公开(公告)号：US06787284B2

公开(公告)日：2004-09-07

申请号：US09922723

申请日：2001-08-07

申请人： Toshiyuki Ogata ,  Koutaro Endo ,  Hiroshi Komano

发明人： Toshiyuki Ogata ,  Koutaro Endo ,  Hiroshi Komano

IPC分类号： G03C173

CPC分类号： G03F7/0757 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/115

摘要： A positive resist composition includes (A) an alkali-soluble polysiloxane resin, (B) an acid generator composed of a compound which generates an acid upon irradiation of active light or radiant ray, and (C) a compound in which at least one hydrogen atom of phenolic hydroxyl group or carboxyl group is substituted with an acid-decomposable group. This positive resist composition is useful for processes using F2 excimer laser (157 nm), extreme-ultraviolet rays (EUV, vacuum ultraviolet rays; 13 nm) and other light sources having wavelengths equal to or shorter than that of KrF excimer laser, and has high definition and can form resist patterns with good sectional shapes. A base material carrying a layer of the positive resist composition is also useful.

摘要翻译： 正型抗蚀剂组合物包括（A）碱溶性聚硅氧烷树脂，（B）由在活性光或辐射线照射时产生酸的化合物组成的酸发生剂，和（C）至少一种氢 酚羟基或羧基的原子被酸可分解基团取代。 该正性抗蚀剂组合物可用于使用F2准分子激光器（157nm），极紫外线（EUV，真空紫外线; 13nm）和波长等于或短于KrF准分子激光器的其它光源的方法，并具有 高清晰度，可以形成具有良好截面形状的抗蚀剂图案。 携带正性抗蚀剂组合物层的基材也是有用的。

公开(公告)号：US08349543B2

公开(公告)日：2013-01-08

申请号：US12373714

申请日：2007-06-18

申请人： Shogo Matsumaru ,  Ryoji Watanabe ,  Toshiyuki Ogata

发明人： Shogo Matsumaru ,  Ryoji Watanabe ,  Toshiyuki Ogata

IPC分类号： G03F7/26 ,  C09D5/00

CPC分类号： H01L21/0273 ,  G03F7/0035 ,  G03F7/0397 ,  G03F7/40 ,  H01L21/0337 ,  H01L21/0338

摘要： A pattern-forming method, including: forming a first resist film by applying a first chemically amplified resist composition onto a support, forming a plurality of resist patterns by selectively exposing and then developing the first resist film, forming a plurality of coated patterns by forming a coating film composed of a metal oxide film on the surface of each resist pattern, forming a second resist film by applying a second chemically amplified resist composition onto the support having the coated patterns formed thereon, and selectively exposing and then developing the second resist film, thereby forming a pattern composed of the plurality of coated patterns and a resist pattern formed in the second resist film onto the support.

摘要翻译： 一种图案形成方法，包括：通过将第一化学放大抗蚀剂组合物施加到载体上来形成第一抗蚀剂膜，通过选择性地暴露然后显影第一抗蚀剂膜形成多个抗蚀剂图案，通过形成 在每个抗蚀剂图案的表面上由金属氧化物膜构成的涂膜，通过将第二化学放大型抗蚀剂组合物施加到其上形成有涂覆图案的载体上形成第二抗蚀剂膜，并选择性地暴露然后显影第二抗蚀剂膜 从而形成由多个涂布图案构成的图案和形成在第二抗蚀剂膜上的抗蚀剂图案到支撑体上。

公开(公告)号：US07919227B2

公开(公告)日：2011-04-05

申请号：US12440447

申请日：2007-08-07

申请人： Yohei Kinoshita ,  Takeshi Iwai ,  Toshiyuki Ogata

发明人： Yohei Kinoshita ,  Takeshi Iwai ,  Toshiyuki Ogata

IPC分类号： G03F7/004 ,  G03F7/30

CPC分类号： G03F7/0397 ,  Y10S430/111

摘要： A positive resist composition including a resin component (A) which exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a structural unit (a1) represented by general formula (I) shown below: wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; R1′ represents a hydrogen atom or a lower alkyl group; n represents an integer of 0 to 3; R1 represents a lower alkyl group, a fluorine atom, or a fluorinated lower alkyl group; and p represents an integer of 0 to 2.

摘要翻译： 一种正型抗蚀剂组合物，包括在酸作用下表现出增加的碱溶性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），所述树脂组分（A）包含由 通式（I）如下：其中R表示氢原子，卤素原子，低级烷基或卤代低级烷基; R1'表示氢原子或低级烷基; n表示0〜3的整数， R1表示低级烷基，氟原子或氟代低级烷基; p表示0〜2的整数。

公开(公告)号：US20110064913A1

公开(公告)日：2011-03-17

申请号：US12991690

申请日：2009-05-13

申请人： Motoki Takahashi ,  Toshiyuki Ogata ,  Christopher Cordonier ,  Akimasa Nakamura ,  Tetsuya Shichi ,  Teruhiro Uematsu

发明人： Motoki Takahashi ,  Toshiyuki Ogata ,  Christopher Cordonier ,  Akimasa Nakamura ,  Tetsuya Shichi ,  Teruhiro Uematsu

IPC分类号： B32B3/10 ,  G03F7/004

CPC分类号： C23C18/14 ,  G03F7/0047 ,  G03F7/0226 ,  Y10T428/24479

摘要： Disclosed is a positive-type photosensitive composition which can form a metal compound film pattern at high resolution and with less affection by organic residues. The positive-type photosensitive composition comprises: a metal complex component (A) which can form a metal compound film when applied and subsequently fired; and a photosensitizing agent (B). In the composition, a ligand in the component (A) is preferably a multidentate ligand having an aromatic compound as its skeleton. According to this construction, even a composition containing substantially no photosensitive resin can impart photosensitivity and a metal compound film pattern can be formed readily.

摘要翻译： 公开了能够以高分辨率形成金属化合物膜图案并且较少受有机残基影响的正型感光性组合物。 正型感光性组合物包括：金属络合物成分（A），其可以在涂布后随后烧制时形成金属化合物膜; 和光敏剂（B）。 在组合物中，组分（A）中的配体优选为具有芳族化合物作为其骨架的多齿配体。 根据该结构，即使是基本上不含感光性树脂的组合物也能赋予光敏性，容易形成金属化合物膜图案。

公开(公告)号：US20100151383A1

公开(公告)日：2010-06-17

申请号：US12707462

申请日：2010-02-17

申请人： Toshiyuki Ogata ,  Syogo Matsumaru ,  Hideo Hada ,  Masaaki Yoshida

发明人： Toshiyuki Ogata ,  Syogo Matsumaru ,  Hideo Hada ,  Masaaki Yoshida

IPC分类号： G03F7/20 ,  G03F7/004 ,  C08F224/00

CPC分类号： C08F220/28 ,  C07C69/54 ,  C07C2601/14 ,  C08F222/1006 ,  C08F232/08 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

摘要： A polymer compound that, within a chemically amplified positive resist system, exhibits a significant change in alkali solubility from a state prior to exposure to that following exposure, as well as a photoresist composition that includes such a polymer compound and a method for forming a resist pattern, which are capable of forming fine patterns with a high level of resolution. The polymer compound includes, as an alkali-soluble group (i), a substituent group in which a group selected from amongst alcoholic hydroxyl groups, carboxyl groups, and phenolic hydroxyl groups is protected with an acid dissociable, dissolution inhibiting group (ii) represented by a general formula (1) shown below: [Formula 1] —CH2—O-AO—CH2—]n  (1) (wherein, A represents an organic group of 1 to 20 carbon atoms with a valency of at least n+1, and n represents an integer from 1 to 4).

摘要翻译： 化学放大型正性抗蚀剂体系内的曝光后的状态下的碱溶解度显着变化的高分子化合物以及包含这种高分子化合物的光致抗蚀剂组合物和形成抗蚀剂的方法 图案，能够以高分辨率形成精细图案。 高分子化合物作为碱溶性基团（i）包括其中选自醇羟基，羧基和酚羟基的基团用酸解离的溶解抑制基团（ii）保护的取代基， 通式（1）表示的化合物：[式1] -CH 2 OAOO-CH 2 - ] n（1）（其中，A表示1〜20个碳原子的有机基团， 1，n表示1〜4的整数）。

公开(公告)号：US07737794B2

公开(公告)日：2010-06-15

申请号：US12120331

申请日：2008-05-14

申请人： David W. Boerstler ,  Masaaki Kaneko ,  Toshiyuki Ogata ,  Jieming Qi

发明人： David W. Boerstler ,  Masaaki Kaneko ,  Toshiyuki Ogata ,  Jieming Qi

IPC分类号： G01R23/02

CPC分类号： H03L1/022 ,  H03L1/00 ,  H03L7/099 ,  H03L2207/06

摘要： Mechanisms are provided for compensating for process and temperature variations in a circuit. The mechanisms may select at least one resistor in a plurality of resistors in the circuit to provide a resistance value for generating a calibration voltage input to the circuit to compensate for variations in process. A reference signal may be compared to a feedback signal generated by the circuit based on the calibration signal. A determination is made as to whether the feedback signal is within a tolerance of the reference signal and, if so, an identifier of the selected at least one resistor is stored in a memory device coupled to the circuit. The circuit may be operated using the selected at least one resistor based on the identifier stored in the memory device. An apparatus and integrated circuit device utilizing these mechanisms are also provided.

摘要翻译： 提供用于补偿电路中的工艺和温度变化的机构。 这些机构可以选择电路中的多个电阻器中的至少一个电阻器，以提供用于产生输入到电路的校准电压的电阻值，以补偿过程中的变化。 参考信号可以与基于校准信号的电路产生的反馈信号进行比较。 确定反馈信号是否在参考信号的公差之内，如果是，则将所选择的至少一个电阻器的标识符存储在耦合到该电路的存储器件中。 可以基于存储在存储器件中的标识符，使用所选择的至少一个电阻器来操作该电路。 还提供了利用这些机构的装置和集成电路装置。

公开(公告)号：US20100040970A1

公开(公告)日：2010-02-18

申请号：US12440447

申请日：2007-08-07

申请人： Yohei Kinoshita ,  Takeshi Iwai ,  Toshiyuki Ogata

发明人： Yohei Kinoshita ,  Takeshi Iwai ,  Toshiyuki Ogata

IPC分类号： G03F7/20 ,  G03F7/004

CPC分类号： G03F7/0397 ,  Y10S430/111

摘要： A positive resist composition including a resin component (A) which exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a structural unit (a1) represented by general formula (I) shown below: wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; R1′ represents a hydrogen atom or a lower alkyl group; n represents an integer of 0 to 3; R1 represents a lower alkyl group, a fluorine atom, or a fluorinated lower alkyl group; and p represents an integer of 0 to 2.

摘要翻译： 一种正型抗蚀剂组合物，包括在酸作用下表现出增加的碱溶性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），所述树脂组分（A）包含由 通式（I）如下：其中R表示氢原子，卤素原子，低级烷基或卤代低级烷基; R1'表示氢原子或低级烷基; n表示0〜3的整数， R1表示低级烷基，氟原子或氟代低级烷基; p表示0〜2的整数。

公开(公告)号：US20090162784A1

公开(公告)日：2009-06-25

申请号：US11576518

申请日：2005-09-22

申请人： Toshiyuki Ogata ,  Shogo Matsumaru ,  Hideo Hada

发明人： Toshiyuki Ogata ,  Shogo Matsumaru ,  Hideo Hada

IPC分类号： G03F7/004 ,  C08F16/36 ,  C08F24/00 ,  G03F7/20

CPC分类号： G03F7/0397 ,  C08F220/28 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/146

摘要： The present invention relates to a polymer compound comprising at least one constituent unit (a0) selected from the group consisting of constituent units represented by the following general formulas (A0-1), (A0-2), (A0-3) and (A0-4) [wherein R represents a hydrogen atom or a lower alkyl group], and a constituent unit (a1) derived from an (a-lower alkyl)acrylate ester having an acid dissociable dissolution inhibiting group.

摘要翻译： 本发明涉及包含至少一种选自由以下通式（A0-1），（A0-2），（A0-3）和（A0-3）和（A0-3）表示的结构单元组成的组的组成单元（a0） A0-4）[其中R表示氢原子或低级烷基]，以及由具有酸解离溶解抑制基团的（α-低级烷基）丙烯酸酯衍生的构成单元（a1）。

公开(公告)号：US07346424B2

公开(公告)日：2008-03-18

申请号：US11073575

申请日：2005-03-08

申请人： Toshiyuki Ogata ,  Koji Suzuki ,  Hiroyuki Abe

发明人： Toshiyuki Ogata ,  Koji Suzuki ,  Hiroyuki Abe

IPC分类号： G06F14/00

CPC分类号： G05B19/4068 ,  B23H7/06 ,  B23H7/20 ,  G05B2219/35351

摘要： A machining configuration drawing apparatus includes a drawing unit for drawing a machining configuration and a present machining position, a setting unit for setting a display area in an overall drawing area, a division unit for dividing the overall drawing area into a plurality of display areas based on the set display area, and a selection unit for selecting a drawing region drawn by the drawing unit from a plurality of drawing regions. The selection unit selects a drawing region in which the present machining position exists. Further, the drawing unit draws a machining configuration and a present machining position of the selected drawing region.

摘要翻译： 加工配置描绘装置包括用于绘制加工构造和当前加工位置的绘制单元，用于设置整个绘图区域中的显示区域的设置单元，用于将整个绘图区域划分为多个显示区域的分割单元 以及选择单元，用于从多个绘图区域中选择由绘制单元绘制的绘图区域。 选择单元选择存在当前加工位置的绘图区域。 此外，绘图单元绘制所选择的绘图区域的加工配置和当前的加工位置。

公开(公告)号：US20060229760A1

公开(公告)日：2006-10-12

申请号：US11397624

申请日：2006-04-05

申请人： Koji Suzuki ,  Toshiyuki Ogata

发明人： Koji Suzuki ,  Toshiyuki Ogata

IPC分类号： G06F19/00

CPC分类号： G05B19/408 ,  G05B19/4148 ,  G05B2219/31421 ,  G05B2219/34273 ,  G05B2219/34376

摘要： When the system is powered on, a BOOT device detecting unit detects which data exchange device (memory card or the like) is to be booted first, and the detected data exchange device is booted first. A data exchange process program which is set as software starting at BOOT is started to detect a data exchange file. At this time, with reference to a type code of a numerical control apparatus to be used, data matched to the type code is selected. A data exchange file is transferred to an internal storing device to which the data exchange device is connected. Then, a data exchange file is transferred to an internal storing device to which the data exchange device is not connected.

摘要翻译： 当系统通电时，BOOT设备检测单元首先检测哪个数据交换设备（存储卡等）被引导，并且检测到的数据交换设备首先启动。 开始设置为以BOOT开始的软件的数据交换处理程序来检测数据交换文件。 此时，参考要使用的数字控制装置的类型代码，选择与类型代码相匹配的数据。 数据交换文件被传送到数据交换设备连接到的内部存储设备。 然后，将数据交换文件传送到未连接数据交换装置的内部存储装置。