SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MEMORY DEVICE

    公开(公告)号:US20230413529A1

    公开(公告)日:2023-12-21

    申请号:US18177060

    申请日:2023-03-01

    CPC classification number: H10B12/33

    Abstract: According to one embodiment, a semiconductor device includes a first electrode, a second electrode, a metal oxide semiconductor contacting the first electrode and the second electrode, a gate electrode, and an insulating film disposed between the metal oxide semiconductor and the gate electrode. The metal oxide semiconductor comprises indium, zinc, and niobium.

    SWITCHING DEVICE AND RESISTANCE VARIABLE DEVICE

    公开(公告)号:US20220093851A1

    公开(公告)日:2022-03-24

    申请号:US17469778

    申请日:2021-09-08

    Abstract: A switching device according to an embodiment includes a switching layer disposed between a first electrode and a second electrode. The switching layer contains a material containing a first cation element Z, Te, and N. This material contains at least 5 atomic % or more of each of Z, Te, and N, and when an atomic ratio of Te is X, an atomic ratio of N is Y, an atomic ratio of Z is W, a ratio of Z2Te3 to ZN on a straight line connecting a compound of the first cation element Z with tellurium and nitride of the first cation element Z in a ternary phase diagram of Z, Te, and N is A, and a change in an N content from the Z2Te3-ZN line is B, the material has a composition satisfying X=1.2 (1−A) (0.5+B), Y=A (0.5+B), and W=1−X−Y, where −0.06≤B≤0.06 is satisfied when ⅓>A and ¾

    SEMICONDUCTOR DEVICE
    15.
    发明申请

    公开(公告)号:US20220068925A1

    公开(公告)日:2022-03-03

    申请号:US17193941

    申请日:2021-03-05

    Abstract: A semiconductor device of an embodiment includes an oxide semiconductor layer. The oxide semiconductor layer includes a metal oxide containing at least one first metal element selected from the group consisting of indium and tin and at least one second metal element selected from the group consisting of zinc, gallium, aluminum, tungsten, and silicon. The oxide semiconductor layer includes a first region in which at least one anion element selected from the group consisting of fluorine and chlorine is contained within a range of 1 atomic % or more and less than 8 atomic % in the metal oxide.

Patent Agency Ranking