公开(公告)号：US20080192335A1

公开(公告)日：2008-08-14

申请号：US11917500

申请日：2006-06-13

申请人： Christoph Zaczek ,  Alexandra Pazidis

发明人： Christoph Zaczek ,  Alexandra Pazidis

IPC分类号： G02B5/20 ,  G02B1/11

CPC分类号： G03F7/70958 ,  G02B1/02 ,  G02B1/113 ,  G02B1/115 ,  G03F7/70341 ,  G03F7/70941

摘要： An optical element (14) transparent for radiation with a wavelength λ in the ultraviolet wavelength range below 250 nm, in particular at 193 nm, comprises a substrate (17) with a refractive index nS larger than 1.6, and an antireflection coating (16) formed on at least part of the surface of the substrate (17) between the substrate (17) and an ambient medium with a refractive index nA, preferably with nA=1.0. The antireflection coating (16) consists of a single layer of a material with a refractive index nL of about nL=√{square root over (nAnS)}, in particular nL>1.3, and the optical thickness dL of the single layer is about λ/4. The optical element (14) is preferably part of a projection objective (5) in a microlithography projection exposure apparatus (1) and located adjacent to a light-sensitive substrate (10).

摘要翻译： 在紫外线波长范围在250nm以下，特别是193nm的波长为λ的辐射透明的光学元件（14）包括具有大于1.6的折射率n S S的衬底（17） ，以及形成在基板（17）的表面的至少部分之间的抗反射涂层（16），所述基板（17）和折射率为n A的环境介质之间，优选为n < SUB> A = 1.0。 抗反射涂层（16）由单层材料构成，折射率为nLL的材料的平均根数超过（n A 特别是nL 1.3，单层的光学厚度d L L大约是λ / 4。 光学元件（14）优选在微光刻投影曝光装置（1）中的投影物镜（5）的一部分，并且位于与感光基板（10）相邻的位置。

公开(公告)号：US20060171020A1

公开(公告)日：2006-08-03

申请号：US11392027

申请日：2006-03-29

申请人： Daniel Krahmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christoph Zaczek

发明人： Daniel Krahmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christoph Zaczek

IPC分类号： G02B13/14 ,  G02B3/00

CPC分类号： G03F7/70966 ,  G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70958 ,  Y10S359/90

摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

摘要翻译： 微光刻投影系统的目的在于至少有一个氟化物晶体透镜。 如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。 如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个 其他。 通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。 通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。

公开(公告)号：US20060132917A1

公开(公告)日：2006-06-22

申请号：US11274152

申请日：2005-11-16

申请人： Christoph Zaczek ,  Thomas Muelders ,  Toralf Gruner

发明人： Christoph Zaczek ,  Thomas Muelders ,  Toralf Gruner

IPC分类号： G02B27/28

CPC分类号： G03F7/70958 ,  G02B27/0012 ,  G02B27/283 ,  G03F7/705

摘要： In a method for making an optical system for imaging a radiation distribution from an input surface of the optical system into an output surface of the optical system, the optical system has a multiplicity of optical components which determine an imaging quality of the optical system, which are arranged along an optical axis of the optical system and comprise at least one optical component which has a substrate with a substrate surface which is provided for carrying an interference layer system having a layer construction that determines the optical properties of the optical component covered with the interference layer system. The method includes: predefining an optimization target for at least one imaging quality parameter that represents the imaging quality of the system; determining the imaging quality of the optical system while taking account of the layer construction of the interference layer system; and varying the layer construction for approximating the imaging quality parameter to the optimization target. In accordance with the method, the determination of the optimum layer construction is coupled directly with an assessment and of the imaging quality of the total system including the interference layer system to be optimized.

摘要翻译： 在制造用于将从光学系统的输入表面的辐射分布成像到光学系统的输出表面的光学系统的方法中，光学系统具有多个光学部件，其确定光学系统的成像质量， 沿着光学系统的光轴布置并且包括至少一个光学部件，该光学部件具有衬底，该衬底具有衬底表面，衬底表面被提供用于承载具有层结构的干涉层系统，所述层结构决定了被覆盖的光学部件的光学特性 干涉层系统。 该方法包括：为表示系统的成像质量的至少一个成像质量参数预定义优化目标; 在考虑到干涉层系统的层结构的同时确定光学系统的成像质量; 并且改变用于将成像质量参数近似到优化目标的层结构。 根据该方法，最佳层结构的确定直接与包括要优化的干涉层系统的总体系统的评估和成像质量相耦合。

公开(公告)号：US20070007491A1

公开(公告)日：2007-01-11

申请号：US11414692

申请日：2006-04-28

申请人： Ralf Mueller ,  Olaf Dittmann ,  Michael Totzeck ,  Daniel Kraehmer ,  Christoph Zaczek ,  Karl-Heinz Schuster

发明人： Ralf Mueller ,  Olaf Dittmann ,  Michael Totzeck ,  Daniel Kraehmer ,  Christoph Zaczek ,  Karl-Heinz Schuster

IPC分类号： C09K19/52

CPC分类号： G02B5/3083 ,  G02B1/02 ,  G02B27/281 ,  G03F7/70966

摘要： The invention concerns an optical element, in particular for an objective or an illumination system of a microlithographic projection exposure apparatus, including a substrate which for light of a predetermined working wavelength which passes through the substrate causes a first retardation between mutually perpendicular polarization states, and a layer which is epitaxially grown on the substrate and which is made from a material with non-cubic crystal structure, which by virtue of natural birefringence causes a second retardation between mutually perpendicular polarization states, which at least partially compensates for the first retardation caused in the substrate.

摘要翻译： 本发明涉及一种光学元件，特别是用于微光刻投影曝光设备的物镜或照明系统，该微光刻投影曝光设备包括用于通过基板的预定工作波长的光的基板，引起相互垂直的偏振状态之间的第一延迟，以及 在衬底上外延生长并且由具有非立方晶体结构的材料制成的层，其由于天然双折射引起相互垂直的极化状态之间的第二延迟，其至少部分地补偿在 底物。

公开(公告)号：US09684252B2

公开(公告)日：2017-06-20

申请号：US13281138

申请日：2011-10-25

申请人： Christoph Zaczek ,  Alexandra Pazidis

发明人： Christoph Zaczek ,  Alexandra Pazidis

IPC分类号： G03F7/20 ,  G02B1/113 ,  G02B1/115 ,  G02B1/02

CPC分类号： G03F7/70958 ,  G02B1/02 ,  G02B1/113 ,  G02B1/115 ,  G03F7/70341 ,  G03F7/70941

摘要： An optical element (14) transparent for radiation with a wavelength λ in the ultraviolet wavelength range below 250 nm, in particular at 193 nm, comprises a substrate (17) with a refractive index ns larger than 1.6, and an antireflection coating (16) formed on at least part of the surface of the substrate (17) between the substrate (17) and an ambient medium with a refractive index nA, preferably with nA=1.0. The antireflection coating (16) consists of a single layer of a material with a refractive index nL of about nL=√{square root over (nAnS)}, in particular nL>1.3, and the optical thickness dL of the single layer is about λ/4. The optical element (14) is preferably part of a projection objective (5) in a microlithography projection exposure apparatus (1) and located adjacent to a light-sensitive substrate (10).

公开(公告)号：US07518797B2

公开(公告)日：2009-04-14

申请号：US11607024

申请日：2006-11-30

申请人： Alexandra Pazidis ,  Christoph Zaczek

发明人： Alexandra Pazidis ,  Christoph Zaczek

IPC分类号： G02B1/10 ,  G03B27/54

CPC分类号： G03F7/70958

摘要： The disclosure relates to optical systems, such as illumination devices or projection objectives of microlithographic projection exposure apparatuses, that include at least one optical element having at least one curved lens surface which carries an interference layer system. The interference layer system includes an alternating sequence of layers. At least one of the layers is subdivided by at least one intermediate layer having a thickness of not more than 5 nanometers. A column structure which is formed in the at least one subdivided layer is interrupted by the at least one intermediate layer.

摘要翻译： 本公开涉及包括至少一个具有至少一个带有干涉层系统的弯曲透镜表面的光学元件的光学系统，诸如微光刻投影曝光装置的照明装置或投影物镜。 干涉层系统包括层的交替序列。 至少一个层被至少一个厚度不超过5纳米的中间层细分。 形成在至少一个细分层中的列结构被至少一个中间层中断。

公开(公告)号：US20070128453A1

公开(公告)日：2007-06-07

申请号：US11607024

申请日：2006-11-30

申请人： Alexandra Pazidis ,  Christoph Zaczek

发明人： Alexandra Pazidis ,  Christoph Zaczek

IPC分类号： B32B9/00 ,  B29C71/02

CPC分类号： G03F7/70958

摘要： The disclosure relates to optical systems, such as illumination devices or projection objectives of microlithographic projection exposure apparatuses, that include at least one optical element having at least one curved lens surface which carries an interference layer system. The interference layer system includes an alternating sequence of layers. At least one of the layers is subdivided by at least one intermediate layer having a thickness of not more than 5 nanometers. A column structure which is formed in the at least one subdivided layer is interrupted by the at least one intermediate layer.

摘要翻译： 本公开涉及包括至少一个具有至少一个带有干涉层系统的弯曲透镜表面的光学元件的光学系统，诸如微光刻投影曝光装置的照明装置或投影物镜。 干涉层系统包括层的交替序列。 至少一个层被至少一个厚度不超过5纳米的中间层细分。 形成在至少一个细分层中的列结构被至少一个中间层中断。

公开(公告)号：US10146137B2

公开(公告)日：2018-12-04

申请号：US13423344

申请日：2012-03-19

申请人： Sascha Bleidistel ,  Toralf Gruner ,  Christoph Zaczek ,  Ralf Mueller

发明人： Sascha Bleidistel ,  Toralf Gruner ,  Christoph Zaczek ,  Ralf Mueller

IPC分类号： G03F7/20 ,  G02B13/14 ,  G02B17/08

摘要： A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a measuring device. The reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and transmits a second part of the imaging radiation. The reflected, first part of the imaging radiation at least partly contributes to the imaging of the object field. The transmitted, second part of the imaging radiation is at least partly fed to a measuring device. This allows a simultaneous exposure of the photosensitive layer at the location of the image field with the imaging radiation and monitoring of the imaging radiation with the aid of the measuring device.

公开(公告)号：US20130182234A1

公开(公告)日：2013-07-18

申请号：US13786134

申请日：2013-03-05

申请人： Paul Graupner ,  Olaf Conradi ,  Christoph Zaczek ,  Wilhelm Ulrich ,  Helmut Beierl ,  Toralf Gruner ,  Volker Graeschus

发明人： Paul Graupner ,  Olaf Conradi ,  Christoph Zaczek ,  Wilhelm Ulrich ,  Helmut Beierl ,  Toralf Gruner ,  Volker Graeschus

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  G03F7/70308

摘要： A projection exposure system includes an illumination system configured to illuminate a mask with radiation. The projection exposure system also includes a projection objective configured to project an image of a pattern of the mask onto a radiation-sensitive substrate. The projection exposure system further includes an angle-selective filter arrangement arranged at or close to a field surface of the projection objective in a projection beam path optically downstream of the object surface. The angle-selective filter arrangement is effective to filter radiation incident on the filter arrangement according to an angle-selective filter function.

摘要翻译： 投影曝光系统包括被配置为用辐射照射掩模的照明系统。 投影曝光系统还包括被配置为将掩模的图案的图像投影到辐射敏感基板上的投影物镜。 投影曝光系统还包括在物镜表面光学下游的投影光束路径中布置在投影物镜的场表面处或其附近的角度选择滤光器装置。 角度选择滤波器装置可以根据角度选择滤波器功能对入射到滤波器装置上的辐射进行滤波。

公开(公告)号：US20120218536A1

公开(公告)日：2012-08-30

申请号：US13423344

申请日：2012-03-19

申请人： Sascha Bleidistel ,  Toralf Gruner ,  Christoph Zaczek ,  Ralf Mueller

发明人： Sascha Bleidistel ,  Toralf Gruner ,  Christoph Zaczek ,  Ralf Mueller

IPC分类号： G03B27/42

CPC分类号： G03F7/70258 ,  G02B13/143 ,  G02B17/0856 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/706

摘要： A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a measuring device. The reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and transmits a second part of the imaging radiation. The reflected, first part of the imaging radiation at least partly contributes to the imaging of the object field. The transmitted, second part of the imaging radiation is at least partly fed to a measuring device. This allows a simultaneous exposure of the photosensitive layer at the location of the image field with the imaging radiation and monitoring of the imaging radiation with the aid of the measuring device.

摘要翻译： 用于通过成像辐射将物体场映射到图像场上的反射折射投影物镜。 投影物镜包括至少一个反射光学部件和测量装置。 在投影物镜的操作期间，反射光学部件反射成像辐射的第一部分并透射成像辐射的第二部分。 成像辐射的反射的第一部分至少部分地有助于对象场的成像。 成像辐射的透射的第二部分至少部分地被馈送到测量装置。 这允许在成像辐射的图像位置处的感光层同时曝光并借助测量装置监测成像辐射。