公开(公告)号：US5793041A

公开(公告)日：1998-08-11

申请号：US711263

申请日：1996-09-09

申请人： Munehiro Ogasawara ,  Shuichi Tamamushi ,  Kazunori Onoguchi ,  Hideo Wakamori

发明人： Munehiro Ogasawara ,  Shuichi Tamamushi ,  Kazunori Onoguchi ,  Hideo Wakamori

IPC分类号： G01R31/302 ,  H01J37/153 ,  H01J37/21 ,  H01J37/28 ,  H01J37/10

CPC分类号： H01J37/21 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/223

摘要： In a method for correcting astigmatism and focusing in a charged particle optical lens-barrel, according to the invention, Fourier transformation data items are obtained, which indicate images obtained by scanning a sample with a charged particle beam when the focal distance of an objective lens is set to each of at least two different values. Then, the configuration of the section of the beam is determined on the basis of the difference between the data items, thereby performing astigmatism correction and focusing. As a result, a charged particle microscope can perform highly accurate astigmatism correction and focusing during observation, irrespective of the surface configuration of the sample or the beam section on the sample.

摘要翻译： 在根据本发明的用于校正散光和聚焦的方法中，根据本发明，获得傅立叶变换数据项，其表示当物镜的焦距被扫描时带有带电粒子束的样本获得的图像 被设置为至少两个不同值中的每一个。 然后，基于数据项之间的差来确定光束的部分的配置，从而执行散光校正和聚焦。 结果，带电粒子显微镜可以在观察期间执行高精度的像散校正和聚焦，而不管样品的表面构型或样品上的光束部分如何。

公开(公告)号：US4794340A

公开(公告)日：1988-12-27

申请号：US127089

申请日：1987-12-01

申请人： Munehiro Ogasawara

发明人： Munehiro Ogasawara

IPC分类号： H05H13/04

CPC分类号： H05H13/04

摘要： A synchrotron-type accelerator of the invention has a torus-shaped beam duct and an acceleration section inserted in the beam duct. The acceleraton section has an accelerating cavity communicating with the interior of the beam duct. An RF electric field is applied to the interior of the accelerating cavity. A damping antenna such as a loop antenna is arranged in the accelerating cavity. The damping antenna is supported to be movable in a direction with proper angle to the axis of the accelerating cavity and is connected to a linear drive unit arranged outside the acceleration section. The linear drive unit moves the damping antenna in a direction with proper angle to the axis of the accelerating cavity, so that an insertion amount of the damping antenna with respect to the accelerating cavity is varied.

摘要翻译： 本发明的同步加速器型加速器具有环形梁管道和插入射束管道中的加速段。 加速部分具有与束管内部连通的加速腔。 RF电场施加到加速腔的内部。 诸如环形天线的阻尼天线布置在加速腔中。 阻尼天线被支撑为可以在与加速腔的轴线成适当角度的方向上移动，并且连接到布置在加速部分外部的线性驱动单元。 线性驱动单元使阻尼天线沿与加速腔的轴线成适当角度的方向移动，使阻尼天线相对于加速腔的插入量变化。

公开(公告)号：US20120235054A1

公开(公告)日：2012-09-20

申请号：US13240242

申请日：2011-09-22

申请人： Shinsuke Nishimura ,  Munehiro Ogasawara

发明人： Shinsuke Nishimura ,  Munehiro Ogasawara

IPC分类号： H01J3/14

CPC分类号： H01J37/244

摘要： According to one embodiment, an electron beam irradiation apparatus comprises an objective lens configured to irradiate a specimen surface with an electron beam, an electron detector which is provided between the objective lens and the specimen surface and which is configured to detect reflected electrons or secondary electrons emitted from the specimen surface, and an antireflection mechanism which is provided between the electron detector and the specimen surface. The antireflection mechanism has a plurality of holes following spiral trajectories of reflected electrons or secondary electrons emitted from the specimen surface and is configured to prevent the reflected electrons or secondary electrons from being re-reflected toward the specimen surface and to direct a part of the reflected electrons or secondary electrons to the electron detector.

摘要翻译： 根据一个实施例，电子束照射装置包括被配置为用电子束照射样本表面的物镜，设置在物镜和样本表面之间并被配置为检测反射电子或二次电子的电子检测器 从样品表面发射的反射机构，以及设置在电子检测器和试样表面之间的防反射机构。 防反射机构具有从被检体表面发射的反射电子或二次电子的螺旋轨迹之后的多个孔，并且被配置为防止反射的电子或二次电子朝向试样表面再反射并且引导反射的一部分 电子或二次电子到电子检测器。

公开(公告)号：US07388216B2

公开(公告)日：2008-06-17

申请号：US11759057

申请日：2007-06-06

申请人： Munehiro Ogasawara

发明人： Munehiro Ogasawara

IPC分类号： G03C5/00 ,  G03F9/00 ,  G21K5/10 ,  H01J37/08

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/30455 ,  H01J2237/31769 ,  Y10S430/143

摘要： A pattern forming method is proposed for easy correction of a pattern-size variation occurring in an etching process. An energy beam is radiated onto a resist-applied target while the energy beam is adjusted to correct the pattern-size variation occurring in the etching process. The resist on the target is developed to form a resist pattern. The target is etched with the resist pattern as a mask, thus forming patterns thereon.

摘要翻译： 提出了一种图案形成方法，用于容易校正在蚀刻工艺中发生的图案尺寸变化。 能量束被辐射到抗蚀剂施加的目标上，同时调整能量束以校正在蚀刻过程中发生的图案尺寸变化。 开发目标上的抗蚀剂以形成抗蚀剂图案。 用抗蚀剂图案作为掩模蚀刻靶，从而在其上形成图案。

公开(公告)号：US07270921B2

公开(公告)日：2007-09-18

申请号：US10360801

申请日：2003-02-10

申请人： Munehiro Ogasawara

发明人： Munehiro Ogasawara

IPC分类号： G03C5/00 ,  G03F9/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/30455 ,  H01J2237/31769 ,  Y10S430/143

摘要： A pattern forming method is proposed for easy correction of a pattern-size variation occurring in an etching process. An energy beam is radiated onto a resist-applied target while the energy beam is adjusted to correct the pattern-size variation occurring in the etching process. The resist on the target is developed to form a resist pattern. The target is etched with the resist pattern as a mask, thus forming patterns thereon.

摘要翻译： 提出了一种图案形成方法，用于容易校正在蚀刻工艺中发生的图案尺寸变化。 能量束被辐射到抗蚀剂施加的目标上，同时调整能量束以校正在蚀刻过程中发生的图案尺寸变化。 开发目标上的抗蚀剂以形成抗蚀剂图案。 用抗蚀剂图案作为掩模蚀刻靶，从而在其上形成图案。

公开(公告)号：US5923034A

公开(公告)日：1999-07-13

申请号：US950802

申请日：1997-10-15

申请人： Munehiro Ogasawara ,  Ken-ichi Murooka

发明人： Munehiro Ogasawara ,  Ken-ichi Murooka

IPC分类号： G01B11/24 ,  G01B15/00 ,  G01B15/04 ,  G01N23/18 ,  G03F1/20 ,  G03F1/84 ,  G03F1/86 ,  H01J37/26 ,  H01L21/027 ,  H01J37/256

CPC分类号： H01J37/26 ,  H01J2237/2817

摘要： A mask inspection apparatus of the present invention includes an electron gun for irradiating an electron beam onto a mask with a pattern formed thereon, an electron lens for magnifying an electro-optic mask image passed through the mask, a fluorescent screen for converting the magnified electro-optic mask image to an optical mask image, an optical lens for optically magnifying the optical mask image, a detector for detecting the magnified optical mask image, and a comparator for inspection a defect in the pattern on the basis of the image. By doing so, it is possible to suppress aberrations resulting from the electro-optic magnification and, in addition, inspect the pattern with a high resolution through optical magnification. It is also possible to inspect the mask at its area and to inspect a defect at high speeds.

摘要翻译： 本发明的掩模检查装置包括：电子枪，用于将电子束照射到形成在其上的图案的掩模上;电子透镜，用于放大通过掩模的电光掩模图像;荧光屏，用于转换放大电 - 光学掩模图像到光学掩模图像，用于光学放大光学掩模图像的光学透镜，用于检测放大的光学掩模图像的检测器，以及用于基于图像检查图案中的缺陷的比较器。 通过这样做，可以抑制由电光放大产生的像差，并且还可以通过光学放大率以高分辨率检查图案。 也可以在其区域检查面罩，并高速检查缺陷。

公开(公告)号：US08362427B2

公开(公告)日：2013-01-29

申请号：US13240242

申请日：2011-09-22

申请人： Shinsuke Nishimura ,  Munehiro Ogasawara

发明人： Shinsuke Nishimura ,  Munehiro Ogasawara

IPC分类号： H01J37/26

CPC分类号： H01J37/244

摘要： According to one embodiment, an electron beam irradiation apparatus comprises an objective lens configured to irradiate a specimen surface with an electron beam, an electron detector which is provided between the objective lens and the specimen surface and which is configured to detect reflected electrons or secondary electrons emitted from the specimen surface, and an antireflection mechanism which is provided between the electron detector and the specimen surface. The antireflection mechanism has a plurality of holes following spiral trajectories of reflected electrons or secondary electrons emitted from the specimen surface and is configured to prevent the reflected electrons or secondary electrons from being re-reflected toward the specimen surface and to direct a part of the reflected electrons or secondary electrons to the electron detector.

摘要翻译： 根据一个实施例，电子束照射装置包括被配置为用电子束照射样本表面的物镜，设置在物镜和样本表面之间并被配置为检测反射电子或二次电子的电子检测器 从样品表面发射的反射机构，以及设置在电子检测器和试样表面之间的防反射机构。 防反射机构具有从被检体表面发射的反射电子或二次电子的螺旋轨迹之后的多个孔，并且被配置为防止反射的电子或二次电子朝向试样表面再反射并且引导反射的一部分 电子或二次电子到电子检测器。

公开(公告)号：US07692158B2

公开(公告)日：2010-04-06

申请号：US11710930

申请日：2007-02-27

申请人： Munehiro Ogasawara

发明人： Munehiro Ogasawara

IPC分类号： G21K1/08 ,  H01J1/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J2237/03 ,  H01J2237/1504 ,  H01J2237/151

摘要： A charged beam drawing apparatus deflects, by an electrostatic deflector, a charged beam generated from a charged beam source, and applies the charged beam to a desired position on a sample to draw a pattern. The electrostatic deflector includes a plurality of deflecting electrodes arranged symmetrically with respect to a point around an optical axis of the charged beam, a ground external cylinder which is disposed coaxially with the optical axis and which is provided to enclose the deflecting electrodes, a resistive film provided on an inner surface of the ground external cylinder, and a conductive film provided on a surface of the resistive film. A capacitance is formed between the deflecting electrodes and the conductive film, and a resistance is formed between the ground conductor and the conductive film.

摘要翻译： 带电束的拉伸装置通过静电偏转器偏转从带电束源产生的带电束，并将带电束施加到样品上的期望位置以绘制图案。 静电偏转器包括相对于带电光束的光轴围绕的点对称布置的多个偏转电极，与光轴同轴设置并且被设置为包围偏转电极的电阻膜 设置在接地外筒的内表面上，以及设置在电阻膜的表面上的导电膜。 在偏转电极和导电膜之间形成电容，并且在接地导体和导电膜之间形成电阻。

公开(公告)号：US20080231192A1

公开(公告)日：2008-09-25

申请号：US12033467

申请日：2008-02-19

申请人： Munehiro Ogasawara

发明人： Munehiro Ogasawara

IPC分类号： H01J23/16

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J2237/03 ,  H01J2237/038 ,  H01J2237/1504 ,  H01J2237/151

摘要： An electron beam drawing apparatus, comprises an electrostatic deflector which deflects the electron beam by an electric field, a coaxial cable which is connected to deflecting electrodes, and a resistive element which is connected between a central conductor and an outer conductor or the external cylinder. The electrostatic deflector includes the external cylinder provided more downstream than the electron source and kept at the ground potential and a plurality of deflecting electrodes which are provided in the external cylinder. The coaxial cable includes the central conductor and the tubular outer conductor, one end of the central conductor passing through the external cylinder and being connected to the deflecting electrodes and one end of the outer conductor being connected to the external cylinder. The resistive element is set to a resistance for obtaining impedance matching with the coaxial cable.

摘要翻译： 一种电子束描绘装置，包括通过电场使电子束偏转的静电偏转器，连接到偏转电极的同轴电缆，以及连接在中心导体和外部导体或外部气缸之间的电阻元件。 静电偏转器包括设置在电子源下游并保持在接地电位的外筒，以及设置在外筒中的多个偏转电极。 同轴电缆包括中心导体和管状外部导体，中心导体的一端穿过外部圆筒并连接到偏转电极，外部导体的一端连接到外部圆筒。 电阻元件被设置为用于获得与同轴电缆的阻抗匹配的电阻。

公开(公告)号：US20060192148A1

公开(公告)日：2006-08-31

申请号：US11348238

申请日：2006-02-07

申请人： Munehiro Ogasawara

发明人： Munehiro Ogasawara

IPC分类号： G21K5/10 ,  H01J37/08

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31776

摘要： It is made possible to prevent the color aberration at the lenses from increasing and prevent the current distribution on the sample surface from changing at the time of the blanking operation. A deflector is placed between the first and second shaping apertures. A first crossover image is formed between the first and second shaping apertures. A second crossover image is formed in the vicinity of the beam blanking aperture. The deflector placed between the first shaping aperture and the second shaping aperture includes at least two deflectors. A beam position on the beam blanking aperture is moved without moving the image of the first shaping aperture on the second shaping aperture, by deflecting the electron beam at the time of blanking.

摘要翻译： 可以防止透镜上的色差增大，防止样品表面上的电流分布在消隐操作时变化。 偏转器被放置在第一和第二成形孔之间。 在第一和第二成形孔之间形成第一交叉图像。 第二交叉图像形成在光束消隐孔附近。 放置在第一成形孔和第二成形孔之间的偏转器包括至少两个偏转器。 通过在消隐时偏转电子束，移动光束消隐孔上的光束位置而不移动第二成形孔上的第一成形孔的图像。