公开(公告)号：US4289377A

公开(公告)日：1981-09-15

申请号：US23268

申请日：1979-03-23

申请人： Yoshiya Matsui ,  Setsuo Minami ,  Noritaka Mochizuki

发明人： Yoshiya Matsui ,  Setsuo Minami ,  Noritaka Mochizuki

IPC分类号： G03B27/50 ,  G02B9/08 ,  G02B17/08 ,  G02B27/18 ,  G03B21/00 ,  G03B21/28 ,  G03B27/52 ,  G03G15/04 ,  H04N9/31 ,  G03B27/48 ,  G02B27/10 ,  G02B27/28

CPC分类号： H04N9/31 ,  G03B21/00 ,  G03B27/527 ,  G03B27/528

摘要： In a projecting apparatus which focuses the image of an object on an intermediate mirror through a lens array and finally projects the reflected image onto a projection plane again through said lens array, a polarizing beam splitter is provided between the object plane and the lens array to reduce the light loss and to compactize the apparatus.

摘要翻译： 在将物体的图像通过透镜阵列聚焦在中间镜上的投影装置中，最后通过所述透镜阵列将反射的图像再次投影到投影平面上，在物平面和透镜阵列之间设置偏振分束器， 降低光损耗并使设备压实。

公开(公告)号：US5153898A

公开(公告)日：1992-10-06

申请号：US841298

申请日：1992-02-28

申请人： Masayuki Suzuki ,  Noritaka Mochizuki ,  Setsuo Minami ,  Shigetaro Ogura ,  Yasuaki Fukuda ,  Yutaka Watanabe ,  Yasuo Kawai ,  Takao Kariya

发明人： Masayuki Suzuki ,  Noritaka Mochizuki ,  Setsuo Minami ,  Shigetaro Ogura ,  Yasuaki Fukuda ,  Yutaka Watanabe ,  Yasuo Kawai ,  Takao Kariya

IPC分类号： G02B17/06 ,  G03F7/20

CPC分类号： B82Y10/00 ,  G02B17/0636 ,  G03F7/2039 ,  G03F7/70033 ,  G03F7/70233 ,  G03F7/7025 ,  G03F7/70691 ,  G03F7/70866 ,  G03F7/70875 ,  G03F7/70883 ,  G03F7/70891

摘要： An X-ray exposure apparatus includes a stage for holding a mask having a pattern for circuit manufacturing, a stage for holding a wafer to be exposed to the pattern of the mask with X-rays, and a reflection reduction imaging system, disposed between the mask stage and the wafer stage, including a reflecting mirror arrangement, containing at least three, but not more than five, reflecting mirrors coated with multi-layer films for receiving X-rays from the mask and directing them to the wafer to expose the wafer to the pattern of the mask with the X-ray in a reduced scale.

摘要翻译： X射线曝光装置包括：用于保持具有用于电路制造的图案的掩模的台，用于将要暴露于掩模的图案的晶片用X射线保持的晶片的台，以及设置在该掩模之间的反射减少成像系统 掩模台和晶片台，包括反射镜装置，其包含涂覆有多层膜的至少三个但不多于五个的反射镜，用于从掩模接收X射线并将其引导到晶片以暴露晶片 以减小的X射线的掩模图案。

公开(公告)号：US4630902A

公开(公告)日：1986-12-23

申请号：US731341

申请日：1985-05-06

申请人： Noritaka Mochizuki ,  Setsuo Minami

发明人： Noritaka Mochizuki ,  Setsuo Minami

IPC分类号： G02B15/00 ,  G02B3/00 ,  G02B27/18 ,  G02B15/04 ,  G02B15/14 ,  G02B27/00

CPC分类号： G02B3/0081

摘要： A compound eye optical system having a variable magnification function includes a first imaging element array having a plurality of imaging elements of the same focal length at an equal pitch, a second imaging element array having a plurality of imaging elements of the same focal length arranged at a pitch different from that of the first imaging element array, the second imaging element array disposed more adjacent to the image side than the first imaging element array, and means for varying the imaging magnification of a composite optical system comprising the first and second imaging element arrays.

摘要翻译： 具有可变放大倍率功能的复眼系统包括具有相同焦距的多个成像元件的第一成像元件阵列，第二成像元件阵列具有相同焦距的多个成像元件， 与第一成像元件阵列不同的节距，与第一成像元件阵列相比更靠近图像侧设置的第二成像元件阵列，以及用于改变包括第一和第二成像元件的复合光学系统的成像倍率的装置 阵列

公开(公告)号：US4189214A

公开(公告)日：1980-02-19

申请号：US880500

申请日：1978-02-23

申请人： Yoshiya Matsui ,  Setsuo Minami ,  Shih Yamaguchi

发明人： Yoshiya Matsui ,  Setsuo Minami ,  Shih Yamaguchi

IPC分类号： G02B9/60 ,  G02B9/62 ,  G02B13/24

CPC分类号： G02B9/60 ,  G02B13/24 ,  G02B9/62

摘要： The present invention includes asymmetrical Fourier transform lens systems for use in performing optical Fourier transforms. The present invention also treats the application of an aberration theory to the design of such lens systems. The aberration theory leads to the conclusion that the lens systems not always necessitate symmetrical configuration and to a provision of necessary conditions which the resulting lens systems should satisfy. One embodiment of the first subsystem comprises at least three lens components each of which is composed of at least two lens elements. In a complete optical Fourier transform lens system, the second subsystem of the same construction as that of the first subsystem is arranged in longitudinally inverted relation thereto.

摘要翻译： 本发明包括用于执行光学傅里叶变换的不对称傅里叶变换透镜系统。 本发明还将像差理论应用于这种透镜系统的设计。 像差理论得出的结论是，透镜系统不总是需要对称配置和提供所得透镜系统应该满足的必要条件。 第一子系统的一个实施例包括至少三个透镜部件，每个透镜部件由至少两个透镜元件组成。 在完整的光学傅里叶变换透镜系统中，与第一子系统相同结构的第二子系统与其纵向相反地布置。

公开(公告)号：US4274733A

公开(公告)日：1981-06-23

申请号：US29109

申请日：1979-04-11

申请人： Muneharu Sugiura ,  Setsuo Minami

发明人： Muneharu Sugiura ,  Setsuo Minami

IPC分类号： G03B27/50 ,  G02B13/24 ,  G03B27/52 ,  G03G15/04 ,  G03B27/34

CPC分类号： G03B27/526

摘要： A copying apparatus comprising a flat stationary original support table, at least a movable mirror for scanning the surface of an original placed on said original support table, and an imaging optical system adapted for focusing the light beam from said movable mirror onto a photosensitive member and capable of compensating the change in the light path length from said original support table to the photosensitive member resulting from the displacement of said movable mirror while maintaining a constant image magnification.

摘要翻译： 一种复印设备，包括平坦的固定原始支撑台，至少一个用于扫描放置在所述原始支撑台上的原稿的表面的可移动镜，以及适于将来自所述可移动镜的光束聚焦到感光元件上的成像光学系统，以及 能够补偿由所述可移动反射镜的位移导致的从所述原始支撑台到感光部件的光路长度的变化，同时保持恒定的图像放大倍率。

公开(公告)号：US4259004A

公开(公告)日：1981-03-31

申请号：US48257

申请日：1979-06-13

申请人： Masamichi Tateoka ,  Toshiaki Asano ,  Kazuo Minoura ,  Setsuo Minami

发明人： Masamichi Tateoka ,  Toshiaki Asano ,  Kazuo Minoura ,  Setsuo Minami

IPC分类号： G02B26/10 ,  G03B27/52 ,  G03G15/04 ,  H04N1/113 ,  G03G15/30

CPC分类号： H04N1/113 ,  G02B26/10 ,  G03B27/526 ,  G03G15/04 ,  G03G15/0435

摘要： A scanning device for scanning a flat scanned surface by means of a rotating or rotatively vibrating deflector. The scanning device is provided with a rotational asymmetric image forming optical system disposed between the deflector and the scanned surface for forming an image of the scanned surface at a substantially equal distance from the deflecting surface of the deflector in the plane defined by the path of movement of the normal to the deflecting surface of the deflector in accordance with the rotation thereof.

摘要翻译： 一种用于通过旋转或旋转振动偏转器扫描平坦扫描表面的扫描装置。 扫描装置设置有设置在偏转器和扫描表面之间的旋转非对称图像形成光学系统，用于在由偏移器的移动路径限定的平面中与偏转器的偏转表面基本相等的距离处形成扫描表面的图像 与偏转器的偏转面垂直的方向。

公开(公告)号：US4251126A

公开(公告)日：1981-02-17

申请号：US45843

申请日：1979-06-05

申请人： Kazuo Minoura ,  Setsuo Minami

发明人： Kazuo Minoura ,  Setsuo Minami

IPC分类号： B41J2/44 ,  G02B26/10 ,  G03G15/30 ,  H04N1/04 ,  H04N1/113 ,  G02B27/17

CPC分类号： H04N1/1135 ,  G02B26/10 ,  G03G15/30 ,  H04N1/04

摘要： A light beam scanning device provided with a rotationally vibrating deflector having at least two deflective and reflective surfaces, a scanning surface subjected to scanning operation with light beam deflected by the deflector, an image-forming optical system interposed between the deflector and the scanning surface to focus the light beam from the deflector onto the scanning surface, and a light source section which emits light beam to the deflector, in which device a first deflected light beam plane to be formed by the deflected light beam immediately before entering the image-forming optical system at the forward movement of the deflector is made parallel with a second deflected light beam plane to be formed by the deflected light beam immediately before entering the image-forming optical system at the return movement of the deflector, and the deflecting direction of each beam to be deflected by the first deflected light beam plane and the second deflected light beam plane is made identical.

摘要翻译： 一种具有旋转振动偏转器的光束扫描装置，其具有至少两个偏转和反射表面，经由偏转器偏转的光束进行扫描操作的扫描表面;插入在偏转器和扫描表面之间的图像形成光学系统， 将来自偏转器的光束聚焦到扫描表面上，以及光源部分，该光源部分向偏转器发射光束，在该光源部分中，设备将在进入图像形成光学器件之前由偏转光束形成的第一偏转光束平面 在偏转器的向前运动的过程中，系统在与偏转光束平行的状态下与偏转的光束平行，偏转的光束在偏转器的返回运动之前立即进入图像形成光学系统之前，并且每个光束的偏转方向 由第一偏转光束平面和第二偏转光束平面偏转 相同。

公开(公告)号：US4352541A

公开(公告)日：1982-10-05

申请号：US971439

申请日：1978-12-20

申请人： Kazuo Minoura ,  Setsuo Minami

发明人： Kazuo Minoura ,  Setsuo Minami

IPC分类号： G02B26/12 ,  G02B9/02 ,  G02B9/04 ,  G02B13/00 ,  G02B26/10 ,  G06T1/00 ,  H04N1/113 ,  G02B27/17 ,  G02B3/02

CPC分类号： G02B13/0005 ,  G02B26/10

摘要： Optical scanning device of this invention includes an optical source to produce light rays, means for deflecting light rays toward a predetermined direction, a surface to be scanned by the deflected light rays, a single lens disposed between the deflecting means and the surface to focus the deflected light rays on the surface to be scanned, a partial optical system consisting of said deflecting means and the single lens having means to move light rays on the surface at a constant speed.

摘要翻译： 本发明的光学扫描装置包括用于产生光线的光源，用于使光线朝向预定方向偏转的装置，被偏转的光线扫描的表面，设置在偏转装置和表面之间的单个透镜，以便聚焦 被扫描表面上的偏转的光线，由所述偏转装置和单个透镜组成的部分光学系统具有以恒定速度移动表面上的光线的装置。

公开(公告)号：US4084881A

公开(公告)日：1978-04-18

申请号：US732408

申请日：1976-10-14

申请人： Yoichi Hirabayashi ,  Setsuo Minami ,  Takeshi Goshima

发明人： Yoichi Hirabayashi ,  Setsuo Minami ,  Takeshi Goshima

IPC分类号： G01R13/38 ,  G02B13/10 ,  G02B26/12 ,  G02B27/00 ,  G02B27/17

CPC分类号： G02B13/10 ,  G01R13/38 ,  G02B26/125 ,  G02B27/0031

摘要： A prism anamorphic optical system is disposed in the path of deflected beam from a rotatable polygonal mirror or a galvano-mirror. This prism anamorphic optical system includes at least two prisms, so that different amounts of displacement of the deflected beam at each angle of deflection and in a direction perpendicular to the direction of deflection caused by the first of the prisms are corrected by the second and subsequent prisms, as viewed from the incidence side. Thus, a straight scanning line may be obtained.

摘要翻译： 棱镜变形光学系统设置在来自可旋转多面镜或电流镜的偏转光束的路径中。 该棱镜变形光学系统包括至少两个棱镜，使得在每个偏转角和与由第一棱镜引起的偏转方向垂直的方向上的偏转光束的不同位移量被第二次和随后的 棱镜，从发生侧看。 因此，可以获得直线扫描线。

公开(公告)号：US06300020B1

公开(公告)日：2001-10-09

申请号：US09041012

申请日：1998-03-12

申请人： Hideki Ina ,  Setsuo Minami

发明人： Hideki Ina ,  Setsuo Minami

IPC分类号： H01L21027

CPC分类号： G03F7/24 ,  G03F1/42 ,  G03F1/50

摘要： A circuit pattern surface curving in correspondence with the surface shape of a ball-like semiconductor device material such as a silicon ball is formed in a reticle. A resist-applied surface of the device material is so exposed as to move the ball-like semiconductor device material close to the circuit pattern surface. In this manner, a circuit pattern is formed on the surface of the ball-like device material.

摘要翻译： 在光罩中形成与硅球等球状半导体器件材料的表面形状对应地弯曲的电路图形表面。 使装置材料的抗蚀剂涂敷表面暴露以使球状半导体器件材料靠近电路图形表面移动。 以这种方式，在球状器件材料的表面上形成电路图案。