公开(公告)号：US20180329291A1

公开(公告)日：2018-11-15

申请号：US15979827

申请日：2018-05-15

Applicant: IMEC VZW ,  Imec USA Nanoelectronics Design Center

Inventor： Marina Timmermans ,  Emily Gallagher ,  Ivan Pollentier ,  Hanns Christoph Adelmann ,  Cedric Huyghebaert ,  Jae Uk Lee

IPC: G03F1/64

CPC classification number: G03F1/64 ,  G03F1/62

Abstract: The present disclosure relates to a method for forming a pellicle for extreme ultraviolet lithography, the method comprising: forming a coating of a first material on a peripheral region of a main surface of a carbon nanotube pellicle membrane, the membrane including a carbon nanotube film, arranging the carbon nanotube pellicle membrane on a pellicle frame with the peripheral region facing a support surface of the pellicle frame, wherein the support surface of the pellicle frame is formed by a second material, and bonding together the coating of the carbon nanotube pellicle membrane and the pellicle support surface by pressing the carbon nanotube pellicle membrane and the pellicle support surface against each other. The present disclosure relates also relates to a method for forming a reticle system for extreme ultraviolet lithography.

公开(公告)号：US11163229B2

公开(公告)日：2021-11-02

申请号：US16674582

申请日：2019-11-05

Applicant: IMEC VZW ,  Katholieke Universiteit Leuven, KU LEUVEN R&D

Inventor： Marina Mariano Juste ,  Marina Timmermans ,  Ivan Pollentier ,  Cedric Huyghebaert ,  Emily Gallagher

IPC: G03F1/64 ,  G03F1/62 ,  G03F1/40

Abstract: A method for protecting a photomask comprises: (i) providing the photomask, (ii) providing a border, (iii) depositing at least two electrical contacts on the border, (iv) mounting a film comprising carbon nanotubes on the border such that the film comprises a free-standing part, wherein after the mounting and depositing steps, the electrical contacts are in contact with the film, (v) inducing a current through the free-standing part of the film by biasing at least one pair of the electrical contacts, and (vi) mounting the border on at least one side of the photomask with the free-standing part of the film above the photomask.

公开(公告)号：US20210191255A1

公开(公告)日：2021-06-24

申请号：US17131297

申请日：2020-12-22

Applicant: IMEC VZW

Inventor： Marina Timmermans ,  Cedric Huyghebaert ,  Ivan Pollentier ,  Elie Schapmans ,  Emily Gallagher

IPC: G03F1/64

Abstract: According to an aspect of the present disclosure there is provided a method for forming an EUVL pellicle, the method comprising: coating a carbon nanotube, CNT, membrane, and mounting the CNT membrane to a pellicle frame, wherein coating the CNT membrane comprises: pre-coating CNTs of the membrane with a seed material, and forming an outer coating on the pre-coated CNTs, the outer coating covering the pre-coated CNTs, the forming of the outer coating comprising depositing a coating material on the pre-coated CNTs by atomic layer deposition.

公开(公告)号：US20210011370A1

公开(公告)日：2021-01-14

申请号：US16926460

申请日：2020-07-10

Applicant: IMEC VZW

Inventor： Joern-Holger Franke ,  Emily Gallagher

IPC: G03F1/62 ,  G03F7/20

Abstract: The present disclosure relates to an extreme ultraviolet lithography, EUVL, device comprising: a reticle comprising a lithographic pattern to be imaged on a target wafer; a light-transmissive pellicle membrane mounted in front of, and parallel to, the reticle, wherein the pellicle membrane scatters transmitted light along a scattering axis; and an extreme ultraviolet, EUV, illumination system configured to illuminate the reticle through the pellicle membrane, wherein an illumination distribution provided by the EUV illumination system is asymmetric as seen in a source-pupil plane of the EUV illumination system; wherein light reflected by the reticle and then transmitted through the pellicle membrane comprises a non-scattered fraction and a scattered fraction formed by light scattered by the pellicle membrane; the EUVL device further comprising: an imaging system having an acceptance cone configured to capture a portion of the light reflected by the reticle and then transmitted through the pellicle membrane.

公开(公告)号：US20180329289A1

公开(公告)日：2018-11-15

申请号：US15979800

申请日：2018-05-15

Applicant: IMEC VZW ,  Imec USA Nanoelectronics Design Center

Inventor： Emily Gallagher ,  Cedric Huyghebaert ,  Ivan Pollentier ,  Hanns Christoph Adelmann ,  Marina Timmermans ,  Jae Uk Lee

IPC: G03F1/64 ,  C01B32/159 ,  G03F1/22

CPC classification number: G03F1/64 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/159 ,  G03F1/22 ,  G03F1/62

Abstract: The present disclosure relates to a method for forming a carbon nanotube pellicle membrane for an extreme ultraviolet lithography reticle, the method comprising: bonding together overlapping carbon nanotubes of at least one carbon nanotube film by pressing the at least one carbon nanotube film between a first pressing surface and a second pressing surface, thereby forming a free-standing carbon nanotube pellicle membrane. The present disclosure also relates to a method for forming a pellicle for extreme ultraviolet lithography and for forming a reticle system for extreme ultraviolet lithography respectively.