公开(公告)号：US5427888A

公开(公告)日：1995-06-27

申请号：US101176

申请日：1993-08-03

申请人： Eiji Yoda ,  Hitoshi Yuasa ,  Yutaka Otsuki

发明人： Eiji Yoda ,  Hitoshi Yuasa ,  Yutaka Otsuki

IPC分类号： C08K5/42 ,  C08K5/41 ,  C08L101/00 ,  G03F7/022 ,  G03F7/023 ,  G03F7/039 ,  H05K3/00 ,  H05K3/06 ,  G03F7/30

CPC分类号： G03F7/0233 ,  H05K3/0076 ,  H05K3/0094 ,  Y10S430/111

摘要： A positive photosensitive resin composition contains 50 to 95 parts by weight of a resin (a) composed of a high molecular compound (A) having a molecular weight of 300 to 30,000 and an iodine value of 50 to 500 and containing carbon-carbon double bonds and a group represented by the formula (I) ##STR1## wherein R.sub.1 denotes a hydrogen atom, a halogen atom or an alkyl group having 1 to 3 carbon atoms and X denotes a hydrogen atom or a bond, on the proviso that if X denotes the bond, a carbon atom linked to R.sub.1 and a carbon atom linked to a hydrogen atom together form a portion of a main chain of the high molecular compound (A), and a group represented by the formula (II) ##STR2## wherein R.sub.1 and X denote the same as above, and R.sub.2 denotes an alkyl, cycloalkyl or aryl group, and 5 to 50 parts by weight of a compound (b) containing quinone diazide groups.

摘要翻译： 正型感光性树脂组合物含有50〜95重量份的由分子量为300〜30,000的高分子化合物（A）和碘值为50〜500的含有碳 - 碳双键的树脂（a） 和由式（I）表示的基团，其中R 1表示氢原子，卤素原子或具有1至3个碳原子的烷基，X表示氢原子或键，条件是 如果X表示键，则与R1连接的碳原子和与氢原子连接的碳原子一起形成高分子化合物（A）的主链的一部分，由式（II）表示的基团（II）其中R1和X表示与上述相同的含义，R2表示烷基，环烷基或芳基，以及5-50重量份含有醌二叠氮基的化合物（b）。

公开(公告)号：US5368977A

公开(公告)日：1994-11-29

申请号：US34357

申请日：1993-03-19

申请人： Eiji Yoda ,  Hitoshi Yuasa ,  Yutaka Otsuki

发明人： Eiji Yoda ,  Hitoshi Yuasa ,  Yutaka Otsuki

IPC分类号： G03F7/023

CPC分类号： G03F7/023

摘要： A positive type photosensitive resin composition contains (a) a quinone diazido phenolic resin represented by the formula: ##STR1## wherein R.sup.1 is an alkyl group having 1 to 4 carbon atoms, R.sup.2 is a bivalent hydrocarbon residue having 5 to 16 carbon atoms provided that groups bound to R.sup.2 do not bind with the same carbon atom of R.sup.2, D.sup.1, D.sup.2 and D.sup.3 and are the same or different groups and each represent a hydrogen atom or a quinone diazido unit represented by ##STR2## provided that a molar ratio of the hydrogen atom to the quinone diazido unit is 0 to 10, m is a number of 0 to 10, n is a number of 1 or 2, and l.sub.1, l.sub.2 and l.sub.3 are the same or different numbers and each represent a number of 1 to 3; and (b) an alkali-soluble resin.

摘要翻译： 正型型感光性树脂组合物含有（a）由式（Ⅰ）表示的醌二叠氮酚醛树脂，其中R1为碳原子数为1〜4的烷基，R2为碳原子数为5〜16的二价烃基 条件是与R2结合的基团不与R2，D1，D2和D3的相同碳原子结合，并且是相同或不同的基团，并且各自表示由 表示的氢原子或醌二叠氮基单元 氢原子与醌二叠氮基单元的摩尔比为0〜10，m为0〜10的数，n为1或2的数，l1，l2和l3分别相同或不同。 代表1到3的数字; 和（b）碱溶性树脂。

公开(公告)号：US5096800A

公开(公告)日：1992-03-17

申请号：US618387

申请日：1990-11-27

申请人： Hitoshi Yuasa ,  Eiji Yoda ,  Haruyoshi Sato ,  Yutaka Otsuki

发明人： Hitoshi Yuasa ,  Eiji Yoda ,  Haruyoshi Sato ,  Yutaka Otsuki

IPC分类号： G03F7/027 ,  C08F2/48 ,  C08F290/00 ,  C08F299/00 ,  C08L47/00 ,  C09D4/00 ,  C09D147/00 ,  G03F7/033 ,  H05K3/28

CPC分类号： G03F7/033 ,  H05K3/287

摘要： A resin composition for forming a durable protection coating contains (A) an alkali-soluble resin which is a polymer of a conjugated diene and has a monoamidated succinic acid group represented by the following formula (I) of: ##STR1## wherein R.sup.1 and R.sup.2 each stand for a hydrogen atom, a halogen atom or an organic residue having 1 to 3 carbon atoms; and R.sup.3 stands for an organic residue having 1 to 16 carbon atoms; (B) a pre-polymer having a photosensitive ethylenic double bond; and (C) a photopolymerization initiator. The mixing ratio by weight of the alkali-soluble resin (A) to the pre-polymer (B) ranges from 1:4 to 4:1. A process for preparing the durable protection coating contains applying the resin composition on a substrate, and exposing the resin composition to ultraviolet ray through a circuit pattern mask to cure the resin composition followed by development and after-curing to form the protection coating.