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    Probe used for surface enhanced vibrational spectroscopic analysis and method of manufacturing the same
    2.
    发明授权
    Probe used for surface enhanced vibrational spectroscopic analysis and method of manufacturing the same 失效
    用于表面增强振动光谱分析的探头及其制造方法

    公开(公告)号：US07707647B2

    公开(公告)日：2010-04-27

    申请号：US12110768

    申请日：2008-04-28

    申请人： Kaoru Konakahara

    发明人： Kaoru Konakahara

    IPC分类号： G01Q60/22

    CPC分类号： G01N21/658 ,  Y10S977/862 ,  Y10S977/875 ,  Y10S977/879 ,  Y10T428/256

    摘要： Provided are a probe for surface enhanced vibrational spectroscopic analysis which has excellent detection sensitivity to laser light having an intensity level at which a sample is not damaged and which has a long life, and a method of manufacturing the probe. The probe for surface enhanced vibrational spectroscopic analysis is formed on a cantilever. A plurality of metal fine particles are dispersed in the probe. The plurality of metal fine particles are exposed on the surface of the probe.

    摘要翻译： 本发明提供一种用于表面增强振动光谱分析的探针，其具有对样品未被损坏的强度水平并且寿命长的激光具有优异的检测灵敏度，以及制造探针的方法。 用于表面增强振动光谱分析的探针在悬臂上形成。 多个金属微粒分散在探针中。 多个金属微粒暴露在探针的表面上。

    Tapered probe structures and fabrication
    3.
    发明申请
    Tapered probe structures and fabrication 有权
    锥形探头结构和制造

    公开(公告)号：US20090133171A1

    公开(公告)日：2009-05-21

    申请号：US11914108

    申请日：2006-05-10

    申请人： Sungho Jin

    发明人： Sungho Jin

    IPC分类号： G12B21/00

    CPC分类号： G01Q70/12 ,  Y10S977/875 ,  Y10S977/878

    摘要： Probe structures and fabrication techniques are described. The described probe structures can be used as probes for various applications such as conductance measurement probes, field emitter probes, nanofabrication probes, and magnetic bit writing or reading probes.

    摘要翻译： 描述了探头结构和制造技术。 所描述的探针结构可用作各种应用的探针，例如电导测量探针，场致发射探针，纳米制造探针和磁头写入或读取探针。

    STRUCTURE HAVING NANO-HOLE AND FABRICATING METHOD THEREOF, TIP ARRAY STRUCTURE AND FABRICATING METHOD OF TIP STRUCTURE
    4.
    发明申请
    STRUCTURE HAVING NANO-HOLE AND FABRICATING METHOD THEREOF, TIP ARRAY STRUCTURE AND FABRICATING METHOD OF TIP STRUCTURE 有权
    具有纳米孔的结构及其制造方法，尖端结构和制造方法的尖端结构

    公开(公告)号：US20080160285A1

    公开(公告)日：2008-07-03

    申请号：US11737768

    申请日：2007-04-20

    申请人： Wei-Su Chen

    发明人： Wei-Su Chen

    IPC分类号： G21K1/00 ,  B32B3/26 ,  G03C5/00

    CPC分类号： G03F7/405 ,  B82Y15/00 ,  Y10S977/875 ,  Y10T428/249979

    摘要： A fabricating method of a structure having nano-hole is provided. The fabricating method includes: providing a substrate, forming a photoresist layer on the substrate, forming an opening, and performing a heat treatment process on the photoresist layer to shrink the opening to form a nano-hole. The structure having nano-hole fabricated by the method of the present invention can be used to fabricate a nano-tip having a diameter of tip-body of no more than 10 mm, high aspect ratio, and a uniform diameter of tip-body.

    摘要翻译： 提供了具有纳米孔结构的制造方法。 制造方法包括：提供基板，在基板上形成光致抗蚀剂层，形成开口，并在光致抗蚀剂层上进行热处理工艺以收缩开口以形成纳米孔。 通过本发明的方法制造的具有纳米孔的结构可用于制造具有不超过10mm的尖端直径，高纵横比和尖端体直径均匀的纳米尖端。

    Semiconductor probe with resistive tip and method of fabricating the same
    5.
    发明授权
    Semiconductor probe with resistive tip and method of fabricating the same 失效
    具有电阻尖端的半导体探针及其制造方法

    公开(公告)号：US07319224B2

    公开(公告)日：2008-01-15

    申请号：US11219732

    申请日：2005-09-07

    申请人： Hong-sik Park ,  Kyoung-lock Baeck ,  Ju-hwan Jung ,  Hyoung-soo Ko ,  Chul-min Park ,  Seung-bum Hong

    发明人： Hong-sik Park ,  Kyoung-lock Baeck ,  Ju-hwan Jung ,  Hyoung-soo Ko ,  Chul-min Park ,  Seung-bum Hong

    IPC分类号： G21K7/00

    CPC分类号： G11B9/1409 ,  G01Q60/30 ,  Y10S977/875 ,  Y10S977/878 ,  Y10S977/879

    摘要： Provided are a semiconductor probe with a resistive tip, and a method of fabricating the semiconductor probe. The method includes forming a stripe-shaped mask layer on a substrate doped with a first impurity, and forming first and second electrode regions by heavily doping portions of the substrate not covered by the mask layer with a second impurity opposite in polarity to the first impurity; annealing the substrate to decrease a gap between the first and second semiconductor electrode regions, and forming resistive regions lightly doped with the second impurity at portions contiguous with the first and second semiconductor electrode regions; forming a stripe-shaped first photoresist orthogonal to the mask layer, and etching the mask layer such that the mask layer has a square shape; forming a second photoresist on the substrate to cover a portion of the first photoresist and define a cantilever region; forming the cantilever region by etching portions not covered by the first and second photoresists; and removing the first and second photoresists, and forming a resistive tip having a semi-quadrangular pyramidal shape by etching portions of the substrate not covered by the mask layer.

    摘要翻译： 提供具有电阻尖端的半导体探针和制造半导体探针的方法。 该方法包括在掺杂有第一杂质的衬底上形成条形掩模层，以及通过以与第一杂质极性相反的第二杂质重掺杂未被掩模层覆盖的衬底的部分来形成第一和第二电极区 ; 退火所述衬底以减小所述第一和第二半导体电极区之间的间隙，以及在与所述第一和第二半导体电极区相邻的部分形成轻掺杂有所述第二杂质的电阻区; 形成与所述掩模层正交的条状的第一光致抗蚀剂，并且蚀刻所述掩模层，使得所述掩模层具有正方形形状; 在所述基板上形成第二光致抗蚀剂以覆盖所述第一光致抗蚀剂的一部分并限定悬臂区域; 通过蚀刻未被第一和第二光致抗蚀剂覆盖的部分形成悬臂区域; 以及去除所述第一和第二光致抗蚀剂，以及通过蚀刻未被所述掩模层覆盖的所述衬底的部分，形成具有半四棱锥形形状的电阻尖端。

    Multiple local probe measuring device and method
    6.
    发明申请
    Multiple local probe measuring device and method 失效
    多个本地探头测量装置及方法

    公开(公告)号：US20060255818A1

    公开(公告)日：2006-11-16

    申请号：US11487428

    申请日：2006-07-17

    申请人： Stephan Altmann ,  Johann Horber

    发明人： Stephan Altmann ,  Johann Horber

    IPC分类号： G01R31/02

    CPC分类号： G01Q20/02 ,  G01Q40/00 ,  G01Q70/06 ,  Y10S977/863 ,  Y10S977/869 ,  Y10S977/874 ,  Y10S977/875

    摘要： The invention provides a local probe measuring device for effecting local measurements referring to a sample, comprising a first local probe for local measurements with respect to a sample or a reference surface, a second local probe for local measurements with respect to the sample or the reference surface, a measurement condition adjustment arrangement adapted to commonly adjust a first measurement condition of the first local probe with respect to the sample or the reference surface and a second measurement condition of the second local probe with respect to the sample or the reference surface, a detection arrangement comprising a first detection arrangement associated with the first local probe adapted to independently detect first measurement data referring to local measurements reflected by said first local probe and a second detection arrangement associated with the second local probe adapted to independently detect second measurement data referring to local measurements effected by said second local probe. Further, methods for effecting local measurements and local manipulations by means for multiple local probes are provided.

    摘要翻译： 本发明提供了一种本地探针测量装置，用于参照样品进行局部测量，其包括用于相对于样品或参考表面进行局部测量的第一局部探针，用于相对于样品或参考物进行局部测量的第二局部探针 表面，适于相对于样品或参考表面共同调整第一局部探针的第一测量条件和第二局部探针相对于样品或参考表面的第二测量条件的测量条件调整装置， 检测装置，其包括与第一本地探针相关联的第一检测装置，其适于独立地检测参考由所述第一本地探针反射的局部测量的第一测量数据，以及与第二本地探针相关联的第二检测装置，其适于独立地检测第二测量数据， 局部测量效果 d由所述第二局部探针。 此外，提供了通过多个局部探针的手段进行局部测量和局部操作的方法。

    Scanning probe microscopy probes and methods
    8.
    发明授权
    Scanning probe microscopy probes and methods 失效
    扫描探针显微镜探针和方法

    公开(公告)号：US07081624B2

    公开(公告)日：2006-07-25

    申请号：US10670585

    申请日：2003-09-25

    申请人： Chang Liu ,  Jun Zou ,  Xuefeng Wang ,  David Bullen

    发明人： Chang Liu ,  Jun Zou ,  Xuefeng Wang ,  David Bullen

    IPC分类号： G01N23/00 ,  B05D5/00 ,  B29C59/00 ,  B29C33/76

    CPC分类号： G01Q70/16 ,  G01Q70/06 ,  G01Q80/00 ,  G03F7/0002 ,  Y10S977/857 ,  Y10S977/86 ,  Y10S977/875 ,  Y10S977/877

    摘要： A method for fabricating scanning probe microscopy (SPM) probes is disclosed. The probes are fabricated by forming a structural layer on a substrate, wherein the substrate forms a cavity. A sacrificial layer is located between the substrate and the structural layer. Upon forming the structural layer, the sacrificial layer is selectively removed, and the probe is then released from the substrate. The substrate may then later be reused to form additional probes. Additionally, a contact printing method using a scanning probe microscopy probe is also disclosed.

    摘要翻译： 公开了一种制造扫描探针显微镜（SPM）探针的方法。 通过在衬底上形成结构层来制造探针，其中衬底形成空腔。 牺牲层位于衬底和结构层之间。 在形成结构层时，选择性地去除牺牲层，然后从衬底释放探针。 然后可以再次使用底物以形成另外的探针。 此外，还公开了使用扫描探针显微镜探针的接触印刷方法。

    Multiple local probe measuring device and method
    9.
    发明授权
    Multiple local probe measuring device and method 失效
    多个本地探头测量装置及方法

    公开(公告)号：US06943574B2

    公开(公告)日：2005-09-13

    申请号：US10942875

    申请日：2004-09-17

    申请人： Stephan Maximilian Altmann ,  Johann Karl Heinrich Hörber

    发明人： Stephan Maximilian Altmann ,  Johann Karl Heinrich Hörber

    IPC分类号： G01Q20/02 ,  G01Q70/00 ,  G01R31/02

    CPC分类号： G01Q20/02 ,  G01Q40/00 ,  G01Q70/06 ,  Y10S977/863 ,  Y10S977/869 ,  Y10S977/874 ,  Y10S977/875

    摘要： The invention provides a local probe measuring device for effecting local measurements referring to a sample, having a first local probe for local measurements with respect to a sample, a second local probe for local measurements with respect to the sample, a measurement condition adjustment arrangement adapted to commonly adjust a first measurement condition of the first local probe with respect to the sample and a second measurement condition of the second local probe with respect to the sample, a detection arrangement having a first detection arrangement associated with the first local probe adapted to independently detect first measurement data referring to local measurements reflected by the first local probe and a second detection arrangement associated with the second local probe adapted to independently detect second measurement data referring to local measurements effected by the second local probe. Further, methods for effecting local measurements and local manipulations using multiple local probes are provided.

    摘要翻译： 本发明提供了一种本地探针测量装置，用于参照样品进行局部测量，该样品具有用于相对于样品进行局部测量的第一局部探针，用于相对于样品进行局部测量的第二局部探针，适于 相对于样本共同地调整第一局部探针的第一测量条件和第二局部探针的第二测量条件，具有与第一局部探针相关联的第一检测装置的检测装置适于独立地 检测第一测量数据，参考由第一本地探针反射的局部测量值和与第二局部探针相关联的第二检测装置，其适于独立地检测第二测量数据，参考由第二局部探针实施的局部测量。 此外，提供了使用多个局部探针进行局部测量和局部操纵的方法。

    Active probe for an atomic force microscope and method for use thereof
    10.
    发明申请
    Active probe for an atomic force microscope and method for use thereof 有权
    原子力显微镜的有源探针及其使用方法

    公开(公告)号：US20050066714A1

    公开(公告)日：2005-03-31

    申请号：US10966619

    申请日：2004-10-15

    申请人： Dennis Adderton ,  Stephen Minne

    发明人： Dennis Adderton ,  Stephen Minne

    IPC分类号： G01B21/30 ,  G01Q10/06 ,  G01Q20/02 ,  G01Q60/24 ,  G01Q60/34 ,  G05D3/00 ,  G05D3/12 ,  G01B5/28

    CPC分类号： G01Q60/34 ,  G01Q10/045 ,  G01Q10/065 ,  Y10S977/849 ,  Y10S977/851 ,  Y10S977/863 ,  Y10S977/869 ,  Y10S977/875 ,  Y10S977/881

    摘要： An AFM that combines an AFM Z position actuator and a self-actuated Z position cantilever (both operable in cyclical mode and contact mode), with appropriate nested feedback control circuitry to achieve high-speed imaging and accurate Z position measurements. A preferred embodiment of an AFM for analyzing a surface of a sample in either ambient air or fluid includes a self-actuated cantilever having a Z-positioning element integrated therewith and an oscillator that oscillates the self-actuated cantilever at a frequency generally equal to a resonant frequency of the self-actuated cantilever and at an oscillation amplitude generally equal to a setpoint value. The AFM includes a first feedback circuit nested within a second feedback circuit, wherein the first feedback circuit generates a cantilever control signal in response to vertical displacement of the self-actuated cantilever during a scanning operation, and the second feedback circuit is responsive to the cantilever control signal to generate a position control signal. A Z position actuator is also included within the second feedback circuit and is responsive to the position control signal to position the sample. In operation, preferably, the cantilever control signal alone is indicative of the topography of the sample surface. In a further embodiment, the first feedback circuit includes an active damping circuit for modifying the quality factor (“Q”) of the cantilever resonance to optimize the bandwidth of the cantilever response.

    摘要翻译： AFM将AFM Z位置执行器和自动Z位置悬臂（可循环模式和接触模式）两者兼容，并配有适当的嵌套反馈控制电路，实现高速成像和精确的Z位置测量。 用于在环境空气或流体中分析样品表面的AFM的优选实施例包括具有与其集成的Z定位元件的自动致动悬臂和振荡器，该振荡器以大致等于 自激式悬臂的谐振频率和大致等于设定值的振荡幅度。 AFM包括嵌套在第二反馈电路内的第一反馈电路，其中第一反馈电路在扫描操作期间响应于自致动悬臂的垂直位移而产生悬臂控制信号，并且第二反馈电路响应于悬臂 控制信号以产生位置控制信号。 Z位置致动器还包括在第二反馈电路内，并且响应于位置控制信号来定位样品。 在操作中，优选地，悬臂控制信号单独指示样品表面的形貌。 在另一实施例中，第一反馈电路包括用于修改悬臂谐振的质量因子（“Q”）的主动阻尼电路，以优化悬臂响应的带宽。