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公开(公告)号:US20230413529A1
公开(公告)日:2023-12-21
申请号:US18177060
申请日:2023-03-01
Applicant: Kioxia Corporation
Inventor: Kasumi YASUDA , Hiroki KAWAI
IPC: H10B12/00
CPC classification number: H10B12/33
Abstract: According to one embodiment, a semiconductor device includes a first electrode, a second electrode, a metal oxide semiconductor contacting the first electrode and the second electrode, a gate electrode, and an insulating film disposed between the metal oxide semiconductor and the gate electrode. The metal oxide semiconductor comprises indium, zinc, and niobium.
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公开(公告)号:US20230411530A1
公开(公告)日:2023-12-21
申请号:US18177751
申请日:2023-03-02
Applicant: Kioxia Corporation
Inventor: Hiroki KAWAI
IPC: H01L29/786 , H01L29/423 , H01L23/528 , H10B12/00
CPC classification number: H01L29/78693 , H01L29/42392 , H01L23/5283 , H10B12/30
Abstract: According to one embodiment, a semiconductor device includes an oxide semiconductor layer, an oxide conductor layer disposed on the oxide semiconductor layer, a first oxide layer disposed on the oxide conductor layer and comprising vanadium oxide, and a metal wiring layer disposed on the first oxide layer.
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公开(公告)号:US20230085722A1
公开(公告)日:2023-03-23
申请号:US17687130
申请日:2022-03-04
Applicant: Kioxia Corporation
Inventor: Jieqiong ZHANG , Katsuyoshi KOMATSU , Tadaomi DAIBOU , Takeshi IWASAKI , Hiroki TOKUHIRA , Hiroki KAWAI , Hiroshi TAKEHIRA
IPC: H01L45/00
Abstract: A semiconductor storage device including a phase change memory film having a composition containing at least Ge, Sb, Te, and Se, and containing Se as a design composition ratio to Te in a composition ratio showing a phase change memory property with at least three elements Ge, Sb, and Te. The composition ratio of Se is 33.6 atom % or less.
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公开(公告)号:US20220093851A1
公开(公告)日:2022-03-24
申请号:US17469778
申请日:2021-09-08
Applicant: Kioxia Corporation
Inventor: Hiroshi TAKEHIRA , Katsuyoshi KOMATSU , Tadaomi DAIBOU , Hiroki KAWAI , Yuichi ITO
Abstract: A switching device according to an embodiment includes a switching layer disposed between a first electrode and a second electrode. The switching layer contains a material containing a first cation element Z, Te, and N. This material contains at least 5 atomic % or more of each of Z, Te, and N, and when an atomic ratio of Te is X, an atomic ratio of N is Y, an atomic ratio of Z is W, a ratio of Z2Te3 to ZN on a straight line connecting a compound of the first cation element Z with tellurium and nitride of the first cation element Z in a ternary phase diagram of Z, Te, and N is A, and a change in an N content from the Z2Te3-ZN line is B, the material has a composition satisfying X=1.2 (1−A) (0.5+B), Y=A (0.5+B), and W=1−X−Y, where −0.06≤B≤0.06 is satisfied when ⅓>A and ¾
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公开(公告)号:US20220068925A1
公开(公告)日:2022-03-03
申请号:US17193941
申请日:2021-03-05
Applicant: Kioxia Corporation
Inventor: Hiroki KAWAI , Junji KATAOKA , Keiji IKEDA
IPC: H01L27/108 , H01L29/24 , H01L29/786 , H01L21/02 , H01L29/66
Abstract: A semiconductor device of an embodiment includes an oxide semiconductor layer. The oxide semiconductor layer includes a metal oxide containing at least one first metal element selected from the group consisting of indium and tin and at least one second metal element selected from the group consisting of zinc, gallium, aluminum, tungsten, and silicon. The oxide semiconductor layer includes a first region in which at least one anion element selected from the group consisting of fluorine and chlorine is contained within a range of 1 atomic % or more and less than 8 atomic % in the metal oxide.
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公开(公告)号:US20210288252A1
公开(公告)日:2021-09-16
申请号:US17184871
申请日:2021-02-25
Applicant: Kioxia Corporation
Inventor: Toshihiko NAGASE , Daisuke WATANABE , Yoshitomo KOBAYASHI , Hiroki TOKUHIRA , Hiroki KAWAI
Abstract: A selector includes a first electrode, a second electrode, and a selector layer provided between the first electrode and the second electrode and contains SixTeyNz. The x, y, and z of the SixTeyNz satisfy 0
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