公开(公告)号：US07751002B2

公开(公告)日：2010-07-06

申请号：US12190601

申请日：2008-08-13

Applicant: Shih-Chia Hsu ,  Ying-Ru Chen ,  Hsiang-Lin Lin ,  Ching-Huan Lin

Inventor： Shih-Chia Hsu ,  Ying-Ru Chen ,  Hsiang-Lin Lin ,  Ching-Huan Lin

IPC: G02F1/1335

CPC classification number: G02F1/133555 ,  G02F1/136213 ,  G02F1/136286

Abstract: A pixel structure of a transflective LCD panel includes a substrate, a data line and a scan, a thin film transistor containing an extending electrode, a first common electrode and a second common electrode, a transmissive pixel electrode, and a reflective pixel electrode forming a first coupling capacitor with the extending electrode and a second coupling capacitor with the second common electrode. The first and second common electrodes and the data line overlap with each other in an overlapping area, wherein the first common electrode is disposed between the second common electrode and the data line.

Abstract translation: 半透射型LCD面板的像素结构包括基板，数据线和扫描，包含延伸电极的薄膜晶体管，第一公共电极和第二公共电极，透射像素电极和反射像素电极，形成 第一耦合电容器与延伸电极和第二耦合电容器与第二公共电极。 第一和第二公共电极和数据线在重叠区域彼此重叠，其中第一公共电极设置在第二公共电极和数据线之间。

公开(公告)号：US07713797B2

公开(公告)日：2010-05-11

申请号：US12177882

申请日：2008-07-23

Applicant: Hsiang-Lin Lin ,  Chun-Chieh Tsao

Inventor： Hsiang-Lin Lin ,  Chun-Chieh Tsao

IPC: H01L21/00 ,  H01L21/84

CPC classification number: G02F1/133555 ,  G02F1/136227 ,  H01L27/124 ,  H01L27/1248

Abstract: A pixel structure including a gate, a gate dielectric layer, a patterned semiconductor layer having a channel area disposed above the gate, a patterned dielectric layer having an etching-stop layer disposed above the gate and a number of bumps, a patterned metal layer having a reflective pixel electrode, a source and a drain, an overcoat dielectric layer, and a transparent pixel electrode sequentially disposed on a substrate is provided. The source and the drain respectively cover portions of the channel area. The reflective pixel electrode connects the drain and covers the bumps to form an uneven surface. The overcoat dielectric layer disposed on a transistor constituted by the gate, the gate dielectric layer, the patterned semiconductor layer, the source and the drain has a contact opening exposing a portion of the reflective pixel electrode. The transparent pixel electrode is electrically connected to the reflective pixel electrode through the contact opening.

Abstract translation: 一种像素结构，包括栅极，栅极电介质层，具有设置在栅极上方的沟道区域的图案化半导体层，具有设置在栅极上方的蚀刻停止层和多个凸起的图案化电介质层，具有 提供反射像素电极，源极和漏极，外涂层电介质层和顺序地设置在基板上的透明像素电极。 源极和漏极分别覆盖沟道区域的部分。 反射像素电极连接漏极并覆盖凸块以形成不平坦的表面。 设置在由栅极，栅极电介质层，图案化半导体层，源极和漏极构成的晶体管上的外涂层电介质层具有暴露反射像素电极的一部分的接触开口。 透明像素电极通过接触开口电连接到反射像素电极。

公开(公告)号：US20100053483A1

公开(公告)日：2010-03-04

申请号：US12419305

申请日：2009-04-07

Applicant: Sung-Kao Liu ,  Hsiang-Lin Lin ,  Ching-Huan Lin ,  Chih-Jen Hu

Inventor： Sung-Kao Liu ,  Hsiang-Lin Lin ,  Ching-Huan Lin ,  Chih-Jen Hu

IPC: G02F1/133 ,  G02F1/1337

CPC classification number: G02F1/1393 ,  G02F1/133753 ,  G02F1/134309 ,  G02F1/134363 ,  G02F2001/134381 ,  G02F2201/122

Abstract: A pixel structure includes at least a pixel electrode, and at least an aligning electrode. The pixel electrode, which has a central opening, is disposed on a substrate. The aligning electrode, which is disposed between the pixel electrode and substrate, includes an aligning part disposed under and corresponding to the central part of the pixel electrode. The aligning voltage applied to the aligning electrode is greater than the pixel voltage applied to the pixel electrode.

Abstract translation: 像素结构至少包括像素电极和至少一个对准电极。 具有中心开口的像素电极设置在基板上。 设置在像素电极和基板之间的对准电极包括设置在像素电极的中心部分下方并对应于其的中心部分的对准部。 施加到对准电极的取向电压大于施加到像素电极的像素电压。

公开(公告)号：US20090173943A1

公开(公告)日：2009-07-09

申请号：US12102027

申请日：2008-04-14

Applicant: Wei-Sheng Yu ,  Kuo-Lung Fang ,  Hsiang-Lin Lin ,  Hsien-Chieh Tseng ,  Han-Tu Lin

Inventor： Wei-Sheng Yu ,  Kuo-Lung Fang ,  Hsiang-Lin Lin ,  Hsien-Chieh Tseng ,  Han-Tu Lin

IPC: H01L33/00

CPC classification number: H01L27/124 ,  H01L27/1248 ,  H01L27/1288

Abstract: An active matrix array structure, disposed on a substrate, includes a first patterned conductive layer, a patterned gate insulating layer, a patterned semiconductor layer, a second patterned conductive layer, a patterned overcoat layer and a transparent conductive layer. The patterned gate insulating layer has first openings that expose a part of the first patterned conductive layer. The patterned semiconductor layer is disposed on the patterned gate insulating layer. The second patterned conductive layer is disposed on the patterned semiconductor layer. The patterned overcoat layer has second openings that expose a part of the first patterned conductive layer and a part of the second patterned conductive layer. The transparent conductive layer is completely disposed on the substrate. The transparent conductive layer disposed in the first openings and the second openings is broken off at a position that is in between the substrate and the patterned overcoat layer.

Abstract translation: 设置在基板上的有源矩阵阵列结构包括第一图案化导电层，图案化栅极绝缘层，图案化半导体层，第二图案化导电层，图案化外涂层和透明导电层。 图案化栅极绝缘层具有暴露第一图案化导电层的一部分的第一开口。 图案化的半导体层设置在图案化的栅极绝缘层上。 第二图案化导电层设置在图案化的半导体层上。 图案化的外涂层具有暴露第一图案化导电层的一部分和第二图案化导电层的一部分的第二开口。 透明导电层完全设置在基板上。 设置在第一开口和第二开口中的透明导电层在基板和图案化外涂层之间的位置处断开。

公开(公告)号：US20090108259A1

公开(公告)日：2009-04-30

申请号：US12040281

申请日：2008-02-29

Applicant: Hsiang-Lin Lin ,  Ching-Huan Lin

Inventor： Hsiang-Lin Lin ,  Ching-Huan Lin

IPC: H01L27/12 ,  H01L21/84

CPC classification number: H01L27/1288 ,  G02F1/134363 ,  G02F2001/134372 ,  H01L27/1214 ,  H01L27/124

Abstract: A pixel structure of a fringe field switching liquid crystal display (FFS-LCD) and a method for manufacturing the pixel structure are provided. Compared to the conventional method of using seven photolithography-etching processes for manufacturing a pixel structure, the method of the present invention uses only six photolithography-etching processes that save manufacturing costs and time. Furthermore, the pixel structure thereby only comprises two insulating layers, and thus, the light transmittance thereof can be increased in comparison to the conventional pixel structure comprising three insulating layers.

Abstract translation: 提供了一种边缘场切换液晶显示器（FFS-LCD）的像素结构以及像素结构的制造方法。 与使用七个光刻蚀刻工艺用于制造像素结构的常规方法相比，本发明的方法仅使用六个光刻蚀刻工艺，其节省制造成本和时间。 此外，像素结构由此仅包括两个绝缘层，因此与包括三个绝缘层的常规像素结构相比，其透光率可以增加。

公开(公告)号：US20080237594A1

公开(公告)日：2008-10-02

申请号：US11863283

申请日：2007-09-28

Applicant: Hsiang-Lin Lin ,  Sung-Kao Liu

Inventor： Hsiang-Lin Lin ,  Sung-Kao Liu

IPC: H01L29/04 ,  H01L21/00

CPC classification number: G02F1/136227 ,  G02F1/136213 ,  G02F2001/13606 ,  G02F2001/136218

Abstract: A method of manufacturing a pixel structure is provided. A first patterned conductive layer including a gate and a data line is formed on a substrate. A gate insulating layer is formed to cover the first patterned conductive layer and a semiconductor channel layer is formed on the gate insulating layer above the gate. A second patterned conductive layer including a scan line, a common line, a source and a drain is formed on the gate insulating layer and the semiconductor channel layer. The scan line is connected to the gate and the common line is located above the data line. The source and drain are located on the semiconductor channel layer, and the source is connected to the data line. A passivation layer is formed on the substrate to cover the second patterned conductive layer. A pixel electrode connected to the drain is formed on the passivation layer.

Abstract translation: 提供了一种制造像素结构的方法。 在基板上形成包括栅极和数据线的第一图案化导电层。 形成栅极绝缘层以覆盖第一图案化导电层，并且在栅极上方的栅极绝缘层上形成半导体沟道层。 包括扫描线，公共线，源极和漏极的第二图案化导电层形成在栅极绝缘层和半导体沟道层上。 扫描线连接到栅极，公共线位于数据线上方。 源极和漏极位于半导体沟道层上，源极连接到数据线。 在衬底上形成钝化层以覆盖第二图案化导电层。 连接到漏极的像素电极形成在钝化层上。

公开(公告)号：US20080199638A1

公开(公告)日：2008-08-21

申请号：US11707577

申请日：2007-02-15

Applicant: Hsiang-Lin Lin ,  Chun-Chieh Tsao

Inventor： Hsiang-Lin Lin ,  Chun-Chieh Tsao

IPC: C09K19/02 ,  G03F1/00

CPC classification number: G03F7/40 ,  G02F1/133504 ,  G02F1/133555 ,  G02F2201/123 ,  G03F7/0007 ,  H01R13/6675 ,  H02J7/0068 ,  Y10T307/625 ,  Y10T428/1068

Abstract: A method for producing a light reflecting structure in a transflective or reflective liquid crystal display uses one or two masks for masking a photoresist layer in a back-side exposing process. The pattern on the masks is designed to produce rod-like structures or crevices and holes on exposed and developed photoresist layer. After the exposed photoresist is developed, a heat treatment process or a UV curing process is used to soften the photoresist layer so that the reshaped surface is more or less contiguous but uneven. A reflective coating is then deposited on the uneven surface. One or more intermediate layers can be made between the masks, between the lower mask and the substrate, and between the upper masks and the photoresist layers. The masks and the intermediate layers can be made in conjunction with the fabrication of the liquid crystal display panel.

Abstract translation: 在半反射或反射型液晶显示器中制造光反射结构的方法使用一个或两个掩模来掩模背面曝光工艺中的光致抗蚀剂层。 掩模上的图案被设计成在曝光和显影的光致抗蚀剂层上产生棒状结构或缝隙和孔。 曝光的光致抗蚀剂显影后，使用热处理工艺或UV固化工艺来软化光致抗蚀剂层，使得整形表面或多或少地连续但不均匀。 然后将反射涂层沉积在不平坦表面上。 可以在掩模之间，下掩模和基板之间以及上掩模和光致抗蚀剂层之间形成一个或多个中间层。 掩模和中间层可以与液晶显示面板的制造相结合。

公开(公告)号：US08339559B2

公开(公告)日：2012-12-25

申请号：US13466195

申请日：2012-05-08

Applicant: Liu-Chung Lee ,  Hsiang-Lin Lin ,  Kuo-Yu Huang

Inventor： Liu-Chung Lee ,  Hsiang-Lin Lin ,  Kuo-Yu Huang

IPC: G02F1/136 ,  G02F1/1333 ,  G02F1/1343 ,  H01L29/04 ,  H01L29/10 ,  H01L31/00 ,  H01L27/14 ,  H01L29/15 ,  H01L31/036

CPC classification number: G02F1/13458 ,  G02F1/136227 ,  G02F2001/136218 ,  H01L27/124 ,  H01L27/1255 ,  H01L27/1288

Abstract: A liquid crystal display unit structure and the manufacturing method thereof are provided. The liquid crystal display unit structure comprises a patterned first metal layer with a first data line segment and a gate line on a substrate; a patterned dielectric layer covering the first data line and the gate line having a plurality of first openings and a second opening therein, a patterned etch stop layer having a first portion located above the first data line segment and a second portion; a patterned second metal layer including a common electrode line, a second data line segment, a source electrode and a drain electrode, wherein the first portion of the patterned etch stop layer is between the first data line segment and the common line; a patterned passivation layer and a patterned transparent conductive layer.

Abstract translation: 提供了一种液晶显示单元结构及其制造方法。 液晶显示单元结构包括在基板上具有第一数据线段和栅极线的图案化第一金属层; 覆盖第一数据线的图案化介电层和具有多个第一开口和第二开口的栅极线，具有位于第一数据线段上方的第一部分的图案化蚀刻停止层和第二部分; 图案化的第二金属层，包括公共电极线，第二数据线段，源电极和漏电极，其中图案化蚀刻停止层的第一部分在第一数据线段和公共线之间; 图案化钝化层和图案化的透明导电层。

公开(公告)号：US08304782B2

公开(公告)日：2012-11-06

申请号：US13439092

申请日：2012-04-04

Applicant: Hsiang-Lin Lin ,  Ching-Huan Lin ,  Chih-Hung Shih ,  Wei-Ming Huang

Inventor： Hsiang-Lin Lin ,  Ching-Huan Lin ,  Chih-Hung Shih ,  Wei-Ming Huang

IPC: H01L29/04 ,  H01L31/036

CPC classification number: H01L27/124

Abstract: An array substrate and method for manufacturing the same is provided, wherein a data line is composed of first and second segments connected by a contact pad. First and second insulation layers are disposed between the first segment of the data line and a shielding electrode. In addition, the first insulation layer is disposed between the second segment of the data line and a gate line in their overlapping area. Accordingly, the coupling effect between the conductive layers can be reduced. For example, the RC delay problem due to parasitic capacitance between the shielding electrode and the data line is solved. As a result of the design of the two insulator layers between the first segment of the data line and the shielding electrode, the shorting between the conductive layers can also be simultaneously solved and the product yield can be increased.

Abstract translation: 提供阵列基板及其制造方法，其中数据线由通过接触焊盘连接的第一和第二部分组成。 第一和第二绝缘层设置在数据线的第一段和屏蔽电极之间。 此外，第一绝缘层设置在数据线的第二段和其重叠区域中的栅极线之间。 因此，可以降低导电层之间的耦合效应。 例如，解决了由于屏蔽电极和数据线之间的寄生电容引起的RC延迟问题。 作为数据线的第一段与屏蔽电极之间的两个绝缘体层的设计的结果，导电层之间的短路也可以同时解决，并且可以提高产品的产率。

公开(公告)号：US08294651B2

公开(公告)日：2012-10-23

申请号：US12508573

申请日：2009-07-24

Applicant: Ching-Huan Lin ,  Hsiang-Lin Lin ,  Shih-Chia Hsu ,  Sheng-Chao Liu ,  Kuang-Hsiang Liu

Inventor： Ching-Huan Lin ,  Hsiang-Lin Lin ,  Shih-Chia Hsu ,  Sheng-Chao Liu ,  Kuang-Hsiang Liu

IPC: G09G3/36

CPC classification number: G02F1/136286 ,  G09G3/3655 ,  G09G2300/0456 ,  G09G2320/0673

Abstract: A liquid crystal display (LCD) is provided. The LCD includes a display panel and a voltage supply device (VSD). The display panel includes a plurality of scan lines, a plurality of data lines disposed substantially perpendicularly with the scan lines, and a plurality of pixels. The pixels are respectively electrically connected with the corresponding data line and the corresponding scan line, and are arranged in an array. Each of the pixels includes a common line and a compensation line, wherein the common line is located in the transparent area to receive a common voltage, and the compensation line is located in the reflection area to receive a stable voltage. The VSD is coupled to the compensation line of each of the pixels for continuously and correspondingly providing the stable voltage to the compensation line of each of the pixels.

Abstract translation: 提供液晶显示器（LCD）。 LCD包括显示面板和电压供应装置（VSD）。 显示面板包括多条扫描线，与扫描线大致垂直设置的多条数据线以及多个像素。 像素分别与相应的数据线和对应的扫描线电连接，并且被排列成阵列。 每个像素包括公共线和补偿线，其中公共线位于透明区域中以接收公共电压，并且补偿线位于反射区域中以接收稳定的电压。 VSD耦合到每个像素的补偿线，用于连续地并相应地将稳定的电压提供给每个像素的补偿线。