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34 条记录 (耗时 0.036 秒)

    X-ray mask, and exposure apparatus and device production using the mask
    3.
    发明授权
    X-ray mask, and exposure apparatus and device production using the mask 失效
    X射线掩模，以及使用掩模的曝光装置和装置制造

    公开(公告)号：US5485495A

    公开(公告)日：1996-01-16

    申请号：US286904

    申请日：1994-08-08

    申请人： Takeshi Miyachi ,  Nobutoshi Mizusawa ,  Shinichi Hara ,  Hiroshi Maehara

    发明人： Takeshi Miyachi ,  Nobutoshi Mizusawa ,  Shinichi Hara ,  Hiroshi Maehara

    IPC分类号： G03F1/22 ,  G03F7/20 ,  G21K5/04 ,  H01L21/027 ,  G21K5/00

    CPC分类号： G03F1/22 ,  G03F7/70783 ,  G21K5/04

    摘要： A method of producing an X-ray mask includes a step of forming a mask pattern on a mask substrate having an amount of warp, and a step of bonding the mask substrate to a mask frame. In both steps, the mask substrate maintains a shape obtained due to the amount of warp. Since the mask substrate is fixed to the mask frame in a warped state, distortion is not produced in the mask pattern. As a result, an X-ray mask, which is suitable for very precise exposure, is provided.

    摘要翻译： 制造X射线掩模的方法包括在具有翘曲量的掩模基板上形成掩模图案的步骤，以及将掩模基板接合到掩模框架的步骤。 在两个步骤中，掩模基板保持由于翘曲量而获得的形状。 由于掩模基板以翘曲状态固定在荫罩框架上，所以在掩模图案中不产生畸变。 因此，提供了适合于非常精确的曝光的X射线掩模。

    Method of making X-ray mask structure
    4.
    发明授权
    Method of making X-ray mask structure 失效
    制作X光掩模结构的方法

    公开(公告)号：US5656398A

    公开(公告)日：1997-08-12

    申请号：US479358

    申请日：1995-06-07

    申请人： Takeshi Miyachi ,  Yasuaki Fukuda ,  Keiko Chiba

    发明人： Takeshi Miyachi ,  Yasuaki Fukuda ,  Keiko Chiba

    IPC分类号： G03F1/22 ,  G03F9/00

    CPC分类号： G03F1/22

    摘要： A method of making an X-ray mask structure having an X-ray absorber in a desired pattern on the surface of a support film held by a frame. The method includes a step of patterning the X-ray absorber, including a drawing step that utilizes charged particles, and a step of thereafter providing the frame with a magnetic member. The frame and the support film each include a non-magnetic material.

    摘要翻译： 一种在由框架保持的支撑膜的表面上制造具有期望图案的X射线吸收体的X射线掩模结构的方法。 该方法包括图案化X射线吸收体的步骤，包括利用带电粒子的拉伸步骤，以及此后向框架提供磁性部件的步骤。 框架和支撑膜各自包括非磁性材料。

    METHOD OF MANUFACTURING IMAGE DISPLAY DEVICE AND METHOD OF DIVIDING DEVICE
    5.
    发明申请
    METHOD OF MANUFACTURING IMAGE DISPLAY DEVICE AND METHOD OF DIVIDING DEVICE 失效
    制造图像显示装置的方法和分割装置的方法

    公开(公告)号：US20070275493A1

    公开(公告)日：2007-11-29

    申请号：US11749310

    申请日：2007-05-16

    申请人： Takeshi Miyachi ,  Masaaki Furuya

    发明人： Takeshi Miyachi ,  Masaaki Furuya

    IPC分类号： H01L21/00

    CPC分类号： G02F1/133351 ,  H01L21/78

    摘要： A manufacturing method of manufacturing an image display device having a wiring and a display element electrically connected to the wiring, comprises a step of dividing a device having the wiring and a substrate holding the wiring, at a predetermined division position, and the dividing step further comprises a step of dividing the substrate at the predetermined division position, and a step of dividing the wiring at the predetermined division position. The step of dividing the wiring is executed in a method different from a method in the step of dividing the substrate. Thus, the device constituting the image display device can be suitably divided.

    摘要翻译： 一种制造具有布线的图像显示装置的制造方法和与布线电连接的显示元件，包括在预定分割位置分割具有布线的装置和保持布线的基板的步骤，以及分割步骤 包括在预定分割位置分割基板的步骤，以及在预定分割位置分割布线的步骤。 以与分割基板的步骤中的方法不同的方法执行分割布线的步骤。 因此，可以适当地划分构成图像显示装置的装置。

    X-ray mask structure and method of making the same
    6.
    发明授权
    X-ray mask structure and method of making the same 有权
    X射线掩模结构及其制作方法

    公开(公告)号：US06258492B1

    公开(公告)日：2001-07-10

    申请号：US09383626

    申请日：1999-08-26

    申请人： Takeshi Miyachi

    发明人： Takeshi Miyachi

    IPC分类号： G03F900

    CPC分类号： G03F1/22 ,  G03F7/70433

    摘要： A method of producing a mask for use in lithography is disclosed, wherein a structure having a membrane and a mask substrate for supporting the membrane are prepared, while a pattern is to be formed on the membrane, wherein a force is applied to the structure so that distortion is produced in the membrane, and wherein a pattern is formed on the membrane with the force being applied to the membrane, whereby accurate magnification correction can be accomplished.

    摘要翻译： 公开了一种制造用于光刻的掩模的方法，其中制备具有用于支撑膜的膜和掩模基板的结构，同时在膜上形成图案，其中力施加到结构上 在膜中产生变形，并且其中在膜上形成图案，其中力施加到膜上，由此可以实现精确的放大校正。

    Liquid-jet recording head
    10.
    发明授权
    Liquid-jet recording head 失效
    液体喷射记录头

    公开(公告)号：US4450457A

    公开(公告)日：1984-05-22

    申请号：US409504

    申请日：1982-08-19

    申请人： Takeshi Miyachi ,  Hisanori Tsuda ,  Toshitami Hara ,  Yukio Kasugayama

    发明人： Takeshi Miyachi ,  Hisanori Tsuda ,  Toshitami Hara ,  Yukio Kasugayama

    IPC分类号： B41J2/05 ,  B41J2/14 ,  B41J2/16 ,  G01D15/18

    CPC分类号： B41J2/14129 ,  B41J2/1604 ,  B41J2/1623 ,  B41J2/1626 ,  B41J2/1631 ,  B41J2/1642 ,  B41J2/1645 ,  B41J2/1646

    摘要： A liquid-jet recording head provided with a liquid ejecting section comprising an orifice for ejecting a liquid to form its flying droplets and a liquid flow path communicating with the orifice and having as a portion of the constitution a heat action zone where thermal energy for forming said droplets acts on the liquid and with an electro-thermal transducer comprising at least one pair of opposing electrodes electrically connecting to a heat-generating resistance layer formed on a base plate and a heat generating part formed between the electrodes, characterized by having a protective layer composed of a first layer of an organic material and a second layer of an inorganic material which are laminated on the portion of the electrode under the liquid flow path in that order from the electrode side.

    摘要翻译： 一种液体喷射记录头，其具有液体喷射部分，该液体喷射部分包括用于喷射液体以形成其飞行液滴的孔口和与该孔口连通的液体流动通道，并且具有作为部分结构的热作用区域，其中形成热能的热作用区域 所述液滴作用在液体上，并具有电热换能器，该电热换能器包括电连接到形成在基板上的发热电阻层和形成在电极之间的发热部分的至少一对相对电极，其特征在于具有保护 由电极侧依次层叠在液体流路下方的电极部分上的由有机材料的第一层和第二无机材料层构成的层。