公开(公告)号：US20110286094A1

公开(公告)日：2011-11-24

申请号：US13137214

申请日：2011-07-28

申请人： Yuriko Kaida ,  Hiroshi Sakamoto ,  Takahira Miyagi ,  Hiromi Sakurai ,  Yasuhiro Ikeda ,  Eiji Shidoji

发明人： Yuriko Kaida ,  Hiroshi Sakamoto ,  Takahira Miyagi ,  Hiromi Sakurai ,  Yasuhiro Ikeda ,  Eiji Shidoji

IPC分类号： G02B5/30 ,  C08J7/04 ,  B05D5/06

CPC分类号： G02B5/3058

摘要： Provided are a wire-grid polarizer, which has not only a high degree of polarization, a high p-polarized light transmittance and a high s-polarized light reflectance but also a low angle dependency and a low wavelength dependency in terms of optical properties in a visible light region, and a process for producing the same.A wire-grid polarizer 10 comprising a light-transmitting substrate 14 having a plurality of ridges 12 formed in parallel to one another at certain pitches Pp through respective flat portions 13 disposed between adjacent ridges 12, each of the ridges having a width gradually reduced from a base portion to a top portion thereof, and a metal layer 20 composed of metal or a metal compound, the metal layer covering the entirety of a first lateral face 16 of each ridge 12 and a part of the flat portion 13 adjacent to the first lateral face 16 such that a second lateral face 18 of each ridge 12 is covered with no metal layer or is partially covered with the metal layer; and a process for forming the metal layer 20 by vapor-depositing metal or a metal compound on the first lateral face from a direction that is substantially orthogonal to a longitudinal direction of the ridges 12 and forms an angle of from 25 to 40 degrees toward the first lateral face 16 with respect to a height direction of the ridge 12 under conditions where the metal layer is disposed at a deposition amount of from 40 to 60 nm.

摘要翻译： 提供一种线栅偏振器，其具有不仅高度偏振，高p偏振光透射率和高s偏振光反射率，而且在光学性能方面具有低角度依赖性和低波长依赖性 可见光区域及其制造方法。 一种线栅偏振器10，其包括透光基板14，透光基板14具有通过设置在相邻凸条12之间的相应平坦部分13以一定的间距Pp彼此平行地形成的多个脊12，每个脊具有从 其顶部的基部和由金属或金属化合物构成的金属层20，覆盖每个脊12的第一侧面16的整体的金属层和邻近第一边的平坦部13的一部分 侧面16，使得每个脊12的第二侧面18被覆盖没有金属层或部分被金属层覆盖; 以及通过从与脊12的长度方向基本正交的方向在第一侧面上蒸镀金属或金属化合物而形成金属层20的工序，并且朝向 在金属层以40〜60nm的沉积量配置的条件下，相对于脊12的高度方向的第一侧面16。

公开(公告)号：US07749622B2

公开(公告)日：2010-07-06

申请号：US11110849

申请日：2005-04-21

申请人： Tomohiro Yamada ,  Eiji Shidoji ,  Akira Mitsui ,  Takuji Oyama ,  Toshihisa Kamiyama

发明人： Tomohiro Yamada ,  Eiji Shidoji ,  Akira Mitsui ,  Takuji Oyama ,  Toshihisa Kamiyama

IPC分类号： G11B11/105 ,  C09J7/02 ,  B32B9/00 ,  B32B19/00 ,  F21V9/04 ,  G02B1/10 ,  G02B27/14

CPC分类号： C23C14/10 ,  C23C14/083 ,  H01Q1/1271 ,  Y10T428/26 ,  Y10T428/266

摘要： A multilayer film-coated substrate having the stress of the film relaxed by depositing a multilayer film comprising a metal oxide film and a silicon oxide film on a substrate at a high speed by a sputtering method using a conductive sputtering material, and a process for producing a multilayer film-coated substrate having such a low stress, are presented.A multilayer film-coated substrate comprising a substrate and at least a metal oxide film and a silicon oxide film laminated thereon repeatedly at least once, wherein at least one layer of said metal oxide film is a metal oxide film deposited by sputtering by using, as the target material, a metal oxide MOX which is deficient in oxygen than the stoichiometric composition, to have the oxygen deficiency resolved, and the stress of the multilayer film is from −100 MPa to +100 MPa.

摘要翻译： 通过使用导电性溅射材料的溅射法，通过在基板上高速沉积包含金属氧化物膜和氧化硅膜的多层膜而使薄膜的应力弛豫的多层膜被覆基板，以及制造方法 提出了具有如此低应力的多层膜涂覆的基板。 一种多层膜被覆基板，包括基板和至少一层金属氧化物膜和氧化硅膜，其上重复层叠至少一次，其中至少一层所述金属氧化物膜是通过溅射沉积的金属氧化物膜，其通过使用作为 目标材料，缺氧比化学计量组成的金属氧化物MOX，氧缺陷分解，多层膜的应力为-100MPa〜+100MPa。

公开(公告)号：US5150232A

公开(公告)日：1992-09-22

申请号：US413072

申请日：1989-09-27

申请人： Tomoki Gunkima ,  Masanori Yuki ,  Masaya Kunigita ,  Yoshinori Hirai ,  Yukio Yoshikawa ,  Eiji Shidoji

发明人： Tomoki Gunkima ,  Masanori Yuki ,  Masaya Kunigita ,  Yoshinori Hirai ,  Yukio Yoshikawa ,  Eiji Shidoji

IPC分类号： G02F1/1334 ,  G09F19/18 ,  H04N9/31

CPC分类号： H04N9/3105 ,  G02F1/1334 ,  G09F19/18 ,  G02F2202/40

摘要： An active matrix liquid crystal display element and a projection type active matrix liquid crystal display device by which a display can be obtained which is good in color balance and high in brightness and also in contrast ratio. The display element includes a liquid crystal material held between an active matrix substrate and a counter electrode substrate. The liquid crystal material is formed from a liquid crystal polymer composite wherein nematic liquid is contained dispersively in a polymer matrix having a refractive index which coincides with the ordinary refractive index of the liquid crystal used, and a silicon thin film transistor is used as an active element on the active matrix substrate. The display device includes such an active matrix liquid crystal display element, a light source for projection light, and an optical system of projection.

公开(公告)号：US20110096396A1

公开(公告)日：2011-04-28

申请号：US12986612

申请日：2011-01-07

申请人： Yuriko KAIDA ,  Hiroshi Sakamoto ,  Takahira Miyagi ,  Kosuke Takayama ,  Hiromi Sakurai ,  Eiji Shidoji

发明人： Yuriko KAIDA ,  Hiroshi Sakamoto ,  Takahira Miyagi ,  Kosuke Takayama ,  Hiromi Sakurai ,  Eiji Shidoji

IPC分类号： G02B5/30 ,  B05D5/12

CPC分类号： C23C14/225 ,  C23C14/024 ,  C23C14/205 ,  G02B5/3058

摘要： A wire-grid polarizer having a high polarization separation ability in the visible light region and an improved transmittance in a short wavelength region, and a process for easily producing such a wire-grid polarizer, are provided.A wire-grid polarizer 10 comprising a light-transmitting substrate 14 having a surface on which a plurality of ridges 12 are formed in parallel with one another at a predetermined pitch; an underlayer 22 made of a metal oxide and present at least on a top portion of each ridge 12; and a metal wire made of a metal layer 24 and present on a surface of the underlayer 22 to cover at least a top portion of each ridge 12.

摘要翻译： 提供了在可见光区域具有高极化分离能力和在短波长区域中改善的透射率的线栅偏振器，以及用于容易地生产这种线栅偏振器的方法。 一种线栅偏振器10，其包括具有以预定间距彼此平行地形成有多个脊12的表面的透光基板14; 由金属氧化物制成的底层22至少存在于每个脊12的顶部; 以及由金属层24制成的金属线，其存在于下层22的表面上，以覆盖每个脊12的至少顶部。

公开(公告)号：US20060032739A1

公开(公告)日：2006-02-16

申请号：US11256941

申请日：2005-10-25

申请人： Toru Ikeda ,  Takahiro Mashimo ,  Eiji Shidoji ,  Toshihisa Kamiyama ,  Yoshihito Katayama

发明人： Toru Ikeda ,  Takahiro Mashimo ,  Eiji Shidoji ,  Toshihisa Kamiyama ,  Yoshihito Katayama

IPC分类号： C23C14/32

CPC分类号： G02B1/10 ,  C23C14/0042 ,  C23C14/0094 ,  C23C14/083 ,  C23C14/10

摘要： The invention provides a method for producing a silicon oxide film, whereby a film having uniform optical constants such as refractive index, absorption coefficient, etc. can be formed continuously at a high deposition rate. A method for producing a silicon oxide film, which comprises depositing a silicon oxide film on a substrate by carrying out AC sputtering by using a sputtering target comprising silicon carbide and silicon with a ratio in number of atoms of C to Si being from 0.5 to 0.95, in an atmosphere containing an oxidizing gas, with an alternating current having a frequency of from 1 to 1,000 kHz.

摘要翻译： 本发明提供一种制造氧化硅膜的方法，由此可以以高沉积速率连续地形成具有均匀光学常数如折射率，吸收系数等的膜。 一种制造氧化硅膜的方法，其包括通过使用包含碳化硅和硅的溅射靶进行AC溅射在基板上沉积氧化硅膜，其中C与Si的原子数之比为0.5至0.95 在含有氧化气体的气氛中，具有频率为1至1,000kHz的交流电。

公开(公告)号：US6122021A

公开(公告)日：2000-09-19

申请号：US350175

申请日：1994-11-30

申请人： Yoshinori Hirai ,  Satoshi Niiyama ,  Tomoki Gunjima ,  Masanori Yuki ,  Masaya Kunigita ,  Yukio Yoshikawa ,  Eiji Shidoji

发明人： Yoshinori Hirai ,  Satoshi Niiyama ,  Tomoki Gunjima ,  Masanori Yuki ,  Masaya Kunigita ,  Yukio Yoshikawa ,  Eiji Shidoji

IPC分类号： G02F1/1334 ,  G09F19/18 ,  H04N9/31 ,  G02F1/1333 ,  G02F1/1335

CPC分类号： G09F19/18 ,  G02F1/1334 ,  H04N9/3105 ,  H04N9/3144 ,  G02F2202/40

摘要： A liquid crystal display element comprises a pair of substrates provided with electrodes and a liquid crystal and solidified matrix composite material, disposed between the pair of substrates, which includes a nematic liquid crystal dispersed and held in a solidified matrix, the nematic liquid crystal being such that the refractive index of the liquid crystal is changed depending on states of applying a voltage wherein in a state, the refractive index of the liquid crystal substantially coincides with that of the solidified matrix to thereby pass light, and in the other state, the former does not coincide with the latter to thereby cause the scattering of light, wherein the refractive index anisotropy .DELTA.n of the liquid crystal used is 0.18 or higher, and the dielectric anisotropy .DELTA..epsilon..sub.LC of the liquid crystal used satisfies the relation of 5

摘要翻译： 液晶显示元件包括设置有电极的一对基板和设置在一对基板之间的液晶和固化基质复合材料，其包括分散并保持在固化基质中的向列型液晶，向列型液晶为 液晶的折射率根据施加电压的状态而变化，其中在状态下，液晶的折射率基本上与固化的基质的折射率一致，从而使光通过，而在另一种状态下，前者 与后者不一致，从而引起光的散射，其中使用的液晶的折射率各向异性DELTA n为0.18或更高，并且所使用的液晶的介电各向异性DELTAεLC满足关系式5

公开(公告)号：US5386306A

公开(公告)日：1995-01-31

申请号：US886946

申请日：1992-05-22

申请人： Tomoki Gunjima ,  Masanori Yuki ,  Masaya Kunigita ,  Yoshinori Hirai ,  Yukio Yoshikawa ,  Eiji Shidoji

发明人： Tomoki Gunjima ,  Masanori Yuki ,  Masaya Kunigita ,  Yoshinori Hirai ,  Yukio Yoshikawa ,  Eiji Shidoji

IPC分类号： G02F1/1334 ,  G09F19/18 ,  H04N9/31 ,  G02F1/13

CPC分类号： H04N9/3105 ,  G02F1/1334 ,  G09F19/18 ,  G02F2202/40

摘要： An active matrix liquid crystal display element and a projection type active matrix liquid crystal display device by which a display can be obtained which is good in color balance and high in brightness and also in contrast ratio. The display element includes a liquid crystal material held between an active matrix substrate and a counter electrode substrate. The liquid crystal material is formed from a liquid crystal polymer composite wherein nematic liquid crystal is contained dispersively in a polymer matrix having a refractive index which coincides with the ordinary refractive index of the liquid crystal used, and a silicon thin film transistor is used as an active element on the active matrix substrate. The display device includes such an active matrix liquid crystal display element, a light source for projection light, and an optical system of projection.

摘要翻译： 有源矩阵液晶显示元件和投影型有源矩阵液晶显示器件，通过该有源矩阵液晶显示元件可以获得色彩平衡好，亮度高，对比度高的显示器。 显示元件包括保持在有源矩阵基板和对电极基板之间的液晶材料。 液晶材料由液晶聚合物复合体形成，其中向列型液晶分散地分散在具有与所用液晶的普通折射率一致的折射率的聚合物基质中，硅薄膜晶体管用作 有源矩阵衬底上的有源元件。 显示装置包括这样的有源矩阵液晶显示元件，投影光源和投影光学系统。

公开(公告)号：US08709317B2

公开(公告)日：2014-04-29

申请号：US13467010

申请日：2012-05-08

申请人： Yuriko Kaida ,  Hiroshi Sakamoto ,  Takahira Miyagi ,  Kosuke Takayama ,  Eiji Shidoji

发明人： Yuriko Kaida ,  Hiroshi Sakamoto ,  Takahira Miyagi ,  Kosuke Takayama ,  Eiji Shidoji

IPC分类号： B29C33/38

CPC分类号： G03F7/0002 ,  B29C33/424 ,  B29C33/56 ,  B82Y10/00 ,  B82Y40/00

摘要： To provide a mold for nanoimprinting capable of accurately transcribing a fine concavo-convex structure, available at a low cost and having high durability, its production process, and processes for producing a molded resin having a fine concavo5 convex structure on its surface having the fine concavo-convex structure of the mold accurately transcribed, and a wire-grid polarizer, with high productivity. A mold 10 for nanoimprinting having on its mold surface a fine concavo-convex structure comprising a plurality of grooves 14 formed in parallel with one another at a constant pitch, which comprises a mold base 12 made of a resin having on its surface a 10 fine concavo-convex structure to be the base of the fine concavo-convex structure, a metal oxide layer 16 covering the surface having the fine concavo-convex structure of the mold base 12, and a release layer 18 covering the surface of the metal oxide layer 16, is used.

摘要翻译： 本发明提供一种能够精确地转录低成本，高耐久性的微细凹凸结构的纳米压印用模具及其制造方法，其表面具有细微凹凸结构的成型树脂的制造方法 模具的凹凸结构精确转录，并且线栅偏振器具有高生产率。 一种用于纳米压印的模具10，其在其模具表面上具有细小的凹凸结构，其包括以恒定间距彼此平行地形成的多个凹槽14，其包括由其表面上具有10微米的树脂制成的模具底座12 作为微细凹凸结构的基底的凹凸结构，覆盖具有模座12的微细凹凸结构的表面的金属氧化物层16和覆盖金属氧化物层的表面的剥离层18 16，被使用。

公开(公告)号：US07842168B2

公开(公告)日：2010-11-30

申请号：US11256941

申请日：2005-10-25

申请人： Toru Ikeda ,  Takahiro Mashimo ,  Eiji Shidoji ,  Toshihisa Kamiyama ,  Yoshihito Katayama

发明人： Toru Ikeda ,  Takahiro Mashimo ,  Eiji Shidoji ,  Toshihisa Kamiyama ,  Yoshihito Katayama

IPC分类号： C23C14/00 ,  C23C14/32

CPC分类号： G02B1/10 ,  C23C14/0042 ,  C23C14/0094 ,  C23C14/083 ,  C23C14/10

摘要： The invention provides a method for producing a silicon oxide film, whereby a film having uniform optical constants such as refractive index, absorption coefficient, etc. can be formed continuously at a high deposition rate.A method for producing a silicon oxide film, which comprises depositing a silicon oxide film on a substrate by carrying out AC sputtering by using a sputtering target comprising silicon carbide and silicon with a ratio in number of atoms of C to Si being from 0.5 to 0.95, in an atmosphere containing an oxidizing gas, with an alternating current having a frequency of from 1 to 1,000 kHz.

摘要翻译： 本发明提供一种制造氧化硅膜的方法，由此可以以高沉积速率连续地形成具有均匀光学常数如折射率，吸收系数等的膜。 一种制造氧化硅膜的方法，其包括通过使用包含碳化硅和硅的溅射靶进行AC溅射在基板上沉积氧化硅膜，其中C与Si的原子数之比为0.5至0.95 在含有氧化气体的气氛中，具有频率为1至1,000kHz的交流电。

公开(公告)号：US20050205998A1

公开(公告)日：2005-09-22

申请号：US11110849

申请日：2005-04-21

申请人： Tomohiro Yamada ,  Eiji Shidoji ,  Akira Mitsui ,  Takuji Oyama ,  Toshihisa Kamiyama

发明人： Tomohiro Yamada ,  Eiji Shidoji ,  Akira Mitsui ,  Takuji Oyama ,  Toshihisa Kamiyama

IPC分类号： C23C14/08 ,  C23C14/10 ,  H01L21/4763 ,  H01L23/48 ,  H01Q1/12

CPC分类号： C23C14/10 ,  C23C14/083 ,  H01Q1/1271 ,  Y10T428/26 ,  Y10T428/266

摘要： A multilayer film-coated substrate having the stress of the film relaxed by depositing a multilayer film comprising a metal oxide film and a silicon oxide film on a substrate at a high speed by a sputtering method using a conductive sputtering material, and a process for producing a multilayer film-coated substrate having such a low stress, are presented. A multilayer film-coated substrate comprising a substrate and at least a metal oxide film and a silicon oxide film laminated thereon repeatedly at least once, wherein at least one layer of said metal oxide film is a metal oxide film deposited by sputtering by using, as the target material, a metal oxide MOX which is deficient in oxygen than the stoichiometric composition, to have the oxygen deficiency resolved, and the stress of the multilayer film is from −100 MPa to +100 MPa.

摘要翻译： 通过使用导电性溅射材料的溅射法，通过在基板上高速沉积包含金属氧化物膜和氧化硅膜的多层膜而使薄膜的应力弛豫的多层膜被覆基板，以及制造方法 提出了具有如此低应力的多层膜涂覆的基板。 一种多层膜被覆基板，包括基板和至少一层金属氧化物膜和氧化硅膜，其上重复层叠至少一次，其中至少一层所述金属氧化物膜是通过溅射沉积的金属氧化物膜，其通过使用作为 目标材料，缺氧量低于化学计量组成的金属氧化物MO X X，以使氧缺陷分解，多层膜的应力为-100MPa〜+100MPa。