Polyimide copolymer film for lift-off metallization
    12.
    发明授权
    Polyimide copolymer film for lift-off metallization 失效
    用于剥离金属化的聚酰亚胺共聚物膜

    公开(公告)号:US5426071A

    公开(公告)日:1995-06-20

    申请号:US205440

    申请日:1994-03-04

    Inventor: John D. Summers

    CPC classification number: C08J5/18 C08G73/1039 H01L21/0272 C08J2379/08

    Abstract: A polyimide copolymer derived from 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride, oxydiphthalic dianhydride, m-phenylene diamine and 4,4'-oxydianiline, for use as a high-temperature resistant lift-off layer in the fabrication of integrated circuit substrates.

    Abstract translation: 衍生自2,2-双(3,4-二羧基苯基)六氟丙烷二酐,氧联二邻苯二甲酸二酐,间苯二胺和4,4'-氧二苯胺的聚酰亚胺共聚物,用作制造中的耐高温剥离层 的集成电路基板。

    Polyimide compositions having resistance to water sorption, and methods relating thereto
    18.
    发明授权
    Polyimide compositions having resistance to water sorption, and methods relating thereto 失效
    具有耐水吸附性的聚酰亚胺组合物及其相关方法

    公开(公告)号:US07348373B2

    公开(公告)日:2008-03-25

    申请号:US10782326

    申请日:2004-02-19

    Abstract: Water absorption resistant polyimide pastes (or solutions), are particularly useful to make electronic screen printable pastes and the electronic components made from these pastes. A group of soluble polyimides and their solvents were discovered to be particularly resistant to moisture absorption. These polyimide solutions optionally contain polyimides also containing cross-linkable monomers and/or thermal cross-linking agents. In addition, these polyimide pastes may optionally contain adhesion promoting agents, blocked isocyanates, metals, metal oxides, and other inorganic fillers. The polyimide pastes (or solutions) of the present invention have a polyimide with a glass transition temperature greater than 250° C., have a water absorption factor of less than 2%, and a have a positive solubility measurement.

    Abstract translation: 吸水性聚酰亚胺浆料(或溶液)对于制造电子丝网印刷浆料和由这些浆料制成的电子部件特别有用。 发现一组可溶性聚酰亚胺及其溶剂特别耐吸湿性。 这些聚酰亚胺溶液任选地含有也含有可交联单体和/或热交联剂的聚酰亚胺。 此外,这些聚酰亚胺浆料可任选地含有粘合促进剂,封闭的异氰酸酯,金属,金属氧化物和其它无机填料。 本发明的聚酰亚胺膏(或溶液)具有玻璃化转变温度大于250℃的聚酰亚胺,吸水系数小于2%,并且具有正的溶解度测量。

    Wet-etchable random polyimide copolymer for multichip module applications
    20.
    发明授权
    Wet-etchable random polyimide copolymer for multichip module applications 失效
    用于多芯片模块应用的湿蚀刻随机聚酰亚胺共聚物

    公开(公告)号:US5393864A

    公开(公告)日:1995-02-28

    申请号:US051828

    申请日:1993-04-26

    Inventor: John D. Summers

    CPC classification number: C08G73/1039 H01B3/306 H05K1/0346 H05K3/4676

    Abstract: A random polyimide copolymer, based on a rigid dianhydride, a rigid diamine and an additional diamine and/or dianhydride containing one or more flexibilizing linkages. Soft-baked coatings of the poly(amic acid) precursor are readily processed using conventional aqueous base developers, such as tetramethylammonium hydroxide. The polyimide and soft-baked coatings are useful as a dielectric layer In multichip module applications or as a stress buffer coating.

    Abstract translation: 基于刚性二酸酐的无规聚酰亚胺共聚物,刚性二胺和含有一个或多个柔性键的另外的二胺和/或二酐。 使用常规的水性碱性显影剂如氢氧化四甲基铵容易地加工聚(酰胺酸)前体的软烘烤涂层。 聚酰亚胺和软烘烤涂层可用作多芯片模块应用中的介电层或作为应力缓冲涂层。

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