-03-27
申请号：US11472566
申请日：2006-06-22
申请人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter-Paul Steijaert , Marcus Vermeulen , Jacco Van Der Hoeven
发明人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter-Paul Steijaert , Marcus Vermeulen , Jacco Van Der Hoeven
IPC分类号： G01N21/86
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
摘要翻译： 公开了一种浸没式光刻投影装置，其中液体移除系统围绕向投影系统和基板之间的空间提供液体的液体供应系统。 液体移除系统相对于液体供应系统是可移动的，并且被控制为相对于移动的基板台具有基本上零的速度。 可以覆盖液体供应系统和液体移除系统之间的间隙，并且可以保持液体供应系统和衬底台之上的液体去除系统之间的气氛，使得液体的蒸汽压力相对较高。
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19.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US06995379B2
公开(公告)日：2006-02-07
申请号：US10458726
申请日：2003-06-11
IPC分类号： A61N5/00
CPC分类号： G03F7/70733 , G03F7/70716 , G03F7/70725
摘要： A lithographic projection apparatus in which a vacuum chamber provided with a vacuum generator constructed and arranged to generate a vacuum beam path for the projection beam, wherein the apparatus is provided with a collision protection apparatus for reducing the effects of a collision of an object table with the wall of the vacuum chamber or with another object table. These collisions may occur during a power failure or an error in a programmed control logic in a controller of the apparatus.
摘要翻译： 一种光刻投影装置，其中设置有真空发生器的真空室被构造和布置成产生用于投影光束的真空光束路径，其中该装置设置有防撞装置，用于减少对象台与 真空室的墙壁或另一个物体台。 这些碰撞可能在设备的控制器中的电源故障或编程控制逻辑的错误期间发生。
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20.发明授权公开(公告)号：US07145269B2
公开(公告)日：2006-12-05
申请号：US10796291
申请日：2004-03-10
申请人： Sven Antoin Johan Hol , Henrikus Herman Marie Cox , Hernes Jacobs , Patricia Vreugdewater , Koen Jacobus Johannes Marie Zaal
发明人： Sven Antoin Johan Hol , Henrikus Herman Marie Cox , Hernes Jacobs , Patricia Vreugdewater , Koen Jacobus Johannes Marie Zaal
IPC分类号： H02K41/00
CPC分类号： G03F7/70758 , G03F7/70941
摘要： A lithographic apparatus comprising a highly effective Lorentz actuator, is presented. The Lorentz actuator comprises a main magnet system and a subsidiary magnet system arranged in Halbach configuration, an electrically conductive element for producing a force via the interaction of an electric current carried by the electrically conductive element and a resulting field of the first and second magnetic field generated by the main and subsidiary magnet system, respectively. The actuator further comprises a magnetic element extending substantially between outer sides of the first and second magnet system subassemblies. The magnetic element guides a portion of the second, subsidiary field between the first and second magnet system subassemblies.
摘要翻译： 提出了包括高效洛伦兹致动器的光刻设备。 洛伦兹致动器包括以Halbach构造布置的主磁体系统和辅助磁体系统，用于通过由导电元件承载的电流和第一和第二磁场的所得场的相互作用产生力的导电元件 分别由主磁铁系统产生。 致动器还包括基本上在第一和第二磁体系统子组件的外侧之间延伸的磁性元件。 磁性元件引导第一和第二磁体系统子组件之间的第二辅助磁场的一部分。
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