公开(公告)号：US07102749B2

公开(公告)日：2006-09-05

申请号：US11101736

申请日：2005-04-07

申请人： Noah Bareket

发明人： Noah Bareket

IPC分类号： G01B11/00

CPC分类号： G03F7/70633

摘要： A mark comprising at least one set of calibration periodic structures and at least two sets of test periodic structures, both types of which are positioned along an axis. The mark is used to measure the relative position between two layers of a device. Each set of test periodic structures has its periodic structures formed within first and second sections. The periodic structures of the first and second sections are each formed on one of the two layers of the device, respectively. The first and second sections of each test set is positioned proximate to the second and first sections of the next test set, respectively. This mark allows two beams which scan the mark to travel over both a test section formed on one layer of the device and a test section formed on the other of the two layers. Scanning multiple test sets provides multiple registration error values which are then averaged to obtain an average registration error value. Another aspect of the present invention is directed towards a method for measuring the relative position between two layers of a device. The method begins by providing a mark as described above. A beam is scanned in a first path across the mark. A beam is then scanned in a second path across the mark. Signals are generated with respect to the portion of each beam which reflects off the surface of the device so that the registration error between the two layers may be calculated.

公开(公告)号：US4583855A

公开(公告)日：1986-04-22

申请号：US581185

申请日：1984-02-17

申请人： Noah Bareket

发明人： Noah Bareket

IPC分类号： G01J9/02

CPC分类号： G01J9/02 ,  G01J2009/0261

摘要： An apparatus is described for measuring spatial phase difference between a signal beam and a reference beam in substantially real time, where the signal and reference beams are coherent beams of optical radiation superimposed upon each other and having orthogonal polarization states with respect to each other.

摘要翻译： 描述了用于基本上实时地测量信号光束和参考光束之间的空间相位差的装置，其中信号和参考光束是相互叠加并具有彼此具有正交极化状态的光辐射的相干光束。

公开(公告)号：US07301634B2

公开(公告)日：2007-11-27

申请号：US10785821

申请日：2004-02-23

申请人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Christopher F. Bevis ,  John Fielden ,  Noah Bareket ,  Anatoly Fabrikant ,  Mark Ghinovker ,  Piotr Zalicki ,  Dan Wack

发明人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Christopher F. Bevis ,  John Fielden ,  Noah Bareket ,  Anatoly Fabrikant ,  Mark Ghinovker ,  Piotr Zalicki ,  Dan Wack

IPC分类号： G01B11/00

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an interferometer is employed to modulate substantially a plurality of wavelengths of a broadband source and then acquiring one or more images of the periodic targets. There are predefined offsets between the first and second structures. An overlay error between the first and second structures is then determined by analyzing the one or more acquired images from the periodic targets using a scatterometry overlay technique based on the predefined offsets.

摘要翻译： 公开了一种确定多层样本的两层之间的覆盖误差的方法。 对于每个具有由第一层形成的第一结构和由样本的第二层形成的第二结构的多个周期性目标，使用干涉仪来调制宽带源的基本上多个波长，然后获取一个或 更多图像的周期性目标。 在第一和第二结构之间有预定义的偏移。 然后通过使用基于预定义的偏移的散射测量覆盖技术来分析来自周期性目标的一个或多个获取的图像来确定第一和第二结构之间的重叠误差。

公开(公告)号：US06894783B2

公开(公告)日：2005-05-17

申请号：US10428908

申请日：2003-05-02

申请人： Noah Bareket

发明人： Noah Bareket

IPC分类号： G01B11/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G01B11/27

CPC分类号： G03F7/70633

摘要： A mark comprising at least one set of calibration periodic structures and at least two sets of test periodic structures, both types of which are positioned along an axis. The mark is used to measure the relative position between two layers of a device. Each set of test periodic structures has its periodic structures formed within first and second sections. The periodic structures of the first and second sections are each formed on one of the two layers of the device, respectively. The first and second sections of each test set is positioned proximate to the second and first sections of the next test set, respectively. This mark allows two beams which scan the mark to travel over both a test section formed on one layer of the device and a test section formed on the other of the two layers. Scanning multiple test sets provides multiple registration error values which are then averaged to obtain an average registration error value. Another aspect of the present invention is directed towards a method for measuring the relative position between two layers of a device. The method begins by providing a mark as described above. A beam is scanned in a first path across the mark. A beam is then scanned in a second path across the mark. Signals are generated with respect to the portion of each beam which reflects off the surface of the device so that the registration error between the two layers may be calculated.

摘要翻译： 包括至少一组校准周期性结构和至少两组测试周期性结构的标记，其两种类型沿轴线定位。 该标记用于测量设备两层之间的相对位置。 每组测试周期结构具有形成在第一和第二部分内的周期性结构。 第一和第二部分的周期性结构分别形成在装置的两层之一上。 每个测试集的第一和第二部分分别位于下一个测试集的第二和第一部分附近。 该标记允许扫描标记的两个光束在形成在装置的一层上的测试部分和形成在两个层中的另一层上的测试部分上行进。 扫描多个测试集提供多个配准误差值，然后对其进行平均以获得平均配准误差值。 本发明的另一方面涉及一种用于测量装置的两层之间的相对位置的方法。 该方法通过提供如上所述的标记开始。 在标记上的第一条路径中扫描光束。 然后在标记上的第二条路径中扫描光束。 相对于从设备表面反射的每个光束的部分产生信号，从而可以计算两层之间的配准误差。

公开(公告)号：US06577389B2

公开(公告)日：2003-06-10

申请号：US09888724

申请日：2001-06-25

申请人： Steve Biellak ,  Noah Bareket ,  Stanley E. Stokowski

发明人： Steve Biellak ,  Noah Bareket ,  Stanley E. Stokowski

IPC分类号： G01N2100

CPC分类号： G01N21/958

摘要： A method for detecting an anomaly on a first surface of a transparent substrate starts with providing a transparent substrate that has a reflective second surface. The method then comprises directing a radiation beam at the first surface of the substrate so that at least a portion of the radiation penetrates the substrate and strikes the reflective second surface. This radiation is reflected back as a reflected radiation beam through the first surface of the substrate. The method then comprises detecting radiation from the reflected radiation beam. This method can further comprise causing relative motion between the radiation beam and the first surface of the substrate. This method can also further comprise documenting the presence of an anomaly if the detected radiation shows that the reflected radiation beam was scattered upon traversing the first surface.

公开(公告)号：US4712913A

公开(公告)日：1987-12-15

申请号：US935900

申请日：1986-11-28

申请人： Noah Bareket

发明人： Noah Bareket

IPC分类号： G01J9/00 ,  G01B11/26

CPC分类号： G01J9/00

摘要： A plurality of sample beam wavefronts derived from selected portions of a wide-aperture outgoing optical beam wavefront enter an entrance pupil (11) located adjacent a focal surface (12) on which the sample beams are individually focussed. A relay lens system (13) transmits the sample beams to a beam splitter (14), which divides each of the sample beams into an undeviated component and a diviated component. The undeviated components of the various sample beams image the entrance pupil (11) on a first scanning mirror (15), and the deviated components image the entrance pupil (11) on a second scanning mirror (16). The focal surface (12) is reimaged by the relay lens system (13) onto focal planes (17 and 18), respectively, so that the foci of the individual sample beams appear as spots on the focal planes (17 and 18). The scanning mirrors (15 and 16) are ditherable to sweep each of the sample bean spots across a plurality of maching rows of linear photodector arrays positioned at each of the focal planes (17 and 18). Line centroids of the various line images of the samle beam spots are calculated by the centroid processor (19) from quantitative measurements of the irraddiance distributions of the line images at the focal planes (17, and 18) This calculation, which can be performed continuously in real time, provides an indication of the form of the wide-aperture outgoing wavefront.

摘要翻译： 衍生自宽孔径输出光束波阵面的选定部分的多个样本波束波前进入位于邻近聚焦表面（12）的入射光瞳（11），样本波束单独聚焦在其上。 中继透镜系统（13）将采样光束传送到分束器（14），分束器（14）将每个样本光束分成未变形分量和分离分量。 各个样本光束的未变形分量将第一扫描反射镜（15）上的入射光瞳（11）成像，并且偏离的分量将入射光瞳（11）成像在第二扫描反射镜（16）上。 焦距面（12）分别由中继透镜系统（13）重新成像到焦平面（17和18）上，使得各个样本光束的焦点在焦平面（17和18）上表现为斑点。 扫描反射镜（15和16）可抖动以扫描位于每个焦平面（17和18）处的多个加工行的线性光电二极管阵列中的每个样品豆斑点。 通过质心处理器（19）通过定焦测量焦平面（17和18）处的线图像的辐照度分布来计算样品束斑点的各种线图像的线质心。该计算可连续进行 实时地提供了宽光圈输出波前的形式的指示。

公开(公告)号：US07663753B2

公开(公告)日：2010-02-16

申请号：US11963730

申请日：2007-12-21

申请人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanevsky ,  Michael Friedmann ,  Ian Smith ,  Michael Adel ,  Anatoly Fabrikant ,  Christopher F. Bevis ,  John Fielden ,  Noah Bareket ,  Ken Gross ,  Piotr Zalicki ,  Dan Wack ,  Paola Dececco ,  Thaddeus G. Dziura ,  Mark Ghinovker

发明人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanevsky ,  Michael Friedmann ,  Ian Smith ,  Michael Adel ,  Anatoly Fabrikant ,  Christopher F. Bevis ,  John Fielden ,  Noah Bareket ,  Ken Gross ,  Piotr Zalicki ,  Dan Wack ,  Paola Dececco ,  Thaddeus G. Dziura ,  Mark Ghinovker

IPC分类号： G01B11/00

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. Target A is designed to have an offset Xa between its first and second structures portions; target B is designed to have an offset Xb; target C is designed to have an offset Xc; and target D is designed to have an offset Xd. Each of the offsets Xa, Xb, Xc and Xd is preferably different from zero; Xa is an opposite sign and differ from Xb; and Xc is an opposite sign and differs from Xd. The targets A, B, C and D are illuminated with electromagnetic radiation to obtain spectra SA, SB, SC, and SD from targets A, B, C, and D, respectively. Any overlay error between the first structures and the second structures is then determined using a linear approximation based on the obtained spectra SA, SB, SC, and SD.

摘要翻译： 公开了用于确定样品的两层之间的重叠误差的技术，装置和目标。 目标A设计成在其第一和第二结构部分之间具有偏移Xa; 目标B设计为具有偏移Xb; 目标C被设计为具有偏移Xc; 并且目标D被设计为具有偏移量Xd。 偏移量Xa，Xb，Xc和Xd中的每一个优选地不同于零; Xa是相反的符号，不同于Xb; Xc是相反的符号，与Xd不同。 目标A，B，C和D用电磁辐射照射，分别从目标A，B，C和D获得光谱SA，SB，SC和SD。 然后使用基于获得的光谱SA，SB，SC和SD的线性近似来确定第一结构和第二结构之间的任何覆盖误差。

公开(公告)号：US07379183B2

公开(公告)日：2008-05-27

申请号：US10785731

申请日：2004-02-23

申请人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Christopher F. Bevis ,  Paola Dececco ,  John Fielden ,  Noah Bareket ,  Kenneth P. Gross ,  Mark Ghinovker

发明人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Christopher F. Bevis ,  Paola Dececco ,  John Fielden ,  Noah Bareket ,  Kenneth P. Gross ,  Mark Ghinovker

IPC分类号： G01B11/00 ,  G01B11/02 ,  G01J4/00 ,  G01N21/55

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an optical system is employed to thereby measure an optical signal from each of the periodic targets. There are predefined offsets between the first and second structures. An overlay error is determined between the first and second structures by analyzing the measured optical signals from the periodic targets using a scatterometry overlay technique based on the predefined offsets.

摘要翻译： 公开了一种确定多层样本的两层之间的覆盖误差的方法。 对于每个具有由第一层形成的第一结构和由第二层样品形成的第二结构的多个周期性目标，采用光学系统，从而测量来自每个周期性目标的光信号。 在第一和第二结构之间有预定义的偏移。 通过使用基于预定偏移的散射测量覆盖技术来分析来自周期性目标的所测量的光信号，在第一和第二结构之间确定覆盖误差。

公开(公告)号：US07298481B2

公开(公告)日：2007-11-20

申请号：US10785395

申请日：2004-02-23

申请人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanevsky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Anatoly Fabrikant ,  Mark Ghinovker ,  John Fielden ,  Noah Bareket

发明人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanevsky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Anatoly Fabrikant ,  Mark Ghinovker ,  John Fielden ,  Noah Bareket

IPC分类号： G01B11/00

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For each of a plurality of periodic targets target that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, a plurality of optical signals are measured at a plurality of incident angles, wherein there are predefined offsets between the first and second structures. An overlay error is then determined between the first and second structures by analyzing the measured optical signals at the plurality of incident angles from the periodic targets using a scatterometry overlay technique based on the predefined offsets without using a calibration operation.

摘要翻译： 公开了一种确定多层样本的两层之间的覆盖误差的方法。 对于每个具有由第一层形成的第一结构和由第二层样品形成的第二结构的多个周期性目标中的每一个，多个光信号以多个入射角测量，其中存在 第一和第二结构之间的预定偏移量。 然后，在不使用校准操作的情况下，通过使用基于预定义的偏移的散射测量覆盖技术来分析来自周期性靶的多个入射角的测量光信号，从而在第一和第二结构之间确定覆盖误差。

公开(公告)号：US06614520B1

公开(公告)日：2003-09-02

申请号：US08993107

申请日：1997-12-18

申请人： Noah Bareket ,  Christian G. Desplat ,  Lance A. Glasser

发明人： Noah Bareket ,  Christian G. Desplat ,  Lance A. Glasser

IPC分类号： G01N2188

CPC分类号： G01N21/95607

摘要： Disclosed is a method of inspecting a reticle for defects that occur over time. The invention accomplishes this by generating and storing a “baseline” image of the reticle and then periodically generating a “current” image of the reticle and comparing the current and baseline images. The baseline image is taken at a time when the reticle is known to be acceptable. This may be when the reticle has been “qualified” by an optical test or when a die fabricated by reticle has passed an electrical test. Also disclosed in a method for compacting the baseline image before storage.

摘要翻译： 公开了一种检查掩模版以及随时间发生的缺陷的方法。 本发明通过生成和存储标线的“基线”图像，然后周期性地生成标线的“当前”图像并比较当前图像和基线图像来实现。 在已知掩模版可接受的时候拍摄基线图像。 这可能是当光掩膜通过光学测试“合格”时，或者通过掩模版制造的模具已经通过电气测试。 还在存储之前用于压缩基线图像的方法中公开。