公开(公告)号：US20060062350A1

公开(公告)日：2006-03-23

申请号：US10946426

申请日：2004-09-21

申请人： Boris Yokhin ,  Isaac Mazor ,  Tzachi Rafaeli

发明人： Boris Yokhin ,  Isaac Mazor ,  Tzachi Rafaeli

IPC分类号： G01N23/201

CPC分类号： G01N23/20008

摘要： Apparatus for analysis of a sample includes a radiation source, which is adapted to direct a converging beam of X-rays toward a surface of the sample. At least one detector array is arranged to sense the X-rays scattered from the sample as a function of elevation angle over a range of elevation angles simultaneously, and to generate output signals responsively to the scattered X-rays. The detector array has a first configuration in which the detector array senses the X-rays that are reflected from the surface of the sample at a grazing angle, and a second configuration in which the detector array senses the X-rays that are diffracted from the surface in a vicinity of a Bragg angle of the sample. A signal processor processes the output signals so as to determine a characteristic of the surface layer of the sample.

摘要翻译： 用于分析样品的装置包括辐射源，其适于将X射线的会聚束引导到样品的表面。 至少一个检测器阵列布置成同时检测从样品散射的X射线作为仰角范围上的仰角的函数，并且响应于散射的X射线产生输出信号。 检测器阵列具有第一配置，其中检测器阵列以掠射角度感测从样品表面反射的X射线，以及第二配置，其中检测器阵列感测从衍射的X射线衍射的X射线 表面在样品的布拉格角附近。 信号处理器处理输出信号，以便确定样品的表面层的特性。

公开(公告)号：US06895071B2

公开(公告)日：2005-05-17

申请号：US10635365

申请日：2003-08-06

申请人： Boris Yokhin ,  Alexander Dikopoltsev ,  Isaac Mazor ,  David Berman

发明人： Boris Yokhin ,  Alexander Dikopoltsev ,  Isaac Mazor ,  David Berman

IPC分类号： G01B15/02 ,  G01N23/20 ,  G01N23/223 ,  G01T1/36

CPC分类号： G01T1/36

摘要： Reflectometry apparatus includes a radiation source, adapted to irradiate a sample with radiation over a range of angles relative to a surface of the sample, and a detector assembly, positioned to receive the radiation reflected from the sample over the range of angles and to generate a signal responsive thereto. A shutter is adjustably positionable to intercept the radiation, the shutter having a blocking position, in which it blocks the radiation in a lower portion of the range of angles, thereby allowing the reflected radiation to reach the array substantially only in a higher portion of the range, and a clear position, in which the radiation in the lower portion of the range reaches the array substantially without blockage.

摘要翻译： 反射仪装置包括：辐射源，其适于在相对于样品表面的一定范围的角度范围内辐射样品;以及检测器组件，其定位成在角度范围内接收从样品反射的辐射，并产生 响应于此的信号。 快门可调节地定位以拦截辐射，快门具有阻挡位置，其中阻挡在角度范围的下部的辐射，从而允许反射的辐射基本上仅在其中的较高部分 范围和清晰的位置，其中该范围的下部的辐射基本上没有阻塞地达到阵列。

公开(公告)号：US07483513B2

公开(公告)日：2009-01-27

申请号：US11487433

申请日：2006-07-17

申请人： Isaac Mazor ,  Boris Yokhin

发明人： Isaac Mazor ,  Boris Yokhin

IPC分类号： G01N23/20

CPC分类号： G01N23/20

摘要： A method for X-ray analysis of a sample includes directing a beam of X-rays to impinge on an area of a periodic feature on a surface of the sample and receiving the X-rays scattered from the surface in a reflection mode so as to detect a spectrum of diffraction in the scattered X-rays as a function of azimuth. The spectrum of diffraction is analyzed in order to determine a dimension of the feature.

摘要翻译： 用于样品的X射线分析的方法包括引导X射线束照射到样品表面上的周期性特征的区域上，并以反射模式接收从表面散射的X射线，以便 检测散射X射线中的衍射光谱作为方位角的函数。 分析衍射光谱以确定特征的尺寸。

公开(公告)号：US07110491B2

公开(公告)日：2006-09-19

申请号：US11018352

申请日：2004-12-22

申请人： Isaac Mazor ,  Boris Yokhin

发明人： Isaac Mazor ,  Boris Yokhin

IPC分类号： G01N23/20

CPC分类号： G01N23/20

摘要： A method for X-ray analysis of a sample includes directing a beam of X-rays to impinge on an area of a periodic feature on a surface of the sample and receiving the X-rays scattered from the surface in a reflection mode so as to detect a spectrum of diffraction in the scattered X-rays as a function of azimuth. The spectrum of diffraction is analyzed in order to determine a dimension of the feature.

摘要翻译： 用于样品的X射线分析的方法包括引导X射线束照射到样品表面上的周期性特征的区域上，并以反射模式接收从表面散射的X射线，以便 检测散射X射线中的衍射光谱作为方位角的函数。 分析衍射光谱以确定特征的尺寸。

公开(公告)号：US20060023836A1

公开(公告)日：2006-02-02

申请号：US10902177

申请日：2004-07-30

申请人： David Berman ,  Isaac Mazor ,  Boris Yokhin ,  Amos Gvirtzman

发明人： David Berman ,  Isaac Mazor ,  Boris Yokhin ,  Amos Gvirtzman

IPC分类号： G01N23/20

CPC分类号： G01N23/203 ,  G01B15/02

摘要： A method for inspection of a sample having a surface layer. The method includes acquiring a first reflectance spectrum of the sample while irradiating the sample with a collimated beam of X-rays, and processing the first reflectance spectrum to measure a diffuse reflection property of the sample. A second reflectance spectrum of the sample is acquired while irradiating the sample with a converging beam of the X-rays. The second reflectance spectrum is analyzed using the diffuse reflection property so as to determine a characteristic of the surface layer of the sample.

公开(公告)号：US20050069090A1

公开(公告)日：2005-03-31

申请号：US10673996

申请日：2003-09-29

申请人： Tzachi Rafaeli ,  Isaac Mazor

发明人： Tzachi Rafaeli ,  Isaac Mazor

IPC分类号： G01N23/223 ,  A61B6/08 ,  G01N23/22

CPC分类号： G01N23/22

摘要： A method for X-ray analysis of a sample includes aligning an optical radiation source with an X-ray excitation source, so that a spot on the sample that is irradiated by an X-ray beam generated by the X-ray excitation source is illuminated with optical radiation generated by the optical radiation source. Optical radiation that is reflected from the sample is used to generate a first signal, which is indicative of an alignment of the spot on the sample. The X-ray beam is aligned, responsively to the first signal, so that the spot coincides with a target area of the sample. X-ray photons received from the spot on the sample, after aligning the X-ray beam, are used in generating a second signal that is indicative of a characteristic of the target area.

摘要翻译： 用于样品的X射线分析的方法包括使光辐射源与X射线激发源对准，使得由X射线激发源产生的X射线束照射的样品上的斑点被照亮 具有由光辐射源产生的光辐射。 从样品反射的光辐射用于产生第一信号，其表示样品上的斑点的对准。 响应于第一信号将X射线束对准，使得斑点与样品的目标区域重合。 在对准X射线束之后从样品上的点接收的X射线光子用于产生指示目标区域的特征的第二信号。

公开(公告)号：US06512814B2

公开(公告)日：2003-01-28

申请号：US09833902

申请日：2001-04-12

申请人： Boris Yokhin ,  Alexander Dikopoltsev ,  Isaac Mazor ,  David Berman

发明人： Boris Yokhin ,  Alexander Dikopoltsev ,  Isaac Mazor ,  David Berman

IPC分类号： G01T136

CPC分类号： G01T1/36

摘要： Reflectometry apparatus includes a radiation source, adapted to irradiate a sample with radiation over a range of angles relative to a surface of the sample, and a detector assembly, positioned to receive the radiation reflected from the sample over the range of angles and to generate a signal responsive thereto. A shutter is adjustably positionable to intercept the radiation, the shutter having a blocking position, in which it blocks the radiation in a lower portion of the range of angles, thereby allowing the reflected radiation to reach the array substantially only in a higher portion of the range, and a clear position, in which the radiation in the lower portion of the range reaches the array substantially without blockage.

公开(公告)号：US06381303B1

公开(公告)日：2002-04-30

申请号：US09408894

申请日：1999-09-29

申请人： Long Vu ,  Boris Yokhin ,  Isaac Mazor ,  Amos Gvirtzman

发明人： Long Vu ,  Boris Yokhin ,  Isaac Mazor ,  Amos Gvirtzman

IPC分类号： G01N23223

CPC分类号： G01N23/20

摘要： Apparatus for X-ray microanalysis of a sample includes an X-ray source, which irradiates a spot having a dimension less than 500 &mgr;m on a surface of the sample. A first X-ray detector captures fluorescent X-rays emitted from the sample, responsive to the irradiation, at a high angle relative to the surface of the sample. A second X-ray detector captures X-rays from the spot at a grazing angle relative to the surface of the sample. Processing circuitry receives respective signals from the first and second X-ray detectors responsive to the X-rays captured thereby, and analyzes the signals in combination to determine a property of a surface layer of the sample within the area of the spot.

摘要翻译： 用于样品的X射线微量分析的装置包括X射线源，其在样品的表面上照射尺寸小于500μm的斑点。 第一X射线检测器相对于样品的表面以高角度捕获从样品发射的荧光X射线，其响应于照射。 第二个X射线检测器以相对于样品表面的掠角捕获来自斑点的X射线。 处理电路响应于由此捕获的X射线，从第一和第二X射线检测器接收相应的信号，并组合分析信号以确定样品在斑点区域内的表面层的性质。

公开(公告)号：US06351516B1

公开(公告)日：2002-02-26

申请号：US09461670

申请日：1999-12-14

申请人： Isaac Mazor ,  Long Vu

发明人： Isaac Mazor ,  Long Vu

IPC分类号： G01N23223

CPC分类号： H01L21/76877 ,  G01N23/223 ,  G01N2223/076 ,  G01N2223/648 ,  H01L22/12

摘要： A method for testing the deposition and/or the removal of a material within a recess on the surface of a sample. An excitation beam is directed onto a region of the sample in a vicinity of the recess, and an intensity of X-ray fluorescence, emitted from the region in a spectral range in which the material is known to fluoresce, is measured. A quantity of the material that is deposited within the recess is determined responsive to the measured intensity.

摘要翻译： 一种用于测试在样品表面上的凹槽内的材料的沉积和/或去除的方法。 激发光束被引导到在凹部附近的样品的区域上，并且测量从该材料已知发荧光的光谱范围内的区域发射的X射线荧光强度。 根据测量的强度确定沉积在凹部内的一定量的材料。

公开(公告)号：US20090074137A1

公开(公告)日：2009-03-19

申请号：US12272050

申请日：2008-11-17

申请人： Dileep Agnihotri ,  Jeremy O'Dell ,  Isaac Mazor ,  Boris Yokhin

发明人： Dileep Agnihotri ,  Jeremy O'Dell ,  Isaac Mazor ,  Boris Yokhin

IPC分类号： G01N23/223

CPC分类号： G01B15/02 ,  G01N23/223 ,  G01N2223/076 ,  H01L22/12

摘要： A method for inspection of a sample includes directing an excitation beam to impinge on an area of a planar sample that includes a feature having sidewalls perpendicular to a plane of the sample, the sidewalls having a thin film thereon. An intensity of X-ray fluorescence (XRF) emitted from the sample responsively to the excitation beam is measured, and a thickness of the thin film on the sidewalls is assessed based on the intensity. In another method, the width of recesses in a surface layer of a sample and the thickness of a material deposited in the recesses after polishing are assessed using XRF.

摘要翻译： 用于检查样品的方法包括引导激发光束撞击平面样品的区域，该平面样品的区域包括具有垂直于样品平面的侧壁的特征，该侧壁在其上具有薄膜。 测量响应于激发光束从样品发射的X射线荧光强度（XRF），并且基于强度来评估侧壁上的薄膜的厚度。 在另一种方法中，使用XRF来评估样品的表面层中的凹陷的宽度和抛光后沉积在凹部中的材料的厚度。