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11.发明授权Mask structure for x-ray exposure and x-ray exposure device and method using it 失效X射线曝光和X射线曝光装置的掩模结构及其使用方法
公开(公告)号：US5333167A
公开(公告)日：1994-07-26
申请号：US984527
申请日：1992-12-02
申请人： Takashi Iizuka , Yasuaki Fukuda
发明人： Takashi Iizuka , Yasuaki Fukuda
CPC分类号： G03F1/22 , G03F7/707 , G03F9/7053 , G21K1/06
摘要： A mask structure for X-ray exposure comprises a retaining frame, a supporting frame, a mask support and an absorber pattern. The mask structure possesses a function for detecting a state change of the mask structure from its steady state.
摘要翻译： 用于X射线曝光的掩模结构包括保持框架，支撑框架，掩模支撑件和吸收体图案。 掩模结构具有用于检测掩模结构从其稳定状态的状态变化的功能。
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公开(公告)号：US5159621A
公开(公告)日：1992-10-27
申请号：US739259
申请日：1991-08-01
申请人： Yutaka Watanabe , Shunichi Uzawa , Yasuaki Fukuda , Nobutoshi Mizusawa , Ryuichi Ebinuma , Mitsuaki Amemiya
发明人： Yutaka Watanabe , Shunichi Uzawa , Yasuaki Fukuda , Nobutoshi Mizusawa , Ryuichi Ebinuma , Mitsuaki Amemiya
CPC分类号： G21K5/04 , H01J2235/18
摘要： An X-ray transmitting window for use in X-ray lithography, for allowing transmission therethrough of X-rays from a vacuum ambience to a different ambience, includes an X-ray transmitting film, and a gasket material gas-tightly provided on at least one of opposite surfaces in a peripheral portion of the X-ray transmitting film. The gasket material has a Brinell hardness smaller than that of the X-ray transmitting film. The formed X-ray transmitting window is able to be sandwiched and fastened between a pair of flanges in a gas-tight manner.
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公开(公告)号：US5123036A
公开(公告)日：1992-06-16
申请号：US735691
申请日：1991-07-22
CPC分类号： G03F7/702 , G21K1/06 , G21K2201/064
摘要： An X-ray exposure apparatus for exposing a resist on a substrate to a pattern of an original includes a radiation source for providing X-rays; and an illumination system for irradiating the original and the substrate with the X-rays such that the resist of the substrate is exposed to the pattern of the original with the X-rays; wherein the illumination system has a convex mirror having a reflection surface of a shape like a cylindrical surface, for reflecting the X-rays from the radiation source to the original; and wherein the reflection surface of the mirror has such an aspherical surface shape that, with respect to a top of the reflection surface, a radiation source side and an original side are asymmetrical in shape, that, in the neighborood of the top, the radiation source side has a radius of curvature smaller than that of the original side, and that at a peripheral potion the reflection surface has a curvature of a radius larger than that at the top of the reflection surface.
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公开(公告)号：US5101420A
公开(公告)日：1992-03-31
申请号：US689092
申请日：1991-04-22
申请人： Nobuo Kushibiki , Hideo Kato , Akira Miyake , Yasuaki Fukuda
发明人： Nobuo Kushibiki , Hideo Kato , Akira Miyake , Yasuaki Fukuda
CPC分类号： G03F1/22 , G03F7/707 , G03F7/70858 , G03F7/70891
摘要： An X-ray mask support comprises a support frame and a support film, wherein both of the support frame and the support film have a thermal expansion coefficient of not more than 1.times.10.sup.-5 K.sup.-1 or wherein the thermal expansion coefficient of the support film does not exceed that of the support flame or wherein both the support frame and the support film have a thermal expansion coefficient of not more than 1.times.10.sup.-5 K.sup.-1 and the support film has a surface roughness at least on the mask surface, of not more than 10 nm r.m.s. Basically a process for preparing the X-ray support film comprises the steps of forming a film on a substrate and sintering the film.
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公开(公告)号：US07657219B2
公开(公告)日：2010-02-02
申请号：US11467207
申请日：2006-08-25
IPC分类号： G03G15/00
CPC分类号： G03G15/6573 , G03G2215/00421
摘要： An image forming apparatus including: a paper feed cassette; a paper pickup roller; an image forming portion; a fixing unit; a paper discharge portion for discharging paper P with a developer image fused and fixed thereon; and an inversion roller and a paper discharge drive roller for conveying paper P along a paper conveyance path, and is constructed such that guide ribs are provided for a curved portion in a main conveyance path and the first and second curved portions of a sub conveyance path are provided in shapes that will not cause concentration of stress acting on the paper P in abutment.
摘要翻译： 一种图像形成装置，包括：供纸盒; 拾纸辊; 图像形成部分; 固定单元; 纸张排出部分，用于在其上融合和固定的显影剂图像排出纸张P; 以及用于沿着纸张输送路径传送纸张P的反转辊和排纸驱动辊，并且被构造成使得在主传送路径中的弯曲部分设置有引导肋，并且副传送路径的第一和第二弯曲部分 设置成不会引起作用在纸张P上的应力集中的形状。
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公开(公告)号：US5656398A
公开(公告)日：1997-08-12
申请号：US479358
申请日：1995-06-07
申请人： Takeshi Miyachi , Yasuaki Fukuda , Keiko Chiba
发明人： Takeshi Miyachi , Yasuaki Fukuda , Keiko Chiba
CPC分类号： G03F1/22
摘要： A method of making an X-ray mask structure having an X-ray absorber in a desired pattern on the surface of a support film held by a frame. The method includes a step of patterning the X-ray absorber, including a drawing step that utilizes charged particles, and a step of thereafter providing the frame with a magnetic member. The frame and the support film each include a non-magnetic material.
摘要翻译： 一种在由框架保持的支撑膜的表面上制造具有期望图案的X射线吸收体的X射线掩模结构的方法。 该方法包括图案化X射线吸收体的步骤，包括利用带电粒子的拉伸步骤，以及此后向框架提供磁性部件的步骤。 框架和支撑膜各自包括非磁性材料。
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公开(公告)号：US5606586A
公开(公告)日：1997-02-25
申请号：US678784
申请日：1996-07-11
CPC分类号： G03F7/70075 , G03F7/2039 , G03F7/702 , B29C2035/0844
摘要： An exposure method using X-rays from a synchrotron radiation source includes determining a relationship between an X-ray intensity distribution and an exposure amount distribution in an exposure area; and effecting exposure operation while controlling a dose amount for respective positions in the exposure area using the relationship, wherein the dose amount is controlled by changing a driving profile of a movable shutter for controlling the exposure operation, and wherein the relationship is in the form of a proportional coefficient between an X-ray intensity and the exposure amount as a function of position information in the exposure area.
摘要翻译： 使用来自同步加速器辐射源的X射线的曝光方法包括确定曝光区域中的X射线强度分布与曝光量分布之间的关系; 以及通过使用关系控制曝光区域中的各个位置的剂量量来进行曝光操作，其中通过改变用于控制曝光操作的活动快门的驱动轮廓来控制剂量，并且其中的关系为 作为曝光区域中的位置信息的函数的X射线强度与曝光量之间的比例系数。
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公开(公告)号：US5356686A
公开(公告)日：1994-10-18
申请号：US182513
申请日：1994-01-14
申请人： Hidehiko Fujioka , Takeshi Miyachi , Yasuaki Fukuda , Yuji Chiba , Nobutoshi Mizusawa , Takao Kariya , Shunichi Uzawa
发明人： Hidehiko Fujioka , Takeshi Miyachi , Yasuaki Fukuda , Yuji Chiba , Nobutoshi Mizusawa , Takao Kariya , Shunichi Uzawa
CPC分类号： G03F1/22 , G03F7/70866 , Y10T428/21 , Y10T428/24612 , Y10T428/24851
摘要： An X-ray mask structure includes a mask substrate having a pattern; a supporting frame for carrying and supporting the mask substrate; and an adhesive material for fixing the mask substrate to the supporting frame; wherein a stress releasing groove is formed in at least one of the mask substrate and the supporting frame.
摘要翻译： X射线掩模结构包括具有图案的掩模基板; 用于承载和支撑掩模基板的支撑框架; 以及用于将掩模基板固定到支撑框架的粘合材料; 其中在所述掩模基板和所述支撑框架中的至少一个中形成有应力释放槽。
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19.发明授权X-ray exposure process for preventing electrostatic attraction or contact of X-ray masks 失效用于防止X射线掩模的静电吸引或接触的X射线曝光工艺
公开(公告)号：US5048066A
公开(公告)日：1991-09-10
申请号：US624521
申请日：1990-12-10
申请人： Yasuaki Fukuda
发明人： Yasuaki Fukuda
CPC分类号： G03F1/22 , G03F7/70691
摘要： Provided are an X-ray mask support member, an X-ray mask, and an X-ray exposure process using the X-ray mask, that can effectively prevent the phenomenon of electrostatic attraction or contact of X-ray masks by appropriately disposing an X-ray mask support membrane in an exposure apparatus that employs soft X-rays. A high precision alignment can be performed.
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公开(公告)号：US5607733A
公开(公告)日：1997-03-04
申请号：US475464
申请日：1995-06-07
CPC分类号： G03F1/22
摘要： A process for preparing an X-ray mask structure comprises an X-ray transmissive film, an X-ray absorptive member held on the X-ray transmissive film and supporting frame for supporting the X-ray transmissive film. The X-ray absorptive member is constituted of crystalline grains having a grain boundary size of 1 .mu.m or larger, or has a density of 90% or more relative to the density of the bulk material.
摘要翻译： 制备X射线掩模结构的方法包括X射线透过膜，X射线透射膜上保持的X射线吸收元件和用于支撑X射线透过膜的支撑框架。 X射线吸收构件由晶粒尺寸为1μm以上的晶粒构成，或者相对于散装材料的密度为90％以上的密度。
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