Resistive memory device having array of probes and method of manufacturing the resistive memory device
    11.
    发明申请
    Resistive memory device having array of probes and method of manufacturing the resistive memory device 失效
    具有探针阵列的电阻式存储器件和制造该阻性存储器件的方法

    公开(公告)号:US20060091437A1

    公开(公告)日:2006-05-04

    申请号:US11240570

    申请日:2005-10-03

    IPC分类号: H01L29/94

    摘要: Provided are a resistive memory device having a probe array and a method of manufacturing the same. The resistive memory device includes a memory part having a bottom electrode and a ferroelectric layer sequentially formed on a first substrate; a probe part having an array of resistive probes arranged on a second substrate, with the tips of the resistive probes facing the ferroelectric layer so as to write and read data on the ferroelectric layer; and a binding layer which grabs and fixes the resistive probes on or above the ferroelectric layer. The method of manufacturing the resistive memory device includes forming a bottom electrode and a ferroelectric layer sequentially on a first substrate; forming an array of resistive probes on a second substrate; and wafer level bonding the first substrate to the second substrate using a binding layer such that tips of the resistive probes face the ferroelectric layer.

    摘要翻译: 提供了具有探针阵列的电阻式存储器件及其制造方法。 电阻式存储器件包括一个存储器部分,其具有顺序地形成在第一衬底上的底部电极和铁电层; 探针部分,其具有布置在第二基板上的电阻式探针阵列,其中所述电阻式探针的尖端面对强电介质层,以便在铁电层上写入和读取数据; 以及在铁电层上或上方抓住并固定电阻式探头的结合层。 制造电阻式存储器件的方法包括在第一衬底上依次形成底电极和铁电层; 在第二衬底上形成电阻性探针阵列; 并且使用结合层将第一衬底与第二衬底结合到晶片级,使得电阻探针的尖端面对强电介质层。

    Electric field information reading head, electric field information writing/reading head and fabrication methods thereof and information storage device using the same
    12.
    发明授权
    Electric field information reading head, electric field information writing/reading head and fabrication methods thereof and information storage device using the same 失效
    电场信息读取头,电场信息写入/读取头及其制造方法以及使用该读取头的信息存储装置

    公开(公告)号:US08432001B2

    公开(公告)日:2013-04-30

    申请号:US12300177

    申请日:2007-05-10

    IPC分类号: H01L29/94 H01L21/00

    CPC分类号: G11B9/02

    摘要: Provided is an electric field information reading head for reading information from a surface electric charge of an information storage medium, the electric field information reading head comprising a semiconductor substrate having a resistance region formed in a central part at one end of a surface facing a recording medium, the resistance region being lightly doped with impurities, and source and drain regions formed on both sides of the resistance region, the source region and the drain region being more highly doped with impurities than the resistance region. The source region and the drain region extend along the surface of the semiconductor substrate facing the recording medium, and electrodes are connected electrically with the source region and the drain region respectively. In addition, provided is a method of fabricating the electric field information reading head and a method of mass-producing the electric field information reading head on a wafer.

    摘要翻译: 提供一种用于从信息存储介质的表面电荷读取信息的电场信息读取头,电场信息读取头包括半导体衬底,该半导体衬底具有形成在面向记录的表面的一端的中心部分的电阻区域 介质,电阻区域被轻掺杂杂质,形成在电阻区两侧的源区和漏区,源极区和漏区比电阻区更加掺杂杂质。 源极区域和漏极区域沿着面向记录介质的半导体衬底的表面延伸,并且电极分别与源极区域和漏极区域电连接。 此外,提供了制造电场信息读取头的方法和在晶片上批量生成电场信息读取头的方法。

    Method of fabricating resistive probe having self-aligned metal shield
    13.
    发明授权
    Method of fabricating resistive probe having self-aligned metal shield 有权
    制造具有自对准金属屏蔽的电阻式探头的方法

    公开(公告)号:US07605014B2

    公开(公告)日:2009-10-20

    申请号:US11498095

    申请日:2006-08-03

    IPC分类号: H01L21/00

    摘要: A method of fabricating a resistive probe having a self-aligned metal shield. The method includes sequentially forming a first insulating layer, a metal shield, and a second insulating layer on a resistive tip of a substrate; etching the second insulating layer to expose the metal shield on a resistive region; etching the exposed metal shield; and etching the first insulating layer to expose the resistive region.

    摘要翻译: 一种制造具有自对准金属屏蔽的电阻式探头的方法。 该方法包括在衬底的电阻端上顺序地形成第一绝缘层,金属屏蔽和第二绝缘层; 蚀刻第二绝缘层以在电阻区域上暴露金属屏蔽; 蚀刻暴露的金属屏蔽; 并蚀刻第一绝缘层以暴露电阻区域。

    Semiconductor probe having resistive tip with low aspect ratio and method of fabricating the same
    14.
    发明授权
    Semiconductor probe having resistive tip with low aspect ratio and method of fabricating the same 有权
    具有低纵横比的电阻尖端的半导体探针及其制造方法

    公开(公告)号:US07528371B2

    公开(公告)日:2009-05-05

    申请号:US11448723

    申请日:2006-06-08

    IPC分类号: G01N23/00

    摘要: A semiconductor probe having a resistive tip with a low aspect ratio and a method of fabricating the semiconductor probe are provided. The semiconductor probe includes a resistive tip and a cantilever having an end portion on which the resistive tip is located. The resistive tip doped with a first impurity includes a resistive region formed at a peak of the resistive tip and lightly doped with a second impurity opposite in polarity to the first impurity, and first and second semiconductor electrode regions formed on inclined surfaces of the resistive tip and heavily doped with the second impurity. The height of the resistive tip is less than the radius of the resistive tip. Accordingly, the spatial resolution of the semiconductor probe is improved.

    摘要翻译: 提供具有低纵横比的电阻尖端和制造半导体探针的方法的半导体探针。 半导体探针包括电阻尖端和悬臂,其具有阻挡尖端所在的端部。 掺杂有第一杂质的电阻尖端包括形成在电阻尖端的峰处的电阻区,并且轻掺杂有与第一杂质极性相反的第二杂质,以及形成在电阻尖端的倾斜表面上的第一和第二半导体电极区 并重掺杂第二杂质。 电阻尖端的高度小于电阻尖端的半径。 因此,提高了半导体探针的空间分辨率。

    FERROELECTRIC RECORDING MEDIUM AND WRITING METHOD FOR THE SAME
    15.
    发明申请
    FERROELECTRIC RECORDING MEDIUM AND WRITING METHOD FOR THE SAME 失效
    电磁记录介质及其相关的书写方法

    公开(公告)号:US20080225678A1

    公开(公告)日:2008-09-18

    申请号:US12128788

    申请日:2008-05-29

    IPC分类号: G11B7/00

    摘要: A ferroelectric recording medium and a writing method for the same are provided. The ferroelectric recording medium includes a ferroelectric layer which reverses its polarization when receiving a predetermined coercive voltage. A nonvolatile anisotrophic conduction layer is formed on the ferroelectric layer. A resistance of the anisotrophic conduction layer decreases when receiving a first voltage lower than the coercive voltage, and the resistance of the anisotrophic conduction layer increases when receiving a second voltage higher than the coercive voltage. Multi-bit information is stored by a combination of polarization states of the ferroelectric layer and the resistance of the anisotrophic conduction layer. Accordingly, multiple bits can be expressed on one domain of the ferroelectric recording medium.

    摘要翻译: 提供铁电记录介质及其写入方法。 铁电记录介质包括在接收预定的矫顽电压时反转其极化的铁电层。 在铁电层上形成非挥发性各向异性导电层。 当接收到低于矫顽电压的第一电压时,各向异性传导层的电阻降低,并且当接收到高于矫顽电压的第二电压时,各向异性导电层的电阻增加。 通过铁电层的极化状态和各向异性导电层的电阻的组合来存储多位信息。 因此,可以在铁电记录介质的一个域上表示多个位。

    Method of fabricating resistive probe having self-aligned metal shield
    16.
    发明申请
    Method of fabricating resistive probe having self-aligned metal shield 有权
    制造具有自对准金属屏蔽的电阻式探头的方法

    公开(公告)号:US20070042522A1

    公开(公告)日:2007-02-22

    申请号:US11498095

    申请日:2006-08-03

    IPC分类号: H01L21/00

    摘要: A method of fabricating a resistive probe having a self-aligned metal shield. The method includes sequentially forming a first insulating layer, a metal shield, and a second insulating layer on a resistive tip of a substrate; etching the second insulating layer to expose the metal shield on a resistive region; etching the exposed metal shield; and etching the first insulating layer to expose the resistive region.

    摘要翻译: 一种制造具有自对准金属屏蔽的电阻式探头的方法。 该方法包括在衬底的电阻端上顺序地形成第一绝缘层,金属屏蔽和第二绝缘层; 蚀刻第二绝缘层以在电阻区域上暴露金属屏蔽; 蚀刻暴露的金属屏蔽; 并蚀刻第一绝缘层以暴露电阻区域。

    Semiconductor probe having resistive tip with low aspect ratio and method of fabricating the same
    17.
    发明申请
    Semiconductor probe having resistive tip with low aspect ratio and method of fabricating the same 有权
    具有低纵横比的电阻尖端的半导体探针及其制造方法

    公开(公告)号:US20070040116A1

    公开(公告)日:2007-02-22

    申请号:US11448723

    申请日:2006-06-08

    IPC分类号: G12B21/02

    摘要: A semiconductor probe having a resistive tip with a low aspect ratio and a method of fabricating the semiconductor probe are provided. The semiconductor probe includes a resistive tip and a cantilever having an end portion on which the resistive tip is located. The resistive tip doped with a first impurity includes a resistive region formed at a peak of the resistive tip and lightly doped with a second impurity opposite in polarity to the first impurity, and first and second semiconductor electrode regions formed on inclined surfaces of the resistive tip and heavily doped with the second impurity. The height of the resistive tip is less than the radius of the resistive tip. Accordingly, the spatial resolution of the semiconductor probe is improved.

    摘要翻译: 提供具有低纵横比的电阻尖端和制造半导体探针的方法的半导体探针。 半导体探针包括电阻尖端和悬臂,其具有阻挡尖端所在的端部。 掺杂有第一杂质的电阻尖端包括形成在电阻尖端的峰处的电阻区,并且轻掺杂有与第一杂质极性相反的第二杂质,以及形成在电阻尖端的倾斜表面上的第一和第二半导体电极区 并重掺杂第二杂质。 电阻尖端的高度小于电阻尖端的半径。 因此,提高了半导体探针的空间分辨率。

    Semiconductor probe with resistive tip and method of fabricating the same
    19.
    发明申请
    Semiconductor probe with resistive tip and method of fabricating the same 失效
    具有电阻尖端的半导体探针及其制造方法

    公开(公告)号:US20060060779A1

    公开(公告)日:2006-03-23

    申请号:US11219732

    申请日:2005-09-07

    IPC分类号: G21K7/00

    摘要: A semiconductor probe with a resistive tip, and a method of fabricating the semiconductor probe. The method includes forming a stripe-shaped mask layer on a substrate doped with a first impurity, and forming first and second electrode regions by heavily doping portions of the substrate not covered by the mask layer with a second impurity opposite in polarity to the first impurity; annealing the substrate to decrease a gap between the first and second semiconductor electrode regions, and forming resistive regions lightly doped with the second impurity at portions contiguous with the first and second semiconductor electrode regions; forming a stripe-shaped first photoresist layer orthogonal to the mask layer, and etching the mask layer such that the mask layer has a square shape; forming a second photoresist layer on the substrate to cover a portion of the first photoresist layer and define a cantilever region; forming the cantilever region by etching portions not covered by the first and second photoresist layers; and removing the first and second photoresist layers, and forming a resistive tip having a semi-quadrangular pyramidal shape by etching portions of the substrate not covered by the mask layer.

    摘要翻译: 具有电阻尖端的半导体探针及其制造方法。 该方法包括在掺杂有第一杂质的衬底上形成条形掩模层,以及通过以与第一杂质极性相反的第二杂质重掺杂未被掩模层覆盖的衬底的部分来形成第一和第二电极区 ; 退火所述衬底以减小所述第一和第二半导体电极区之间的间隙,以及在与所述第一和第二半导体电极区相邻的部分形成轻掺杂有所述第二杂质的电阻区; 形成与所述掩模层正交的条状的第一光致抗蚀剂层,并且蚀刻所述掩模层使得所述掩模层具有正方形形状; 在所述基板上形成第二光致抗蚀剂层以覆盖所述第一光致抗蚀剂层的一部分并限定悬臂区域; 通过蚀刻未被第一和第二光致抗蚀剂层覆盖的部分形成悬臂区域; 以及去除所述第一和第二光致抗蚀剂层,以及通过蚀刻未被所述掩模层覆盖的所述衬底的部分,形成具有半四棱锥形形状的电阻尖端。

    Semiconductor probe having wedge shape resistive tip and method of fabricating the same
    20.
    发明授权
    Semiconductor probe having wedge shape resistive tip and method of fabricating the same 有权
    具有楔形电阻尖端的半导体探针及其制造方法

    公开(公告)号:US07994499B2

    公开(公告)日:2011-08-09

    申请号:US11750404

    申请日:2007-05-18

    IPC分类号: H01L21/00

    CPC分类号: G01Q60/30 G01Q60/40

    摘要: A semiconductor probe having a wedge shape resistive tip and a method of fabricating the semiconductor probe is provided. The semiconductor probe includes a resistive tip that is doped with a first impurity, has a resistance region doped with a low concentration of a second impurity having an opposite polarity to the first impurity, and has first and second semiconductor electrode regions doped with a high concentration of the second impurity on both side slopes of the resistive tip. The probe also includes a cantilever having the resistive tip on an edge portion thereof, and an end portion of the resistive tip has a wedge shape.

    摘要翻译: 提供具有楔形电阻端头的半导体探针和制造半导体探针的方法。 半导体探针包括掺杂有第一杂质的电阻尖端,具有掺杂有与第一杂质具有相反极性的低浓度第二杂质的电阻区域,并且具有掺杂高浓度的第一和第二半导体电极区域 的第二杂质在电阻尖端的两个侧面上。 探针还包括在其边缘部分具有电阻尖端的悬臂,并且电阻尖端的端部具有楔形。