Method of forming a sample image and charged particle beam apparatus
    12.
    发明授权
    Method of forming a sample image and charged particle beam apparatus 失效
    形成样品图像和带电粒子束装置的方法

    公开(公告)号:US07361894B2

    公开(公告)日:2008-04-22

    申请号:US11501229

    申请日:2006-08-09

    摘要: An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed.In order to attain the above object, the present invention provide a method of forming a sample image by scanning a charged particle beam on a sample and forming an image based on secondary signals emitted from the sample, the method comprising the steps of forming a plurality of composite images by superposing a plurality of images obtained by a plurality of scanning times; and forming a further composite image by correcting positional displacements among the plurality of composite images and superposing the plurality of composite images, and a charged particle beam apparatus for realizing the above method.

    摘要翻译: 本发明的目的是提供一种在抑制由于带电粒子束的照射引起的充电的影响被抑制的情况下,能够高精度地实现视区域位移的抑制的样本图像形成方法和带电粒子束装置 。 为了实现上述目的,本发明提供一种通过在样品上扫描带电粒子束并基于从样品发射的二次信号形成图像来形成样品图像的方法,该方法包括以下步骤:形成多个 通过叠加通过多个扫描时间获得的多个图像的合成图像; 以及通过校正多个合成图像之间的位置偏移并叠加多个合成图像来形成另一个合成图像,以及用于实现上述方法的带电粒子束装置。

    Image evaluation method and microscope
    13.
    发明申请
    Image evaluation method and microscope 失效
    图像评估方法和显微镜

    公开(公告)号:US20050199811A1

    公开(公告)日:2005-09-15

    申请号:US11124252

    申请日:2005-05-09

    摘要: Image evaluation method capable of objectively evaluating the image resolution of a microscope image. An image resolution method is characterized in that resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image, averaging is performed over the entire area of the image or the portion of the image, and the averaged value is established as the resolution evaluation value of the entire area of the image or the portion of the image. This method eliminates the subjective impressions of the evaluator from evaluation of microscope image resolution, so image resolution evaluation values of high accuracy and good repeatability can be obtained.

    摘要翻译: 能够客观评价显微镜图像的图像分辨率的图像评价方法。 图像分辨方法的特征在于,在图像的整个区域或图像的一部分上获得图像的部分区域中的分辨率,在图像的整个区域或图像的整个区域上进行平均化, 建立平均值作为图像的整个区域或图像的部分的分辨率评估值。 该方法消除了评估者对显微镜图像分辨率评估的主观印象,因此可以获得高精度和良好重复性的图像分辨率评估值。

    Method and apparatus for circuit pattern inspection
    14.
    发明授权
    Method and apparatus for circuit pattern inspection 有权
    电路图案检查的方法和装置

    公开(公告)号:US07369703B2

    公开(公告)日:2008-05-06

    申请号:US11501843

    申请日:2006-08-10

    IPC分类号: G06K9/48 H04N7/18

    摘要: A system for measuring a pattern on a sample, including: a data processing system that processes a set of two-dimensional distribution data of intensities from the sample, to calculate: a set of edge points indicative of position of edges of the pattern in a two-dimensional plane from the two-dimensional distribution data; an approximation edge indicative of the edge of the pattern; an edge fluctuation data by calculating a difference between the set of edge points and the approximation edge; and a correlation between a first portion of the edge fluctuation data and a second portion of the edge fluctuation data.

    摘要翻译: 一种用于测量样本上的图案的系统,包括:数据处理系统,处理来自样本的一组强度的二维分布数据,以计算:一组边缘点,其指示图案的边缘的位置 二维平面从二维分布数据; 指示图案的边缘的近似边缘; 通过计算边缘点集合和近似边缘之间的差异的边缘波动数据; 以及边缘波动数据的第一部分与边缘波动数据的第二部分之间的相关性。

    Image evaluation method and microscope
    15.
    发明授权
    Image evaluation method and microscope 失效
    图像评估方法和显微镜

    公开(公告)号:US07236651B2

    公开(公告)日:2007-06-26

    申请号:US10219765

    申请日:2002-08-16

    IPC分类号: G06K9/32 G21K7/00 G09G5/02

    摘要: Image evaluation method capable of objectively evaluating the image resolution of a microscope image. An image resolution method is characterized in that resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image, averaging is performed over the entire area of the image or the portion of the image, and the averaged value is established as the resolution evaluation value of the entire area of the image or the portion of the image. This method eliminates the subjective impressions of the evaluator from evaluation of microscope image resolution, so image resolution evaluation values of high accuracy and good repeatability can be obtained.

    摘要翻译: 能够客观评价显微镜图像的图像分辨率的图像评价方法。 图像分辨方法的特征在于,在图像的整个区域或图像的一部分上获得图像的部分区域中的分辨率,在图像的整个区域或图像的整个区域上进行平均化, 建立平均值作为图像的整个区域或图像的部分的分辨率评估值。 该方法消除了评估者对显微镜图像分辨率评估的主观印象,因此可以获得高精度和良好重复性的图像分辨率评估值。

    Method and apparatus for circuit pattern inspection
    17.
    发明申请
    Method and apparatus for circuit pattern inspection 有权
    电路图案检查的方法和装置

    公开(公告)号:US20060269121A1

    公开(公告)日:2006-11-30

    申请号:US11501843

    申请日:2006-08-10

    IPC分类号: G06K9/00

    摘要: A system for measuring a pattern on a sample, including: a data processing system that processes a set of two-dimensional distribution data of intensities from the sample, to calculate: a set of edge points indicative of position of edges of said pattern in a two-dimensional plane from said two-dimensional distribution data; an approximation edge indicative of the edge of the pattern; an edge roughness data by calculating a difference between the set of edge points and said approximation edge; and a correlation between a first portion of the edge roughness data and a second portion of the edge roughness data.

    摘要翻译: 一种用于测量样本上的图案的系统,包括:数据处理系统,处理来自样本的一组强度的二维分布数据,以计算:一组指示所述图案的边缘位置的边缘点, 二维平面从所述二维分布数据; 指示图案的边缘的近似边缘; 通过计算所述一组边缘点和所述近似边缘之间的差异的边缘粗糙度数据; 以及边缘粗糙度数据的第一部分与边缘粗糙度数据的第二部分之间的相关性。

    Method for measuring dimensions of sample and scanning electron microscope
    19.
    发明授权
    Method for measuring dimensions of sample and scanning electron microscope 有权
    测量样品和扫描电子显微镜尺寸的方法

    公开(公告)号:US07659508B2

    公开(公告)日:2010-02-09

    申请号:US10450852

    申请日:2002-03-27

    IPC分类号: H01J37/28 G01N23/225

    摘要: The present invention suppresses decreases in the volumes of the patterns which have been formed on the surfaces of semiconductor samples or of the like, or performs accurate length measurements, irrespective of such decreases. In an electrically charged particle ray apparatus by which the line widths and other length data of the patterns formed on samples are to be measured by scanning the surface of each sample with electrically charged particle rays and detecting the secondary electrons released from the sample, the scanning line interval of said electrically charged particle rays is set so as not to exceed the irradiation density dictated by the physical characteristics of the sample. Or measured length data is calculated from prestored approximation functions.

    摘要翻译: 本发明抑制在半导体样品的表面上形成的图案的体积减少,或者执行精确的长度测量,而不管这种减少。 在带电粒子射线装置中,通过用带电粒子射线扫描每个样品的表面并检测从样品释放的二次电子,测量在样品上形成的图案的线宽和其它长度数据,扫描 所述带电粒子束的线间隔被设定为不超过由样品的物理特性决定的照射密度。 或者测量的长度数据由预先存储的近似函数计算。

    Sample dimension measuring method and scanning electron microscope
    20.
    发明申请
    Sample dimension measuring method and scanning electron microscope 有权
    样品尺寸测量方法和扫描电子显微镜

    公开(公告)号:US20100038535A1

    公开(公告)日:2010-02-18

    申请号:US12560091

    申请日:2009-09-15

    IPC分类号: G01Q20/00 G01N23/00

    摘要: The present invention suppresses decreases in the volumes of the patterns which have been formed on the surfaces of semiconductor samples or of the like, or performs accurate length measurements, irrespective of such decreases. In an electrically charged particle ray apparatus by which the line widths and other length data of the patterns formed on samples are to be measured by scanning the surface of each sample with electrically charged particle rays and detecting the secondary electrons released from the sample, the scanning line interval of said electrically charged particle rays is set so as not to exceed the irradiation density dictated by the physical characteristics of the sample. Or measured length data is calculated from prestored approximation functions.

    摘要翻译: 本发明抑制在半导体样品的表面上形成的图案的体积减少,或者执行精确的长度测量,而不管这种减少。 在带电粒子射线装置中,通过用带电粒子射线扫描每个样品的表面并检测从样品释放的二次电子,测量在样品上形成的图案的线宽和其它长度数据,扫描 所述带电粒子束的线间隔被设定为不超过由样品的物理特性决定的照射密度。 或者测量的长度数据由预先存储的近似函数计算。