公开(公告)号：US20130230796A1

公开(公告)日：2013-09-05

申请号：US13883850

申请日：2011-11-18

申请人： Hiroki Yoshikawa ,  Souichi Fukaya ,  Yukio Inazuki ,  Tsuneo Yamamoto ,  Hideo Nakagawa

发明人： Hiroki Yoshikawa ,  Souichi Fukaya ,  Yukio Inazuki ,  Tsuneo Yamamoto ,  Hideo Nakagawa

IPC分类号： G03F1/50

CPC分类号： G03F1/80 ,  B32B15/01 ,  C22C27/06 ,  C23C14/0641 ,  C23C14/0676 ,  G03F1/00 ,  G03F1/30 ,  G03F1/50 ,  G03F1/54

摘要： In the chromium-containing material film of the present invention, an element is added thereto and is capable of bringing a mixture of the element and the chromium into a liquid phase at a temperature of 400° C. or lower. The use of such a chromium-containing material film as an optical film (e.g., a light-shielding film, an etching mask film, or an etching stopper film) of a photo mask blank can achieve an improvement in chlorine-dry etching while retaining the same optical characteristics and the like as those of the conventional chromium-containing material film, thereby increasing the patterning precision.

公开(公告)号：US06689515B2

公开(公告)日：2004-02-10

申请号：US09805902

申请日：2001-03-15

申请人： Nobuyuki Yoshioka ,  Akihiko Isao ,  Susumu Kawada ,  Tsuneo Yamamoto ,  Jun Amano ,  Ryoichi Kobayashi

发明人： Nobuyuki Yoshioka ,  Akihiko Isao ,  Susumu Kawada ,  Tsuneo Yamamoto ,  Jun Amano ,  Ryoichi Kobayashi

IPC分类号： G03F900

CPC分类号： C23C14/0057 ,  C23C14/0676 ,  C23C14/50 ,  G03F1/32

摘要： A uniform thin phase-shifting photomask blank can be formed by depositing a thin film on a substrate by a reactive sputtering technique while passing, at least four times, the substrate over a sputtering target. In the formation of the blank, NO gas is used as the reactive gas, a target composed of a mixture of molybdenum and silicon is used as the sputtering target and a transparent substrate is used as the thin film-forming substrate to form, on the transparent substrate, a light-transmitting film capable of transmitting light rays having an intensity, which cannot substantially contribute to the exposure. In addition, the film is formed, on the substrate, through an opening having a sufficiently enlarged length along the substrate-conveying direction so that even regions whose deposition rate of the target component is not more than 90% of the maximum level thereof also contribute to the film-formation. The phase-shifting photomask blank thus prepared is subjected to a patterning treatment to form a phase-shifting photomask.

摘要翻译： 可以通过反应溅射技术在衬底上沉积薄膜，同时在溅射靶上通过至少四次衬底来形成均匀的薄移相光掩模坯料。 在坯料的形成中，使用NO气体作为反应气体，使用由钼和硅的混合物构成的靶作为溅射靶，并且使用透明衬底作为薄膜形成衬底，以形成 透明基板，能够透射具有强度的光线的透光膜，其不能显着地有助于曝光。 此外，膜在基板上通过沿着基板输送方向具有足够长的长度的开口形成，使得目标成分的成膜速度不超过其最大值的90％的均匀区域也有贡献 到电影形成。 将如此制备的相移光掩模坯料进行图案化处理以形成相移光掩模。

公开(公告)号：US5952128A

公开(公告)日：1999-09-14

申请号：US633338

申请日：1996-04-17

申请人： Akihiko Isao ,  Susumu Kawada ,  Yoshihiro Saito ,  Tsuneo Yamamoto ,  Atsushi Hayashi ,  Nobuyuki Yoshioka ,  Akira Chiba ,  Junji Miyazaki

发明人： Akihiko Isao ,  Susumu Kawada ,  Yoshihiro Saito ,  Tsuneo Yamamoto ,  Atsushi Hayashi ,  Nobuyuki Yoshioka ,  Akira Chiba ,  Junji Miyazaki

IPC分类号： C23C14/06 ,  C23C14/34 ,  G03F1/32 ,  G03F9/00

CPC分类号： G03F1/32 ,  C23C14/0676 ,  C23C14/3414

摘要： A phase-shifting photomask blank is made by sputtering a target of molybdenum suicide with a sputtering gas to which nitric monoxide is added in a ratio of 2.65-6.47% by volume. A nitrided-oxide film of molybdenum silicide as a phase-shifting film is formed on a transparent substrate. A base phase-shifting film may be formed on a transparent substrate and then a nitrided-oxide film of molybdenum silicide as a surface layer may be formed on top of the base phase-shifting film by sputtering a target of molybdenum silicide with a sputtering gas to which nitric monoxide is added in a ratio of 0.59-6.47% by volume. The transparent substrate on which the nitrided-oxide film of molybdenum slicide is formed may be subjected to a heat treatment at a temperature of 200.degree. C. or more.

摘要翻译： 通过以2.65-6.47体积％的比例加入一氧化氮的溅射气体溅射硅化钼靶，制成相移光掩模坯料。 在透明基板上形成硅化钼作为移相膜的氮化氧化物膜。 基底相移膜可以形成在透明基板上，然后可以通过用溅射气体溅射硅化钼靶，在基底相移膜的顶部上形成作为表面层的硅化钼的氮化氧化物膜 加入一氧化氮的比例为0.59-6.47％（体积）。 其上形成有切割钼的氮化氧化物膜的透明基板可以在200℃以上的温度下进行热处理。

公开(公告)号：US5938897A

公开(公告)日：1999-08-17

申请号：US876906

申请日：1997-06-16

申请人： Akihiko Isao ,  Susumu Kawada ,  Yoshihiro Saito ,  Tsuneo Yamamoto ,  Atsushi Hayashi ,  Nobuyuki Yoshioka ,  Akira Chiba ,  Junji Miyazaki

发明人： Akihiko Isao ,  Susumu Kawada ,  Yoshihiro Saito ,  Tsuneo Yamamoto ,  Atsushi Hayashi ,  Nobuyuki Yoshioka ,  Akira Chiba ,  Junji Miyazaki

IPC分类号： C23C14/06 ,  C23C14/34 ,  G03F1/32 ,  C23C14/14

CPC分类号： G03F1/32 ,  C23C14/0676 ,  C23C14/3414

摘要： A phase-shifting photomask blank is made by sputtering a target of molybdenum silicide with a sputtering gas to which nitric monoxide is added in a ratio of 2.65-6.47% by volume. A nitrided-oxide film of molybdenum silicide as a phase-shifting film is formed on a transparent substrate. A base phase-shifting film may be formed on a transparent substrate and then a nitrided-oxide film of molybdenum silicide as a surface layer may be formed on top of the base phase-shifting film by sputtering a target of molybdenum silicide with a sputtering gas to which nitric monoxide is added in a ratio of 0.59-6.47% by volume. The transparent substrate on which the nitrided-oxide film of molybdenum slicide is formed may be subjected to a heat treatment at a temperature of 200.degree. C. or more.

摘要翻译： 通过用溅射气体以2.65-6.47体积％的比例加入一氧化氮，溅射硅化钼靶，制成相移光掩模坯料。 在透明基板上形成硅化钼作为移相膜的氮化氧化物膜。 基底相移膜可以形成在透明基板上，然后可以通过用溅射气体溅射硅化钼靶，在基底相移膜的顶部上形成作为表面层的硅化钼的氮化氧化物膜 加入一氧化氮的比例为0.59-6.47％（体积）。 其上形成有切割钼的氮化氧化物膜的透明基板可以在200℃以上的温度下进行热处理。

公开(公告)号：US4515915A

公开(公告)日：1985-05-07

申请号：US570313

申请日：1984-01-13

申请人： Junji Uda ,  Tsuneo Yamamoto ,  Takumi Kosugi

发明人： Junji Uda ,  Tsuneo Yamamoto ,  Takumi Kosugi

IPC分类号： C08L79/08 ,  C08G73/10 ,  C08K5/34

CPC分类号： C08G73/1007

摘要： A polyamide acid composition for preparing a polyimide which is improved in the stability in a form of solution and can extend the pot life of the composition comprising a solution of a polyamide acid in an organic solvent, the polyamide acid being a precursor of the polyimide, and an N-substituted heterocyclic compound as a chemical treating agent which can lower a rate of conversion of the polyamide acid to the polyimide. The pot life can be extremely extended to give the composition an enough flowability for a long time without reducing the excellent properties such as a heat resistance of the obtained polyimide.

摘要翻译： 一种用于制备聚酰亚胺的聚酰胺酸组合物，其以溶液形式的稳定性得到改善，并且可以延长包含聚酰胺酸在有机溶剂中的溶液的组合物的适用期，聚酰胺酸是聚酰亚胺的前体， 和作为能降低聚酰胺酸向聚酰亚胺的转化率的化学处理剂的N-取代的杂环化合物。 使用寿命可以极大地延长，以使组合物长时间地具有足够的流动性，而不会降低所得聚酰亚胺的优异性能如耐热性。

公开(公告)号：US20120215968A1

公开(公告)日：2012-08-23

申请号：US13401033

申请日：2012-02-21

申请人： Nobuya Uematsu ,  Tsuneo Yamamoto

发明人： Nobuya Uematsu ,  Tsuneo Yamamoto

IPC分类号： G06F12/02

CPC分类号： G11C16/16 ,  G06F12/0246 ,  G06F2212/7205 ,  G11C16/3445 ,  G11C29/82

摘要： To record data in a flash memory, upon detecting that a current destination memory block is full, a control apparatus records data in a destination memory block one block by one block, with “in-advance” data erasure of the next memory block and by determining if data erasure of the next memory block is successful. When data erasure of the next memory block fails, such memory block is designated as broken, and such memory block is excluded from a group of blocks to be used as recording destination. After determining the data erasure result of a yet-next memory block is successful, the required data is copied to the yet-next memory block. Therefore, even when one of the blocks is broken, a sequential data recording in the flash memory is performed without increasing the number of data copy operations between blocks.

摘要翻译： 为了将数据记录在闪速存储器中，在检测到当前目的地存储器块已满时，控制装置以一个块为单位将目的地存储块中的数据以下一个存储器块的“提前”数据擦除，并通过 确定下一个存储块的数据擦除是否成功。 当下一个存储器块的数据擦除失败时，这种存储器块被指定为损坏，并且这样的存储器块被从用作记录目的地的一组块中排除。 在确定下一个存储器块的数据擦除结果成功之后，所需数据被复制到下一个存储块。 因此，即使当其中一个块被破坏时，在不增加块之间的数据复制操作的次数的情况下执行闪速存储器中的顺序数据记录。

公开(公告)号：US6166351A

公开(公告)日：2000-12-26

申请号：US437640

申请日：1999-11-10

申请人： Tsuneo Yamamoto

发明人： Tsuneo Yamamoto

IPC分类号： B60H1/00 ,  B60H1/03 ,  B60H1/22 ,  B60L1/02

CPC分类号： B60H1/2225 ,  B60H1/00064 ,  B60H1/034 ,  B60H2001/00128 ,  B60H2001/00135 ,  B60H2001/2296 ,  F24H3/0405 ,  F24H3/0429 ,  F24H9/1863 ,  F24H9/1872

摘要： In an air conditioning apparatus for a vehicle, plural electrical heating members are integrated with a heater core for heating air. The air conditioning apparatus includes a first control unit for determining number of the electrical heating members to be operated, and a second control unit for controlling electrical power supplied to each of the electrical heating members based on the number determined by the first control unit. The second control unit preferentially supplies electrical power to an electrical heating member plated at a side of a foot opening through which air blown toward a lower side of a passenger compartment. Thus, the lower side of the passenger compartment can be preferentially quickly heated by heat generated from the electrical heating members.

摘要翻译： 在车辆用空调装置中，多个电加热构件与用于加热空气的加热器芯一体化。 空调装置包括：第一控制单元，用于确定要操作的电加热构件的数量;以及第二控制单元，用于基于由第一控制单元确定的数量来控制供应给每个电加热构件的电力。 第二控制单元优选向电气加热部件供电，所述电加热部件镀在位于乘客室的下侧吹入的脚部开口侧。 因此，可以通过从电加热构件产生的热量来优先地快速地加热乘客舱的下侧。

公开(公告)号：US5737786A

公开(公告)日：1998-04-14

申请号：US690146

申请日：1996-07-31

申请人： Tsuneo Yamamoto

发明人： Tsuneo Yamamoto

IPC分类号： A61G7/00 ,  A61G7/02 ,  A61G7/16 ,  A61H33/00

CPC分类号： A61G7/02 ,  A61G7/0005

摘要： In a collapsible bed structure for bed-ridden invalids, a bed section is provided on an upper open end of a bathtub, the bed section having at least first, second and third bed plates each pivotably connected at their neighboring side. A link structure is provided to change the bed section between a rest position in which the first, second and third bed plates are horizontally supported and an operative position in which the first, second and third bed plates are supported in a chair-shaped configuration within the bathtub. A pedestal plate is pivotably placed at one end by a hinge to the first plate of the bed section, the pedestal plate having a rack operative to move the pedestal plate upward around the hinge so as to raise the haunches of an occupant lying on the bed section to expedite the occupant's divestiture. A slide plate is slidably mounted on each of the first and second bed plates of the bed section to slightly slide along a lengthwise direction of the occupant so as to prevent a slippage between the occupant lying on the bed section and the first and second bed plates when changing the bed section from the rest position to the operative position.

摘要翻译： 在卧床无门的可折叠床结构中，在浴缸的上开口端设有床部，床部具有至少第一，第二和第三床板，每个床板在其相邻侧面可枢转地连接。 提供了一种连杆结构，以在第一，第二和第三床板水平地支撑的休息位置和第一，第二和第三床板之间以椅子形状的形式支撑着其中的工作位置 浴缸。 基座板的一端通过铰链枢转地放置在床部分的第一板上，底座板具有一个齿条，可操作以使底座板向上移动铰链，以便抬起躺在床上的乘员的臀部 以加快占用人的剥离。 滑动板可滑动地安装在床部分的每个第一床板和第二床板上，以沿乘员的长度方向稍微滑动，以防止躺在床部分上的乘员与第一和第二床板之间的滑动 当将床部分从休息位置改变到操作位置时。

公开(公告)号：US4832772A

公开(公告)日：1989-05-23

申请号：US202299

申请日：1988-06-06

申请人： Takehiko Noguchi ,  Yoshiki Takeoka ,  Tsuneo Yamamoto

发明人： Takehiko Noguchi ,  Yoshiki Takeoka ,  Tsuneo Yamamoto

IPC分类号： B29C71/00 ,  B29C59/02 ,  B29C59/04 ,  B29L7/00

CPC分类号： B29C59/02 ,  B29C59/04 ,  Y10T156/1956

摘要： There is provided a method for plastic film surface treatment for improving printability and adhesion properties which comprises feeding a plastic film and a wiping web in the opposite direction to each other in a ratio of the film running speed to the wiping web running speed being 1/1 to 100/1 and bringing them into contact with each other between knip rolls under a proper pressure, whereby a weak layer containing oligomers and additives is wiped off from the plastic film surface. The treatment improves the printability and adhesion of film inexpensively in a stable manner without being affected by the varied properties of film to be treated and also without deteriorating the physical properties of the film.

摘要翻译： 提供了一种用于改善印刷性和粘合性的塑料膜表面处理方法，其包括以相对于彼此的相反方向馈送塑料膜和擦拭幅材，其中膜运行速度与擦拭纸幅运动速度的比率为1 / 1〜100/1，并在适当的压力下使它们彼此接触，从而从塑料膜表面擦除含有低聚物和添加剂的弱层。 该处理可以稳定地改善薄膜的可印刷性和附着性，而不受待处理的膜的变化性能的影响，并且也不会降低膜的物理性能。

公开(公告)号：US4742099A

公开(公告)日：1988-05-03

申请号：US936524

申请日：1986-12-01

申请人： Hirosaku Nagano ,  Junji Takase ,  Hideki Kawai ,  Hitoshi Nojiri ,  Tsuneo Yamamoto

发明人： Hirosaku Nagano ,  Junji Takase ,  Hideki Kawai ,  Hitoshi Nojiri ,  Tsuneo Yamamoto

IPC分类号： C08J5/18 ,  C08K3/24 ,  C08K5/00 ,  C08K5/04 ,  C08K5/42 ,  C08K5/52 ,  C08L79/08

CPC分类号： C08J5/18 ,  C08K5/0091 ,  C08J2379/08

摘要： A new polyimide film which contains 30 to 800 ppm of titanium based on the weight of the film, and a process for producing a new polyimide film which comprises introducing an organic titanium compound substance into the film-forming polyimide resin prior to the casting step. This process enables one to control the film surface forming process and improve directly the adhesive properties of the film.

摘要翻译： 一种新的聚酰亚胺薄膜，其包含基于薄膜重量的30至800ppm的钛，以及一种新的聚酰亚胺薄膜的制造方法，其包括在铸造步骤之前将有机钛化合物引入成膜聚酰亚胺树脂中。 该方法使得能够控制膜表面形成过程并直接改善膜的粘合性能。