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公开(公告)号：US20100047702A1
公开(公告)日：2010-02-25
申请号：US12610907
申请日：2009-11-02
申请人： Kunie OGATA , Koki Nishimuko , Hiroshi Tomita , Yoshio Kimura , Ryouichi Uemura , Michio Tanaka
发明人： Kunie OGATA , Koki Nishimuko , Hiroshi Tomita , Yoshio Kimura , Ryouichi Uemura , Michio Tanaka
CPC分类号： H01L21/67253 , G03F7/162 , G03F7/3021 , H01L21/6715
摘要： A resist pattern forming method using a coating and developing apparatus and an aligner being connected thereto which are controlled to form a resist film on a surface of a substrate with a base film and a base pattern formed thereon, followed by inspecting at least one of a plurality of measurement items selected from: reflection ratio and film thickness of the base film and the resist film, line width after a development, an accuracy that the base pattern matches with a resist pattern, a defect on the surface after the development, etc. A parameter subject to amendment is selected based on corresponding data of each measurement item, such as the film thickness of the resist and the line width after the development, and amendment of the parameter is performed. This results in a reduced workload of an operator, and the appropriate amendment can be performed.
摘要翻译： 使用涂覆和显影装置和对准器连接的抗蚀剂图案形成方法被控制以在其上形成有基膜和基底图案的基板的表面上形成抗蚀剂膜，然后检查至少一个 选自以下的多个测量项目：基膜和抗蚀剂膜的反射率和膜厚度，显影后的线宽度，基底图案与抗蚀剂图案匹配的精度，显影后的表面上的缺陷等。 基于每个测量项目的对应数据（例如抗蚀剂的膜厚度和显影后的线宽度）来选择修改参数，并且修改参数。 这导致操作者的工作量减少，并且可以执行适当的修改。
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公开(公告)号：US07281869B2
公开(公告)日：2007-10-16
申请号：US11335635
申请日：2006-01-20
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： G03B5/00
CPC分类号： H01L21/67184 , H01L21/00 , H01L21/6715 , H01L21/67178 , H01L21/6719
摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with a case where antireflection films are formed and a case where any antireflection film is not formed. Film forming unit blocks, namely, a TCT layer, a COT layer and a BCT layer, and developing unit blocks, namely, DEV layers, are stacked up in layers in a processing block. The TCT layer, the COT layer and the BCT layer are used selectively in the case where antireflection films are formed and where no antireflection film is formed. The coating and developing system is controlled by a simple carrying program.
摘要翻译： 涂覆显影系统包括：抗蚀剂膜形成单元块和层叠的抗反射膜形成单元块，以形成抗蚀剂膜和抗反射膜下面的抗反射膜以及在小空间中覆盖抗蚀剂膜的抗反射膜。 涂覆和显影系统可以应对形成防反射膜的情况以及没有形成任何抗反射膜的情况。 成膜单位块，即TCT层，COT层和BCT层，以及显影单元块，即DEV层，在处理块中层叠。 在形成防反射膜并且不形成抗反射膜的情况下，TCT层，COT层和BCT层被选择性地使用。 涂层和显影系统由简单的携带程序控制。
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公开(公告)号：US20060164613A1
公开(公告)日：2006-07-27
申请号：US11117566
申请日：2005-04-29
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： G03B27/32
CPC分类号： H01L21/67184 , H01L21/6715 , H01L21/67178 , H01L21/6719
摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.
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公开(公告)号：US20060162646A1
公开(公告)日：2006-07-27
申请号：US11117552
申请日：2005-04-29
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
CPC分类号： H01L21/67184 , H01L21/67173 , H01L21/67178
摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.
摘要翻译： 涂覆显影系统包括：抗蚀剂膜形成单元块和层叠的抗反射膜形成单元块，以形成抗蚀剂膜和抗反射膜下面的抗反射膜以及在小空间中覆盖抗蚀剂膜的抗反射膜。 涂层显影系统能够应对形成防反射膜的情况和没有形成任何抗反射膜的情况，并且需要简单的软件。 成膜单元块，即TCT层B 3，COT层B 4和BCT层B 5以及显影单元块，即DEV层B 1和B 2，层叠在处理块S 2。 在形成防反射膜的情况下，选择性地使用TCT层B 3，COT层B 4和BCT层B 5以及未形成任何抗反射膜的情况。 涂层和显影系统由简单的携带程序和简单的软件控制。
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公开(公告)号：US20060067532A1
公开(公告)日：2006-03-30
申请号：US11235071
申请日：2005-09-27
申请人： Yoshio Kimura , Noriya Sakamoto
发明人： Yoshio Kimura , Noriya Sakamoto
IPC分类号： H04L9/00
CPC分类号： H04L9/0891 , H04L9/0894 , H04L2209/60
摘要： A communication unit of the invention has a ciphering section which ciphers a content signal with a cipher key and outputs a ciphered content signal, a key ciphering section which ciphers the cipher key with the static device key and the dynamic device key preliminarily stored and outputs a ciphered cipher key, communication sections which makes communication in order to record the ciphered content signal in a predetermined unit on the network and record the ciphered cipher key in a predetermined region on the network, and a key updating section which, when the cipher key is abolished, updates the stored dynamic device key.
摘要翻译： 本发明的通信单元具有加密部分，其使用加密密钥对内容信号进行加密，并输出加密的内容信号;密钥加密部分，其利用静态设备密钥加密密钥和预先存储的动态设备密钥，并输出 加密密钥，进行通信的通信部分，以便在网络上的预定单元中记录加密内容信号，并将加密密码密钥记录在网络上的预定区域中;密钥更新部分，当密码密钥为 废除，更新存储的动态设备密钥。
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公开(公告)号：US06984477B2
公开(公告)日：2006-01-10
申请号：US09963527
申请日：2001-09-27
申请人： Kunie Ogata , Koki Nishimuko , Hiroshi Tomita , Yoshio Kimura , Ryouichi Uemura , Michio Tanaka
发明人： Kunie Ogata , Koki Nishimuko , Hiroshi Tomita , Yoshio Kimura , Ryouichi Uemura , Michio Tanaka
CPC分类号： H01L21/67253 , G03F7/162 , G03F7/3021 , H01L21/6715
摘要： A resist pattern forming method using a coating and developing apparatus and an aligner being connected thereto which are controlled to form a resist film on a surface of a substrate with a base film and a base pattern formed thereon, followed by inspecting at least one of a plurality of measurement items selected from: reflection ratio and film thickness of the base film and the resist film, line width after a development, an accuracy that the base pattern matches with a resist pattern, a defect on the surface after the development, etc. A parameter subject to amendment is selected based on corresponding data of each measurement item, such as the film thickness of the resist and the line width after the development, and amendment of the parameter is performed. This results in a reduced workload of an operator, and an appropriate amendment can be performed.
摘要翻译： 使用涂覆和显影装置和对准器连接的抗蚀剂图案形成方法被控制以在其上形成有基膜和基底图案的基板的表面上形成抗蚀剂膜，然后检查至少一个 选自以下的多个测量项目：基膜和抗蚀剂膜的反射率和膜厚度，显影后的线宽度，基底图案与抗蚀剂图案匹配的精度，显影后的表面上的缺陷等。 基于每个测量项目的对应数据（例如抗蚀剂的膜厚度和显影后的线宽度）来选择修改参数，并且修改参数。 这导致操作者的工作量减少，并且可以执行适当的修改。
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公开(公告)号：US06713239B2
公开(公告)日：2004-03-30
申请号：US10108382
申请日：2002-03-29
申请人： Takayuki Toshima , Tsutae Omori , Yoshio Kimura
发明人： Takayuki Toshima , Tsutae Omori , Yoshio Kimura
IPC分类号： G03F730
CPC分类号： G03D5/04 , G03F7/3021 , G03F7/38 , Y10S134/902
摘要： A solution having a photosensitive radical is applied onto a resist film, a developing solution is applied thereonto, and the entire surface of the solution having the photosensitive radical is exposed all at once. Developing of the resist film progresses all at once after a coating film of the solution having the photosensitive radical dissolves in the developing solution, and hence time difference in the start time of developing does not occur in the surface of a substrate, thereby enabling uniform developing and an improvement in line width uniformity (CD value uniformity) in the surface of the substrate.
摘要翻译： 将具有光敏基团的溶液施加到抗蚀剂膜上，将显影液施加到其上，并且具有光敏基团的溶液的整个表面全部被曝光。 在具有感光性自由基的溶液的涂膜溶解在显影液中之后，抗蚀剂膜的显影全部进行，因此在基板表面上不会发生显影开始时间的时间差，从而能够均匀显影 以及衬底表面的线宽均匀性（CD值均匀性）的改善。
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公开(公告)号：US06593045B2
公开(公告)日：2003-07-15
申请号：US09902159
申请日：2001-07-11
申请人： Norikatsu Sato , Kunie Ogata , Yoshio Kimura , Hiroshi Tomita , Seiji Nakashima , Hidehiko Kamiya
发明人： Norikatsu Sato , Kunie Ogata , Yoshio Kimura , Hiroshi Tomita , Seiji Nakashima , Hidehiko Kamiya
IPC分类号： G03F900
CPC分类号： H01L21/67161 , G01N21/9501 , H01L21/67178 , H01L21/67184 , H01L21/67778 , H01L21/67781 , Y10S414/136 , Y10S414/137 , Y10S414/141
摘要： A cassette station, a processing station having a coating unit and a developing unit, and an inspecting station having a film thickness inspecting apparatus and a defect inspecting apparatus are disposed in the direction approximately perpendicular to the direction of the disposition of cassettes of the cassette station in such a manner that the inspecting station is disposed midway between the cassette station and the processing station. In the structure, the inspecting station and the processing station are connected and wafers are automatically transferred among the stations, operations from the substrate process to the inspection can be simplified and the time period necessary therefore can be shortened.
摘要翻译： 具有涂布单元和显影单元的盒式磁带站，具有膜厚度检查装置和缺陷检查装置的检查站沿大致垂直于盒式磁带机的盒的方向的方向设置 以这样的方式，使得检查站位于盒站和处理站之间的中间。 在结构中，检测站和处理站连接，晶片自动转移到站之间，可以简化从基板处理到检查的操作，从而可以缩短所需的时间。
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公开(公告)号：US6161969A
公开(公告)日：2000-12-19
申请号：US412977
申请日：1999-10-06
申请人： Yoshio Kimura , Issei Ueda
发明人： Yoshio Kimura , Issei Ueda
IPC分类号： H01L21/027 , G03F7/20 , G03F7/30 , H01L21/00 , H01L21/677 , H01L21/68 , G03D5/00
CPC分类号： H01L21/67178 , G03F7/7075 , H01L21/67184 , H01L21/67745 , H01L21/67754 , Y10S414/137 , Y10S414/139
摘要： An apparatus for processing a substrate, comprises a cassette station for loading and unloading a cassette storing a plurality of substrates, a sub-transfer arm mechanism arranged in the cassette station, for loading/unloading a substrate into/from the cassette, and a process station for processing a plurality of substrates unloaded from the cassette station, simultaneously in parallel, in which the process station comprises a front-stage station block adjoined to the cassette station and having a plurality of first process units for processing a substrate, a first main transfer arm mechanism arranged in the front-stage station block, for transferring a substrate to/from the sub-transfer arm mechanism and loading/unloading the substrate into/from the first process unit, a rear-stage station block adjoined to the front-stage station block and having a plurality of second process units for processing a substrate, and a second main transfer arm mechanism arranged in the rear-stage station block for transferring a substrate to/from the first main transfer arm mechanism and loading/unloading the substrate into/from the second process unit, a relative positional relationship between the first process units and the first main transfer arm mechanism is substantially the same as that of the second process units and the second main transfer arm mechanism, and the first main transfer arm mechanism also loads/unloads the substrate directly to at least one of second process units belonging to the rear-stage station block.
摘要翻译： 一种用于处理基板的设备，包括用于装载和卸载存储多个基板的盒的盒式放像台，布置在盒式磁带站中的用于将/从盒中装载/卸载基板的副传送臂机构，以及处理 同时并行地处理从盒式磁带站卸载的多个基板的工位，其中处理站包括邻近盒式站的前级站块，并具有用于处理衬底的多个第一处理单元，第一主体 传送臂机构，其布置在前级站块中，用于将基板传送到/从副传送臂机构并将基板装载/卸载到第一处理单元中;后级站块， 并且具有用于处理基板的多个第二处理单元，以及布置在后台的第二主传送臂机构 用于将基板传送到第一主传送臂机构并从第二主处理单元装载/卸载基板的块，第一处理单元和第一主传送臂机构之间的相对位置关系基本上与 的第二主处理单元和第二主传送臂机构，并且第一主传送臂机构还将基板直接加载/卸载到属于后级站块的第二处理单元中的至少一个。
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公开(公告)号：US5908657A
公开(公告)日：1999-06-01
申请号：US946917
申请日：1997-10-09
申请人： Yoshio Kimura , Satoshi Morita , Yuuji Matsuyama
发明人： Yoshio Kimura , Satoshi Morita , Yuuji Matsuyama
CPC分类号： H01L21/6715 , B05B15/0406 , B05D1/005 , B05C11/08
摘要： In the present invention, a waste solution and a exhaust gas are guided together from a drain cup DC into a storing means through common discharge means. Naturally, the gas-liquid separation is performed within the storing means in place of performing the gas-liquid separation within the drain cup DC. Therefore, the waste solution is not solidified within the drain cup so as to plug the common discharge means. Also, a predetermined waste solution is kept stored in the storing means included in the coating apparatus of the present invention, making it possible to permit the surface of the stored waste solution to absorb the mist, and the waste solution is prevented from being solidified within the storing means. Further, since a minimum amount of the exhaust gas is kept discharged even during non-operation of the coating apparatus by using an exhaust gas damper whose degree of opening can be controlled, the waste solution stored in the storing means is prevented from being solidified. Also, the waste solution evaporated within the storing means can be released to the outside.
摘要翻译： 在本发明中，废液和废气通过共同排放装置从排水杯DC一起被引导到存储装置中。 自然地，在储存装置内进行气液分离，代替在排水杯DC内进行气液分离。 因此，废液不会在排水杯内凝固，堵塞普通排放装置。 此外，将预定的废液保存在本发明的涂布装置所包含的储存装置中，使得可以使储存的废液的表面吸收雾气，并且防止废液在其内固化 存储装置。 此外，由于即使在使用能够控制开度的排气阻尼器的涂布装置的非操作期间，排气的最小量也被排出，所以防止存储在存储装置中的废液固化。 此外，在存储装置内蒸发的废液可以释放到外部。
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