公开(公告)号：US08731132B2

公开(公告)日：2014-05-20

申请号：US13362962

申请日：2012-01-31

申请人： Masato Okamura ,  Tetsuo Oosato ,  Seiji Yamamoto ,  Tadasu Yotsuyanagi ,  Nagayoshi Ichikawa ,  Kenji Yamazaki ,  Junichi Takagi ,  Hidehiro Urata ,  Shunichi Suzuki ,  Kenro Takamori ,  Junichi Suzuki

发明人： Masato Okamura ,  Tetsuo Oosato ,  Seiji Yamamoto ,  Tadasu Yotsuyanagi ,  Nagayoshi Ichikawa ,  Kenji Yamazaki ,  Junichi Takagi ,  Hidehiro Urata ,  Shunichi Suzuki ,  Kenro Takamori ,  Junichi Suzuki

IPC分类号： G21C15/28

CPC分类号： G21C17/0225 ,  G21C13/08 ,  G21C17/022 ,  G21Y2002/103 ,  G21Y2004/10 ,  Y02E30/40

摘要： In a nuclear power plant, a corrosion-resistant oxide film on a surface of the metal component of a reactor structure is exposed to a high-temperature water, the corrosion-resistant oxide film containing an oxide having a property of a P-type semiconductor, and a catalytic substance having a property of an N-type semiconductor is deposited on the oxide film. The oxide film maintains the property of the P-type semiconductor.

摘要翻译： 在核电站中，将反应器结构体的金属成分表面的耐腐蚀氧化膜暴露于高温水中，含有具有P型半导体的性质的氧化物的耐腐蚀性氧化物膜 ，并且在氧化物膜上沉积具有N型半导体性质的催化物质。 氧化膜保持P型半导体的性质。

公开(公告)号：US08564082B2

公开(公告)日：2013-10-22

申请号：US13063061

申请日：2008-09-10

申请人： Shingo Furui ,  Toshinori Yoshimuta ,  Junichi Suzuki ,  Koji Watadani ,  Satoru Morita

发明人： Shingo Furui ,  Toshinori Yoshimuta ,  Junichi Suzuki ,  Koji Watadani ,  Satoru Morita

IPC分类号： H01L27/22 ,  H01L33/00

CPC分类号： G01T1/244 ,  H01L27/14618 ,  H01L27/14676 ,  H01L2924/0002 ,  H01L2924/00

摘要： A radiation detector of this invention has a curable synthetic resin film covering exposed surfaces of a radiation sensitive semiconductor layer, a carrier selective high resistance film and a common electrode, in which a material allowing no chloride to mix in is used in a manufacturing process of the curable synthetic resin film. This prevents pinholes and voids from being formed by chlorine ions in the carrier selective high resistance film and semiconductor layer. Also a protective film which does not transmit ionic materials may be provided between the exposed surface of the common electrode and the curable synthetic resin film, thereby to prevent the carrier selective high resistance film from being corroded by chlorine ions included in the curable synthetic resin film, and to prevent an increase of dark current flowing through the semiconductor layer.

摘要翻译： 本发明的放射线检测器具有可固化的合成树脂膜，其覆盖辐射敏感半导体层，载体选择性高电阻膜和公共电极的暴露表面，其中不含氯化物的材料混合使用在制造过程中 可固化合成树脂膜。 这样可以防止载流子选择性高电阻膜和半导体层中的氯离子形成针孔和空隙。 也可以在公共电极的露出表面和可固化合成树脂膜之间设置不透过离子性材料的保护膜，由此防止载体选择性高电阻膜被包含在可固化合成树脂膜中的氯离子腐蚀 ，并且防止流过半导体层的暗电流增加。

公开(公告)号：US20130231845A1

公开(公告)日：2013-09-05

申请号：US13821795

申请日：2010-09-09

申请人： Ryota Onoe ,  Junichi Suzuki ,  Takahiko Fujiwara ,  Makoto Tomimatsu

发明人： Ryota Onoe ,  Junichi Suzuki ,  Takahiko Fujiwara ,  Makoto Tomimatsu

IPC分类号： F02D41/02

CPC分类号： F02D41/0235 ,  F02D41/1441 ,  F02D41/1454 ,  F02D41/1475 ,  F02D41/2441 ,  F02D41/2454

摘要： An air-fuel ratio control apparatus of the present invention comprises an inverse direction spike introducing section and an inverse direction spike interval setting section. The inverse direction spike introducing section introduces, while an air-fuel ratio correction required by an output of a downstream air-fuel ratio sensor is being carried out, an inverse direction spike which is an air-fuel ratio spike to temporarily change an air-fuel ratio of an exhaust gas toward a direction opposite to a direction of the air-fuel ratio correction with respect to a target control air-fuel ratio. The inverse direction spike interval setting section sets, based on an operating state of an internal combustion engine system, an inverse direction spike interval which is an interval between two of the inverse direction spikes next to each other in time.

摘要翻译： 本发明的空燃比控制装置包括反方向尖峰引入部和逆方向尖峰间隔设定部。 逆向尖峰引入部引入在进行下游空燃比传感器的输出所要求的空燃比校正的同时进行作为空燃比尖峰的反方向尖峰， 相对于目标控制空燃比，排气朝与空燃比校正方向相反的方向的燃料比。 逆方向尖峰间隔设定部基于内燃机系统的运转状态，设定作为时间上相邻的两个逆方向前后的间隔的反方向时间间隔。

公开(公告)号：US20130027674A1

公开(公告)日：2013-01-31

申请号：US13549579

申请日：2012-07-16

申请人： Junichi Suzuki ,  Satoshi Kito

发明人： Junichi Suzuki ,  Satoshi Kito

IPC分类号： H05B41/39 ,  G03B21/14

CPC分类号： H05B41/2928 ,  G03B21/2026 ,  H05B41/2885 ,  Y02B20/202 ,  Y02B20/208

摘要： A light source apparatus includes a discharge lamp including a light-emitting container having a cavity in which a discharge medium is enclosed, and a pair of electrodes disposed such that respective tip portions thereof oppose each other in the cavity, and a driving unit that supplies a driving current to the pair of electrodes. The driving current is generated by modulating amplitude of alternating current having a frequency not lower than 1 kHz and not higher than 10 GHz, such that a first section and a second section in which the amplitude is smaller than in the first section are alternately repeated.

摘要翻译： 一种光源装置，包括放电灯，该放电灯包括发光容器，该发光容器具有封闭放电介质的空腔;以及一对电极，其设置成使其各自的前端部分在空腔中相对;以及驱动单元， 到一对电极的驱动电流。 通过调制具有不低于1kHz且不高于10GHz的频率的交变电流的振幅来产生驱动电流，使得其中振幅小于第一部分的第一部分和第二部分交替重复。

公开(公告)号：US08227732B2

公开(公告)日：2012-07-24

申请号：US12637503

申请日：2009-12-14

申请人： Satoshi Kito ,  Junichi Suzuki ,  Norio Imaoka ,  Satoshi Fujii

发明人： Satoshi Kito ,  Junichi Suzuki ,  Norio Imaoka ,  Satoshi Fujii

IPC分类号： G01J1/32

CPC分类号： H01Q1/26 ,  G03B21/2026 ,  H05B41/2806 ,  Y02B20/22

摘要： A light source device includes an elliptical resonator, an electric discharge lamp that has an electric discharge tube and an electrode connected to the electric discharge tube and is disposed at one of two confocal points of the elliptical resonator, and a power supply antenna that supplies a microwave to the electric discharge lamp and is disposed at the other confocal point.

摘要翻译： 光源装置包括椭圆形谐振器，具有放电管的放电灯和连接到放电管并且设置在椭圆形谐振器的两个共焦点之一的电极的放电灯，以及供电天线 微波至放电灯并设置在另一共焦点处。

公开(公告)号：US20110315978A1

公开(公告)日：2011-12-29

申请号：US13203769

申请日：2010-03-26

申请人： Shingo Furui ,  Toshinori Yoshimuta ,  Junichi Suzuki ,  Koji Watadani ,  Satoru Morita

发明人： Shingo Furui ,  Toshinori Yoshimuta ,  Junichi Suzuki ,  Koji Watadani ,  Satoru Morita

IPC分类号： H01L31/0272

CPC分类号： H01L27/14676 ,  G01T1/244 ,  H01L31/085

摘要： The construction of this invention includes an active matrix substrate, an amorphous selenium layer, a high resistance layer, a gold electrode layer, an insulating layer and an auxiliary plate laminated in this order. In one aspect of the present invention, the insulating layer has an inorganic anion exchanger added thereto in order to provide a radiation detector which prevents void formation and pinhole formation in the amorphous semiconductor layer and carrier selective high resistance film, without accumulating electric charges on the auxiliary plate. The inorganic anion exchanger adsorbs chloride ions in the insulating layer, thereby preventing destruction of X-ray detector due to the chloride ions drawn to the gold electrode layer.

摘要翻译： 本发明的结构包括依次层叠的有源矩阵基板，非晶硒层，高电阻层，金电极层，绝缘层和辅助板。 在本发明的一个方面，绝缘层具有添加无机阴离子交换剂，以提供防止非晶半导体层和载体选择性高电阻膜中的空隙形成和针孔形成的辐射检测器，而不会在 辅助板 无机阴离子交换剂吸附绝缘层中的氯离子，从而防止由于氯离子被吸引到金电极层而导致的X射线检测器的破坏。

公开(公告)号：US08081911B2

公开(公告)日：2011-12-20

申请号：US12388857

申请日：2009-02-19

申请人： Yoichi Yamada ,  Masahiro Maeda ,  Junichi Suzuki ,  Takatomo Fukumoto

发明人： Yoichi Yamada ,  Masahiro Maeda ,  Junichi Suzuki ,  Takatomo Fukumoto

IPC分类号： G03G15/08

CPC分类号： G03G15/0818

摘要： A development roller includes a base unit having a base recess and a base projection formed in a predetermined area of a circumference surface of the base unit, and a surface layer formed on the circumference surface of the base unit and having a recess and a projection formed respectively in accordance with the base recess and the base projection of the base unit.

摘要翻译： 显影辊包括：基座单元，具有形成在基座单元的圆周表面的预定区域中的基部凹部和基部突起;以及基底单元的圆周表面上形成的凹部和突起， 分别根据基部凹部和基部单元的基底突起。

公开(公告)号：US07740991B2

公开(公告)日：2010-06-22

申请号：US11460848

申请日：2006-07-28

申请人： Keiko Emi ,  Junichi Suzuki ,  Takayuki Abe ,  Tomohiro Iijima ,  Jun Yashima

发明人： Keiko Emi ,  Junichi Suzuki ,  Takayuki Abe ,  Tomohiro Iijima ,  Jun Yashima

IPC分类号： G06F1/00 ,  G06F19/00 ,  G06F17/50 ,  G06K9/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31764 ,  H01J2237/31769

摘要： A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions, using said corrected size values in said second regions to create a map of base doses of the beam in respective ones of said second regions, using said corrected size values to prepare a map of proximity effect correction coefficients in respective ones of said second regions, using the maps to determine second corrected doses of said beam for correction of proximity effects in said third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.

摘要翻译： 光束剂量计算方法包括：从目标对象的表面区域划分出区域的行和列的矩阵，以包括不同大小的第一，第二和第三区域，第三区域的尺寸小于第一和第二区域 确定用于校正所述第一区域中的雾化效应的带电粒子束的第一校正剂量，确定用于校正由于所述第二区域中的负载效应而导致的图案线宽度偏差的校正大小值，使用所述第二区域中的所述校正大小值来创建 使用所述校正的大小值，在所述第二区域的各个区域中的所述光束的基本剂量的映射，以使用所述映射来确定所述第二区域中的相应的所述第二区域中的邻近效应校正系数的映射，以确定所述光束的第二校正剂量 校正所述第三区域中的邻近效应，并且使用第一和第二校正剂量来确定实际波束d 在所述对象的表面上的每个位置上。

公开(公告)号：US07736138B2

公开(公告)日：2010-06-15

申请号：US11808843

申请日：2007-06-13

申请人： Takahiro Nishikawa ,  Hirotsugu Ogasawara ,  Takao Kanayama ,  Yoshiaki Hiruma ,  Manabu Takenaka ,  Masazumi Sakaniwa ,  Akira Hashimoto ,  Junichi Suzuki

发明人： Takahiro Nishikawa ,  Hirotsugu Ogasawara ,  Takao Kanayama ,  Yoshiaki Hiruma ,  Manabu Takenaka ,  Masazumi Sakaniwa ,  Akira Hashimoto ,  Junichi Suzuki

IPC分类号： F04C18/00 ,  F03C4/00

CPC分类号： F01C21/0845 ,  F04C18/3568 ,  F04C23/008 ,  F04C27/009 ,  F05C2201/0439 ,  F05C2201/0448 ,  F05C2201/0457 ,  F05C2201/046 ,  F05C2203/08 ,  F05C2225/12 ,  F05C2251/10

摘要： A compressor comprises: a cylinder with a compression space; a suction port and a discharge port which communicate with the compression space in the cylinder; a support member which closes an opening of the cylinder; a rotary shaft which is rotatably supported on the support member; a compression member whose one surface crossing an axial direction of the rotary shaft is inclined continuously between a top dead center and a bottom dead center and which is rotated and compresses a fluid to discharge the fluid via the discharge port; and a vane which is disposed between a suction port and the discharge port, abuts on one surface of the compression member and partitions the compression space in the cylinder into high and low pressure chambers.

摘要翻译： 压缩机包括：具有压缩空间的气缸; 与气缸中的压缩空间连通的吸入口和排出口; 关闭气缸的开口的支撑构件; 旋转轴，其被可旋转地支撑在所述支撑构件上; 压缩构件，其与旋转轴的轴向交叉的一个表面在上死点和下死点之间连续地倾斜，并且旋转并压缩流体以经由排出口排出流体; 并且设置在吸入口和排出口之间的叶片邻接在压缩构件的一个表面上，并将气缸中的压缩空间分隔成高压室和低压室。

公开(公告)号：US07705327B2

公开(公告)日：2010-04-27

申请号：US11850904

申请日：2007-09-06

申请人： Tomoyuki Horiuchi ,  Noriaki Nakayamada ,  Junichi Suzuki ,  Takeshi Kurohori

发明人： Tomoyuki Horiuchi ,  Noriaki Nakayamada ,  Junichi Suzuki ,  Takeshi Kurohori

IPC分类号： H01J37/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J2237/20292 ,  H01J2237/3045

摘要： A charged-particle beam lithography apparatus includes a charged-particle beam irradiation unit, a deflector which deflects the charged particle beam, a stage which disposes thereon a workpiece for pattern writing and a plurality of marks being regularly laid out in an entire area substantially equal to a pattern writing region of the workpiece, a measurement unit for measuring positions of the marks on the stage through scanning of the charged-particle beam by the deflector, a coefficient calculation unit which uses an approximation equation for correction of a position deviation occurring due to a hardware configuration of the apparatus to perform the fitting of a position deviation amount of each mark by a coordinate system of the apparatus to thereby calculate more than one coefficient of the fitting-applied approximation equation, and a storage unit which performs overwrite-storing whenever the coefficient calculation unit calculates the coefficient.

摘要翻译： 带电粒子束光刻设备包括带电粒子束照射单元，使带电粒子束偏转的偏转器，在其上放置用于图案书写的工件的阶段，以及在基本相等的整个区域中定期布置的多个标记 涉及到工件的图案写入区域的测量单元，用于通过偏转器扫描带电粒子束来测量台架上的标记位置的测量单元，使用近似方程校正出现的位置偏差的系数计算单元 涉及一种装置的硬件结构，用于通过装置的坐标系进行每个标记的位置偏移量的拟合，从而计算拟合拟合近似方程的多于一个系数;以及存储单元，其执行重写存储 每当系数计算单元计算系数时。