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    Method for making an optical system with coated optical components and optical system made by the method
    1.
    发明申请
    Method for making an optical system with coated optical components and optical system made by the method 审中-公开
    用该方法制造具有涂层光学部件和光学系统的光学系统的方法

    公开(公告)号：US20060132917A1

    公开(公告)日：2006-06-22

    申请号：US11274152

    申请日：2005-11-16

    申请人： Christoph Zaczek ,  Thomas Muelders ,  Toralf Gruner

    发明人： Christoph Zaczek ,  Thomas Muelders ,  Toralf Gruner

    IPC分类号： G02B27/28

    CPC分类号： G03F7/70958 ,  G02B27/0012 ,  G02B27/283 ,  G03F7/705

    摘要： In a method for making an optical system for imaging a radiation distribution from an input surface of the optical system into an output surface of the optical system, the optical system has a multiplicity of optical components which determine an imaging quality of the optical system, which are arranged along an optical axis of the optical system and comprise at least one optical component which has a substrate with a substrate surface which is provided for carrying an interference layer system having a layer construction that determines the optical properties of the optical component covered with the interference layer system. The method includes: predefining an optimization target for at least one imaging quality parameter that represents the imaging quality of the system; determining the imaging quality of the optical system while taking account of the layer construction of the interference layer system; and varying the layer construction for approximating the imaging quality parameter to the optimization target. In accordance with the method, the determination of the optimum layer construction is coupled directly with an assessment and of the imaging quality of the total system including the interference layer system to be optimized.

    摘要翻译： 在制造用于将从光学系统的输入表面的辐射分布成像到光学系统的输出表面的光学系统的方法中，光学系统具有多个光学部件，其确定光学系统的成像质量， 沿着光学系统的光轴布置并且包括至少一个光学部件，该光学部件具有衬底，该衬底具有衬底表面，衬底表面被提供用于承载具有层结构的干涉层系统，所述层结构决定了被覆盖的光学部件的光学特性 干涉层系统。 该方法包括：为表示系统的成像质量的至少一个成像质量参数预定义优化目标; 在考虑到干涉层系统的层结构的同时确定光学系统的成像质量; 并且改变用于将成像质量参数近似到优化目标的层结构。 根据该方法，最佳层结构的确定直接与包括要优化的干涉层系统的总体系统的评估和成像质量相耦合。

    Projection Exposure System and Projection Exposure Method
    6.
    发明申请
    Projection Exposure System and Projection Exposure Method 有权
    投影曝光系统和投影曝光方法

    公开(公告)号：US20130182234A1

    公开(公告)日：2013-07-18

    申请号：US13786134

    申请日：2013-03-05

    申请人： Paul Graupner ,  Olaf Conradi ,  Christoph Zaczek ,  Wilhelm Ulrich ,  Helmut Beierl ,  Toralf Gruner ,  Volker Graeschus

    发明人： Paul Graupner ,  Olaf Conradi ,  Christoph Zaczek ,  Wilhelm Ulrich ,  Helmut Beierl ,  Toralf Gruner ,  Volker Graeschus

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70191 ,  G03F7/70308

    摘要： A projection exposure system includes an illumination system configured to illuminate a mask with radiation. The projection exposure system also includes a projection objective configured to project an image of a pattern of the mask onto a radiation-sensitive substrate. The projection exposure system further includes an angle-selective filter arrangement arranged at or close to a field surface of the projection objective in a projection beam path optically downstream of the object surface. The angle-selective filter arrangement is effective to filter radiation incident on the filter arrangement according to an angle-selective filter function.

    摘要翻译： 投影曝光系统包括被配置为用辐射照射掩模的照明系统。 投影曝光系统还包括被配置为将掩模的图案的图像投影到辐射敏感基板上的投影物镜。 投影曝光系统还包括在物镜表面光学下游的投影光束路径中布置在投影物镜的场表面处或其附近的角度选择滤光器装置。 角度选择滤波器装置可以根据角度选择滤波器功能对入射到滤波器装置上的辐射进行滤波。

    CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL COMPONENT AND A MEASURING DEVICE
    7.
    发明申请
    CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL COMPONENT AND A MEASURING DEVICE 审中-公开
    反射光学元件和测量装置的目标投影目标

    公开(公告)号：US20120218536A1

    公开(公告)日：2012-08-30

    申请号：US13423344

    申请日：2012-03-19

    申请人： Sascha Bleidistel ,  Toralf Gruner ,  Christoph Zaczek ,  Ralf Mueller

    发明人： Sascha Bleidistel ,  Toralf Gruner ,  Christoph Zaczek ,  Ralf Mueller

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70258 ,  G02B13/143 ,  G02B17/0856 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/706

    摘要： A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a measuring device. The reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and transmits a second part of the imaging radiation. The reflected, first part of the imaging radiation at least partly contributes to the imaging of the object field. The transmitted, second part of the imaging radiation is at least partly fed to a measuring device. This allows a simultaneous exposure of the photosensitive layer at the location of the image field with the imaging radiation and monitoring of the imaging radiation with the aid of the measuring device.

    摘要翻译： 用于通过成像辐射将物体场映射到图像场上的反射折射投影物镜。 投影物镜包括至少一个反射光学部件和测量装置。 在投影物镜的操作期间，反射光学部件反射成像辐射的第一部分并透射成像辐射的第二部分。 成像辐射的反射的第一部分至少部分地有助于对象场的成像。 成像辐射的透射的第二部分至少部分地被馈送到测量装置。 这允许在成像辐射的图像位置处的感光层同时曝光并借助测量装置监测成像辐射。

    Method for improving the imaging properties of a projection objective for a microlithographic projection exposure apparatus
    10.
    发明授权
    Method for improving the imaging properties of a projection objective for a microlithographic projection exposure apparatus 有权
    用于改善微光刻投影曝光装置的投影物镜的成像特性的方法

    公开(公告)号：US07456933B2

    公开(公告)日：2008-11-25

    申请号：US11220643

    申请日：2005-09-08

    申请人： Ulrich Wegmann ,  Vladimir Kamenov ,  Thomas Muelders ,  Toralf Gruner ,  Markus Mengel

    发明人： Ulrich Wegmann ,  Vladimir Kamenov ,  Thomas Muelders ,  Toralf Gruner ,  Markus Mengel

    IPC分类号： G03B27/54 ,  G03B27/72

    CPC分类号： G03F7/706 ,  G03F7/701 ,  G03F7/70566 ,  G03F7/70591

    摘要： In a method for improving the imaging properties of a projection objective of a microlithographic projection exposure apparatus, an appropriate illumination angle distribution adapted to a mask (24; 224) to be projected is selected. Then locations (40a, 40b; 60a, 60b; 80a, 80b, 80c) in an exit pupil of the projection objective (20), which are illuminated under these conditions by projection light during a projection of the mask, are determined. For at least one image point, an actual value of an imaging quantity, e.g. a wavefront profile or a polarization state, is determined that influences the imaging properties of the projection objective. Finally, corrective measures are calculated such that the actual value of the imaging quantity approximates a desired value at these locations. In this last step, however, deviations of the actual value from the desired value are taken into account exclusively at said locations illuminated in the exit pupil.

    摘要翻译： 在用于改善微光刻投影曝光装置的投影物镜的成像特性的方法中，选择适于投影的掩模（24; 224）的适当的照明角度分布。 然后在投影物镜（20）的出射光瞳处的位置（40a，40b; 60a，60b; 80a，80b，80c）处， 面具，确定。 对于至少一个图像点，成像量的实际值，例如， 确定影响投影物镜的成像特性的波前轮廓或偏振状态。 最后，计算校正措施，使得成像量的实际值在这些位置处接近期望值。 然而，在最后一步中，实际值与期望值的偏差仅在出口光瞳上照亮的所述位置被考虑。